Add time:09/07/2019 Source:sciencedirect.com
A volatile complex of copper(II) trifluoroacetate with 1,4-dioxan has been obtained together with its acetate and trichloroacetate analogues. These compounds have been found to be convenient precursors for the metal organic chemical vapour deposition (MOCVD) technique for the synthesis of copper-containing thin films (including high-temperature superconducting films).
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