(diphenyl)bischloromethylsilane
dichloro[bis(chloromethyl)]silane
Conditions | Yield |
---|---|
With aluminum (III) chloride; acetyl chloride In hexane at 20 - 35℃; | 90% |
bis(chloromethyl)(phenyl)chlorosilane
dichloro[bis(chloromethyl)]silane
Conditions | Yield |
---|---|
at 20℃; | 88% |
diazomethane
(chloromethyl)trichlorosilane
A
dichloro[bis(chloromethyl)]silane
B
chlorotris(chloromethyl)silane
Conditions | Yield |
---|---|
With copper(II) sulfate In diethyl ether at -25℃; for 3h; | A 61% B 33% |
diazomethane
tetrachlorosilane
dichloro[bis(chloromethyl)]silane
Conditions | Yield |
---|---|
copper(II) sulfate In diethyl ether SiCl4 and diazomethane in ether; -45°C, slow increase of temp.;; | 45% |
diazomethane
(chloromethyl)trichlorosilane
dichloro[bis(chloromethyl)]silane
Conditions | Yield |
---|---|
With diethyl ether; copper(II) sulfate at -35℃; |
dichloro[bis(chloromethyl)]silane
2,2-dimethyl-3-(trimethylsilyl)-2H-benzo[e][1,3]oxazin-4-one
Conditions | Yield |
---|---|
In n-heptane for 2h; Heating; | 97% |
dichloro[bis(chloromethyl)]silane
2,2-dimethyl-3-(trimethylsilyl)-2H-benzo[e][1,3]oxazin-4-one
Conditions | Yield |
---|---|
In n-heptane for 2h; Inert atmosphere; Reflux; | 97% |
dichloro[bis(chloromethyl)]silane
N-methyl-N-trimethylsilylacetamide
Conditions | Yield |
---|---|
In dichloromethane at 0℃; for 24h; | 90% |
dichloro[bis(chloromethyl)]silane
N-methyl-N-trimethylsilylacetamide
Conditions | Yield |
---|---|
In dichloromethane at 0 - 20℃; | 90% |
N-trimethylsilyl-pyrrolidin-2-one
dichloro[bis(chloromethyl)]silane
bis(2-oxopyrrolidinomethyl)dichlorosilane
Conditions | Yield |
---|---|
at 100 - 110℃; | 88% |
dichloro[bis(chloromethyl)]silane
1-trimethylsilanyl-azepan-2-one
Conditions | Yield |
---|---|
85.5% |
dichloro[bis(chloromethyl)]silane
N-methyl-N-trimethylsilylacetamide
Conditions | Yield |
---|---|
In toluene Heating; | 74% |
1-(trimethylsilyl)piperidin-2-one
dichloro[bis(chloromethyl)]silane
Conditions | Yield |
---|---|
With mercury dichloride In acetonitrile Heating; | 71% |
dichloro[bis(chloromethyl)]silane
2,2'-dibromobiphenyl
9,9-bis(chloromethyl)-9-silafluorene
Conditions | Yield |
---|---|
Stage #1: 2,2'-dibromobiphenyl With n-butyllithium In diethyl ether; hexane at -78 - 20℃; Inert atmosphere; Schlenk technique; Stage #2: dichloro[bis(chloromethyl)]silane In diethyl ether; hexane at -78 - 20℃; for 16h; Inert atmosphere; Schlenk technique; | 70% |
Stage #1: 2,2'-dibromobiphenyl With n-butyllithium Inert atmosphere; Schlenk technique; Stage #2: dichloro[bis(chloromethyl)]silane at -78 - 20℃; for 48h; Inert atmosphere; Schlenk technique; |
dichloro[bis(chloromethyl)]silane
4-methyl-1-(trimethylsilyl)quinolin-2(1H)-one
Conditions | Yield |
---|---|
Stage #1: dichloro[bis(chloromethyl)]silane; 4-methyl-1-(trimethylsilyl)quinolin-2(1H)-one In chloroform Cooling with ice; Stage #2: With air moisture In chloroform | 69% |
diphenylether
dichloro[bis(chloromethyl)]silane
Conditions | Yield |
---|---|
Stage #1: diphenylether With n-butyllithium In tetrahydrofuran; hexane at -30 - 20℃; Inert atmosphere; Schlenk technique; Stage #2: dichloro[bis(chloromethyl)]silane In tetrahydrofuran; hexane at -78 - 20℃; for 48h; Inert atmosphere; Schlenk technique; | 68% |
1,2,3-trimethoxybenzene
dichloro[bis(chloromethyl)]silane
bis(chloromethyl)bis(2,4,6-trimethoxyphenyl)silane
Conditions | Yield |
---|---|
Stage #1: 1,2,3-trimethoxybenzene With n-butyllithium; N,N,N,N,-tetramethylethylenediamine In hexane at 20℃; for 16.1333h; Inert atmosphere; Stage #2: dichloro[bis(chloromethyl)]silane In hexane at 0 - 20℃; for 1.16667h; Inert atmosphere; | 65% |
dichloro[bis(chloromethyl)]silane
ethylmagnesium bromide
bis(chloromethyl)diethylsilane
Conditions | Yield |
---|---|
In diethyl ether for 5h; Heating; | 64% |
dichloro[bis(chloromethyl)]silane
pentamethylenebis(magnesium bromide)
1,1-bis(chloromethyl)-1-silacyclohexane
Conditions | Yield |
---|---|
In diethyl ether for 8h; Heating; | 58% |
N-trimethylsilyl-pyrrolidin-2-one
dichloro[bis(chloromethyl)]silane
Conditions | Yield |
---|---|
With mercury dichloride In acetonitrile for 0.5h; Heating; | 54% |
dichloro[bis(chloromethyl)]silane
1-trimethylsilanyl-azepan-2-one
Conditions | Yield |
---|---|
With mercury dichloride In acetonitrile for 0.5h; Heating; | 54% |
1-bromo-2-[(2-bromophenyl)thio]benzene
dichloro[bis(chloromethyl)]silane
Conditions | Yield |
---|---|
Stage #1: 1-bromo-2-[(2-bromophenyl)thio]benzene With n-butyllithium In diethyl ether; hexane at 0℃; Inert atmosphere; Schlenk technique; Reflux; Stage #2: dichloro[bis(chloromethyl)]silane In diethyl ether; hexane at -78 - 20℃; Inert atmosphere; Schlenk technique; | 53% |
dichloro[bis(chloromethyl)]silane
1-trimethylsilanyl-azepan-2-one
Conditions | Yield |
---|---|
Stage #1: dichloro[bis(chloromethyl)]silane; 1-trimethylsilanyl-azepan-2-one In dichloromethane at 0℃; for 2h; Stage #2: With sodium hydrogencarbonate In chloroform for 24h; Stage #3: With boron trifluoride diethyl etherate In dichloromethane Heating; | 47% |
dichloro[bis(chloromethyl)]silane
1,4-bis(bromomagnesium)butane
1,1-bis(chloromethyl)-1-silacyclopentane
Conditions | Yield |
---|---|
In diethyl ether for 17h; Heating; | 45% |
diazomethane
dichloro[bis(chloromethyl)]silane
chlorotris(chloromethyl)silane
Conditions | Yield |
---|---|
With diethyl ether; copper(II) sulfate at -25℃; | |
copper(II) sulfate In not given (CH2Cl)2SiCl2 and CH2N2 with CuSO4 above about -30°C;; | 10-15 |
N-trimethylsilyl-pyrrolidin-2-one
dichloro[bis(chloromethyl)]silane
trimethylsilyl trifluoromethanesulfonate
Conditions | Yield |
---|---|
1.) from 100 to 110 deg C, 1 h, 2.) CH3CN, 24 h; Yield given. Multistep reaction; |
dichloro[bis(chloromethyl)]silane
Conditions | Yield |
---|---|
In chloroform for 24h; |
dichloro[bis(chloromethyl)]silane
2,2-dimethyl-3-(trimethylsilyl)-2H-benzo[e][1,3]oxazin-4-one
Conditions | Yield |
---|---|
In n-heptane for 2h; Heating; |
dichloro[bis(chloromethyl)]silane
4-methyl-1-(trimethylsilyl)quinolin-2(1H)-one
Conditions | Yield |
---|---|
In chloroform for 2h; |
dichloro[bis(chloromethyl)]silane
N-methyl-N-trimethylsilylacetamide
Conditions | Yield |
---|---|
With air moisture In dichloromethane at 0℃; |
This chemical is called Bis(chloromethyl)dichlorosilane, and its systematic name is dichloro[bis(chloromethyl)]silane. With the molecular formula of C2H4Cl4Si, its molecular weight is 197.95. The CAS registry number of this chemical is 18076-97-6.
Other characteristics of the Bis(chloromethyl)dichlorosilane can be summarised as followings: (1)ACD/LogP: 3.93; (2)# of Rule of 5 Violations: 0; (3)ACD/LogD (pH 5.5): 3.93; (4)ACD/LogD (pH 7.4): 3.93; (5)ACD/BCF (pH 5.5): 574.84; (6)ACD/BCF (pH 7.4): 574.84; (7)ACD/KOC (pH 5.5): 3287.66; (8)ACD/KOC (pH 7.4): 3287.66; (9)#H bond acceptors: 0; (10)#H bond donors: 0; (11)#Freely Rotating Bonds: 2; (12)Index of Refraction: 1.464; (13)Molar Refractivity: 39.42 cm3; (14)Molar Volume: 142.8 cm3; (15)Polarizability: 15.63×10-24cm3; (16)Surface Tension: 26.6 dyne/cm; (17)Density: 1.385 g/cm3; (18)Flash Point: 65.2 °C; (19)Enthalpy of Vaporization: 38.57 kJ/mol; (20)Boiling Point: 165.8 °C at 760 mmHg; (21)Vapour Pressure: 2.42 mmHg at 25°C.
When you are using this chemical, please be cautious about it as the following: This chemical causes burns. You should wear suitable protective clothing if you use it. In case of contacting with eyes, rinse immediately with plenty of water and seek medical advice. As it's flammable, keep it away from the sources of ignition.
You can still convert the following datas into molecular structure:
1.SMILES: ClC[Si](Cl)(Cl)CCl
2.InChI: InChI=1/C2H4Cl4Si/c3-1-7(5,6)2-4/h1-2H2
3.InChIKey: UZSFHKMDONVENX-UHFFFAOYAX
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