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inquiry1.No Less 8 years exporting experience. Clients can 100% received goods 2.Lower Price with higher quality 3,Free sample 4,We are sincerely responsible for the "product quality" and "After Service" Upbio is Specialized
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inquiryHenan Wentao Chemical Product Co.,Ltd is Located in Zhengzhou High-tech Development Zone with import and export license, We passed ISO 9001:2008 as well, Henan Wentao has developed more than 1000 compounds, which are widely used in the fields of prod
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inquiryTris(trimethylsilyl)silaneAppearance:detailed see specifications Storage:Keep away of light, cool place Package:25kg/drum;200kg/drum Application:Used in Synthesis, Pharmaceuticals and other fields Transportation:Sea/air/courier
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inquirygood quality, competitive price, thoughtful after sale serviceAppearance:white powder Storage:Keep it in dry,shady and cool place Package:25kg,50kg,180kg,200kg,250kg,1000kg,customization Application:Pharma;Industry;Agricultural;chemical reaserch Tran
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inquiryWe are committed to providing our customers with the best products and services at the most competitive prices.Appearance:clear liquid Storage:Room temperature with sealed well Package:according to the clients requirement Application:Use as primary a
TRIS(TRIMETHYLSILYL)SILANEAppearance:white crystalline powder Storage:Store in dry, dark and ventilated place Package:25KG drum Application:pharmaceutical intermediate Transportation:by air, by sea, by express
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inquirytris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
With sulfuric acid In tetrahydrofuran; diethyl ether | 93% |
Conditions | Yield |
---|---|
Stage #1: tetrakis(trimethylsilyl)silane With potassium tert-butylate In tetrahydrofuran at 30 - 33℃; for 5h; Stage #2: With acetic acid In water at 5 - 10℃; for 2h; | 90.3% |
With methyllithium lithium bromide In diethyl ether at 20℃; for 19h; Inert atmosphere; | 77% |
Multi-step reaction with 2 steps 1: 80 percent / tetrahydrofuran / 1 h 2: 93 percent / H2SO4 / tetrahydrofuran; diethyl ether View Scheme |
Conditions | Yield |
---|---|
With sodium tetrahydroborate |
Conditions | Yield |
---|---|
With sodium tetrahydroborate |
Tris(trimethylsilyl)iodsilan
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
With sodium tetrahydroborate |
{(CH3)3Si}3SiCHO
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
In benzene-d6 at 100℃; Rate constant; decomposition; |
tris(trimethylsilyl)-2-fluoroethoxysilane
A
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
at 350℃; under 1E-06 Torr; for 0.166667h; Product distribution; thermolysis at various pressure and temperature; |
A
tris-(trimethylsilyl)silane
B
1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)-2-trisilanol
Conditions | Yield |
---|---|
at 180℃; Product distribution; | A 55 % Chromat. B 13 % Chromat. C 10 % Chromat. D n/a |
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
In benzene-d6 gradually decompn. in C6D6; |
Conditions | Yield |
---|---|
In not given detected by (1)H-NMR; | A 65-75 B n/a |
Conditions | Yield |
---|---|
In not given detected by (1)H-NMR; | A 65-75 B n/a |
Conditions | Yield |
---|---|
In not given room light, 1-2 d, ratio of educts 1:1, react. to 7:5 mixt. of diastereomers; detected by (1)H-NMR; | A 65-75 B n/a |
cyclohexylsilane
B
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
In not given detected by (1)H-NMR; | A 65-75 B n/a |
(2,4,6-trimethylphenyl)silane
B
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
In not given room light, 1-2 d, ratio of educts 1:1; detected by (1)H-NMR; | A 65-75 B n/a |
Conditions | Yield |
---|---|
In not given room light, ratio of educts 1:1, very slow react.; |
Conditions | Yield |
---|---|
In not given room light, ratio of educts 1:1, very slow react.; |
Conditions | Yield |
---|---|
In pentane Irradiation (UV/VIS); fluorescent room lighting, 1h; | A >99 B >99 |
In benzene Irradiation (UV/VIS); fluorescent room lighting, 1h; | A >99 B >99 |
In not given darkness, 2 d, room temp.; | A >99 B n/a |
Conditions | Yield |
---|---|
In not given room light, 1-2 d, ratio of educts 1:1; detected by (1)H-NMR; | A 65-75 B n/a |
Conditions | Yield |
---|---|
In benzene-d6 darkness, 6h; silanes not isolated, detected by NMR; |
Conditions | Yield |
---|---|
In not given Irradiation (UV/VIS); 5 min, fluorescent room light; | A >99 B >99 |
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
With water | |
With hydrogen at 50℃; under 760.051 Torr; for 12h; Temperature; | |
With tert-butyl alcohol |
Conditions | Yield |
---|---|
With hexachloroethane; palladium dichloride at 20℃; for 1h; | 100% |
With tetrachloromethane for 2h; Heating; | 95% |
With tetrachloromethane for 20h; | 76% |
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
With 2,2'-azobis(isobutyronitrile) In benzene for 4h; Heating; | 100% |
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
With sulfuric acid In tetrahydrofuran; diethyl ether | 93% |
Conditions | Yield |
---|---|
Stage #1: tetrakis(trimethylsilyl)silane With potassium tert-butylate In tetrahydrofuran at 30 - 33℃; for 5h; Stage #2: With acetic acid In water at 5 - 10℃; for 2h; | 90.3% |
With methyllithium lithium bromide In diethyl ether at 20℃; for 19h; Inert atmosphere; | 77% |
Multi-step reaction with 2 steps 1: 80 percent / tetrahydrofuran / 1 h 2: 93 percent / H2SO4 / tetrahydrofuran; diethyl ether View Scheme |
Conditions | Yield |
---|---|
With sodium tetrahydroborate |
Conditions | Yield |
---|---|
With sodium tetrahydroborate |
Tris(trimethylsilyl)iodsilan
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
With sodium tetrahydroborate |
{(CH3)3Si}3SiCHO
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
In benzene-d6 at 100℃; Rate constant; decomposition; |
tris(trimethylsilyl)-2-fluoroethoxysilane
A
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
at 350℃; under 1E-06 Torr; for 0.166667h; Product distribution; thermolysis at various pressure and temperature; |
A
tris-(trimethylsilyl)silane
B
1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)-2-trisilanol
Conditions | Yield |
---|---|
at 180℃; Product distribution; | A 55 % Chromat. B 13 % Chromat. C 10 % Chromat. D n/a |
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
In benzene-d6 gradually decompn. in C6D6; |
Conditions | Yield |
---|---|
In not given detected by (1)H-NMR; | A 65-75 B n/a |
Conditions | Yield |
---|---|
In not given detected by (1)H-NMR; | A 65-75 B n/a |
Conditions | Yield |
---|---|
In not given room light, 1-2 d, ratio of educts 1:1, react. to 7:5 mixt. of diastereomers; detected by (1)H-NMR; | A 65-75 B n/a |
cyclohexylsilane
B
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
In not given detected by (1)H-NMR; | A 65-75 B n/a |
(2,4,6-trimethylphenyl)silane
B
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
In not given room light, 1-2 d, ratio of educts 1:1; detected by (1)H-NMR; | A 65-75 B n/a |
Conditions | Yield |
---|---|
In not given room light, ratio of educts 1:1, very slow react.; |
Conditions | Yield |
---|---|
In not given room light, ratio of educts 1:1, very slow react.; |
Conditions | Yield |
---|---|
In pentane Irradiation (UV/VIS); fluorescent room lighting, 1h; | A >99 B >99 |
In benzene Irradiation (UV/VIS); fluorescent room lighting, 1h; | A >99 B >99 |
In not given darkness, 2 d, room temp.; | A >99 B n/a |
Conditions | Yield |
---|---|
In not given room light, 1-2 d, ratio of educts 1:1; detected by (1)H-NMR; | A 65-75 B n/a |
Conditions | Yield |
---|---|
In benzene-d6 darkness, 6h; silanes not isolated, detected by NMR; |
Conditions | Yield |
---|---|
In not given Irradiation (UV/VIS); 5 min, fluorescent room light; | A >99 B >99 |
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
With water | |
With hydrogen at 50℃; under 760.051 Torr; for 12h; Temperature; | |
With tert-butyl alcohol |
Conditions | Yield |
---|---|
With hexachloroethane; palladium dichloride at 20℃; for 1h; | 100% |
With tetrachloromethane for 2h; Heating; | 95% |
With tetrachloromethane for 20h; | 76% |
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
With 2,2'-azobis(isobutyronitrile) In benzene for 4h; Heating; | 100% |
2,2-dimethyl-3-butyne
tris-(trimethylsilyl)silane
(E)-2-(3,3-dimethylbut-1-en-1-yl)-1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)trisilane
Conditions | Yield |
---|---|
With Eosin Y; potassium carbonate; triisopropylsilanethiol In 1,4-dioxane; water at 20℃; for 4h; Inert atmosphere; Irradiation; stereoselective reaction; | 99% |
With triethyl borane In benzene for 2h; Ambient temperature; | 88% |
tris-(trimethylsilyl)silane
phenylacetylene
(Z)-1,1,1,3,3,3-hexamethyl-2-styryl-2-(trimethylsilyl)trisilane
Conditions | Yield |
---|---|
With oxygen In water at 20℃; for 24h; optical yield given as %de; stereoselective reaction; | 99% |
With 2,2'-azobis(isobutyronitrile) In toluene at 130℃; for 0.0833333h; optical yield given as %de; stereoselective reaction; | 96% |
With oxygen at 20℃; for 0.5h; in sealed vial; | 93% |
tris-(trimethylsilyl)silane
Propiolic acid
(Z)-3-[tris(trimethylsilyl)silyl]propenoic acid
Conditions | Yield |
---|---|
With oxygen In water at 20℃; for 24h; optical yield given as %de; stereoselective reaction; | 99% |
With tris-(trimethylsilyl)silane; 2-hydroxyethanethiol In water at 100℃; for 4h; | 95% |
at 20℃; | 90% |
5-Hexen-1-ol
tris-(trimethylsilyl)silane
6-[tris(trimethylsilyl)]-1-hexanol
Conditions | Yield |
---|---|
With 1,1'-azobis(1-cyanocyclohexanenitrile) In water at 100℃; for 4h; | 99% |
1-octen-3-ol
tris-(trimethylsilyl)silane
6-[tris(trimethylsilyl)]-3-octanol
Conditions | Yield |
---|---|
With 1,1'-azobis(1-cyanocyclohexanenitrile) In water at 100℃; for 4h; | 99% |
tris-(trimethylsilyl)silane
di-tert-butylmercury
bis(tris(trimethylsilyl)silyl)mercury
Conditions | Yield |
---|---|
In hexane room temp. 24 h; | 99% |
In pentane Ar atm.; stirring (24 h, room temp.); cooling (-60°C), crystn.; | 87% |
In n-heptane byproducts: isobutane; Ar-atmosphere; 85°C; evapn., crystn.; | 82% |
tris-(trimethylsilyl)silane
2,6-dimethylphenyl isonitrile
Conditions | Yield |
---|---|
In benzene-d6 xylyl isocyanide was added to soln. of Ta-complex and HSi(SiMe3)3 in benzene-d6, 36 h, stirred for 1 h under N2; solvent was removed in vacuo; | 99% |
Conditions | Yield |
---|---|
In hexane hexane soln. of benzophenone was added to soln. of Ta-complex and HSi(SiMe3)3 in hexane, 72 h, stirred for 1 h at room temp. under N2; solvent was removed in vacuo; | 99% |
but-3-yn-1-yl acetate
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
With Eosin Y; potassium carbonate; triisopropylsilanethiol In 1,4-dioxane; water at 20℃; for 4h; Catalytic behavior; Reagent/catalyst; Inert atmosphere; Irradiation; stereoselective reaction; | 99% |
Conditions | Yield |
---|---|
With Eosin Y; potassium carbonate; triisopropylsilanethiol In 1,4-dioxane; water at 20℃; for 4h; Inert atmosphere; Irradiation; stereoselective reaction; | 99% |
n-octyne
tris-(trimethylsilyl)silane
(Z)-1,1,1,3,3,3-hexamethyl-2-(oct-1-en-1-yl)-2-(trimethylsilyl)trisilane
Conditions | Yield |
---|---|
With Eosin Y; potassium carbonate; triisopropylsilanethiol In 1,4-dioxane; water at 20℃; for 4h; Quantum yield; Solvent; Inert atmosphere; Irradiation; stereoselective reaction; | 99% |
Conditions | Yield |
---|---|
With oxygen; 2-hydroxyethanethiol In water at 20℃; for 24h; optical yield given as %de; stereoselective reaction; | 98% |
With 2,2'-azobis(isobutyronitrile) In toluene Heating; |
Conditions | Yield |
---|---|
With oxygen; 2-hydroxyethanethiol In water at 20℃; for 24h; optical yield given as %de; stereoselective reaction; | 98% |
Conditions | Yield |
---|---|
With 2,2'-azobis(isobutyronitrile) In toluene at 93℃; for 1h; Inert atmosphere; | 98% |
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