- Min.Order :1 Metric Ton
- Purity: 99.995%-99.999%
- Payment Terms : L/C,T/T,
Keywords
Hydrogen H2 Industrial Gases China industrial gases
Quick Details
- Appearance:
- Application:Industry Use, Medical Use, Semiconductor Fabrication
- PackAge:depends
- ProductionCapacity:|Metric Ton|Day
- Storage:
- Transportation:sea
Superiority:
CAS No.: 1333-74-0
EINECS No.: 215-605-7
UN No.: UN1049
Purity: 99.995%-99.999%
Dot Class: 2.1
Appearance: Colorless, flammable, odorless gas.
Grade Standard: Industrial Grade, Medical Grade, Electronic Grade.
Industry Use:
In the high temperature glass manufacturing process and in the production of electronic microchips.
Medical Use:
Offer for treating kinds of disease, such as tumour, stroke.
In semiconductor fabrication:
Carrier gas, especially for silicon deposition gas chromatography.
TYHJ focuses on Industrial Gases development, including Oxygen, Fire Extinguishers Carbon Dioxide, CO2, SO2, H2, N2.
Details:
CAS No.: 1333-74-0
EINECS No.: 215-605-7
UN No.: UN1049
Purity: 99.995%-99.999%
Dot Class: 2.1
Appearance: Colorless, flammable, odorless gas.
Grade Standard: Industrial Grade, Medical Grade, Electronic Grade.
Industry Use:
In the high temperature glass manufacturing process and in the production of electronic microchips.
Medical Use:
Offer for treating kinds of disease, such as tumour, stroke.
In semiconductor fabrication:
Carrier gas, especially for silicon deposition gas chromatography.
CAS No.: 1333-74-0
EINECS No.: 215-605-7
UN No.: UN1049
Purity: 99.995%-99.999%
Dot Class: 2.1
Appearance: Colorless, flammable, odorless gas.
Grade Standard: Industrial Grade, Medical Grade, Electronic Grade.
Industry Use:
In the high temperature glass manufacturing process and in the production of electronic microchips.
Medical Use:
Offer for treating kinds of disease, such as tumour, stroke.
In semiconductor fabrication:
Carrier gas, especially for silicon deposition gas chromatography.
TYHJ focuses on Industrial Gases development, including Oxygen, Fire Extinguishers Carbon Dioxide, CO2, SO2, H2, N2.
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