Conditions | Yield |
---|---|
With aluminium trichloride In benzene for 1h; Heating; | 96% |
With aluminium trichloride In benzene |
chloro-trimethyl-silane
tetrachlorosilane
tetrakis(trimethylsilyl)silane
Conditions | Yield |
---|---|
With lithium In tetrahydrofuran at 5 - 20℃; for 9h; Heating / reflux; | 79.3% |
A
tetrakis(trimethylsilyl)silane
Conditions | Yield |
---|---|
In tetrahydrofuran at -90 - 20℃; for 18h; Reagent/catalyst; Inert atmosphere; Schlenk technique; Glovebox; | A 72.2% B 59.1% |
18-crown-6 ether
A
tetrakis(trimethylsilyl)silane
Conditions | Yield |
---|---|
With potassium tert-butylate In 1,2-dimethoxyethane | A n/a B 65% |
tris(trimethylsilyl)silyllithium
methyl tris(trimethylsilyl)silanecarboxylate
tetrakis(trimethylsilyl)silane
Conditions | Yield |
---|---|
In tetrahydrofuran at -80℃; | 63% |
tris(trimethylsilyl)silyllithium
triphenylsilyl tris(trimethylsilyl)silanecarboxylate
A
tetrakis(trimethylsilyl)silane
B
Tris-(trimethylsilyl)-silancarbonsaeure
D
triphenylhydroxysilane
Conditions | Yield |
---|---|
With water In tetrahydrofuran | A 19% B 58% C 46% D 37% |
Conditions | Yield |
---|---|
With aluminium trichloride In benzene for 1h; Heating; | 96% |
With aluminium trichloride In benzene |
chloro-trimethyl-silane
tetrachlorosilane
tetrakis(trimethylsilyl)silane
Conditions | Yield |
---|---|
With lithium In tetrahydrofuran at 5 - 20℃; for 9h; Heating / reflux; | 79.3% |
A
tetrakis(trimethylsilyl)silane
Conditions | Yield |
---|---|
In tetrahydrofuran at -90 - 20℃; for 18h; Reagent/catalyst; Inert atmosphere; Schlenk technique; Glovebox; | A 72.2% B 59.1% |
18-crown-6 ether
A
tetrakis(trimethylsilyl)silane
Conditions | Yield |
---|---|
With potassium tert-butylate In 1,2-dimethoxyethane | A n/a B 65% |
tris(trimethylsilyl)silyllithium
methyl tris(trimethylsilyl)silanecarboxylate
tetrakis(trimethylsilyl)silane
Conditions | Yield |
---|---|
In tetrahydrofuran at -80℃; | 63% |
tris(trimethylsilyl)silyllithium
triphenylsilyl tris(trimethylsilyl)silanecarboxylate
A
tetrakis(trimethylsilyl)silane
B
Tris-(trimethylsilyl)-silancarbonsaeure
D
triphenylhydroxysilane
Conditions | Yield |
---|---|
With water In tetrahydrofuran | A 19% B 58% C 46% D 37% |
Conditions | Yield |
---|---|
With tetrachlorosilane; lithium In tetrahydrofuran at 20℃; Inert atmosphere; | 50% |
With tetrachlorosilane; lithium In tetrahydrofuran at 0 - 20℃; for 37h; Inert atmosphere; | 41% |
With tetrachlorosilane; lithium for 16h; | |
With tetrachlorosilane; lithium In tetrahydrofuran at -60 - 20℃; for 13.5h; Inert atmosphere; |
18-crown-6 ether
A
tetrakis(trimethylsilyl)silane
Conditions | Yield |
---|---|
With potassium tert-butylate In benzene | A n/a B 45% C n/a |
tris(trimethylsilyl)silyllithium
triphenylsilyl tris(trimethylsilyl)silanecarboxylate
A
tetrakis(trimethylsilyl)silane
C
triphenylhydroxysilane
Conditions | Yield |
---|---|
With water In tetrahydrofuran | A n/a B n/a C 37% |
tris(trimethylsilyl)silyllithium
A
1,1,1,2,2,2-hexamethyldisilane
B
tetrakis(trimethylsilyl)silane
C
2,2,3,3-tetrakis(trimethylsilyl)hexamethyltetrasilane
D
C6H18Li2Si3
Conditions | Yield |
---|---|
at 140 - 150℃; | A n/a B 10% C 27% D 35% |
diphenylsilyl dichloride
A
tetrakis(trimethylsilyl)silane
B
2,2,3,3-tetrakis(trimethylsilyl)hexamethyltetrasilane
C
octakis(trimethylsilyl)cyclotetrasilane
Conditions | Yield |
---|---|
With sodium In toluene at 110℃; for 3h; | A 1% B 9% C 25% |
methylmagnesium bromide
octamethylspiropentasilane
tetrakis(trimethylsilyl)silane
Conditions | Yield |
---|---|
In tetrahydrofuran |
triethylsilyl chloride
2,3-dimethyl-buta-1,3-diene
A
tetrakis(trimethylsilyl)silane
Conditions | Yield |
---|---|
With lithium-tris(trimethylsilyl)silanide Yield given. Multistep reaction. Yields of byproduct given; |
triethylsilyl chloride
2,3-dimethyl-buta-1,3-diene
A
tetrakis(trimethylsilyl)silane
Conditions | Yield |
---|---|
1.) THF, -80 deg C, 2.) THF, from -80 deg C to RT; Yield given. Multistep reaction. Yields of byproduct given; |
tris(trimethylsilyl)silyllithium
triethylsilyl tris(trimethylsilyl)silanecarboxylate
A
tetrakis(trimethylsilyl)silane
Conditions | Yield |
---|---|
1.) -80 deg C to RT, THF, 2.) THF; Yield given. Multistep reaction; |
tris(trimethylsilyl)silyllithium
tert-butyldimethylsilyl chloride
triethylsilyl tris(trimethylsilyl)silanecarboxylate
A
tetrakis(trimethylsilyl)silane
Conditions | Yield |
---|---|
1.) THF, -80 deg C to RT, 2.) THF; Yield given. Multistep reaction; | |
1.) -80 deg C to RT, 24 h, THF, 2.) THF; Yield given. Multistep reaction; |
tris-(trimethylsilyl)silane
A
octamethyltrisilane
B
tetrakis(trimethylsilyl)silane
C
1,1,1,3,3,3-hexamethyltrisilane
D
1,1,1,2,2,2-hexakis(trimethylsilyl)disilane
Conditions | Yield |
---|---|
In hexane for 2h; UV-irradiation; Further byproducts given. Title compound not separated from byproducts; |
tris-(trimethylsilyl)silane
A
methyltris(trimethylsilyl)silane
B
tetrakis(trimethylsilyl)silane
C
1,1,1,3,3,3-hexamethyltrisilane
D
1,1,1,5,5,5-hexamethyl-3-(trimethylsilyl)trisiloxane
Conditions | Yield |
---|---|
With methanol for 2.5h; UV-irradiation; Title compound not separated from byproducts; |
tetrakis(trimethylsilyl)silane
Conditions | Yield |
---|---|
Multi-step reaction with 2 steps 1: tetrahydrofuran / 2 h / -80 °C 2: 1.) THF, -80 deg C, 2.) THF, from -80 deg C to RT View Scheme |
Conditions | Yield |
---|---|
Multi-step reaction with 3 steps 1: Br2 / CCl4 2: Li / tetrahydrofuran / -78 deg C to r.t. 3: tetrahydrofuran View Scheme |
tetrakis(dimethylbromosilyl)silane
tetrakis(trimethylsilyl)silane
Conditions | Yield |
---|---|
Multi-step reaction with 2 steps 1: Li / tetrahydrofuran / -78 deg C to r.t. 2: tetrahydrofuran View Scheme |
A
tetrakis(trimethylsilyl)silane
B
2,2,3,3-tetrakis(trimethylsilyl)hexamethyltetrasilane
Conditions | Yield |
---|---|
for 18h; Inert atmosphere; Irradiation; |
Conditions | Yield |
---|---|
With methyllithium; bromine In tetrahydrofuran; diethyl ether for 1h; Ambient temperature; | 100% |
Multi-step reaction with 2 steps 1: potassium tert-butylate / tetrahydrofuran / 4 h / 20 °C / Schlenk technique 2: ethylene dibromide / toluene / 0 - 20 °C / Schlenk technique View Scheme |
tetrakis(trimethylsilyl)silane
Conditions | Yield |
---|---|
With potassium tert-butylate In benzene at 80℃; for 336h; | 100% |
With potassium tert-butylate Inert atmosphere; | |
With potassium tert-butylate In tetrahydrofuran Inert atmosphere; |
tetrakis(trimethylsilyl)silane
diphenylsilyl dichloride
1-chloro-1,1-diphenyl-2,2-bis(trimethylsilyl)trimethyltrisilane
Conditions | Yield |
---|---|
Stage #1: tetrakis(trimethylsilyl)silane With potassium tert-butylate In 1,2-dimethoxyethane for 6h; Stage #2: diphenylsilyl dichloride In 1,2-dimethoxyethane; toluene for 14h; | 99% |
tetrakis(trimethylsilyl)silane
monobromoundecamethylcyclohexasilane
tris(trimethylsilyl)(undecamethylcyclohexasilanyl)silane
Conditions | Yield |
---|---|
Stage #1: tetrakis(trimethylsilyl)silane With 18-crown-6 ether; potassium tert-butylate In toluene Stage #2: monobromoundecamethylcyclohexasilane In toluene at 20℃; for 6h; | 98% |
Conditions | Yield |
---|---|
Stage #1: tetrakis(trimethylsilyl)silane With potassium tert-butylate In toluene Stage #2: 1,1,3,3-tetramethyl-1,3-dichlorodisiloxane In toluene for 1h; | 97% |
tetrakis(trimethylsilyl)silane
3-Chloro-2-methylpropene
1,1,1,3,3,3-hexamethyl-2-(2-methylallyl)-2-(trimethylsilyl)trisilane
Conditions | Yield |
---|---|
Stage #1: tetrakis(trimethylsilyl)silane With potassium tert-butylate In tetrahydrofuran at 20℃; for 10h; Inert atmosphere; Stage #2: 3-Chloro-2-methylpropene In tetrahydrofuran at 0 - 20℃; for 2h; Inert atmosphere; | 94% |
Stage #1: tetrakis(trimethylsilyl)silane With potassium tert-butylate In tetrahydrofuran at 20℃; for 24h; Schlenk technique; Inert atmosphere; Stage #2: 3-Chloro-2-methylpropene In tetrahydrofuran at 0 - 20℃; for 49h; Schlenk technique; Inert atmosphere; | 89% |
Conditions | Yield |
---|---|
With methyllithium lithium bromide In diethyl ether Ambient temperature; | 92% |
Conditions | Yield |
---|---|
With methyllithium; lithium bromide In tetrahydrofuran; diethyl ether for 12h; Ambient temperature; | 92% |
With methyllithium In tetrahydrofuran; diethyl ether for 96h; Ambient temperature; Yield given; | |
With methyllithium In tetrahydrofuran for 48h; Ambient temperature; | |
With methyllithium In diethyl ether Ambient temperature; | |
With methyllithium In tetrahydrofuran; diethyl ether for 18h; |
tetrakis(trimethylsilyl)silane
Conditions | Yield |
---|---|
Stage #1: tetrakis(trimethylsilyl)silane With potassium tert-butylate In tetrahydrofuran at 20℃; for 18h; Inert atmosphere; Stage #2: 1,1-dimethyl-2,5-bis(chlorodimethylsilyl)-3,4-diphenylsilole In toluene at 20℃; for 18h; Inert atmosphere; | 91% |
Conditions | Yield |
---|---|
Stage #1: tetrakis(trimethylsilyl)silane With potassium tert-butylate In tetrahydrofuran at 30 - 33℃; for 5h; Stage #2: With acetic acid In water at 5 - 10℃; for 2h; | 90.3% |
With methyllithium lithium bromide In diethyl ether at 20℃; for 19h; Inert atmosphere; | 77% |
Multi-step reaction with 2 steps 1: 80 percent / tetrahydrofuran / 1 h 2: 93 percent / H2SO4 / tetrahydrofuran; diethyl ether View Scheme |
Conditions | Yield |
---|---|
Stage #1: tetrakis(trimethylsilyl)silane With potassium tert-butylate In tetrahydrofuran for 6h; Stage #2: With magnesium bromide ethyl etherate In tetrahydrofuran for 0.5h; Stage #3: difluorodiphenylsilane In tetrahydrofuran for 0.55h; | 90% |
trifluorormethanesulfonic acid
tetrakis(trimethylsilyl)silane
<1,1,3,3,3-Pentamethyl-2,2-bis(trimethylsilyl)trisilanyl>-trifluoromethanesulfonate
Conditions | Yield |
---|---|
In dichloromethane for 15h; Ambient temperature; | 87% |
tetrahydrofuran
tetrakis(trimethylsilyl)silane
triethylamine-borane
potassium tert-butylate
Conditions | Yield |
---|---|
In tetrahydrofuran (inert atm.), Schlenk techniques; addn. of K compd. to Si compd. in THF,addn. of soln. of B compd., heating to reflux for 24 h; evapn. in vacuum, treatment with pentane, concn., cooling to -60°C for 16 h, isolation of crystals; | 87% |
dichlorodi(2-methylpropyl)silane
tetrakis(trimethylsilyl)silane
1-chloro-1,1-diisobutyl-2,2,2-tris(trimethylsilyl)disilane
Conditions | Yield |
---|---|
Stage #1: tetrakis(trimethylsilyl)silane With potassium tert-butylate In tetrahydrofuran at 20℃; for 4h; Inert atmosphere; Stage #2: dichlorodi(2-methylpropyl)silane In toluene at -50 - 20℃; for 15h; | 87% |
methyltris(chloromethyl)silane
tetrakis(trimethylsilyl)silane
methyltris{[tris(trimethylsilyl)silyl]methyl}silane
Conditions | Yield |
---|---|
Stage #1: tetrakis(trimethylsilyl)silane With 18-crown-6 ether; potassium tert-butylate In toluene at 20℃; for 2h; Inert atmosphere; Stage #2: tris(chloromethyl)methylsilane In toluene at 20℃; Inert atmosphere; | 86% |
tetrakis(trimethylsilyl)silane
[Li(diethylene glycol dimethyl ether)2][Cr(CO)5Si(SiMe3)3]
Conditions | Yield |
---|---|
With t-BuOK In tetrahydrofuran (Ar); Si compd. (1.5 equiv.) and t-BuOK (1.5 equiv.) were reacted in THF; Cr complex was added; mixt. was reacted overnight; volatiles removed (vac.); extd. (Et2O); concd. at -37°C; elem. anal.; | 82% |
tetrakis(trimethylsilyl)silane
Chloromethyltrimethylsilane
2-(trimethylsilyl)-2-[(trimethylsilyl)methyl]hexamethyltrisilane
Conditions | Yield |
---|---|
Stage #1: tetrakis(trimethylsilyl)silane With 18-crown-6 ether; potassium tert-butylate In toluene at 20℃; for 2h; Inert atmosphere; Stage #2: Chloromethyltrimethylsilane In toluene at 20℃; for 4h; Inert atmosphere; | 82% |
tetrakis(trimethylsilyl)silane
chlorotriisopropylstannane
triisopropyl[tris(trimethylsilyl)silyl]stannane
Conditions | Yield |
---|---|
With potassium tert-butoxide; 18-crown-6 In benzene under inert atm. to soln. Si(SiMe3)4 in benzene KO-t-Bu and 18-crown-6 were added, stirred for 30 min, and added dropwise to soln. (i-Pr)3SnCl in benzene and stirred for 2 h; react. mixt. was poured into 1 M aq. H2SO4 and extd. with Et2O, org. layer was dried over Na2SO4, solvent was removed in vacuo, residue was recrystd. from ether-acetone (1:1); elem. anal.; | 81% |
Conditions | Yield |
---|---|
Stage #1: tetrakis(trimethylsilyl)silane With potassium tert-butylate In tetrahydrofuran for 0.25h; Stage #2: N,N,N',N'',N'''-pentamethyldiethylenetriamine In tetrahydrofuran for 0.5h; | 80.7% |
tetrakis(trimethylsilyl)silane
Benzylidenemalononitrile
A
2-[phenyl(trimethylsilyl)methyl]malononitrile
Conditions | Yield |
---|---|
With phenanthrene In acetonitrile for 5h; Irradiation; | A n/a B 80% |
tetrakis(trimethylsilyl)silane
potassium tert-butylate
A
tert-butoxytrimethylsilane
Conditions | Yield |
---|---|
In tetrahydrofuran for 1h; Yield given; | A n/a B 80% |
tetrakis(trimethylsilyl)silane
A
tert-butoxytrimethylsilane
Conditions | Yield |
---|---|
With potassium tert-butylate In tetrahydrofuran for 1h; | A n/a B 80% |
tetrakis(trimethylsilyl)silane
2,3-dihydro-1,3-di(neopentyl)-1H-1,3,2-benzodiazasilol-2-ylidene
Conditions | Yield |
---|---|
Stage #1: tetrakis(trimethylsilyl)silane With methyllithium In tetrahydrofuran Stage #2: 2,3-dihydro-1,3-di(neopentyl)-1H-1,3,2-benzodiazasilol-2-ylidene In tetrahydrofuran; hexane at -30 - 20℃; | 80% |
Conditions | Yield |
---|---|
With potassium tert-butylate In toluene at 20℃; for 2h; | 80% |
tetrakis(trimethylsilyl)silane
tert-butyldimethylsilyl chloride
(tert-butyldimethylsilyl)tris(trimethylsilyl)silane
Conditions | Yield |
---|---|
Stage #1: tetrakis(trimethylsilyl)silane With potassium tert-butylate In tetrahydrofuran for 10h; Stage #2: tert-butyldimethylsilyl chloride In toluene at -20 - 20℃; | 80% |
tetrakis(trimethylsilyl)silane
bis(chloromethyl)methyl(2,4,6-trimethoxyphenyl)silane
methyl(2,4,6-trimethoxyphenyl)bis{[tris(trimethylsilyl)silyl]methyl}silane
Conditions | Yield |
---|---|
Stage #1: tetrakis(trimethylsilyl)silane With 18-crown-6 ether; potassium tert-butylate In toluene at 20℃; for 2h; Inert atmosphere; Stage #2: bis(chloromethyl)methyl(2,4,6-trimethoxyphenyl)silane In toluene at 55℃; for 1h; Inert atmosphere; | 77% |
tetrakis(trimethylsilyl)silane
(chloromethyl)dimethyl(2,4,6-trimethoxyphenyl)silane
dimethyl(2,4,6-trimethoxyphenyl){[tris(trimethylsilyl)silyl]methyl}silane
Conditions | Yield |
---|---|
Stage #1: tetrakis(trimethylsilyl)silane With 18-crown-6 ether; potassium tert-butylate In toluene at 20℃; for 2h; Inert atmosphere; Stage #2: (chloromethyl)dimethyl(2,4,6-trimethoxyphenyl)silane In toluene at 20℃; Inert atmosphere; | 76% |
tetrakis(trimethylsilyl)silane
(methoxydimethylsilyl)tris(trimethylsilyl)silane
Conditions | Yield |
---|---|
Stage #1: tetrakis(trimethylsilyl)silane With potassium tert-butylate; magnesium bromide ethyl etherate; dimethylsilicon dichloride In tetrahydrofuran at 0℃; for 12h; Inert atmosphere; Stage #2: With triethylamine In methanol; 1,2-dimethoxyethane at 0℃; for 12h; Inert atmosphere; | 75% |
Multi-step reaction with 2 steps 1: 58 percent / Li / tetrahydrofuran; toluene / 7 h / Ambient temperature 2: 80 percent / tetrahydrofuran / 3 h / Heating View Scheme | |
Multi-step reaction with 3 steps 1: 58 percent / Li / tetrahydrofuran; toluene / 7 h / Ambient temperature 2: 88 percent / I2 / benzene / 0.5 h / Ambient temperature 3: 90 percent / CH2Cl2 / 0.17 h / Ambient temperature View Scheme |
The Trisilane,1,1,1,3,3,3-hexamethyl-2,2-bis(trimethylsilyl)-, with the CAS registry number 4098-98-0, is also known as Tetrakil(trimethylsilyl)silane. It belongs to the product categories of Si (Classes of Silicon Compounds); Si-Si Compounds. This chemical's molecular formula is C12H36Si5 and molecular weight is 320.84. What's more, its systematic name is 1,1,1,3,3,3-hexamethyl-2,2-bis(trimethylsilyl)trisilane. It should be sealed and stored in a dark, ventilated and dry place and be protected from light.
Physical properties of Trisilane,1,1,1,3,3,3-hexamethyl-2,2-bis(trimethylsilyl)- are: (1)ACD/LogP: 6.50; (2)# of Rule of 5 Violations: 1; (3)ACD/LogD (pH 5.5): 6.5; (4)ACD/LogD (pH 7.4): 6.5; (5)ACD/BCF (pH 5.5): 51449.36; (6)ACD/BCF (pH 7.4): 51449.36; (7)ACD/KOC (pH 5.5): 82032.82; (8)ACD/KOC (pH 7.4): 82032.82; (9)#H bond acceptors: 0; (10)#H bond donors: 0; (11)#Freely Rotating Bonds: 4; (12)Polar Surface Area: 0 Å2; (13)Index of Refraction: 1.413; (14)Molar Refractivity: 101.22 cm3; (15)Molar Volume: 405.3 cm3; (16)Polarizability: 40.13×10-24 cm3; (17)Surface Tension: 15.5 dyne/cm; (18)Density: 0.791 g/cm3; (19)Flash Point: 84.4 °C; (20)Enthalpy of Vaporization: 48.29 kJ/mol; (21)Boiling Point: 265.2 °C at 760 mmHg; (22)Vapour Pressure: 0.0152 mmHg at 25°C.
Preparation: this chemical can be prepared by tetrakis(trimethylsilyl)silane by heating. This reaction will need reagent AlCl3 and solvent benzene with the reaction time of 1 hour. The yield is about 96%.
Uses of Trisilane,1,1,1,3,3,3-hexamethyl-2,2-bis(trimethylsilyl)-: it can be used to produce tris(trimethylsilyl)silyllithium at the ambient temperature. It will need reagent MeLi*LiBr complex and solvent diethyl ether. The yield is about 92%.
When you are using this chemical, please be cautious about it as the following:
It is irritating to eyes, respiratory system and skin. In case of contact with eyes, you should rinse immediately with plenty of water and seek medical advice. When using it, you need wear suitable protective clothing.
You can still convert the following datas into molecular structure:
(1)Canonical SMILES: C[Si](C)(C)[Si]([Si](C)(C)C)([Si](C)(C)C)[Si](C)(C)C
(2)InChI: InChI=1/C12H36Si5/c1-13(2,3)17(14(4,5)6,15(7,8)9)16(10,11)12/h1-12H3
(3)InChIKey: BOJSDHZZKKYWAS-UHFFFAOYAL
About|Contact|Cas|Product Name|Molecular|Country|Encyclopedia
Message|New Cas|MSDS|Service|Advertisement|CAS DataBase|Article Data|Manufacturers | Chemical Catalog
©2008 LookChem.com,License: ICP
NO.:Zhejiang16009103
complaints:service@lookchem.com Desktop View