- Min.Order :0 Metric Ton
- Purity: >99%
Keywords
HFC-41 593-53-3 99%
Quick Details
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- Application:High-purity monofluoromethane HFC-41 gas is a green, highly efficient etching gas that selectively etches thin films of silicon compounds for use in etching processes for semiconductors and electronic
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Product name: fluoromethane
CAS No.: 593-53-3
Molecular formula: CH3F
Molecular weight: 34.03
Purity: >99%
Appearance: colorless transparent gas
Boiling point: -78.4 °C
Freezing point: -142 °C
Density: 0.61 g/ml, at 25 °C (lit.)
GWP100 years: 150
Storage: 2-8 °C
Packing: 4.64L/10.2L/44L cylinder
Application: High-purity monofluoromethane HFC-41 gas is a green, highly efficient etching gas that selectively etches thin films of silicon compounds for use in etching processes for semiconductors and electronic products.
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