1H,1H,2H,2H-PERFLUO...

1H,1H,2H,2H-PERFLUOROOCTANESULFONIC ACID

1H,1H,2H,2H-PERFLUOROOCTANESULFONIC ACID

Min.Order / FOB Price:Get Latest Price

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Negotiable

  • Min.Order :0
  • Purity: 30

Keywords

1H,1H,2H,2H-PERFLUOROOCTANESULFONIC ACID 27619-97-2 FCS-100 Chromic acid fog inhibitor

Quick Details

  • Appearance:Colorless liquid
  • Application:Surface treatment,Chrome plating baths,Emulsification,Metal treatment,It can be used in organic fluorine synthesis, fluorinated surfactants and other important intermediates, pharmaceutical interm...
  • PackAge:20KG/ DRUM
  • ProductionCapacity:
  • Storage:Store in a cool, dry, ventilated place away from light, away from heat and fire.
  • Transportation:

Superiority:

It is an anionic fluorinated surfactant that reduces the surface tension of aqueous solutions to very low levels. It is
based on six fluorinated carbon molecules that cannot break down to PFOA in the environment. Strong acid resistance, low foaming, low surface tension, can also be used for film anti-static

Details:

Tianjin Radchem Technology Co., Ltd. (www.radchemtech.com) was founded in 2018 by a team with more than ten years of R&D, production and marketing experience in the industries of photoinitiators, coatings & plastic functional materials and drug synthesis. It integrates research, production and marketing, and committed to developing characteristic products and applications. At present, the company has a school-enterprise cooperative laboratory, two pilot laboratories, and two production cooperation factories, mainly responsible for the scale-up and commercial production of technical projects, and the annual capacity of special photoinitiators, characteristic functional materials and pharmaceutical intermediates up to 1,000 tons.
It is an anionic fluorinated surfactant that reduces the surface tension of aqueous solutions to very low levels. It is
based on six fluorinated carbon molecules that cannot break down to PFOA in the environment. Strong acid resistance, low foaming, low surface tension, can also be used for film anti-static

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