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Dayang Chem (Hangzhou) Co.,Ltd.

DayangChem exported this product to many countries and regions at best price. If you are looking for the material's manufacturer or supplier in China, DayangChem is your best choice. Pls contact with us freely for getting detailed product spe

Hexachlorodisilane

Cas:13465-77-5

Min.Order:1 Kilogram

FOB Price: $3.0

Type:Lab/Research institutions

inquiry

Henan Allgreen Chemical Co.,Ltd

he company has advanced technology, as well as a large number of excellent R & D team, to provide customers from the grams to one hundred kilograms and tons of high-quality products, competitive prices and quality se T rvice Appearance:

Hexachlorodisilane

Cas:13465-77-5

Min.Order:1 Kilogram

Negotiable

Type:Manufacturers

inquiry

Ality Chemical Corporation

The above product is Ality Chemical's strong item with best price, good quality and fast supply. Ality Chemical has been focusing on the research and production of this field for over 14 years. At the same time, we are always committed to providi

Factory Supply Hexachlorodisilane

Cas:13465-77-5

Min.Order:1

Negotiable

Type:Other

inquiry

Chemwill Asia Co., Ltd.

Our main production base is located in Xuzhou industry park. We are certified both to the ISO 9001 and ISO 14001 Standards, have a safety management system in place.Our R&D team masters core technology for process-design of target building block

Hexachlorodisilane

Cas:13465-77-5

Min.Order:5 Kiloliter

FOB Price: $1.2 / 5.0

Type:Manufacturers

inquiry

Hebei Nengqian Chemical Import and Export Co., LTD

Our Advantage Rich Experience Our products are sold all over Europe,North&South America, Sino-East, Asia and pacific area as well as Africa,we establish long term. Quality service Company cooperates with research institutes. We strictly con

HEXACHLORODISILANE CAS 13465-77-5

Cas:13465-77-5

Min.Order:1 Kilogram

FOB Price: $1.0 / 10.0

Type:Trading Company

inquiry

Zhuozhou Wenxi import and Export Co., Ltd

WITH US,YOUR MONEY IN SAFE,YOUR BUSINESS IN SAFE 1)Quick Response Within 12 hours; 2)Quality Guarantee: All products are strictly tested by our QC, confirmed by QA and approved by third party lab in China, USA, Canada, Germany, UK, Italy, France et

Factory direct supply CAS 13465-77-5 with best quality

Cas:13465-77-5

Min.Order:1 Kilogram

FOB Price: $139.0 / 210.0

Type:Trading Company

inquiry

Shanghai Upbio Tech Co.,Ltd

1.In No Less 10 years exporting experience. you can 100% received goods 2.Lower Price with higher quality 3,Free sample 4,We are sincerely responsible for the "product quality" and "After Service" Upbio is Specializ

Disilane,1,1,1,2,2,2-hexachloro-

Cas:13465-77-5

Min.Order:1 Gram

Negotiable

Type:Lab/Research institutions

inquiry

Qingdao Beluga Import and Export Co., LTD

HEXACHLORODISILANE CAS:13465-77-5 Qingdao Belugas Import and Export Co., Ltd. is a scientific and technological company integrating research and development, production and trade of chemical intermediates, specializing in high quality organic interm

HEXACHLORODISILANE CAS:13465-77-5

Cas:13465-77-5

Min.Order:1 Gram

Negotiable

Type:Lab/Research institutions

inquiry

Shandong Hanjiang Chemical Co., Ltd.

Hello, dear friend! I'm Hansen and Allen from China. Welcome to my lookchem mall! The following is a brief introduction of our company's products and services. If you are interested in our products, please contact us by emai

Disilane,1,1,1,2,2,2-hexachloro-

Cas:13465-77-5

Min.Order:1 Kilogram

Negotiable

Type:Lab/Research institutions

inquiry

Henan Wentao Chemical Product Co., Ltd.

Henan Wentao Chemical Product Co.,Ltd is Located in Zhengzhou High-tech Development Zone with import and export license, We passed ISO 9001:2008 as well, Henan Wentao has developed more than 1000 compounds, which are widely used in the fields of prod

Disilane,1,1,1,2,2,2-hexachloro-

Cas:13465-77-5

Min.Order:0

Negotiable

Type:Lab/Research institutions

inquiry

Hangzhou J&H Chemical Co., Ltd.

J&H CHEM R&D center can offer custom synthesis according to the contract research and development services for the fine chemicals, pharmaceutical, biotechnique and some of the other chemicals. J&H CHEM has some Manufacturing base in Jia

Disilane,1,1,1,2,2,2-hexachloro-

Cas:13465-77-5

Min.Order:0

Negotiable

Type:Lab/Research institutions

inquiry

Zibo Hangyu Biotechnology Development Co., Ltd

Zibo Hangyu Biotechnology Development Co., Ltd is a leading manufacturer and supplier of chemicals in China. We develop produce and distribute high quality pharmaceuticals, intermediates, special chemicals and OLED intermediates and other fine chemi

Hexachlorodisilane

Cas:13465-77-5

Min.Order:10 Gram

FOB Price: $100.0

Type:Lab/Research institutions

inquiry

TAIZHOU ZHENYU BIOTECHNOLOGY CO., LTD

Zhenyu biotech exported this product to many countries and regions at best price. if you are looking for the material's manufacturer or supplier in china, zhenyu biotech is your best choice. pls contact with us freely for getting detailed

HEXACHLORODISILANE

Cas:13465-77-5

Min.Order:1 Kilogram

FOB Price: $2.0

Type:Lab/Research institutions

inquiry

Win-Win chemical Co.Ltd

Stock products, own laboratory Package:Grams, Kilograms Application:For R&D Transportation:According to customer request Port:Shanghai

Hexachlorodisilane cas no. 13465-77-5 98%

Cas:13465-77-5

Min.Order:0

Negotiable

Type:Lab/Research institutions

inquiry

GIHI CHEMICALS CO.,LIMITED

Lower price, sample is available,SDS test documents are available,large stock in warehouseAppearance:White powder Storage:Sealed and preserved Package:200/Kilograms Application:Fine chemical intermediates, used as the main raw material for the synthe

Hexachlorodisilane

Cas:13465-77-5

Min.Order:0

Negotiable

Type:Lab/Research institutions

inquiry

Xi`an Eastling Biotech Co., Ltd.

high purity lowest priceAppearance:solid or liquid Storage:in sealed air resistant place Package:Foil bag; Drum; Plastic bottle Application:Pharma;Industry;Agricultural Transportation:by sea or air Port:Beijing or Guangzhou

HEXACHLORODISILANE

Cas:13465-77-5

Min.Order:0

Negotiable

Type:Lab/Research institutions

inquiry

Henan Tianfu Chemical Co., Ltd.

1.Our services:A.Supply sampleB.The packing also can be according the customers` requirmentC.Any inquiries will be replied within 24 hoursD.we provide Commerical Invoice, Packing List, Bill of loading, COA , Health certificate and Origin certificate.

Disilane,1,1,1,2,2,2-hexachloro-

Cas:13465-77-5

Min.Order:0

Negotiable

Type:Lab/Research institutions

inquiry

Xian Changyue Biological Technology Co., Ltd.

best seller Application:API

HEXACHLORODISILANE

Cas:13465-77-5

Min.Order:0

Negotiable

Type:Manufacturers

inquiry

Hunan chemfish Pharmaceutical co.,Ltd

Hunan chemfish Pharmaceutical co.,Ltd.located in Lugu High-tech industral park ,Hunan province . with its own R&D center and more than 10000㎡manufacture plant . Chemfish owns 40 reactors from 1000L to 8000L. With complete auxiliary equipment as:

HEXACHLORODISILANE

Cas:13465-77-5

Min.Order:0 Metric Ton

Negotiable

Type:Trading Company

inquiry

Antimex Chemical Limied

Ansciep Chemical is a professional enterprise manufacturing and distributing fine chemicals and speciality chemicals. We have been dedicated to heterocycle compounds and phenyl rings for tens of years. This is our mature product for export. Our quali

Disilane,1,1,1,2,2,2-hexachloro-

Cas:13465-77-5

Min.Order:0

Negotiable

Type:Lab/Research institutions

inquiry

Hangzhou Ocean Chemical Co., Ltd.

1.High purity, like 99%, 99.9%, 99.95%, 99.99%, 99.999%2.Quality control, test sample before shipping and keep sample for 3 years after shipping;3. Prompt shipment with professional documents;4. Packing as your request, with photo before shipment;5.

Hexachlorodisilane

Cas:13465-77-5

Min.Order:0

Negotiable

Type:Lab/Research institutions

inquiry

Guangdong Juda Chemical Industrial Co.,Limited

Appearance:solid or liquid Storage:sealed in cool and dry place Package:As customer's requested Application:Pharma Intermediate Transportation:by courier/air/sea Port:Any port in China

HEXACHLORODISILANE CAS No.13465-77-5

Cas:13465-77-5

Min.Order:0

Negotiable

Type:Trading Company

inquiry

DB BIOTECH CO., LTD

best seller Application:API

HEXACHLORODISILANE

Cas:13465-77-5

Min.Order:0

Negotiable

Type:Trading Company

inquiry

BOC Sciences

We are committed to providing our customers with the best products and services at the most competitive prices.Appearance:off-white powder Storage:Room temperature with sealed well Package:according to the clients requirement Application:Use as prima

hexachlorodisilane

Cas:13465-77-5

Min.Order:0

Negotiable

Type:Trading Company

inquiry

Shandong Mopai Biotechnology Co., LTD

best seller Application:API

HEXACHLORODISILANE

Cas:13465-77-5

Min.Order:0

Negotiable

Type:Lab/Research institutions

inquiry

Henan Kanbei Chemical Co.,LTD

factory?direct?saleAppearance:White powder Storage:Sealed and preserved Package:200/Kilograms Application:healing drugs Transportation:By sea Port:Shanghai/tianjin

HEXACHLORODISILANE

Cas:13465-77-5

Min.Order:0

Negotiable

Type:Lab/Research institutions

inquiry

Hebei Quanhe Biotechnology Co. LTD

1. Timely and efficient service to ensure communication with customers2. Produce products of different specifications and sizes according to your requirements.3. Quality procedures and standards recognized by SGS. Advanced plant equipment ensures sta

HEXACHLORODISILANE

Cas:13465-77-5

Min.Order:0

Negotiable

Type:Lab/Research institutions

inquiry

Shanghai Chinqesen Biotechnology Co., Ltd.

Good Quality Package:1kg/bag Application:Medical or chemical Transportation:Air/Train/Sea Port:Shenzhen

13465-77-5

Cas:13465-77-5

Min.Order:0

Negotiable

Type:Trading Company

inquiry

Hebei Muhuang Technology Co., Ltd

best seller Application:API

HEXACHLORODISILANE

Cas:13465-77-5

Min.Order:0

Negotiable

Type:Trading Company

inquiry

Shanghai Send Pharmaceutical Technology Co., Ltd.

stock,low price,high quality,high purity,good sevice Application:R&D

Hexachlorodisilane

Cas:13465-77-5

Min.Order:0

Negotiable

Type:Lab/Research institutions

inquiry

Synthetic route

silicon
7440-21-3

silicon

A

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

B

hexachlorodisilane
13465-77-5

hexachlorodisilane

C

perchlorotrisilane
13596-23-1

perchlorotrisilane

Conditions
ConditionsYield
In neat (no solvent) chlorination of crude Si at 300-310 °C; best yield of SiCl4;;A 80%
B n/a
C n/a
hexaphenyldisilane
1450-23-3

hexaphenyldisilane

acetyl chloride
75-36-5

acetyl chloride

hexachlorodisilane
13465-77-5

hexachlorodisilane

Conditions
ConditionsYield
With aluminium trichloride In hexane Ph3SiSiPh3, AlCl3 and CH3COCl in hexane were stirred overnight; hexane added; upper phase septd.; hexane removed (vac.); redistd.;55%
chloroform
67-66-3

chloroform

trichlorosilane
10025-78-2

trichlorosilane

A

1,1,2,2-tetrachlorodisilane

1,1,2,2-tetrachlorodisilane

B

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

C

1,1,1,2,2-pentachlorodisilane
31411-98-0

1,1,1,2,2-pentachlorodisilane

D

hexachlorodisilane
13465-77-5

hexachlorodisilane

Conditions
ConditionsYield
byproducts: CH2Cl2; copyrolysis (1:1), quartz tube (550°C, yields of products depending on temperature (350 to 600°C)), product condensing; products not isolated, reaction monitoring by mass spectroscopy;A 1.3%
B 46.7%
C 1.9%
D 1%
chloroform
67-66-3

chloroform

trichlorosilane
10025-78-2

trichlorosilane

A

1,1,2,2-tetrachlorodisilane

1,1,2,2-tetrachlorodisilane

B

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

C

1,1,1,2,2-pentachlorodisilane
31411-98-0

1,1,1,2,2-pentachlorodisilane

D

trichloro(dichloromethyl)silane
1558-24-3

trichloro(dichloromethyl)silane

E

hexachlorodisilane
13465-77-5

hexachlorodisilane

Conditions
ConditionsYield
copyrolysis (1% CHCl3), quartz tube (575°C, retention time 30 s, yields of products depending on temperature (350 to 600°C)), product condensing; products not isolated, reaction monitoring by mass spectroscopy;A 1.7%
B 25.8%
C 5.1%
D 0.7%
E 1.6%
copper(l) chloride

copper(l) chloride

silicon
7440-21-3

silicon

A

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

B

copper silicide
12134-36-0

copper silicide

C

hexachlorodisilane
13465-77-5

hexachlorodisilane

Conditions
ConditionsYield
In neat (no solvent) byproducts: Cu; CuCl particles were deposited on a Si wafer by dipping in a slurry of CuCl in hexane; coated wafer was heated at 380°C in a furnace for 1-60 min;; mixt. not sepd.;;
calcium chloride

calcium chloride

silicon
7440-21-3

silicon

A

hexachlorodisilane
13465-77-5

hexachlorodisilane

B

calcium
7440-70-2

calcium

Conditions
ConditionsYield
In neat (no solvent) vivious reaction under formation of Ca and Si2Cl6, which are burning;;
tetrachloromethane
56-23-5

tetrachloromethane

silicon
7440-21-3

silicon

A

1,1,2,2-tetrachloroethylene
127-18-4

1,1,2,2-tetrachloroethylene

B

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

C

hexa-Si-chloro-Si,Si'-(1,2-dichloro-ethene-1,2-diyl)-bis-silane
5926-33-0

hexa-Si-chloro-Si,Si'-(1,2-dichloro-ethene-1,2-diyl)-bis-silane

D

1,2-bis-(trichlorosilyl)acetylene
18038-55-6

1,2-bis-(trichlorosilyl)acetylene

E

hexachlorodisilane
13465-77-5

hexachlorodisilane

Conditions
ConditionsYield
copper In neat (no solvent) reaction of Si with gaseous CCl4 (in N2) with Cu as catalyst at 110-410°C;; products and yield depend on temp.;;
tetrachloromethane
56-23-5

tetrachloromethane

silicon
7440-21-3

silicon

A

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

B

hexachlorodisilane
13465-77-5

hexachlorodisilane

Conditions
ConditionsYield
silver In neat (no solvent) byproducts: C2Cl4; heating of Si and CCl4 vapor at 80-300 °C;;
manganese In neat (no solvent) byproducts: C2Cl4; heating of Si and CCl4 vapor at 80-300 °C;;
nickel In neat (no solvent) byproducts: C2Cl4; heating of Si and CCl4 vapor at 80-300 °C;;
tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

hexachlorodisilane
13465-77-5

hexachlorodisilane

Conditions
ConditionsYield
In neat (no solvent) Electric Arc; reaction by a electric Zn light arc in N2 atmosphere;;
In neat (no solvent) Electric Arc; reaction by influence of a Zn electric arc on SiCl4 in a N2 atmosphere;;
In neat (no solvent) Electric Arc; reaction by influence of a Zn electric arc on SiCl4 in a N2 atmosphere;;
In neat (no solvent) Electric Arc; reaction by a electric Zn light arc in N2 atmosphere;;
ferrosilicon

ferrosilicon

chlorine
7782-50-5

chlorine

A

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

B

hexachlorodisilane
13465-77-5

hexachlorodisilane

Conditions
ConditionsYield
In neat (no solvent) passing Cl2 over ferrosilicon with 35-65% Si, begin of a strongly exothermic reactn. at 200 °C, 350 °C (yields of SiCl4: 80%), up to 600 °C (yields of SiCl4: 94%), formation of Si2Cl6 < 450 °C (3-10% of the amt. of SiCl4);;
Si(b),Ca(30-35) (X%)

Si(b),Ca(30-35) (X%)

chlorine
7782-50-5

chlorine

A

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

B

tetrasilicon decachloride
13763-19-4

tetrasilicon decachloride

C

dodecachloro pentasilane
13596-24-2

dodecachloro pentasilane

D

hexachlorodisilane
13465-77-5

hexachlorodisilane

E

perchlorotrisilane
13596-23-1

perchlorotrisilane

Conditions
ConditionsYield
In neat (no solvent) passing dry Cl2 through a glass tube, filled with Ca-silicide and heated by a electric spiral at 150-250 °C for about 12-14 days, further products;; fractional distillation;;
silicon iron

silicon iron

chlorine
7782-50-5

chlorine

A

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

B

hexachlorodisilane
13465-77-5

hexachlorodisilane

C

perchlorotrisilane
13596-23-1

perchlorotrisilane

Conditions
ConditionsYield
In neat (no solvent) reaction of 50 kg ferrosilicon with 50% Si with 143 kg Cl2 in a iron tube at 180-260 °C, yields of Si2Cl6 vary between 4.6-8.6% (depending on reaction temperature);; separation by fractional condensation and distillation; removal of Cl2 by shaking with Hg;;
In neat (no solvent) reaction of 50 kg ferrosilicon with 50% Si with 143 kg Cl2 in a iron tube at 180-260 °C, yields of Si2Cl6 vary between 4.6-8.6% (depending on reaction temperature);; separation by fractional condensation and distillation; removal of Cl2 by shaking with Hg;;
difluorosilylene
13966-66-0

difluorosilylene

chlorine
7782-50-5

chlorine

silicon tetrafluoride
7783-61-1

silicon tetrafluoride

A

ClF2SiSiF2Cl
108737-33-3

ClF2SiSiF2Cl

B

Cl2FSiSiCl3
18356-60-0

Cl2FSiSiCl3

C

F3SiSiCl3
108737-34-4

F3SiSiCl3

D

disilicon hexafluoride
13830-68-7

disilicon hexafluoride

E

hexachlorodisilane
13465-77-5

hexachlorodisilane

Conditions
ConditionsYield
In neat (no solvent) The halogen was co-condensed in a flask at -196°C with the mixt. of SiF4 and SiF2 emerging out of the reactor tube; further products;; warmed to room temp.; the volatile products were sepd. and detected by NMR and MS;;
bromine
7726-95-6

bromine

perchlorotrisilane
13596-23-1

perchlorotrisilane

A

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

B

hexachlorodisilane
13465-77-5

hexachlorodisilane

C

dibromo dichlorosilane
13465-75-3

dibromo dichlorosilane

D

bromo trichloro silane
13465-74-2

bromo trichloro silane

E

chloro tribromo silane
13465-76-4

chloro tribromo silane

Conditions
ConditionsYield
In neat (no solvent) dropwise addn. of a mixture of Si3Cl8 and Br2 into a glass tube heated at 500°C under passing CO2 through the tube; reaction with inflammation;;
hydrogen

hydrogen

trichlorosilane
10025-78-2

trichlorosilane

A

hexachlorodisilane
13465-77-5

hexachlorodisilane

B

hydrogen
1333-74-0

hydrogen

Conditions
ConditionsYield
In not given Kinetics; H produced by Hg-sensitized photolysis of H2;; monitored by Lyman-α absorption;;
tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

silicon
7440-21-3

silicon

hexachlorodisilane
13465-77-5

hexachlorodisilane

Conditions
ConditionsYield
In neat (no solvent) repeated passing SiCl4 vapor over molten Si;; rapid cooling; fractional distillation;;
In neat (no solvent) reaction under a SiCl4 stream at high temperature (melting point of Si);;
In neat (no solvent) reaction under a SiCl4 stream at high temperature (melting point of Si);;
hexaiododisilane
13510-43-5

hexaiododisilane

hexachlorodisilane
13465-77-5

hexachlorodisilane

Conditions
ConditionsYield
With mercury dichloride In neat (no solvent)
With mercury dichloride at heating;;
With HgCl2 In neat (no solvent)
With HgCl2
hexaiododisilane
13510-43-5

hexaiododisilane

mercury dichloride

mercury dichloride

hexachlorodisilane
13465-77-5

hexachlorodisilane

Conditions
ConditionsYield
In neat (no solvent) vigorous reaction at moderate warming, beginning of the reaction already on mixing of the substances in the cold;; distn. over HgCl2; fractional distn.;;
In neat (no solvent) vigorous reaction at moderate warming, beginning of the reaction already on mixing of the substances in the cold;; distn. over HgCl2; fractional distn.;;
calcium silicide

calcium silicide

tin(ll) chloride

tin(ll) chloride

A

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

B

hexachlorodisilane
13465-77-5

hexachlorodisilane

Conditions
ConditionsYield
In neat (no solvent) effect of a SnCl2-melt on CaSi2 forms Si2Cl6 and SiCl4;;
trichlorosilane
10025-78-2

trichlorosilane

hexachlorodisilane
13465-77-5

hexachlorodisilane

Conditions
ConditionsYield
In neat (no solvent) reaction by influence of quiet electric discharges on a mixture of SiHCl3 vapors and H2 or HCl;;
In neat (no solvent) reaction by influence of quiet electric discharges on a mixture of SiHCl3 vapors and H2 or HCl;;
tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

A

hexachlorodisilane
13465-77-5

hexachlorodisilane

B

hexachlorodisiloxane
14986-21-1

hexachlorodisiloxane

Conditions
ConditionsYield
With air In neat (no solvent) Electric Arc; reaction by influence of a Zn electric arc on SiCl4 with air in a N2 atmosphere;;
With air In neat (no solvent) Electric Arc; SiCl4 in a Zn electric arc in presence of air;;
With air In neat (no solvent) Electric Arc; SiCl4 in a Zn electric arc in presence of air;;
With air In neat (no solvent) Electric Arc; reaction by influence of a Zn electric arc on SiCl4 with air in a N2 atmosphere;;
tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

oxygen
80937-33-3

oxygen

A

hexachlorodisilane
13465-77-5

hexachlorodisilane

B

hexachlorodisiloxane
14986-21-1

hexachlorodisiloxane

Conditions
ConditionsYield
In neat (no solvent) Electric Arc; reaction by influence of a Zn electric arc on SiCl4 with O2 in a N2 atmosphere;;
In neat (no solvent) Electric Arc; SiCl4 in a Zn electric arc in presence of O2;;
In neat (no solvent) Electric Arc; reaction by influence of a Zn electric arc on SiCl4 with O2 in a N2 atmosphere;;
In neat (no solvent) Electric Arc; SiCl4 in a Zn electric arc in presence of O2;;
perchlorotrisilane
13596-23-1

perchlorotrisilane

A

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

B

hexachlorodisilane
13465-77-5

hexachlorodisilane

Conditions
ConditionsYield
With Br2 In neat (no solvent)
With Br2 In neat (no solvent)
Si10Cl20H2

Si10Cl20H2

A

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

B

silicon monochloride

silicon monochloride

C

trichlorosilane
10025-78-2

trichlorosilane

D

hexachlorodisilane
13465-77-5

hexachlorodisilane

E

perchlorotrisilane
13596-23-1

perchlorotrisilane

Conditions
ConditionsYield
In neat (no solvent) byproducts: HCl, Si4Cl10; formation by thermic decompn. in an inert gas atmosphere at 760 Torr and 300 °C; cracking process;;
In neat (no solvent) byproducts: HCl, Si4Cl10; formation by thermic decompn. in an inert gas atmosphere at 760 Torr and 300 °C; cracking process;;
Si10Cl20H2

Si10Cl20H2

A

hydrogenchloride
7647-01-0

hydrogenchloride

B

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

C

silicon monochloride

silicon monochloride

D

trichlorosilane
10025-78-2

trichlorosilane

E

hexachlorodisilane
13465-77-5

hexachlorodisilane

Conditions
ConditionsYield
In neat (no solvent) thermic decompn.;; cracking process;;
In neat (no solvent) thermic decompn.;; cracking process;;
perchlorotrisilane
13596-23-1

perchlorotrisilane

A

i-Si4Cl10
50683-29-9

i-Si4Cl10

B

tetrakis(trichlorosilyl)silane
50350-62-4

tetrakis(trichlorosilyl)silane

C

(Cl3Si)3SiSiCl2SiCl3
1196525-75-3

(Cl3Si)3SiSiCl2SiCl3

D

hexachlorodisilane
13465-77-5

hexachlorodisilane

Conditions
ConditionsYield
With Na(Si-t-Bu3) In benzene byproducts: (t-Bu3Si)4Si, t-Bu3SiSi-t-Bu3, t-Bu3SiCl; under N2 or Ar; soln. of Cl3SiSiCl2SiCl3 and Na(Si-t-Bu3) (molar ratio 1:4) in benzene stirred at ambient temp. for 1 d; detd. by (29)Si NMR spectra;
Methyltrichlorosilane
75-79-6

Methyltrichlorosilane

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

hexachlorodisilane
13465-77-5

hexachlorodisilane

Conditions
ConditionsYield
under 225.023 Torr;
hexachlorodisilane
13465-77-5

hexachlorodisilane

germaniumtetrachloride
10038-98-9

germaniumtetrachloride

tetraphenyl phosphonium chloride
2001-45-8

tetraphenyl phosphonium chloride

Cl9GeSi3(1-)*C24H20P(1+)

Cl9GeSi3(1-)*C24H20P(1+)

Conditions
ConditionsYield
In dichloromethane at 20℃; for 12h;99%
In dichloromethane at 20℃; for 12h;
hexachlorodisilane
13465-77-5

hexachlorodisilane

tetra-n-butylphosphonium chloride
2304-30-5

tetra-n-butylphosphonium chloride

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

Conditions
ConditionsYield
With 2-methylimidazole at 175℃; for 2.5h; Sealed tube;95%
hexachlorodisilane
13465-77-5

hexachlorodisilane

disilane

disilane

Conditions
ConditionsYield
With lithium aluminium tetrahydride; calcium hydride In diethylene glycol dimethyl ether at 60℃; for 5h; Inert atmosphere; Reflux;94%
hexachlorodisilane
13465-77-5

hexachlorodisilane

tert-butylamine
75-64-9

tert-butylamine

(HNBut)2(Cl)Si-Si(Cl)(HNBut)2
690973-76-3

(HNBut)2(Cl)Si-Si(Cl)(HNBut)2

Conditions
ConditionsYield
In diethyl ether at -78 - 20℃; Schlenk technique; Inert atmosphere;93%
In diethyl ether at 0 - 20℃; Heating / reflux;79%
hexachlorodisilane
13465-77-5

hexachlorodisilane

tetraethylammonium chloride
56-34-8

tetraethylammonium chloride

germaniumtetrachloride
10038-98-9

germaniumtetrachloride

Cl9GeSi3(1-)*C8H20N(1+)

Cl9GeSi3(1-)*C8H20N(1+)

Conditions
ConditionsYield
In dichloromethane at 20℃; for 1h; Schlenk technique; Inert atmosphere;93%
hexachlorodisilane
13465-77-5

hexachlorodisilane

1,1,3,3-tetramethyldisilazane
15933-59-2

1,1,3,3-tetramethyldisilazane

bisdimethylsilyl pentachlorodisilylamine

bisdimethylsilyl pentachlorodisilylamine

Conditions
ConditionsYield
With triethylamine In pentane at -20 - 25℃; for 6h; Inert atmosphere;90%
hexachlorodisilane
13465-77-5

hexachlorodisilane

di-n-propylamine
142-84-7

di-n-propylamine

C24H56Cl2N4Si2

C24H56Cl2N4Si2

Conditions
ConditionsYield
In diethyl ether at -78 - 20℃; Schlenk technique; Inert atmosphere;89%
lithium aluminium tetrahydride
16853-85-3

lithium aluminium tetrahydride

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

hexachlorodisilane
13465-77-5

hexachlorodisilane

A

disilane

disilane

B

monosilane
7440-21-3

monosilane

Conditions
ConditionsYield
In diethyl ether reaction of a ether soln. of Si2Cl6 with a ether solution of LiAlH4 (in 15% exceed) in a vacuum at 0 °C;;A 87%
B n/a
In diethyl ether reaction of a ether soln. of Si2Cl6 with a ether solution of LiAlH4 (in 15% exceed) in a vacuum at 0 °C;;A 87%
B n/a
sodium dicarbonyl(cyclopentadienyl)ferrate

sodium dicarbonyl(cyclopentadienyl)ferrate

hexachlorodisilane
13465-77-5

hexachlorodisilane

1-[dicarbonyl(η(5)-cyclopentadienyl)ferrio]-1,1,2,2,-pentachlorodisilane

1-[dicarbonyl(η(5)-cyclopentadienyl)ferrio]-1,1,2,2,-pentachlorodisilane

Conditions
ConditionsYield
In cyclohexane byproducts: NaCl; N2 atmosphere, stirring (room temp., 3 d, exclusion of light); filtration, removement of volatiles (vacuum), extn. (pentane), evapn. (vacuum), pptn. (-78°C), filtration, washing (cold pentane), drying(vacuum); elem. anal.;86%
sodium[(η(5)-pentamethylcyclopentadienyl)Ru(CO)2]
174534-93-1

sodium[(η(5)-pentamethylcyclopentadienyl)Ru(CO)2]

hexachlorodisilane
13465-77-5

hexachlorodisilane

1,1,2,2,2-pentachloro-1-[dicarbonyl(η(5)-pentamethylcyclopdentadienyl)ruthenio]disilane

1,1,2,2,2-pentachloro-1-[dicarbonyl(η(5)-pentamethylcyclopdentadienyl)ruthenio]disilane

Conditions
ConditionsYield
In cyclohexane byproducts: NaCl; N2 atmosphere, stirring (room temp., 18 h, exclusion of light); filtration, removement of volatiles (vacuum), extn. (pentane), evapn. (vacuum), pptn. (-78°C), filtration, washing (cold pentane), drying(vacuum); elem. anal.;85%
hexachlorodisilane
13465-77-5

hexachlorodisilane

ethylamine
75-04-7

ethylamine

hexakisethylaminodisilane
532980-53-3

hexakisethylaminodisilane

Conditions
ConditionsYield
In hexane at 0 - 20℃; Heating / reflux;84%
In 2-Methylpentane at -40 - 0℃; for 1h; Product distribution / selectivity; Industry scale;
hexachlorodisilane
13465-77-5

hexachlorodisilane

diallylamine
124-02-7

diallylamine

C24H40Cl2N4Si2

C24H40Cl2N4Si2

Conditions
ConditionsYield
In diethyl ether at -78 - 20℃; Schlenk technique; Inert atmosphere;84%
hexachlorodisilane
13465-77-5

hexachlorodisilane

ethylamine
75-04-7

ethylamine

tetrakisdiethylamidodichlorodisilane

tetrakisdiethylamidodichlorodisilane

Conditions
ConditionsYield
In diethyl ether at 0 - 20℃; Heating / reflux;82%
tetrakis(triphenylphosphine) palladium(0)
14221-01-3

tetrakis(triphenylphosphine) palladium(0)

hexachlorodisilane
13465-77-5

hexachlorodisilane

Pd(P(C6H5)3)2(SiCl3)2
81313-98-6

Pd(P(C6H5)3)2(SiCl3)2

Conditions
ConditionsYield
In toluene complex added to soln. of Si compd., stirred for 19 h, under N2; evapd., washed with ether, recrystd. from benzene/hexane; elem. anal.;82%
1-Chloropentane
543-59-9

1-Chloropentane

hexachlorodisilane
13465-77-5

hexachlorodisilane

tetraamylsilane
3429-63-8

tetraamylsilane

Conditions
ConditionsYield
With Na In not given80%
hexachlorodisilane
13465-77-5

hexachlorodisilane

tetrakis(trichlorosilyl)silane
50350-62-4

tetrakis(trichlorosilyl)silane

Conditions
ConditionsYield
In neat (no solvent) byproducts: SiCl3(SiCl3)(Me2NC2H4NMe2); Si2Cl6 was heated in presence of SiCl3(SiCl3)(Me2NC2H4NMe2) (catalyst) at 55°C for 15 h; NMR monitoring; filtered; evapd. (vac.);80%
With pyridine at 20℃; Reagent/catalyst; Schlenk technique; Inert atmosphere; Cooling;73%
lthium[bis(dimethylphosphanyl)(trimethylsilyl)methanide]
102493-28-7

lthium[bis(dimethylphosphanyl)(trimethylsilyl)methanide]

hexachlorodisilane
13465-77-5

hexachlorodisilane

C16H42P4Si3

C16H42P4Si3

Conditions
ConditionsYield
With lithium dihydronaphthylide radical In tetrahydrofuran at -78℃; warming up to 0 deg C;77%
hexachlorodisilane
13465-77-5

hexachlorodisilane

dimethyl zinc(II)
544-97-8

dimethyl zinc(II)

1,1,1,2,2,2-hexamethyldisilane
1450-14-2

1,1,1,2,2,2-hexamethyldisilane

Conditions
ConditionsYield
In diethyl ether Si2Cl6 and 31% excess of Zn(CH3)2 in ether at 85°C in a closed tube;;74%
bis(pentafluorophenyl) sulfoxide
26346-84-9

bis(pentafluorophenyl) sulfoxide

hexachlorodisilane
13465-77-5

hexachlorodisilane

pentafluorophenyl sulfide
1043-50-1

pentafluorophenyl sulfide

Conditions
ConditionsYield
In benzene 22 h, reflux, molar ratio of (C6F5)2SO : Si2Cl6 = 1 : 2;73%
In benzene 22 h, reflux, molar ratio of (C6F5)2SO : Si2Cl6 = 1 : 2;73%
2-thienyl chloride
96-43-5

2-thienyl chloride

hexachlorodisilane
13465-77-5

hexachlorodisilane

germaniumtetrachloride
10038-98-9

germaniumtetrachloride

(2-thienyl)trichlorogermane
119708-57-5

(2-thienyl)trichlorogermane

Conditions
ConditionsYield
In neat (no solvent) pyrolysis, 450-550°C;70%
lithium dicarbonyl(η(5)-pentamethylcyclopentadienyl)(trimethylphosphane)tungstate

lithium dicarbonyl(η(5)-pentamethylcyclopentadienyl)(trimethylphosphane)tungstate

hexachlorodisilane
13465-77-5

hexachlorodisilane

1,1,1,2,2-pentachloro-2-[dicarbonyl(η(5)-pentamethylcyclopentadienyl)(trimethylphosphane)tungsten]disilane
174134-97-5

1,1,1,2,2-pentachloro-2-[dicarbonyl(η(5)-pentamethylcyclopentadienyl)(trimethylphosphane)tungsten]disilane

Conditions
ConditionsYield
In toluene byproducts: LiCl; (N2, exclusion of light); -78°C to room temp., stirring (5 h); filtration, evapn. (vac.), extn. (benzene), concn. (vac.), pptn. with pentane, recrystn. (hot methylcyclohexane); elem. anal.;70%
hexachlorodisilane
13465-77-5

hexachlorodisilane

pentafluorophenyl lithium
1076-44-4

pentafluorophenyl lithium

perfluorotetraphenylsilane
1524-78-3

perfluorotetraphenylsilane

Conditions
ConditionsYield
In diethyl ether reaction at -79°C, 1 hour, heating to 20°C within 8 hours;heating under reflux, 2 hours;;69%
In diethyl ether reaction at -79°C, 1 hour, heating to 20°C within 8 hours;heating under reflux, 2 hours;;69%
In not given
In not given
sodium (pentamethylcyclopentadienyl)dicarbonylferrate

sodium (pentamethylcyclopentadienyl)dicarbonylferrate

hexachlorodisilane
13465-77-5

hexachlorodisilane

1,1,2,2,2-pentachloro-1-[dicarbonyl(η(5)-pentamethylcyclopdentadienyl)ferrio]disilane

1,1,2,2,2-pentachloro-1-[dicarbonyl(η(5)-pentamethylcyclopdentadienyl)ferrio]disilane

Conditions
ConditionsYield
In cyclohexane byproducts: NaCl; N2 atmosphere, stirring (room temp., 18 h, exclusion of light); stirring with benzene (1 h), filtration, removement of solvent (vacuum),pptn. (pentane), filtration, washing (cold pentane), drying (vacuum); e lem. anal.;63%
lithium [dicarbonyl(η(5)-cyclopentadienyl)(trimethylphosphine)tungsten(0)]

lithium [dicarbonyl(η(5)-cyclopentadienyl)(trimethylphosphine)tungsten(0)]

hexachlorodisilane
13465-77-5

hexachlorodisilane

1,1,1,2,2-pentachloro-2-[dicarbonyl(η(5)-cyclopentadienyl)(trimethylphosphane)tungsten]disilane
174134-95-3

1,1,1,2,2-pentachloro-2-[dicarbonyl(η(5)-cyclopentadienyl)(trimethylphosphane)tungsten]disilane

Conditions
ConditionsYield
In toluene byproducts: LiCl; (N2, exclusion of light); -78°C to room temp., stirring (5 h); filtration, evapn. (vac.), extn. (benzene), concn. (vac.), pptn. with pentane, recrystn. (hot methylcyclohexane); elem. anal.;60%
hexachlorodisilane
13465-77-5

hexachlorodisilane

diisobutylaluminium hydride
1191-15-7

diisobutylaluminium hydride

1,1,1-trichlorodisilane
78228-96-3

1,1,1-trichlorodisilane

Conditions
ConditionsYield
at 0℃;60%
lithium [dicarbonyl(η(5)-pentamethylcyclopentadienyl)(trimethylphosphine)molybdenum(0)]
172217-74-2

lithium [dicarbonyl(η(5)-pentamethylcyclopentadienyl)(trimethylphosphine)molybdenum(0)]

hexachlorodisilane
13465-77-5

hexachlorodisilane

1,1,1,2,2-pentachloro-2-[dicarbonyl(η(5)-pentamethylcyclopentadienyl)(trimethylphosphane)molybdenum]disilane
174134-96-4

1,1,1,2,2-pentachloro-2-[dicarbonyl(η(5)-pentamethylcyclopentadienyl)(trimethylphosphane)molybdenum]disilane

Conditions
ConditionsYield
In benzene byproducts: LiCl; (N2, exclusion of light); stirring (room temp., 12 h); filtration, evapn. (vac.), washing (pentane), addn. of methylcyclohexane, crystn. at -78°C; elem. anal.;59%
Na[CpRu(CO)2]

Na[CpRu(CO)2]

hexachlorodisilane
13465-77-5

hexachlorodisilane

1-[dicarbonyl(η(5)-pentamethylcyclopentadienyl)ruthenio]-1,1,2,2,-pentachlorodisilane

1-[dicarbonyl(η(5)-pentamethylcyclopentadienyl)ruthenio]-1,1,2,2,-pentachlorodisilane

Conditions
ConditionsYield
In cyclohexane byproducts: NaCl; N2 atmosphere, stirring (room temp., 14 h, exclusion of light); filtration, removement of volatiles (vacuum), extn. (pentane), evapn. (vacuum), pptn. (-78°C), filtration, washing (cold pentane), drying(vacuum); elem. anal.;58%
hexachlorodisilane
13465-77-5

hexachlorodisilane

dichlorodiphenylgermane
1613-66-7

dichlorodiphenylgermane

1,2-bis(trichlorosilyl)-1,1,2,2-tetraphenyldigermane

1,2-bis(trichlorosilyl)-1,1,2,2-tetraphenyldigermane

Conditions
ConditionsYield
With tetrabutyl-ammonium chloride In dichloromethane at 20℃; for 12h;57%
With tetrabutyl-ammonium chloride In dichloromethane at 20℃; for 12h;

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