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155498-78-5

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155498-78-5 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 155498-78-5 includes 9 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 6 digits, 1,5,5,4,9 and 8 respectively; the second part has 2 digits, 7 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 155498-78:
(8*1)+(7*5)+(6*5)+(5*4)+(4*9)+(3*8)+(2*7)+(1*8)=175
175 % 10 = 5
So 155498-78-5 is a valid CAS Registry Number.

155498-78-5Relevant articles and documents

An organo-catalytic approach to the enantioselective synthesis of (R)-selegiline

Talluri, Siva Kumar,Sudalai, Arumugam

, p. 9758 - 9763 (2007)

An efficient enantioselective synthesis of (R)-selegiline has been achieved by two routes, via proline-catalyzed α-aminooxylation as well as α-amination of phenylpropanaldehyde as the key step.

Selective generation of free radicals from epoxides using a transition-metal radical. A powerful new tool for organic synthesis

RajanBabu,Nugent, William A.

, p. 986 - 997 (2007/10/02)

Bis(cyclopentadienyl)titanium(III) chloride reacts with epoxides by initial C-O homolysis. The regiochemistry of the opening is determined by the relative stabilities of the radicals. Depending on the reaction partners, these radicals undergo intramolecular (hex-5-enyl cyclization) or intermolecular additions to olefins. The resultant radicals are efficiently scavenged by a second equivalent of Ti(III) to afford the corresponding Ti(IV) derivative. Treatment of this intermediate with electrophiles such as H+ or halogens provides a route to functionalized cyclopentanes and other useful products. The radical initially formed from an epoxide can also be trapped by H-atom donors such as 1,4-cyclohexadiene or tert-butyl thiol, resulting in an overall reduction of the epoxide. In the absence of a H-atom donor or an olefin, this radical is trapped by Ti(III), resulting in a β-oxido-Ti organometallic species which undergoes facile elimination to give an olefin. The reaction conditions are remarkably mild and are applicable to very sensitive substrates.

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