13465-77-5 Usage
Chemical Properties
colourless liquid
Physical properties
bp 144–145.5 °C; d 1.562 g cm?3.
Uses
Different sources of media describe the Uses of 13465-77-5 differently. You can refer to the following data:
1. Hexachlorodisilane can be used in deoxygenation and desulfurization of phosphine oxides, phosphine
sulfides, and amine oxides; reducing agent for nitro groups
and sulfur diimides.
2. HCDS may be used as a reducing agent. It may be combined with ammonia to form silicon nitride by chemical vapor deposition(CVD) technique.
General Description
Hexachlorodisilane (HCDS) is a chlorosilane used as a precursor for producing disilanes. It is a dioxidizer that is used in the production of silicon films and silicon nitride based films.
Flammability and Explosibility
Nonflammable
Check Digit Verification of cas no
The CAS Registry Mumber 13465-77-5 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,3,4,6 and 5 respectively; the second part has 2 digits, 7 and 7 respectively.
Calculate Digit Verification of CAS Registry Number 13465-77:
(7*1)+(6*3)+(5*4)+(4*6)+(3*5)+(2*7)+(1*7)=105
105 % 10 = 5
So 13465-77-5 is a valid CAS Registry Number.
InChI:InChI=1/Cl6Si2/c1-7(2,3)8(4,5)6
13465-77-5Relevant articles and documents
Anderson, H. H.
, p. 2761 - 2762 (1950)
Synthesis of Wiberg's tetrasilatetrahedrane (tBu3Si) 4Si4 by a one-pot procedure
Frank, Meyer-Wegner,Scholz, Stefan,Saenger, Inge,Schoedel, Frauke,Bolte, Michael,Wagner, Matthias,Lerner, Hans-Wolfram
, p. 6835 - 6837 (2010/04/01)
A one-pot synthesis of the tetrasilatetrahedrane (tBu3Si) 4Si4 was achieved by the reaction of HSiCl3 and Na[SitBu3]. In this reaction the silane tBu3SiH was obtained along with (tBu3
Pyrolysis of trichlorosilane in the presence of chloroform
Krasnova,Abramova,Alekseev,Chernyshev
, p. 1960 - 1963 (2007/10/03)
The pyrolysis of trichlorosilane in the presence of different amounts of chloroform and the copyrolysis of HSiCl3 with buta-1,3-diene in the presence of 1 mol.% chloroform were studied. The enthalpies of formation of products resulting from the pyrolysis of HSiCl3 in the presence of chloroform were calculated by the quantum chemical method. Based on the thermochemical data as well as data from GLC and mass spectrometry, it was concluded from the condensate composition that introduction of chloroform into the zone of pyrolysis of HSiCl3 favors generation of silylenes.