CAS No.125542-03-2,CHLORODIMETHYL(2,3,4,5-TETRAMETHYL-2,4-CYCLOPENTADIEN-1-YL)SILANE Suppliers

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Chlorodimethyl(2,3,4,5-tetramethyl-2,4-cyclopentadien-1-yl)silane

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Chlorodimethyl(2,3,4,5-tetramethyl-2,4-cyclopentadien-1-yl)silane

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Synthetic route

: 386708-10-7, 82061-21-0
lithium 1,2,3,4-tetramethylcyclopentadienide

: 75-78-5
dimethylsilicon dichloride

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

Conditions

Conditions	Yield
In tetrahydrofuran at -30 - 20℃; Inert atmosphere;	88%

: 4249-10-9
1,2,3,4-tetramethylcyclopenta-1,3-diene

: 75-78-5
dimethylsilicon dichloride

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

Conditions

Conditions	Yield
Stage #1: 1,2,3,4-tetramethylcyclopenta-1,3-diene With n-butyllithium In diethyl ether; hexane Stage #2: dimethylsilicon dichloride In tetrahydrofuran	83%
Stage #1: 1,2,3,4-tetramethylcyclopenta-1,3-diene With n-butyllithium In tetrahydrofuran at -78 - 20℃; Schlenk technique; Stage #2: dimethylsilicon dichloride In tetrahydrofuran; hexane at 20℃; Schlenk technique;	83%
Stage #1: 1,2,3,4-tetramethylcyclopenta-1,3-diene With n-butyllithium In tetrahydrofuran at -78 - 20℃; Schlenk technique; Stage #2: dimethylsilicon dichloride In tetrahydrofuran; hexane at -78 - 20℃; Schlenk technique;	83%

: 75-78-5
dimethylsilicon dichloride

: 2,3,4,5-tetramethylcyclopentadienyl sodium

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

Conditions

Conditions	Yield
In tetrahydrofuran for 16h;

: 54458-61-6
2,3,4,5-tetramethyl-2-cyclopenten-1-one

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

Conditions

Conditions	Yield
Multi-step reaction with 2 steps 1.1: lithium aluminium hydride / diethyl ether / 2 h 1.2: 37 percent / hydrochloric acid; air / diethyl ether; H2O / 16 h 2.1: n-butyllithium / petroleum ether / 16 h / 0 - 20 °C 2.2: 67 percent / petroleum ether; tetrahydrofuran / 16 h View Scheme

: C11H15(1-)*Li(1+)

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: C22H34Si

Conditions

Conditions	Yield
In tetrahydrofuran at -25 - 20℃; Inert atmosphere; Glovebox;	98.9%

: Li(1+)*C5H4C(CH3)2CH2CH2CHCH2(1-)=LiC5H4C(CH3)2CH2CH2CHCH2

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: C23H36Si

Conditions

Conditions	Yield
In tetrahydrofuran at 20℃; for 6h;	98%

: 1,3-diisopropyl-4,5-dimethyl-1H-imidazol-2(3H)-imine

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: 1034125-20-6
C5(CH3)4HSi(CH3)2NCN2(CH(CH3)2)2C2(CH3)2

Conditions

Conditions	Yield
In hexane at 20℃; for 1.5h;	98%

: 2294-88-4
1-n-butyl-3H-indene

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: C24H34Si

Conditions

Conditions	Yield
Stage #1: 1-n-butyl-3H-indene With n-butyllithium In tetrahydrofuran at -78 - 20℃; for 2.5h; Schlenk technique; Stage #2: 1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene In tetrahydrofuran at -78 - 20℃; Schlenk technique;	98%

: 96-50-4
2-thiazolylamine

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: 1000392-78-8
(C5Me4H)SiMe2NH-2-thiazole

Conditions

Conditions	Yield
With triethylamine In tetrahydrofuran at 20℃; for 3h;	97%

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: K(1+)*C5H4CH2CH2P(C6H5)2(1-)=K[C5H4CH2CH2P(C6H5)2]

: (2-{4-[dimethyl-(2,3,4,5-tetramethyl-cyclopenta-2,4-dienyl)-silanyl]-cyclopenta-1,3-dienyl}-ethyl)-diphenyl-phosphane

Conditions

Conditions	Yield
In tetrahydrofuran at 20℃; for 18h;	96%

: 1,4-diisopropyl-1,4,7-triazacyclononane lithium

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: 325791-08-0
1-[dimethyl-(2,3,4,5-tetramethyl-cyclopenta-2,4-dienyl)-silanyl]-4,7-diisopropyl-[1,4,7]triazonane

Conditions

Conditions	Yield
In tetrahydrofuran at -78 - 20℃;	96%

: 65768-38-9
lithium 2,4,6-trimethylaniline

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: 500906-70-7
(CH3)2Si(C5(CH3)4H)NHC6H2(CH3)3

Conditions

Conditions	Yield
In tetrahydrofuran at 20℃; for 12h;	96%

: C15H19(1-)*Li(1+)

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: C26H36Si(2-)*2H(1+)

Conditions

Conditions	Yield
In tetrahydrofuran at -100 - 20℃; Inert atmosphere;	96%

: 111-77-3
2-(2-methoxyethoxy)ethyl alcohol

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: 142992-74-3
[2-(2-Methoxy-ethoxy)-ethoxy]-dimethyl-(2,3,4,5-tetramethyl-cyclopenta-2,4-dienyl)-silane

Conditions

Conditions	Yield
With pyridine In diethyl ether Ambient temperature;	95%

: 123-75-1
pyrrolidine

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: 1450982-86-1
C15H27NSi

Conditions

Conditions	Yield
Stage #1: pyrrolidine With n-butyllithium In tetrahydrofuran at 20℃; Inert atmosphere; Stage #2: 1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene In tetrahydrofuran at 20℃; for 24h; Inert atmosphere;	95%

: 4-(4-(tert-butyl)phenyl)-2-methyl-1H-indene

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: dimethyltetramethylcyclopentadienyl-2-methyl-4-(4-tert-butylphenyl)indenyl silane

Conditions

Conditions	Yield
Stage #1: 4-(4-(tert-butyl)phenyl)-2-methyl-1H-indene With n-butyllithium In tetrahydrofuran; hexane; toluene at -10 - 20℃; for 12h; Stage #2: 1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene In tetrahydrofuran; hexane; toluene at -10 - 20℃; for 12h;	95%

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: lithium (diphenylphosphino)cyclopentadienide

: {4-[dimethyl-(2,3,4,5-tetramethyl-cyclopenta-2,4-dienyl)-silanyl]-cyclopenta-1,3-dienyl}-diphenyl-phosphane

Conditions

Conditions	Yield
In tetrahydrofuran at 20℃; for 18h;	94%

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: 585-32-0
2-phenyl-2-propylamine

: 1290103-43-3
C5Me4HSiMe2N(H)CMe2Ph

Conditions

Conditions	Yield
Stage #1: 2-phenyl-2-propylamine With n-butyllithium In tetrahydrofuran Inert atmosphere; Stage #2: 1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene In tetrahydrofuran at -78℃; Inert atmosphere;	94%

: 2,5-dimethylpyrrolyl lithium salt

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: C17H27NSi

Conditions

Conditions	Yield
In tetrahydrofuran for 24h; Schlenk technique; Glovebox; Inert atmosphere;	93%

: Li{C5H4(CMe2CH2CH2CH=CMe2)}

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: 1187773-75-6
C25H40Si

Conditions

Conditions	Yield
In tetrahydrofuran at -78 - 20℃;	92%

: 1139269-81-0
2-[2-(1H-inden-1-yl)ethyl]-1,3-dioxane

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: 1139269-88-7
C26H36O2Si

Conditions

Conditions	Yield
With n-butyllithium In diethyl ether; hexane at -78 - 20℃; for 20.25h; Inert atmosphere; Schlenk technique;	91%
Stage #1: 2-[2-(1H-inden-1-yl)ethyl]-1,3-dioxane With n-butyllithium In diethyl ether; hexane at 20℃; for 4h; Stage #2: 1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene In diethyl ether; hexane at 20℃; for 15h; Further stages.;	60%

: 594-19-4
tert.-butyl lithium

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: [C5(CH3)4(Si(CH3)2C(CH3)3)](1-)*Li(1+)=[C5(CH3)4(Si(CH3)2C(CH3)3)Li]

Conditions

Conditions	Yield
In tetrahydrofuran; pentane 1.) -78 deg C, 1 h, 2.) r.t., 2 h;	90%

: 109-72-8, 29786-93-4
n-butyllithium

: 16872-09-6
1,2-dicarba-closo-dodecaborane(12)

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: 318955-29-2
Me2Si(C5Me4H)(o-carboranyl)

Conditions

Conditions	Yield
With NH4Cl In diethyl ether; hexane; benzene 2 equiv. of n-BuLi in hexane was added to soln. of o-carborane in C6H6/Et2O (2:1) at 0 °C under N2, mixt. was warmed to room temp. and stirred for 2 h, Si-compd. was added, mixt. was refluxed overnight, satd. aq. soln. of NH4Cl was added; aq. layer was extd. with Et2O, ext. was combined with org. layer and dried over MgSO4, soln. was filtered, solvent was removed, residue was chromd. on silica with n-hexane;	90%

Yield

With NH4Cl In diethyl ether; hexane; benzene 2 equiv. of n-BuLi in hexane was added to soln. of o-carborane in C6H6/Et2O (2:1) at 0 °C under N2, mixt. was warmed to room temp. and stirred for 2 h, Si-compd. was added, mixt. was refluxed overnight, satd. aq. soln. of NH4Cl was added; aq. layer was extd. with Et2O, ext. was combined with org. layer and dried over MgSO4, soln. was filtered, solvent was removed, residue was chromd. on silica with n-hexane;

90%

...Expand

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: C5H7K*C4H8O

: Dimethyl-((E)-penta-2,4-dienyl)-(2,3,4,5-tetramethyl-cyclopenta-2,4-dienyl)-silane

Conditions

Conditions	Yield
In tetrahydrofuran at -78 - 20℃;	88%

: C15H18BN2(1-)*Li(1+)

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: 6-(2-(diethylboryl)phenyl)-N-(dimethylsilyl-(2,3,4,5-tetramethylcyclopenta-2,4-dienyl))pyridin-2-amine

Conditions

Conditions	Yield
Stage #1: C15H18BN2(1-)*Li(1+); 1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene In tetrahydrofuran at -30 - 20℃; Inert atmosphere; Stage #2: In tetrahydrofuran at -30 - 20℃;	88%

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: C18H15NP(1-)*Li(1+)

: [dimethyl-(2,3,4,5-tetramethyl-cyclopenta-2,4-dienyl)-silanyl]-(2-diphenylphosphanyl-phenyl)-amine

Conditions

Conditions	Yield
In hexane at 20℃; for 14h; Alkylation;	86%

: 112-35-6
triethylene glucol monomethyl ether

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: 142992-76-5
{2-[2-(2-Methoxy-ethoxy)-ethoxy]-ethoxy}-dimethyl-(2,3,4,5-tetramethyl-cyclopenta-2,4-dienyl)-silane

Conditions

Conditions	Yield
With pyridine In diethyl ether Ambient temperature;	85%

: 38225-27-3
lithium benzylamide

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: Benzyl-[dimethyl-(2,3,4,5-tetramethyl-cyclopenta-2,4-dienyl)-silanyl]-amine

Conditions

Conditions	Yield
In hexane 1) -78 deg C, 2) r.t., 14 h;	84%

: 504-29-0
2-aminopyridine

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: 231304-97-5
(C5Me4H)SiMe2NH-2-pyridine

Conditions

Conditions	Yield
With triethylamine In tetrahydrofuran at 20℃; for 3h;	84%

: 2243-47-2
3-biphenyl amine

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: 1292186-51-6
N-(biphenyl-3-yl)-1,1-dimethyl-1-(2,3,4,5-tetramethylcyclopenta-2,4-dienyl)silylamine

Conditions

Conditions	Yield
Stage #1: 3-biphenyl amine With n-butyllithium In diethyl ether; hexane at -40 - 20℃; for 1h; Inert atmosphere; Stage #2: 1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene In diethyl ether; hexane at -40 - 20℃; for 8h;	84%

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: (N,N-dimethylaminoethyl)cyclopentadienyl sodium

: (2-{3-[Dimethyl-(2,3,4,5-tetramethyl-cyclopenta-2,4-dienyl)-silanyl]-cyclopenta-1,4-dienyl}-ethyl)-dimethyl-amine

Conditions

Conditions	Yield
In tetrahydrofuran for 12h;	83%

: C17H16O

: 125542-03-2
1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene

: C28H34OSi

Conditions

Conditions	Yield
Stage #1: C17H16O With n-butyllithium In tetrahydrofuran; hexane at -78 - 20℃; for 2h; Inert atmosphere; Stage #2: 1-(chlorodimethylsilyl)-2,3,4,5-tetramethylcyclopenta-2,4-diene With 1,3-dimethyl-2-imidazolidinone In tetrahydrofuran; hexane at -20 - 20℃; for 16h; Inert atmosphere;	83%

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Hazard Codes	C
Risk Statements	14-34
Safety Statements	26-27-36/37/39-45
RIDADR	UN 2986 8/PG 2
WGK Germany	3

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