70384-51-9Relevant articles and documents
Novel method for preparing tris (3,6 -dioxo-heptyl) amine
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Paragraph 0037; 0055-0059; 0063-0067; 0071-0074, (2021/04/14)
The invention relates to a new method for preparing tris(3,6-dioxaheptyl)amine. The new method is characterized in that ammonia water, diethylene glycol monomethyl ether and thionyl chloride are takenas raw materials, and the tris(3,6-dioxaheptyl)amine is synthesized through three steps. The new method provided by the invention has the following advantages that reaction conditions are mild, the operation is safe, and the danger of using high-risk chemicals such as hydrogen and Raney nickel is avoided; the reaction conversion rate is high, and the product yield is high; only products, sodium chloride and a very small amount of pre-distillation fractions are produced in the process, excess materials can be recycled after treatment, three wastes are very few, and the production process is green and environmentally friendly.
Photocurable resin composition, dry film thereof, pattern forming method, and electrical/electronic part protective film
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, (2012/05/04)
A photocurable composition includes: (A) an epoxy group-containing polymer compound having repeating units represented by the following formula (1), where R1 to R4 are each a hydrocarbon group, m is an integer of 1 to 100, a, b, c and d are each 0 or a positive number, such that 0 (c+d)/(a+b+c+d) ≤ 1.0, and X and Y are each the formula (2) or (3), provided that at least one group of the formula (3) is present, (B) a photoacid generator represented by the formula (8) and (C) a solvent.
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
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, (2010/04/23)
A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R1 is H, methyl or trifluoromethyl, X is a single bond or methylene, m is 1 or 2, and the hydroxyl group attaches to a secondary carbon atom. The composition is improved in resolution when processed by lithography.