Conditions | Yield |
---|---|
With sodium; lithium In tetrahydrofuran at 25 - 28℃; for 4h; Heating; Irradiation; ultrasound irrad. var. time, var. temperatures, var. metal purity; | 100% |
With sodium; lithium In tetrahydrofuran at 25 - 28℃; for 4h; Irradiation; | 100% |
With potassium fluoride; phosphorus; potassium In 5,5-dimethyl-1,3-cyclohexadiene at 90℃; for 12h; Reagent/catalyst; Temperature; | 97.3% |
Conditions | Yield |
---|---|
In diethyl ether Heating; | A 68% B 100% |
benzophenone
(trimethylsilyl)potassium
A
1,1,1,2,2,2-hexamethyldisilane
B
tetraphenylethane-1,2-diol
Conditions | Yield |
---|---|
In 1,2-dimethoxyethane for 12h; Ambient temperature; | A 85% B 80% |
chloro-trimethyl-silane
A
1,1,1,2,2,2-hexamethyldisilane
B
Hexamethyldisiloxane
Conditions | Yield |
---|---|
With sodium at 130 - 140℃; for 10h; | A 84% B n/a |
1,1,3,3-tetramethylindan-2-thione
2,2-dimesitylhexamethyltrisilane
A
1,1,1,2,2,2-hexamethyldisilane
B
C31H38SSi
Conditions | Yield |
---|---|
In cyclohexane for 15h; Ambient temperature; Irradiation; low pressure mercury lamp; | A n/a B 82% |
trimethylsilyl isothiocyanate
A
chloro-trimethyl-silane
B
1,1,1,2,2,2-hexamethyldisilane
Conditions | Yield |
---|---|
In toluene Heating at 120-150°C for 10 h.; | A 73% B 32% C 76% |
In toluene molar ratio V-complex/Me3SiNCS=1:2, evacuated sealed ampul (120-150°C, 10 h); | A 73% B 32% C 76% |
Benzylidenemalononitrile
A
1,1,1,2,2,2-hexamethyldisilane
B
Benzylmalononitrile
Conditions | Yield |
---|---|
With phenanthrene In acetonitrile for 43h; Irradiation; 300 W high pressure mercury lamp, λ>280 nm; | A 75% B 10% |
Conditions | Yield |
---|---|
In diethyl ether Si2Cl6 and 31% excess of Zn(CH3)2 in ether at 85°C in a closed tube;; | 74% |
trimethylsilyl 2-iodobenzoate
A
1,1,1,2,2,2-hexamethyldisilane
Conditions | Yield |
---|---|
In toluene at 20℃; for 60h; Sealed tube; | A n/a B 69% |
bis(trimethylsilyl)diphenylgermane
2,3-dimethyl-buta-1,3-diene
A
1,1,1,2,2,2-hexamethyldisilane
B
trimethylphenylsilane
C
1,1-diphenyl-3,4-dimethyl-1-germacyclopent-3-ene
Conditions | Yield |
---|---|
In pentane Irradiation (UV/VIS); (N2), 1 h irradiated; gas chromatography; elem. anal., NMR, mass. spectra; | A 68% B 27% C 61% |
chloro-trimethyl-silane
trimethylsilyl cyanide
A
1,1,1,2,2,2-hexamethyldisilane
B
2-(Bis-trimethylsilanyl-methyl)-1,1,1,3,3,3-hexamethyl-disilazane
C
2-(Bis-trimethylsilanyl-methyl)-1,1,3,3,3-pentamethyl-1-trimethylsilanylmethyl-disilazane
Conditions | Yield |
---|---|
With lithium In tetrahydrofuran at 0℃; Yields of byproduct given; | A 65% B n/a C n/a |
methyl(phenyl)bis(trimethylsilyl)germane
2,3-dimethyl-buta-1,3-diene
A
1,1,1,2,2,2-hexamethyldisilane
B
1,3,4-trimethyl-1-(trimethylsilyl)-1-germacyclopent-3-ene
C
(2,3-dimethyl-3-butenyl)methyl(trimethylsilyl){o-(trimethylsilyl)phenyl}germane
D
trimethylphenylsilane
E
1,3,4-trimethyl-1-phenyl-1-germacyclopent-3-ene
Conditions | Yield |
---|---|
In pentane Irradiation (UV/VIS); (N2), 1.5 h irradiated; column chromatography; elem. anal., NMR, mass. spectra; | A 60% B 28% C 5% D 35% E 55% |
trimethylsilyl 2-iodobenzoate
A
1,1,1,2,2,2-hexamethyldisilane
B
η5-cyclopentadienevanadium bis-o-iodobenzoate
C
cyclopenta-1,3-diene
Conditions | Yield |
---|---|
In toluene at 100℃; for 100h; Time; Sealed tube; | A n/a B 59% C n/a |
trimethylphenylsilane
lithium trimethylstannyl
A
1,1,1,2,2,2-hexamethyldisilane
B
trimethyl(phenyl)stannane
C
hexamethyldistannane
D
trimethyl(trimethylstannyl)silane
E
benzene
Conditions | Yield |
---|---|
In tetrahydrofuran LiSnMe3 added to PhSiMe3 in THF, stirred at 24°C for 1 h or 50°C for 30 min, hydrolysis with water; org. layer extd. with ether, dried over Na2SO4; products determined by GLC; | A 0% B 0% C 50% D 0% E 0% |
1,1,1,4,4,4-hexakis(trimethylsilyl)butin-2
A
1,1,1,2,2,2-hexamethyldisilane
B
1,2-bis(trimethylsilyl)ethane
C
1,1,4,4-tetrakis(trimethylsilyl) 1,2,3-butatriene
D
Bis(trimethylsilyl)ethyne
Conditions | Yield |
---|---|
at 650℃; under 0.001 Torr; Further byproducts given; | A 7% B 5% C 41% D 16% |
bis(trimethylsilyl)methane
bis-trifluoromethyl-aminooxyl
A
1,1,1,2,2,2-hexamethyldisilane
B
trimethylsilyl fluoride
C
N,N-bis(trifluoromethyl)hydroxylamine
D
Perfluoro-2-azapropen
Conditions | Yield |
---|---|
With bis(trimethylsilyl)methane for 4h; Ambient temperature; Further byproducts given; | A 15% B 40% C 33% D 31% |
bis(trimethylsilyl)methane
bis-trifluoromethyl-aminooxyl
A
1,1,1,2,2,2-hexamethyldisilane
B
trimethylsilyl fluoride
C
N,N-bis(trifluoromethyl)hydroxylamine
D
O-Trimethylsilyl-bis-(trifluormethyl)-hydroxylamin
Conditions | Yield |
---|---|
for 4h; Ambient temperature; Further byproducts given; | A 15% B 40% C 33% D 21% |
(dimethylphenylgermyl)trimethylsilane
A
1,1,1,2,2,2-hexamethyldisilane
B
trimethylsilan
C
trimethylphenylsilane
D
dimethylphenylgermane
E
1,1,2,2-tetramethyl-1,2-diphenyldigermane
Conditions | Yield |
---|---|
With methanol In benzene Irradiation (UV/VIS); irradiation of catenate in benzene containing an excess of methanol with a 110 W low pressure Hg arc lamp at room temp. under Ar for 1-4 h; identification by GC and GC-MS; | A <1 B n/a C 37% D <1 E <1 |
In cyclohexane Irradiation (UV/VIS); irradiation of catenate in cyclohexane with a 110 W low pressure Hg arc lamp at room temp. under Ar for 1-4 h; identification by GC and GC-MS; | A <1 B 4% C 24% D <1 E <1 |
tris(trimethylsilyl)silyllithium
A
1,1,1,2,2,2-hexamethyldisilane
B
tetrakis(trimethylsilyl)silane
C
2,2,3,3-tetrakis(trimethylsilyl)hexamethyltetrasilane
D
C6H18Li2Si3
Conditions | Yield |
---|---|
at 140 - 150℃; | A n/a B 10% C 27% D 35% |
triethylsilane
1-<(N,N-dimethylamino)methyl>-2-benzene
A
1,1,1,2,2,2-hexamethyldisilane
Conditions | Yield |
---|---|
In cyclohexane for 1.66667h; Irradiation; | A n/a B 20% C 33% D 24% |
2,3-dimethyl-buta-1,3-diene
1-<(N,N-dimethylamino)methyl>-2-benzene
A
1,1,1,2,2,2-hexamethyldisilane
Conditions | Yield |
---|---|
for 4.5h; Irradiation; | A 33% B 9% C 16% |
1-<(N,N-dimethylamino)methyl>-2-benzene
A
1,1,1,2,2,2-hexamethyldisilane
Conditions | Yield |
---|---|
With triethylsilane In cyclohexane for 1.66667h; Irradiation; | A n/a B 20% C 33% D 24% |
ethanol
bis[2,4,6-tris((dimethylamino)methyl)phenoxy]bis(trimethylsilyl)silane
A
1,1,1,2,2,2-hexamethyldisilane
B
[2,4,6-tris((dimethylamino)methyl)phenoxy]trimethylsilane
Conditions | Yield |
---|---|
at 120℃; for 48h; | A 2% B 33% C 32% D 31% |
In cyclohexane for 4h; Product distribution; Irradiation; | A 7% B 23% C 20% D 6% |
chloro-trimethyl-silane
phenyldi-n-butylchlorosilane
A
1,1,1,2,2,2-hexamethyldisilane
B
1-phenyl-1,1-di-n-butyltrimethyldisilane
Conditions | Yield |
---|---|
With potassium alloy; sodium In benzene for 144h; Heating; | A n/a B 32% |
2,3-dimethyl-buta-1,3-diene
bis[2,4,6-tris((dimethylamino)methyl)phenoxy]bis(trimethylsilyl)silane
A
1,1,1,2,2,2-hexamethyldisilane
B
[2,4,6-tris((dimethylamino)methyl)phenoxy]trimethylsilane
Conditions | Yield |
---|---|
at 120℃; for 168h; Product distribution; | A 3% B 32% C 29% D 2% |
chloro-trimethyl-silane
A
1,1,1,2,2,2-hexamethyldisilane
B
tris(trimethylsilyl)amine
Conditions | Yield |
---|---|
With potassium graphite; Co2(2,2,2-tri(diisopropylphosphinomethylamino)triphenylamine(-3H)); nitrogen In tetrahydrofuran at 25.84℃; under 760.051 Torr; for 12h; Catalytic behavior; Kinetics; Reagent/catalyst; Inert atmosphere; | A n/a B 30% |
With trans-[Mo[N2]2(depf)2]; nitrogen; lithium In tetrahydrofuran at 22 - 24℃; under 760.051 Torr; for 100h; | A 16.53 mmol B 0.55 mmol |
With trans-[Mo[N2]2(depf)2]; nitrogen; sodium In TETRAHYDROPYRANE at 22 - 24℃; under 760.051 Torr; for 100h; | A 0.29 mmol B 1.08 mmol |
adamantane-2-thione
2,2-dimesitylhexamethyltrisilane
A
1,1,1,2,2,2-hexamethyldisilane
Conditions | Yield |
---|---|
In cyclohexane for 15h; Ambient temperature; Irradiation; low pressure mercury lamp; | A n/a B 29% |
A
1,1,1,2,2,2-hexamethyldisilane
B
{(C5H5)2Nb(CH2Si(CH3)3)Cl}(1+)*PF6(1-)={(C5H5)2Nb(CH2Si(CH3)3)Cl}PF6
Conditions | Yield |
---|---|
With CH2Cl2 In dichloromethane addn. of cold (-78°C) CH2Cl2 to mixt. of Cp2Nb(SiMe3)Cl and (Cp2Fe)PF6 in 1:1 molar ratio cooled to -78°C under inert atm., allowed to warm to room temp.; further products; evapd., extd. (Et2O), evapn. gave Cp2Fe (NMR, IR); residue extd. (CH2Cl2), soln. filtered, concd., cooling to -45°C gave cryst. target product (elem.anal.); crystn. (MeCN) of residue gave (Cp2NbCl2)PF6 (IR); others products analyzed by GC; | A <1 B 28% |
(dimethylphenylgermyl)trimethylsilane
2,3-dimethyl-buta-1,3-diene
A
1,1,1,2,2,2-hexamethyldisilane
B
trimethylphenylsilane
Conditions | Yield |
---|---|
In cyclohexane Irradiation (UV/VIS); irradiation of catenate in cyclohexane containing an excess of 2,3-dimethylbutadiene with a 110 W low pressure Hg arc lamp at room temp. under Ar for 1-4 h; identification by GC and GC-MS; | A <1 B 23% |
1,1,1,2,2,2-hexamethyldisilane
Allyl acetate
A
propene
B
trimethylsilyl acetate
C
allyl-trimethyl-silane
D
(E)-trimethyl(prop-1-en-1-yl)silane
Conditions | Yield |
---|---|
tetrakis(triphenylphosphine) palladium(0) at 180℃; for 2h; high pressure, under nitrogen; | A 2 % Chromat. B 100% C 48% D 48% |
1,1,1,2,2,2-hexamethyldisilane
(α,α-dichlorobenzyl)trimethylsilane
(E)-α,β-bis(trimethylsilyl)stilbene
Conditions | Yield |
---|---|
With tetrakis(triphenylphosphine) palladium(0) In 1,3,5-trimethyl-benzene at 130℃; for 18h; | 100% |
1,1,1,2,2,2-hexamethyldisilane
α,β,4-trichlorobenzyltrimethylsilane
Conditions | Yield |
---|---|
With tetrakis(triphenylphosphine) palladium(0) In 1,3,5-trimethyl-benzene at 130℃; for 24h; | 100% |
Conditions | Yield |
---|---|
With hydrogenchloride; diethyl ether at 120℃; for 70h; Sealed tube; | 100% |
With carbon monoxide; hydrogen; nickel at 200℃; under 750.06 Torr; for 2h; | 59% |
With bromobenzene; calcium In water for 1h; Ambient temperature; | 5% |
1,1,1,2,2,2-hexamethyldisilane
1,3-diphenyl-propen-3-one
(E)-1,3-diphenyl-3-trimethylsilyl-2-propene
Conditions | Yield |
---|---|
With copper(I) trifluoromethanesulfonate benzene In various solvent(s) at 100℃; for 19h; | 100% |
1,1,1,2,2,2-hexamethyldisilane
3',4'-dimethoxy-1,1'-biphenyl-4-ol
Conditions | Yield |
---|---|
In pyridine at 115℃; for 3h; | 100% |
1,1,1,2,2,2-hexamethyldisilane
3'-nitro-[1,1'-biphenyl]-4-ol
4-(3'-nitrophenyl)phenol trimethylsilyl ether
Conditions | Yield |
---|---|
In pyridine at 115℃; for 3h; | 100% |
Conditions | Yield |
---|---|
In pyridine at 115℃; for 3h; | 100% |
p-cresol
1,1,1,2,2,2-hexamethyldisilane
trimethyl(4-methylphenoxy)silane
Conditions | Yield |
---|---|
In pyridine at 115℃; for 3h; | 100% |
With lanthanum(III) nitrate hexahydrate In acetonitrile at 20℃; | 90% |
1,1,1,2,2,2-hexamethyldisilane
4-Phenylphenol
4-phenylphenol trimethylsilyl ether
Conditions | Yield |
---|---|
In pyridine at 115℃; for 3h; | 100% |
1,1,1,2,2,2-hexamethyldisilane
2'-fluoro-[1,1'-biphenyl]-4-ol
4-(2'-fluorophenyl)phenol trimethylsilyl ether
Conditions | Yield |
---|---|
In pyridine at 115℃; for 3h; | 100% |
1,1,1,2,2,2-hexamethyldisilane
(E)-1,3-diphenyl-2-propen-1-ol
(R)-(E)-1,3-diphenyl-3-trimethylsilylpropene
Conditions | Yield |
---|---|
With tetrakis(acetonitrile)palladium(II) bis(tetrafluoroborate); allyl alcohol In methanol; dimethyl sulfoxide at 60℃; Inert atmosphere; | 100% |
With Pd(BF4)2(MeCN)4 In methanol; dimethyl sulfoxide at 50℃; for 15h; Air; regioselective reaction; | 69% |
Conditions | Yield |
---|---|
With sodium methylate In N,N,N,N,N,N-hexamethylphosphoric triamide | 99% |
With sodium hydroxide; (o-hydroxyphenyl)diphenylphosphine; PdCl(ϖ-C3H5)2 In tetrahydrofuran at 100℃; for 10h; Substitution; Silylation; | 83% |
With sodium acetate In N,N-dimethyl acetamide at 120℃; for 24h; Catalytic behavior; Solvent; Reagent/catalyst; Inert atmosphere; | 70% |
1,1,1,2,2,2-hexamethyldisilane
(1R*,2R*)-(Z)-4-chloro-2-methyl-1-phenyl-3-buten-1-ol
Conditions | Yield |
---|---|
for 96h; Ambient temperature; | 99% |
1,1,1,2,2,2-hexamethyldisilane
1,1-dimethylhydrazine
N,N-dimethyl-N',N'-bis(trimethylsilyl)hydrazine
Conditions | Yield |
---|---|
With potassium hydride In tetrahydrofuran; N,N,N,N,N,N-hexamethylphosphoric triamide for 24h; Ambient temperature; | 99% |
1,1,1,2,2,2-hexamethyldisilane
(2R,3S)-3-Isopropyl-N-(2,4,6-trimethylphenylsulfonyl)-2-vinylaziridine
Conditions | Yield |
---|---|
Stage #1: 1,1,1,2,2,2-hexamethyldisilane With n-butyllithium In tetrahydrofuran; N,N,N,N,N,N-hexamethylphosphoric triamide; hexane at -78℃; for 1h; Metallation; Stage #2: In tetrahydrofuran; N,N,N,N,N,N-hexamethylphosphoric triamide; hexane at -78 - -30℃; transmetallation; Stage #3: (2R,3S)-3-Isopropyl-N-(2,4,6-trimethylphenylsulfonyl)-2-vinylaziridine In tetrahydrofuran; N,N,N,N,N,N-hexamethylphosphoric triamide; hexane at -78℃; Ring cleavage; | 99% |
Conditions | Yield |
---|---|
Stage #1: pyridine; 1,1,1,2,2,2-hexamethyldisilane With sodium methylate In N,N,N,N,N,N-hexamethylphosphoric triamide for 2h; Stage #2: With water Further stages.; | 99% |
Conditions | Yield |
---|---|
Stage #1: pyridine; 1,1,1,2,2,2-hexamethyldisilane With sodium methylate In N,N,N,N,N,N-hexamethylphosphoric triamide for 0.25h; Stage #2: With water Further stages.; | 99% |
Conditions | Yield |
---|---|
With allyl(cyclopentadiene)palladium(II); trimethylsilyl trifluoromethanesulfonate In benzene at 20℃; for 1h; | 99% |
Conditions | Yield |
---|---|
With palladium diacetate; caesium carbonate; triphenylphosphine In N,N-dimethyl-formamide at 60℃; for 12h; Schlenk technique; Inert atmosphere; | 99% |
1,3 dithiane
ethyl bromide
1,1,1,2,2,2-hexamethyldisilane
2-ethyl-2-(trimethylsilyl)-1,3-dithiane
Conditions | Yield |
---|---|
Mechanism; multistep reaction; other electrophiles, influence of temperature and reaction time; | 98% |
Yield given. Multistep reaction; |
pyridine-4-carboxylic acid
1,1,1,2,2,2-hexamethyldisilane
trimethylsilyl 4-pyridinecarboxylate
Conditions | Yield |
---|---|
RT, then warmed slowly until violent gas evolution occured; | 98% |
5-fluorouracil
1,1,1,2,2,2-hexamethyldisilane
5-fluoro-2,4-bis(trimethylsilyloxy)pyrimidine
Conditions | Yield |
---|---|
With ammonium sulfate for 14h; Heating; | 98% |
1,1,1,2,2,2-hexamethyldisilane
benzyl alcohol
benzyloxy-trimethylsilane
Conditions | Yield |
---|---|
With lanthanum(III) nitrate hexahydrate In acetonitrile at 20℃; | 98% |
With 1% Au/TiO2 In ethyl acetate at 25℃; for 1h; Inert atmosphere; | 96% |
With natural kaolinitic clay In tetrachloromethane for 2h; Ambient temperature; | 90% |
1,1,1,2,2,2-hexamethyldisilane
(2R,3S)-3-methyl-N-(4-methylbenzenesulfonyl)-2-vinylaziridine
Conditions | Yield |
---|---|
Stage #1: 1,1,1,2,2,2-hexamethyldisilane With n-butyllithium In tetrahydrofuran; N,N,N,N,N,N-hexamethylphosphoric triamide; hexane at -78℃; for 1h; Metallation; Stage #2: In tetrahydrofuran; N,N,N,N,N,N-hexamethylphosphoric triamide; hexane at -78 - -30℃; transmetallation; Stage #3: (2R,3S)-3-methyl-N-(4-methylbenzenesulfonyl)-2-vinylaziridine In tetrahydrofuran; N,N,N,N,N,N-hexamethylphosphoric triamide; hexane at -78℃; for 0.5h; Ring cleavage; | 98% |
4-nitrobenzyl chloride
1,1,1,2,2,2-hexamethyldisilane
4-nitrobenzyl trimethylsilyl ether
Conditions | Yield |
---|---|
With lanthanum(III) nitrate hexahydrate In acetonitrile at 20℃; | 98% |
Conditions | Yield |
---|---|
With lanthanum(III) nitrate hexahydrate In acetonitrile at 20℃; | 98% |
With 1% Au/TiO2 In ethyl acetate at 25℃; for 1.5h; Inert atmosphere; | 97% |
1,1,1,2,2,2-hexamethyldisilane
rac-octan-2-ol
trimethyl-(1-methyl-heptyloxy)-silane
Conditions | Yield |
---|---|
With lanthanum(III) nitrate hexahydrate In acetonitrile at 20℃; | 98% |
The IUPAC name of Hexamethyldisilane is trimethyl(trimethylsilyl)silane. With the CAS registry number 1450-14-2 and EINECS 215-911-0, it is also named as Disilane, 1,1,1,2,2,2-hexamethyl-. The product's categories are Standards for NMR; Analytical Chemistry; NMR Spectrometry; Si (Classes of Silicon Compounds); Silicon Compounds (for Synthesis); Si-Si Compounds; Synthetic Organic Chemistry; Blocking Agents; Protective Agents; Silylating Agents; Special Silanes; Disilanes; DisilanesVapor Deposition Precursors; Organometallic Reagents; Organosilicon; Precursors by Metal. It is colorless clear liquid which is insoluble in water, soluble in acetone, benzene, ethyl ether and heptane. What's more, Hexamethyldisilane is a dimer of the trimethylsilyl (TMS) group, linked through a silicon-silicon bond. And it can be cleaved by iodine to give trimethylsilyl iodide. Additionally, this chemical should be sealed in the container and stored in the cool and dry place. People should ensure that the workplace has well-ventilated equipment.
The other characteristics of this product can be summarized as: (1)ACD/LogP: 2.50; (2)# of Rule of 5 Violations: 0; (3)ACD/LogD (pH 5.5): 2.5; (4)ACD/LogD (pH 7.4): 2.5; (5)ACD/BCF (pH 5.5): 46.85; (6)ACD/BCF (pH 7.4): 46.85; (7)ACD/KOC (pH 5.5): 546.38; (8)ACD/KOC (pH 7.4): 546.38; (9)#H bond acceptors: 0; (10)#H bond donors: 0; (11)#Freely Rotating Bonds: 1; (12)Polar Surface Area: 0 Å2; (13)Index of Refraction: 1.39; (14)Molar Refractivity: 47.28 cm3; (15)Molar Volume: 199 cm3; (16)Polarizability: 18.74×10-24 cm3; (17)Surface Tension: 14.6 dyne/cm; (18)Density: 0.735 g/cm3; (19)Flash Point: 5.8 °C; (20)Enthalpy of Vaporization: 33.74 kJ/mol; (21)Boiling Point: 113.5 °C at 760 mmHg; (22)Vapour Pressure: 24.5 mmHg at 25°C.
Preparation of Hexamethyldisilane: It can be obtained by chloro-trimethyl-silane. This reaction needs reagent Li/2 percent Na and solvent tetrahydrofuran at temperature of 25-28 °C. The reaction time is 4 hours. The yield is 100%.
Uses of Hexamethyldisilane: It can be used as raw material in the preparation of trimethylsilyl lithium, sodium trimethylsilyl and trimethylsilyl potassium. It is also used in pharmaceutical synthesis and can be used as terminator of poly carbosilane chain. In addition, it can react with furan-2-carbonyl chloride to get furan-2-yl-trimethylsilanyl-methanone. This reaction needs reagents (p-allyl-PdCl)2, P(OEt)3 and solvent toluene by heating. The reaction time is 6 hours. The yield is 60%.
When you are using this chemical, please be cautious about it as the following:
It is highly flammable, so people should keep it away from sources of ignition. It is also irritating to eyes, respiratory system and skin. People must not breathe vapour. In case of contact with eyes, rinse immediately with plenty of water and seek medical advice. When using this chemical, take precautionary measures against static discharges. In case of accident or if you feel unwell, seek medical advice immediately (show the label whenever possible.)
People can use the following data to convert to the molecule structure.
1. SMILES:C[Si](C)(C)[Si](C)(C)C
2. InChI:InChI=1/C6H18Si2/c1-7(2,3)8(4,5)6/h1-6H3
3. InChIKey:NEXSMEBSBIABKL-UHFFFAOYAV
The following are the toxicity data which has been tested.
Organism | Test Type | Route | Reported Dose (Normalized Dose) | Effect | Source |
---|---|---|---|---|---|
guinea pig | LD50 | oral | > 20gm/kg (20000mg/kg) | Gigiena i Sanitariya. For English translation, see HYSAAV. Vol. 59(4), Pg. 14, 1994. | |
mouse | LD50 | oral | > 20gm/kg (20000mg/kg) | Gigiena i Sanitariya. For English translation, see HYSAAV. Vol. 59(4), Pg. 14, 1994. | |
rat | LD50 | oral | > 20gm/kg (20000mg/kg) | Gigiena i Sanitariya. For English translation, see HYSAAV. Vol. 59(4), Pg. 14, 1994. |
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