tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
With sulfuric acid In tetrahydrofuran; diethyl ether | 93% |
Conditions | Yield |
---|---|
Stage #1: tetrakis(trimethylsilyl)silane With potassium tert-butylate In tetrahydrofuran at 30 - 33℃; for 5h; Stage #2: With acetic acid In water at 5 - 10℃; for 2h; | 90.3% |
With methyllithium lithium bromide In diethyl ether at 20℃; for 19h; Inert atmosphere; | 77% |
Multi-step reaction with 2 steps 1: 80 percent / tetrahydrofuran / 1 h 2: 93 percent / H2SO4 / tetrahydrofuran; diethyl ether View Scheme |
Conditions | Yield |
---|---|
With sodium tetrahydroborate |
Conditions | Yield |
---|---|
With sodium tetrahydroborate |
Tris(trimethylsilyl)iodsilan
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
With sodium tetrahydroborate |
{(CH3)3Si}3SiCHO
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
In benzene-d6 at 100℃; Rate constant; decomposition; |
tris(trimethylsilyl)-2-fluoroethoxysilane
A
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
at 350℃; under 1E-06 Torr; for 0.166667h; Product distribution; thermolysis at various pressure and temperature; |
A
tris-(trimethylsilyl)silane
B
1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)-2-trisilanol
Conditions | Yield |
---|---|
at 180℃; Product distribution; | A 55 % Chromat. B 13 % Chromat. C 10 % Chromat. D n/a |
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
In benzene-d6 gradually decompn. in C6D6; |
Conditions | Yield |
---|---|
In not given detected by (1)H-NMR; | A 65-75 B n/a |
Conditions | Yield |
---|---|
In not given detected by (1)H-NMR; | A 65-75 B n/a |
Conditions | Yield |
---|---|
In not given room light, 1-2 d, ratio of educts 1:1, react. to 7:5 mixt. of diastereomers; detected by (1)H-NMR; | A 65-75 B n/a |
cyclohexylsilane
B
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
In not given detected by (1)H-NMR; | A 65-75 B n/a |
(2,4,6-trimethylphenyl)silane
B
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
In not given room light, 1-2 d, ratio of educts 1:1; detected by (1)H-NMR; | A 65-75 B n/a |
Conditions | Yield |
---|---|
In not given room light, ratio of educts 1:1, very slow react.; |
Conditions | Yield |
---|---|
In not given room light, ratio of educts 1:1, very slow react.; |
Conditions | Yield |
---|---|
In pentane Irradiation (UV/VIS); fluorescent room lighting, 1h; | A >99 B >99 |
In benzene Irradiation (UV/VIS); fluorescent room lighting, 1h; | A >99 B >99 |
In not given darkness, 2 d, room temp.; | A >99 B n/a |
Conditions | Yield |
---|---|
In not given room light, 1-2 d, ratio of educts 1:1; detected by (1)H-NMR; | A 65-75 B n/a |
Conditions | Yield |
---|---|
In benzene-d6 darkness, 6h; silanes not isolated, detected by NMR; |
Conditions | Yield |
---|---|
In not given Irradiation (UV/VIS); 5 min, fluorescent room light; | A >99 B >99 |
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
With water | |
With hydrogen at 50℃; under 760.051 Torr; for 12h; Temperature; | |
With tert-butyl alcohol |
Conditions | Yield |
---|---|
With hexachloroethane; palladium dichloride at 20℃; for 1h; | 100% |
With tetrachloromethane for 2h; Heating; | 95% |
With tetrachloromethane for 20h; | 76% |
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
With 2,2'-azobis(isobutyronitrile) In benzene for 4h; Heating; | 100% |
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
With sulfuric acid In tetrahydrofuran; diethyl ether | 93% |
Conditions | Yield |
---|---|
Stage #1: tetrakis(trimethylsilyl)silane With potassium tert-butylate In tetrahydrofuran at 30 - 33℃; for 5h; Stage #2: With acetic acid In water at 5 - 10℃; for 2h; | 90.3% |
With methyllithium lithium bromide In diethyl ether at 20℃; for 19h; Inert atmosphere; | 77% |
Multi-step reaction with 2 steps 1: 80 percent / tetrahydrofuran / 1 h 2: 93 percent / H2SO4 / tetrahydrofuran; diethyl ether View Scheme |
Conditions | Yield |
---|---|
With sodium tetrahydroborate |
Conditions | Yield |
---|---|
With sodium tetrahydroborate |
Tris(trimethylsilyl)iodsilan
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
With sodium tetrahydroborate |
{(CH3)3Si}3SiCHO
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
In benzene-d6 at 100℃; Rate constant; decomposition; |
tris(trimethylsilyl)-2-fluoroethoxysilane
A
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
at 350℃; under 1E-06 Torr; for 0.166667h; Product distribution; thermolysis at various pressure and temperature; |
A
tris-(trimethylsilyl)silane
B
1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)-2-trisilanol
Conditions | Yield |
---|---|
at 180℃; Product distribution; | A 55 % Chromat. B 13 % Chromat. C 10 % Chromat. D n/a |
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
In benzene-d6 gradually decompn. in C6D6; |
Conditions | Yield |
---|---|
In not given detected by (1)H-NMR; | A 65-75 B n/a |
Conditions | Yield |
---|---|
In not given detected by (1)H-NMR; | A 65-75 B n/a |
Conditions | Yield |
---|---|
In not given room light, 1-2 d, ratio of educts 1:1, react. to 7:5 mixt. of diastereomers; detected by (1)H-NMR; | A 65-75 B n/a |
cyclohexylsilane
B
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
In not given detected by (1)H-NMR; | A 65-75 B n/a |
(2,4,6-trimethylphenyl)silane
B
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
In not given room light, 1-2 d, ratio of educts 1:1; detected by (1)H-NMR; | A 65-75 B n/a |
Conditions | Yield |
---|---|
In not given room light, ratio of educts 1:1, very slow react.; |
Conditions | Yield |
---|---|
In not given room light, ratio of educts 1:1, very slow react.; |
Conditions | Yield |
---|---|
In pentane Irradiation (UV/VIS); fluorescent room lighting, 1h; | A >99 B >99 |
In benzene Irradiation (UV/VIS); fluorescent room lighting, 1h; | A >99 B >99 |
In not given darkness, 2 d, room temp.; | A >99 B n/a |
Conditions | Yield |
---|---|
In not given room light, 1-2 d, ratio of educts 1:1; detected by (1)H-NMR; | A 65-75 B n/a |
Conditions | Yield |
---|---|
In benzene-d6 darkness, 6h; silanes not isolated, detected by NMR; |
Conditions | Yield |
---|---|
In not given Irradiation (UV/VIS); 5 min, fluorescent room light; | A >99 B >99 |
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
With water | |
With hydrogen at 50℃; under 760.051 Torr; for 12h; Temperature; | |
With tert-butyl alcohol |
Conditions | Yield |
---|---|
With hexachloroethane; palladium dichloride at 20℃; for 1h; | 100% |
With tetrachloromethane for 2h; Heating; | 95% |
With tetrachloromethane for 20h; | 76% |
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
With 2,2'-azobis(isobutyronitrile) In benzene for 4h; Heating; | 100% |
2,2-dimethyl-3-butyne
tris-(trimethylsilyl)silane
(E)-2-(3,3-dimethylbut-1-en-1-yl)-1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)trisilane
Conditions | Yield |
---|---|
With Eosin Y; potassium carbonate; triisopropylsilanethiol In 1,4-dioxane; water at 20℃; for 4h; Inert atmosphere; Irradiation; stereoselective reaction; | 99% |
With triethyl borane In benzene for 2h; Ambient temperature; | 88% |
tris-(trimethylsilyl)silane
phenylacetylene
(Z)-1,1,1,3,3,3-hexamethyl-2-styryl-2-(trimethylsilyl)trisilane
Conditions | Yield |
---|---|
With oxygen In water at 20℃; for 24h; optical yield given as %de; stereoselective reaction; | 99% |
With 2,2'-azobis(isobutyronitrile) In toluene at 130℃; for 0.0833333h; optical yield given as %de; stereoselective reaction; | 96% |
With oxygen at 20℃; for 0.5h; in sealed vial; | 93% |
tris-(trimethylsilyl)silane
Propiolic acid
(Z)-3-[tris(trimethylsilyl)silyl]propenoic acid
Conditions | Yield |
---|---|
With oxygen In water at 20℃; for 24h; optical yield given as %de; stereoselective reaction; | 99% |
With tris-(trimethylsilyl)silane; 2-hydroxyethanethiol In water at 100℃; for 4h; | 95% |
at 20℃; | 90% |
5-Hexen-1-ol
tris-(trimethylsilyl)silane
6-[tris(trimethylsilyl)]-1-hexanol
Conditions | Yield |
---|---|
With 1,1'-azobis(1-cyanocyclohexanenitrile) In water at 100℃; for 4h; | 99% |
1-octen-3-ol
tris-(trimethylsilyl)silane
6-[tris(trimethylsilyl)]-3-octanol
Conditions | Yield |
---|---|
With 1,1'-azobis(1-cyanocyclohexanenitrile) In water at 100℃; for 4h; | 99% |
tris-(trimethylsilyl)silane
di-tert-butylmercury
bis(tris(trimethylsilyl)silyl)mercury
Conditions | Yield |
---|---|
In hexane room temp. 24 h; | 99% |
In pentane Ar atm.; stirring (24 h, room temp.); cooling (-60°C), crystn.; | 87% |
In n-heptane byproducts: isobutane; Ar-atmosphere; 85°C; evapn., crystn.; | 82% |
tris-(trimethylsilyl)silane
2,6-dimethylphenyl isonitrile
Conditions | Yield |
---|---|
In benzene-d6 xylyl isocyanide was added to soln. of Ta-complex and HSi(SiMe3)3 in benzene-d6, 36 h, stirred for 1 h under N2; solvent was removed in vacuo; | 99% |
Conditions | Yield |
---|---|
In hexane hexane soln. of benzophenone was added to soln. of Ta-complex and HSi(SiMe3)3 in hexane, 72 h, stirred for 1 h at room temp. under N2; solvent was removed in vacuo; | 99% |
but-3-yn-1-yl acetate
tris-(trimethylsilyl)silane
Conditions | Yield |
---|---|
With Eosin Y; potassium carbonate; triisopropylsilanethiol In 1,4-dioxane; water at 20℃; for 4h; Catalytic behavior; Reagent/catalyst; Inert atmosphere; Irradiation; stereoselective reaction; | 99% |
Conditions | Yield |
---|---|
With Eosin Y; potassium carbonate; triisopropylsilanethiol In 1,4-dioxane; water at 20℃; for 4h; Inert atmosphere; Irradiation; stereoselective reaction; | 99% |
n-octyne
tris-(trimethylsilyl)silane
(Z)-1,1,1,3,3,3-hexamethyl-2-(oct-1-en-1-yl)-2-(trimethylsilyl)trisilane
Conditions | Yield |
---|---|
With Eosin Y; potassium carbonate; triisopropylsilanethiol In 1,4-dioxane; water at 20℃; for 4h; Quantum yield; Solvent; Inert atmosphere; Irradiation; stereoselective reaction; | 99% |
Conditions | Yield |
---|---|
With oxygen; 2-hydroxyethanethiol In water at 20℃; for 24h; optical yield given as %de; stereoselective reaction; | 98% |
With 2,2'-azobis(isobutyronitrile) In toluene Heating; |
Conditions | Yield |
---|---|
With oxygen; 2-hydroxyethanethiol In water at 20℃; for 24h; optical yield given as %de; stereoselective reaction; | 98% |
Conditions | Yield |
---|---|
With 2,2'-azobis(isobutyronitrile) In toluene at 93℃; for 1h; Inert atmosphere; | 98% |
The Trisilane,1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)-, with the CAS registry number 1873-77-4, is also known as Tris(trimethylsilyl)silane. It belongs to the product categories of Reduction; Si (Classes of Silicon Compounds); Si-H Compounds; Silicon Compounds (for Synthesis); Si-Si Compounds; Synthetic Organic Chemistry. This chemical's molecular formula is C9H28Si4 and molecular weight is 248.66. What's more, its IUPAC name is Bis(trimethylsilyl)silyl-trimethylsilane. Additionally, it should be preserved hermetically and put in a cool, dry place. You should ensure that workplaces have good ventilation or exhaust. It is clear colorless to pale yellow liquid.
Physical properties about Trisilane,1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)-: (1)ACD/LogP: 5.50; (2)# of Rule of 5 Violations: 1; (3)ACD/LogD (pH 5.5): 5.503; (4)ACD/LogD (pH 7.4): 5.503; (5)ACD/BCF (pH 5.5): 8952.059; (6)ACD/BCF (pH 7.4): 8952.059; (7)ACD/KOC (pH 5.5): 23462.625; (8)ACD/KOC (pH 7.4): 23462.625; (9)#H bond acceptors: 0; (10)#H bond donors: 0; (11)#Freely Rotating Bonds: 3; (12)Polar Surface Area: 0 Å2; (13)Flash Point: 77.248 °C; (14)Enthalpy of Vaporization: 43.123 kJ/mol; (15)Boiling Point: 213.245 °C at 760 mmHg; (16)Vapour Pressure: 0.242 mmHg at 25 °C; (17)Density: 0.806 g/cm3.
Uses of Trisilane,1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)-: it is used to produce other chemicals. For example, it can react with Maleic acid anhydride to get 2-(Tris(trimethylsilyl)silyl)butanedioic anhydride. The reaction occurs with reagent Azoisobutyronitrile and solvent Toluene at temperature of 90 °C. The yield is 89 %.
When you are dealing with this chemical, you should be very careful. This chemical is inflammation to the skin, eyes and respiratory system or other mucous membranes. What’s more, it’s flammable. So keep it away from sources of ignition. Therefore, you should wear suitable protective clothing in order to avoiding to contact with skin and eyes. Additionally, you can not breathe gas/fumes/vapour/spray. And in case of contacting with eyes, you should rinse immediately with plenty of water and seek medical advice.
You can still convert the following datas into molecular structure:
(1) SMILES: C[Si](C)(C)[SiH]([Si](C)(C)C)[Si](C)(C)C
(2) InChI: InChI=1/C9H28Si4/c1-11(2,3)10(12(4,5)6)13(7,8)9/h10H,1-9H3
(3) InChIKey: SQMFULTZZQBFBM-UHFFFAOYAZ
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