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inquiryTRIMETHYLGALLIUM Basic information Product Name: TRIMETHYLGALLIUM Synonyms: GALLIUM TRIMETHYL;TRIMETHYLGALLIUM;(CH3)3Ga;trimethyl-galliu;TMGa;Trimethylgallium,99+%;
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inquiryProduct Name: TRIMETHYLGALLIUM CAS: 1445-79-0 MF: C3H9Ga MW: 114.83 EINECS: 215-897-6 Mol File: 1445-79-0.mol TRIMETHYLGALLIUM Structure TRIMETHYLGALLIUM Chemical Properties Melting point -15,8°C Boiling point 55,7°
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CAS no. : 1445-79-0 English name: TRIMETHYLGALLIUM English synonyms: TMGa; Me3Ga; (CH3) 3 ga; Trimethylgallane; Trimethyl - galliu; TRIMETHYLGALLIUM; GALLIUM TRIMETHYL; Trimethylgallium, 99 + %; TRIMETHYLGALLIUM (III); Trimethylgallium, elec. G
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trimethyl gallium
Conditions | Yield |
---|---|
In neat (no solvent) heated slowly under 1E-2 mmHg in a trap-to-trap distillation apparatus (receiver flask at -196 °C), liberation of Me3Ga started at 50 °C, temp. was raised to 120 °C;; distillate contained benzene;; | 100% |
Conditions | Yield |
---|---|
at 120 - 145℃; Solvent; Temperature; | A n/a B 98% |
Conditions | Yield |
---|---|
With methylene chloride; sodium at 40 - 50℃; under 375.038 Torr; Inert atmosphere; Flow reactor; | A 93.7% B 96.8% |
Conditions | Yield |
---|---|
With tridodecylamine In 5,5-dimethyl-1,3-cyclohexadiene at 100℃; for 1h; | 93.3% |
Stage #1: gallium(III) trichloride With triethylaluminum Heating; Stage #2: trimethylaluminum at 160℃; | 85% |
Stage #1: trimethylaluminum With triethylamine In toluene at 25 - 100℃; for 1h; Stage #2: gallium(III) trichloride In toluene Product distribution / selectivity; | 81% |
trimethyl gallium
Conditions | Yield |
---|---|
In neat (no solvent) heated slowly under 1E-2 mmHg in a trap-to-trap distillation apparatus (receiver flask at -196 °C), liberation of Me3Ga started at 65 °C, proceeded rapidly at 120-130 °C;; contained traces of benzene;; | 93% |
Conditions | Yield |
---|---|
Stage #1: gallium With magnesium at 60℃; for 1h; Inert atmosphere; Stage #2: methyl iodide In 1,3,5-trimethyl-benzene at 60 - 190℃; for 3.66h; | 92% |
With magnesium In neat (no solvent) byproducts: MgI2; inert atm.; heating (autoclave, 120-160°C, 12 h); distn.; | 65% |
gallium
methyl magnesium iodide
iodine
methyl iodide
trimethyl gallium
Conditions | Yield |
---|---|
Stage #1: gallium; iodine; methyl iodide In toluene at 40 - 50℃; for 6h; Inert atmosphere; Sonication; Stage #2: methyl magnesium iodide In toluene at 100 - 110℃; for 5h; Inert atmosphere; | 92% |
Conditions | Yield |
---|---|
at 20 - 140℃; Glovebox; Inert atmosphere; | 92% |
trimethyl gallium
Conditions | Yield |
---|---|
In neat (no solvent) heated slowly under 1E-2 mmHg in a trap-to-trap distillation apparatus (receiver flask at -196 °C), liberation of Me3Ga started at 85 °C, the rate was more satisfactory at 110-130 °C;; | 91% |
Conditions | Yield |
---|---|
Reflux; | 90% |
In neat (no solvent) warming the mixt. of GaCl3 and trimethylaluminum from 233 K to room temp., stirring for 90 min; vaporization of volatiles in vac., fractional condensation at 178 K; IR; | |
Stage #1: trimethylaluminum at 80 - 85℃; under 187.519 Torr; for 0.5h; Stage #2: Gallium trichloride at 80 - 90℃; for 0.5h; |
trimethyl gallium
Conditions | Yield |
---|---|
In neat (no solvent) metal complex decomposed at 110-120°C for 2-3 h; | 90% |
trimethyl gallium
Conditions | Yield |
---|---|
In neat (no solvent) metal complex decomposed at 100-110°C for 2-3 h; | 88% |
In neat (no solvent) heated slowly under 1E-2 mmHg in a trap-to-trap distillation apparatus (receiver flask at -196 °C), liberation of Me3Ga started at 80 °C, the rate was more satisfactory at 90 °C;; | 71% |
trimethyl gallium
Conditions | Yield |
---|---|
In neat (no solvent) metal complex decomposed at 110-120°C for 2-3 h; | 88% |
Conditions | Yield |
---|---|
Stage #1: gallium(III) trichloride; dimethylaluminum chloride In toluene Stage #2: With triethylamine In toluene at 100℃; for 1h; Product distribution / selectivity; | 82% |
Conditions | Yield |
---|---|
In diethyl ether at -10 - -5℃; for 10h; Large scale; | 80% |
Conditions | Yield |
---|---|
With potassium chloride; sodium chloride at 120℃; Inert atmosphere; | A 25.6% B 71.3% |
With potassium chloride; sodium chloride at 120℃; Inert atmosphere; | A 25.6% B 69.6% |
Conditions | Yield |
---|---|
With potassium chloride; sodium chloride at 120 - 155℃; Concentration; Temperature; Inert atmosphere; | A 24.7% B 69.6% |
With potassium chloride; sodium chloride at 70 - 180℃; Concentration; Temperature; Inert atmosphere; | A 27.4% B 68% |
gallium
magnesium
methyl iodide
A
magnesium chloride
B
trimethyl gallium
Conditions | Yield |
---|---|
In neat (no solvent) inert gas atmosphere; mixing, heating in autoclave (100 - 160°C, stirring, 12 h); distillation; | A n/a B 65% |
Conditions | Yield |
---|---|
In diethyl ether; pentane byproducts: LiCl; under Ar, excess of LiH in Et2O suspn. was added to Et2O soln. of Me2GaCl, reflux for 20 h, filtn., evapn. in vac. at room temp., drying at 45 °C (1E-3 Torr), solid was suspended in n-pentane, Me2GaCl was added in n-pentane, reflux for 16 h; soln. was filtered, residue was twice washed with n-pentane, combined filtrate was evapd., oily residue was distd. in vac. at room temp. (1E-3 Torr) with a cooled (-40 °C) collector, Me3Ga was collected at liq. N2 temp.; | A 49% B n/a |
1,1'-bis(dimethylgallyl)ferrocene
A
[(Fe(η5-C5H4)2)2(GaMe)2]
B
trimethyl gallium
Conditions | Yield |
---|---|
In diethyl ether; toluene under Ar atm. Fe(C5H4GaMe2)2 was treated with Et2O and toluene at room temp. and cooled to +6°C; ppt. was washed with n-hexane and dried in vacuo; | A 46% B n/a |
In chloroform under Ar atm. Fe(C5H4GaMe2)2 was dissolved in CHCl3 and cooled to +6°C; elem. anal.; |
Conditions | Yield |
---|---|
With gallium(III) trichloride at 80 - 120℃; |
Conditions | Yield |
---|---|
With gallium at 110 - 130℃; |
Conditions | Yield |
---|---|
With methyl magnesium iodide; methyl iodide In 1,4-dioxane byproducts: MgI2; excess of CH3MgI and CH3I, heated at 101°C; | |
With methyl magnesium iodide; methyl iodide In tetrahydrofuran byproducts: MgI2; excess of CH3MgI and CH3I, heated at 65°C; | |
With methyl magnesium iodide; methyl iodide In di-isopropyl ether byproducts: MgI2; excess of CH3MgI and CH3I, heated at 69°C; |
Conditions | Yield |
---|---|
according to A. Storr, B. S. Thomas, Can. J. Chem. 48 (1970) 3667; |
Conditions | Yield |
---|---|
In neat (no solvent) vigorously starting reaction, completed at 80 - 120 °C;; |
Conditions | Yield |
---|---|
In not given reaction of excess GaCl3 with Zn(CH3)2;; |
trimethyl gallium
Conditions | Yield |
---|---|
With methyl iodide In further solvent(s) under N2, MeI added slowly to stirred suspn. of Mg5Ga2 in di-isopentyl ether, react. initiated with I2, stirred for 18 h, refluxed for 24 h, cooled to ambient temp.; distn. at bath temp. of 190°C; | 30-50 |
trimethyl gallium
Conditions | Yield |
---|---|
With methylmagnesium bromide GaCl3 is treated with a three-fold excess of MeMgBr; elem. anal.; |
Conditions | Yield |
---|---|
In not given inert atm., PhMe or hexane as solvent, equimolar ratio; | 100% |
In toluene (under dry nitrogen); t-butyl amine added to stirred soln. of trimethylgallium at -78°C; warmed to 25°C; stirred for 24 h; evapd. (vac.); sublimed (65-67°C; E-3 Torr); |
trimethyl gallium
dimethyl(methylperoxy)gallium
Conditions | Yield |
---|---|
With oxygen In n-heptane | 100% |
With oxygen In not given according to: Yu. A. Aleksandrov, G. I. Makin et al., Zh. Obshch. Khim.48 (1978) 467; oxidn. of Ge-compd. with molecular oxygen in hydrocarbonmedium at -78°C; | 100% |
With O2 In neat (no solvent) heated from -120°C -70°C; |
3-Methylpyrazole
trimethyl gallium
dimethyl-(3-methyl-pyrazol-1-yl)-gallium
Conditions | Yield |
---|---|
In benzene byproducts: CH4; under argon atm., reflux, 1 h; evapn. of solvent; | 100% |
Conditions | Yield |
---|---|
In not given N2-atmosphere; equimolar amts.; can be recrystallized (pentane, low temp.) or sublimated (55°C, 1E-2 mbar); | 100% |
Conditions | Yield |
---|---|
In neat (no solvent) all manipulations under N2 atm.; mixed equimolar amts. of Ga and Bi compds. at ambient temp.; elem. anal.; | 100% |
Conditions | Yield |
---|---|
In neat (no solvent) all manipulations under N2 atm.; mixed equimolar amts. of Ga and Bi compds. at ambient temp.; elem. anal.; | 100% |
Conditions | Yield |
---|---|
In neat (no solvent) under N2 atm. react. Me3Ga and Et4Sb2; elem. anal.; | 100% |
Conditions | Yield |
---|---|
In toluene molar ratio 3:1; | 100% |
In benzene dry Ar atm.; 3 equiv. of AlMe3, cooling (-15°C), heating (room temp., stirring), refluxing (1,5 h, 70-80°C); concn., standing (5 to -5 degree.C, several days), washing (toluene), drying (vac.); elem. anal.; | 64% |
tris(diethylamino)difluorophosphorane
trimethyl gallium
[FP(N(C2H5)2)3](1+)*[(CH3)3GaF](1-)=[FP(N(C2H5)2)3][(CH3)3GaF]
Conditions | Yield |
---|---|
In tetrahydrofuran Ar atm.; equimolar amts., stirring (20°C, 24 h); evapn. (vac.); elem. anal.; | 100% |
Conditions | Yield |
---|---|
In toluene molar ratio 3:1; | 100% |
Conditions | Yield |
---|---|
In toluene molar ratio 3:1; | 100% |
In benzene dry Ar atm.; 3 equiv. of AlMe3, cooling (-15°C), heating (room temp., stirring), refluxing (1,5 h, 70-80°C); concn., standing (5 to -5 degree.C, several days), washing (toluene), drying (vac.); elem. anal.; | 73% |
Conditions | Yield |
---|---|
In toluene molar ratio 3:1; | 100% |
In benzene dry Ar atm.; 3 equiv. of AlMe3, cooling (-15°C), heating (room temp., stirring), refluxing (1,5 h, 70-80°C); concn., standing (5 to -5 degree.C, several days), washing (toluene), drying (vac.); elem. anal.; | 67% |
[(CH3)2SnN(CH2CH(CH3)2)]3
trimethyl gallium
Conditions | Yield |
---|---|
In toluene molar ratio 3:1; | 100% |
In benzene dry Ar atm.; 3 equiv. of AlMe3, cooling (-15°C), heating (room temp., stirring), refluxing (1,5 h, 70-80°C); concn., standing (5 to -5 degree.C, several days), washing (toluene), drying (vac.); elem. anal.; | 76% |
Conditions | Yield |
---|---|
In toluene molar ratio 3:1; | 100% |
Conditions | Yield |
---|---|
In not given inert atm., PhMe or hexane as solvent, equimolar ratio; | 100% |
(2,6-iPr2C6H3)N(SiMe3)Si(OH)3
trimethyl gallium
Conditions | Yield |
---|---|
In 1,4-dioxane; hexane byproducts: CH4; molar ratio Ga:ligand 2:1, ratio n-hexane/1,4-dioxane 10/1, addn. (room temp.), refluxing (1 h), pptn.; crystn. (12 h), concn.; elem. anal.; | 100% |
(2,6-iPr2C6H3)N(SiMe3)Si(OH)3
trimethyl gallium
Conditions | Yield |
---|---|
In 1,4-dioxane; hexane byproducts: CH4; equimolar ratio, ratio n-hexane/1,4-dioxane 10/1, stirring (10 min, roomtemp.), refluxing (1 h); evapn. (vac.); elem. anal.; | 100% |
trimethyl gallium
Conditions | Yield |
---|---|
In 1,4-dioxane; hexane byproducts: CH4; molar ratio Ga:ligand 2:1, ratio n-hexane/1,4-dioxane 10/1, addn. (room temp.), refluxing (1 h), pptn.; crystn. (12 h), concn.; elem. anal.; | 100% |
trimethyl gallium
Conditions | Yield |
---|---|
In 1,4-dioxane; hexane byproducts: CH4; equimolar ratio, ratio n-hexane/1,4-dioxane 10/1, stirring (10 min, roomtemp.), refluxing (1 h); evapn. (vac.); elem. anal.; | 100% |
Conditions | Yield |
---|---|
In benzene byproducts: CH4; under argon atm., reflux, 1 h; evapn. of solvent; | 100% |
Conditions | Yield |
---|---|
In dichloromethane (inert atm.), Me3Ga injected to a stirred suspn. of ligand in CH2Cl2 at -76°C, slowly warmed to room temp.; evapd.(vac.), elem. anal.; | 100% |
N,N'-di-tert-butyloxamide
trimethyl gallium
(N,N-di-tert-butyloxamidate)Ga2Me4
Conditions | Yield |
---|---|
In tetrahydrofuran (inert atm.), Me3Ga injected to a stirred suspn. of ligand in THF at room temp., refluxed for 1 h; evapd.(vac.), elem. anal.; | 100% |
Conditions | Yield |
---|---|
In dichloromethane at -50℃; for 1h; Inert atmosphere; Schlenk technique; | 100% |
Conditions | Yield |
---|---|
In dichloromethane at -70 - 20℃; for 1h; Inert atmosphere; Schlenk technique; | 100% |
1-(2,6-diisopropylphenyl)-3-(2-hydroxyphenyl)-4,5-dihydro-imidazolyl chloride
trimethyl gallium
Conditions | Yield |
---|---|
In dichloromethane at -70 - 20℃; for 1h; Inert atmosphere; Schlenk technique; | 100% |
Conditions | Yield |
---|---|
In toluene at 20℃; for 0.166667h; Inert atmosphere; Schlenk technique; | 100% |
trimethyl gallium
Conditions | Yield |
---|---|
In neat (no solvent) at 42℃; for 24h; Temperature; Schlenk technique; Inert atmosphere; | 100% |
trimethyl gallium
Conditions | Yield |
---|---|
In neat (no solvent) at 20℃; for 72h; | 100% |
Conditions | Yield |
---|---|
In dichloromethane at -50 - 20℃; Inert atmosphere; Schlenk technique; | 100% |
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