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inquiryConditions | Yield |
---|---|
With chlorine Irradiation; | 98% |
With chlorine for 3h; Irradiation; visible light; | 89% |
With chlorine Irradiation.mit UV-Licht in der Dampfphase; |
dimethylsilicon dichloride
A
(dichloromethyl)methyldichlorosilane
B
chloromethylmethyldichlorosilane
Conditions | Yield |
---|---|
With chlorine for 15h; Heating; Irradiation; | A 8% B 89% |
With SO2Cl2 In further solvent(s) boiling of (CH3)2SiCl2 and SO2Cl2 in bromobenzene in presence of dibenzoyl peroxide for a longer period of time;; | |
With SO2Cl2 In tetrachloromethane boiling of (CH3)2SiCl2 and SO2Cl2 in CCl4 in presence of dibenzoyl peroxide for a longer period of time;; | |
With SO2Cl2 In chlorobenzene boiling of (CH3)2SiCl2 and SO2Cl2 in chlorobenzene in presence of dibenzoyl peroxide for a longer period of time;; |
dimethylsilicon dichloride
A
(dichloromethyl)methyldichlorosilane
B
(Dichloro-methyl-silanyl)-methanesulfonyl chloride
C
chloromethylmethyldichlorosilane
Conditions | Yield |
---|---|
With yttrium(III) chloride; sulfuryl dichloride at 70℃; for 10h; Product distribution; Irradiation; other catalysts (HoCl3,TmCl3); | A 10% B 38% C 42% |
With sulfuryl dichloride; copper dichloride at 50 - 70℃; Product distribution; Irradiation; various inorganic additives (chlorides and oxychlorides of 32 elements), effect of addition of S; effect of inorganic chlorides and oxychlorides on the photochemical reaction of methylchlorosilanes with SO2Cl2; | A 26 % Spectr. B 8 % Spectr. C 15 % Spectr. |
diazomethane
Methyltrichlorosilane
chloromethylmethyldichlorosilane
Conditions | Yield |
---|---|
copper In diethyl ether (CH3)SiCl3 and diazomethane in ether above -30°C with Cu powder as catalyst;; | 12% |
copper(II) sulfate In diethyl ether (CH3)SiCl3 and diazomethane in ether above -30°C with anhyd. CuSO4 as catalyst;; | 12% |
With diethyl ether; copper(II) sulfate | |
With diethyl ether; copper |
octamethyltrisilane
A
chloro-trimethyl-silane
B
Chloro(chloromethyl)dimethylsilane
C
dimethylsilicon dichloride
D
chloromethylmethyldichlorosilane
Conditions | Yield |
---|---|
With tetrachloromethane; Perbenzoic acid; chlorine 1) 80 deg C, 18 h; 2) 5-10 deg C; Multistep reaction; |
chlorine
dimethylsilicon dichloride
A
(dichloromethyl)methyldichlorosilane
B
(trichloromethyl)methyldichlorosilane
C
chloromethylmethyldichlorosilane
Conditions | Yield |
---|---|
at 24 - 40℃; UV-Licht.Irradiation; | |
at 24 - 40℃; UV-Licht.Irradiation; |
dimethylsilicon dichloride
A
(dichloromethyl)methyldichlorosilane
B
(trichloromethyl)methyldichlorosilane
C
chloromethylmethyldichlorosilane
Conditions | Yield |
---|---|
With chlorine In not given Irradiation (UV/VIS); (CH3)2SiCl2 and Cl2 at 20-40°C under irradiation of light;; | |
With Cl2 In not given Irradiation (UV/VIS); (CH3)2SiCl2 and Cl2 at 20-40°C under irradiation of light;; |
dimethylhydrazone of the trimethylsilyl ester of benzoic acid
chloromethylmethyldichlorosilane
Conditions | Yield |
---|---|
In hexane; chloroform at 20℃; for 168000h; | 99% |
1,1,1,3,3,3-hexamethyl-disilazane
chloromethylmethyldichlorosilane
A
chloro-trimethyl-silane
B
1-Chloro-1-chloromethyl-1,3,3,3-tetramethyl-disilazane
Conditions | Yield |
---|---|
at 20℃; for 24h; | A n/a B 98% |
Conditions | Yield |
---|---|
for 24h; Ambient temperature; | 97% |
chloromethylmethyldichlorosilane
methyl(chloromethyl)dihydrosilane
Conditions | Yield |
---|---|
With lithium aluminium tetrahydride In dibutyl ether under 0.8 - 3.8 Torr; | 96% |
With lithium aluminium tetrahydride In dibutyl ether at 25℃; for 6h; Inert atmosphere; | 70% |
Stage #1: chloromethylmethyldichlorosilane With lithium aluminium tetrahydride In dibutyl ether at 0 - 20℃; Stage #2: With hydrogenchloride for 0.5h; cooling; | 40% |
With lithium aluminium tetrahydride In dibutyl ether | |
With lithium aluminium tetrahydride |
benzyl alcohol
chloromethylmethyldichlorosilane
(chloromethyl)bis(benzyloxy)methylsilane
Conditions | Yield |
---|---|
In pentane 1) 0 deg C, 3 h 2) 23 deg C, 7 h; | 96% |
O,O'-bis-(trimethylsilyl)uracil
chloromethylmethyldichlorosilane
Conditions | Yield |
---|---|
In chloroform at 20℃; for 48h; Inert atmosphere; | 96% |
isopropyl alcohol
chloromethylmethyldichlorosilane
(chloromethyl)(diisopropoxy)methylsilane
Conditions | Yield |
---|---|
With 1H-imidazole; dmap In dichloromethane at 0 - 20℃; for 12h; Inert atmosphere; Schlenk technique; | 95% |
Stage #1: chloromethylmethyldichlorosilane With pyridine In di-isopropyl ether for 0.25h; Stage #2: isopropyl alcohol In di-isopropyl ether at 0 - 20℃; | 80% |
1-trimethylsiloxy-2,2,2-trifluoroacetone dimethylhydrazone
chloromethylmethyldichlorosilane
Conditions | Yield |
---|---|
In toluene at 20℃; for 48h; | 95% |
LiCH2PMe2
lithium diphenylphosphide
chloromethylmethyldichlorosilane
Conditions | Yield |
---|---|
Stage #1: LiCH2PMe2; chloromethylmethyldichlorosilane In diethyl ether at -80℃; for 2h; Inert atmosphere; Schlenk technique; Stage #2: C8H21ClP2Si; lithium diphenylphosphide In tetrahydrofuran; hexane at -50 - -40℃; for 3h; Inert atmosphere; Schlenk technique; | 95% |
LiCH2PMe2
lithium diphenylphosphide
chloromethylmethyldichlorosilane
Conditions | Yield |
---|---|
Stage #1: LiCH2PMe2; chloromethylmethyldichlorosilane In diethyl ether at -80℃; for 2h; Inert atmosphere; Schlenk technique; Stage #2: lithium diphenylphosphide In tetrahydrofuran; diethyl ether; hexane at -50 - -40℃; for 3h; Inert atmosphere; Schlenk technique; | 95% |
1,1,3,3-Tetramethyldisiloxane
chloromethylmethyldichlorosilane
C6H19ClO2Si3
Conditions | Yield |
---|---|
With water at 20℃; | 94% |
2,4,6-tris(trimethylsilyloxy)pyrimidine
chloromethylmethyldichlorosilane
Conditions | Yield |
---|---|
In acetonitrile for 1h; Inert atmosphere; Heating; | 94% |
chloromethylmethyldichlorosilane
chloromethyl-methyl-diphenyl-silane
Conditions | Yield |
---|---|
In diethyl ether Heating; | 93% |
phenylmagnesium bromide
chloromethylmethyldichlorosilane
chloromethyl-methyl-diphenyl-silane
Conditions | Yield |
---|---|
In tetrahydrofuran at 30 - 60℃; for 3h; | 92.75% |
In tetrahydrofuran for 12h; Reflux; | 81% |
In diethyl ether for 16.5h; Inert atmosphere; Reflux; | 80% |
In diethyl ether for 16h; Heating; | 71% |
2-methoxy-ethanol
chloromethylmethyldichlorosilane
(chloromethyl)bis(2-methoxyethoxy)methylsilane
Conditions | Yield |
---|---|
In pentane at 23℃; | 92% |
Conditions | Yield |
---|---|
With 1,1,1,3,3,3-hexamethyl-disilazane In benzene for 1h; Heating; | 92% |
With thionyl chloride; sodium hydrogencarbonate; 1,1,1,3,3,3-hexamethyl-disilazane 1.) C6H6, reflux, 1 h, 2.) H2O, 1 h, 3.) reflux, 1 h; Yield given. Multistep reaction; |
5-chloro-2-tri-methylsilyloxy-pyridine
chloromethylmethyldichlorosilane
Conditions | Yield |
---|---|
In hexane for 7h; Alkylation; desilylation, rearrangement; | 91% |
Conditions | Yield |
---|---|
In diethyl ether at 0 - 37℃; | 90% |
In diethyl ether Heating; | 67% |
In diethyl ether Grignard reaction; Heating; | 67% |
3-methoxy-2-trimethylsiloxypyridine
chloromethylmethyldichlorosilane
Conditions | Yield |
---|---|
In hexane for 7h; Alkylation; desilylation, rearrangement; | 90% |
6-chloro-2-trimethylsiloxypyridine
chloromethylmethyldichlorosilane
Conditions | Yield |
---|---|
In hexane for 7h; Alkylation; desilylation, rearrangement; | 90% |
chloro-trimethyl-silane
5,5-dimethylbarbituric acid
chloromethylmethyldichlorosilane
1,3-bis[(dichloro(methyl)silyl)methyl]-5,5-dimethylpyrimidine-2,4,6-trione
Conditions | Yield |
---|---|
Stage #1: chloro-trimethyl-silane; 5,5-dimethylbarbituric acid With triethylamine In diethyl ether Inert atmosphere; Reflux; Stage #2: chloromethylmethyldichlorosilane In chloroform for 16h; Inert atmosphere; Reflux; | 90% |
Conditions | Yield |
---|---|
In diethyl ether at -80℃; for 2h; Inert atmosphere; Schlenk technique; | 90% |
lithium diisopropylphosphide
LiCH2PMe2
chloromethylmethyldichlorosilane
Conditions | Yield |
---|---|
Stage #1: LiCH2PMe2; chloromethylmethyldichlorosilane In diethyl ether at -80℃; for 2h; Inert atmosphere; Schlenk technique; Stage #2: lithium diisopropylphosphide In diethyl ether; hexane; N,N-dimethyl-formamide at -50 - -40℃; for 3h; Inert atmosphere; Schlenk technique; | 90% |
Conditions | Yield |
---|---|
With silver nitrate In tetrahydrofuran at 20℃; for 2h; | 90% |
allylmagnesium bromide
chloromethylmethyldichlorosilane
A
diallyl(chloromethyl)methylsilane
Conditions | Yield |
---|---|
With 3-chloroprop-1-ene In diethyl ether for 3h; Heating; | A 89.4% B 5.3% |
Conditions | Yield |
---|---|
Heating; | 89% |
isopropyl alcohol
chloromethylmethyldichlorosilane
chloromethyl methyl isopropoxy chlorosilane
Conditions | Yield |
---|---|
With triethylamine In diethyl ether | 89% |
at 20℃; for 4h; Time; Cooling with ice; Inert atmosphere; | 60.8% |
1,3,4,6,7,8-hexahydro-1-trimethylsilyl-2H-pyrimido<1,2-a>pyrimidin
chloromethylmethyldichlorosilane
Conditions | Yield |
---|---|
at 25℃; | 88.5% |
Carbamic acid,[1-(hydroxymethyl)-2,2-diphenylethyl]-, 1,1-dimethylethyl ester, (S)- (9CI)
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