4-Acetoxystyrene

Min.Order / FOB Price:Get Latest Price

1 Metric Ton	Negotiable

1 Metric Ton

Negotiable

Min.Order :1 Metric Ton
Purity: 99.6%
Payment Terms : L/C,T/T

Keywords

acetoxystyrene 4-acetoxystyrene cas 2628-16-2

Quick Details

Appearance:
Application:4-Acetoxystyrene monomer is mainly used in the synthesis of polyhydroxystyrene. Polyhydroxystyrene is the main component of photoresist
PackAge:drum
ProductionCapacity:1|Metric Ton|Month
Storage:
Transportation:

Superiority:

1. quality assured

2. stable supply

3. professional manufacturer

Details:

4-Acetoxystyrene

4-Acetoxystyrene monomer is mainly used in the synthesis of polyhydroxystyrene. Polyhydroxystyrene is the main component of photoresist which currently is the main body of the 248nm photoresist resin. 248nm photoresist is mainly used in the field of microelectronic chips and liquid crystal displays,with the wave length of 248nmKrf laser for processing medium,widely used in the large-scale industrialization lithography production.

Through continuous research and innovation,our company develop a set of industrial production process of the products .It will be a positive role in promoting the 248nm photoresist localization.

Product Name:4-Acetoxystyrene

Cas No:2628-16-2

Molecular Formula: C₁₀H₁₀O₂

Molecular Weight:162.19

Appearance:colorless transparent liquid,no floating debris

Melting Point:7-8℃(lit.)

Boiling point:260℃(lit.)

Density:1.06 g/ml at 25℃(lit.)

Refractive index:n20/D1.538(lit)

Flash Point: 190 °F

The Main test items

Test content	Company standard	Remarks
Content	＞99%	GC
Water	＜0.2%	KF
Polymer	＜0.5%	GPC
Metal Ion	＜50ppb
Inhibitor	20-50ppm	MEHQ

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4-Acetoxystyrene

CAS NO:2628-16-2