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  • Influence of the substrate types on the molybdenum disulfide grown by thermal vapour sulfurization
  • Add time:08/16/2019         Source:sciencedirect.com

    The growth of molybdenum disulfide (MoS2) on different substrate types was demonstrated. MoS2(002) peak was found at ∼14°, however, single crystalline substrate with hexagonal lattice system shows the enhancement of peak intensity. Next, the single crystalline substrates result in highly compactness of MoS2 thin film. In contrast, nanoparticle feature surface morphology was grown by using the amorphous substrate. Multilayers of MoS2 was observed by using high-resolution transmission electron microscope. Several diffraction rings were detected which indicates the polycrystallinity quality of MoS2. Furthermore, the absorption features of MoS2 were found at ∼668 nm, ∼617 nm, and ∼447 nm. Resonant Raman features of MoS2 were determined. The lower, middle and higher frequency region reveals the structural defects, nanoparticle size or nanostructure topography and layer thickness estimation of MoS2, respectively.

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    Prev:A systematic study on the growth of molybdenum disulfide with the carbon disulfide as the sulfurizing source
    Next: Regular ArticleTuning the Schottky rectification in graphene-hexagonal boron nitride-molybdenum disulfide heterostructure)

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