Conditions | Yield |
---|---|
With copper(II) nitrate trihydrate; cetyltrimethylammonim bromide; hydrazine hydrate; silicon at 220 - 260℃; under 760.051 Torr; for 1h; Microwave irradiation; | 96.9% |
With trichlorosilane at 100℃; for 6h; Temperature; | 82.6% |
With amorphous silicon In paraffin oil at 230℃; for 5h; Inert atmosphere; Schlenk technique; | 33% |
trichlorosilane
trimethoxysilane
Conditions | Yield |
---|---|
With methanol | 66% |
With CH3OH | 66% |
Conditions | Yield |
---|---|
With amorphous silicon In paraffin oil at 300℃; for 6h; Reagent/catalyst; Solvent; Temperature; Inert atmosphere; Schlenk technique; | A 24% B 21% |
With copper; silicon at 259.9℃; under 742.6 Torr; for 5h; Product distribution; preheating at 623 K for 3 h; other reaction times, temperatures, and partial pressures; | |
With copper(l) chloride; silicon at 219.9℃; under 442.5 Torr; Kinetics; temperature- and pressure dependence; |
methanol
A
trimethoxysilane
B
tetramethylorthosilicate
C
dimethoxysilane
D
(dimethoxy)methylsilane
Conditions | Yield |
---|---|
With thiophene; silicon grains; copper(l) chloride at 379.85℃; under 315.025 Torr; | A n/a B n/a C n/a D 10% |
With thiophene; silicon grains; copper(l) chloride at 379.85 - 449.85℃; under 315.025 Torr; for 3h; |
methanol
allyl propyl ether
A
trimethoxysilane
B
allyltrimethoxysilane
Conditions | Yield |
---|---|
With copper(l) chloride; silicon at 239.9℃; Mechanism; also with allyl ethyl ether and allyl methyl sulfide; |
methanol
ethene
A
trimethoxysilane
B
tetramethylorthosilicate
C
ethyltrimethoxysilane
D
ethyl dimethoxy silane
Conditions | Yield |
---|---|
With copper(l) chloride; silicon In toluene at 159.9℃; under 3040 Torr; for 3h; Product distribution; Mechanism; also ethanol; other solvents; effect of the amount of methanol on the silicon conversion and selectivity for organomethoxysilanes; var. pressures, times and temperatures; |
methanol
A
trimethoxysilane
B
tetramethylorthosilicate
C
dimethoxysilane
Conditions | Yield |
---|---|
With copper; monosilane |
methanol
silicon
A
trimethoxysilane
B
tetramethylorthosilicate
C
dimethyldimethoxysilan
Conditions | Yield |
---|---|
With sodium chloride at 150℃; Product distribution / selectivity; | |
With sodium chloride; copper(I) oxide at 150℃; Product distribution / selectivity; |
methanol
silicon
A
trimethoxysilane
B
tetramethylorthosilicate
C
dimethyldimethoxysilan
D
Methyltrimethoxysilan
Conditions | Yield |
---|---|
With sodium chloride at 150 - 200℃; Product distribution / selectivity; | |
With sodium chloride; copper(l) chloride at 150℃; Product distribution / selectivity; |
methanol
A
trimethoxysilane
B
tetramethylorthosilicate
C
dimethyldimethoxysilan
D
Methyltrimethoxysilan
Conditions | Yield |
---|---|
With sodium chloride; copper(l) chloride at 150 - 320℃; Product distribution / selectivity; |
Conditions | Yield |
---|---|
copper(II) hydroxide In THERMINOL 59 at 250℃; Product distribution / selectivity; | |
basic copper phosphate In THERMINOL 59 at 250℃; Product distribution / selectivity; | |
copper(II) dimetaphosphate In THERMINOL 59 at 250℃; Product distribution / selectivity; | |
In THERMINOL 59 at 250℃; Product distribution / selectivity; | |
With FS1265; copper(II) hydroxide In THERMINOL 59 at 250℃; for 14.78h; Product distribution / selectivity; |
methanol
silicon
A
trimethoxysilane
B
tetramethylorthosilicate
C
Methyltrimethoxysilan
D
(dimethoxy)methylsilane
Conditions | Yield |
---|---|
copper(II) orthophosphate In THERMINOL 59 at 250℃; Product distribution / selectivity; | |
copper(II) hydroxide; sodium phosphate In THERMINOL 59 at 250℃; Product distribution / selectivity; | |
copper(II) orthophosphate; copper(II) hydroxide In THERMINOL 59 at 250℃; Product distribution / selectivity; |
methanol
silicon
A
trimethoxysilane
B
tetramethylorthosilicate
C
(dimethoxy)methylsilane
Conditions | Yield |
---|---|
copper(II) hydroxide In THERMINOL 59 at 250℃; Product distribution / selectivity; |
hydro-N,N',N''-tris(dimethylboryl)azasilatrane
A
trimethoxysilane
Conditions | Yield |
---|---|
With methanol In chloroform-d1 Ar-atmosphere; not isolated, reaction followed by NMR spectroscopy; |
Conditions | Yield |
---|---|
copper(l) chloride In Marlotherm SH at 180 - 190℃; for 3.48333h; Product distribution / selectivity; Microwave irradiation; |
Conditions | Yield |
---|---|
With trichlorosilane In hexane at 0℃; Inert atmosphere; |
methanol
A
trimethoxysilane
B
tetramethylorthosilicate
C
Methyltrimethoxysilan
Conditions | Yield |
---|---|
With amorphous silicon at 200℃; Temperature; Inert atmosphere; Schlenk technique; |
methanol
A
trimethoxysilane
B
tetramethylorthosilicate
C
dimethyldimethoxysilan
D
Methyltrimethoxysilan
Conditions | Yield |
---|---|
With amorphous silicon In paraffin oil at -196 - 150℃; Reagent/catalyst; Sealed tube; Inert atmosphere; Schlenk technique; |
methanol
A
trimethoxysilane
B
tetramethylorthosilicate
C
dimethyldimethoxysilan
Conditions | Yield |
---|---|
With amorphous silicon at 150℃; Sealed tube; Inert atmosphere; Schlenk technique; |
Conditions | Yield |
---|---|
at 90℃; for 5h; Inert atmosphere; | 100% |
at 90℃; for 5h; Inert atmosphere; | 100% |
With dichlorobis-(ethylene)-μ,μ'-dichloroplatinum(II) |
trimethoxysilane
1,2,3,4-tetra-O-acetyl-6-O-[4-(10-undecenyloxy)benzoyl]-β-D-glucose
Conditions | Yield |
---|---|
With dihydrogen hexachloroplatinate In toluene at 42℃; for 15h; | 100% |
propanedioic acid, [[4-(2-propynyloxy)phenyl]methylene]diethyl ester
trimethoxysilane
Conditions | Yield |
---|---|
platinum 1,3-divinyl-1,1,3,3-tetramethyldisiloxane In toluene at 70℃; for 2h; | 100% |
trimethoxysilane
Conditions | Yield |
---|---|
In benzene inert atmosphere; evapn. (reduced pressure); detd. by NMR spectroscopy; | 100% |
trimethoxysilane
1,4-bis-(5-bromothiophen-2-yl)benzene
1,4-di(5-trimethoxysilylthien-2-yl)benzene
Conditions | Yield |
---|---|
With N-ethyl-N,N-diisopropylamine In N,N-dimethyl-formamide at 65℃; for 2h; Inert atmosphere; | 100% |
rhodium hydrido (PEt3)3 complex
trimethoxysilane
[Rh{Si(OEt)3}(PEt3)3]
Conditions | Yield |
---|---|
In benzene-d6 Schlenk technique; Inert atmosphere; | 100% |
trimethoxysilane
[Rh(CH3)(triethylphosphine)3]
[Rh{Si(OEt)3}(PEt3)3]
Conditions | Yield |
---|---|
In pentane at -90.16℃; Schlenk technique; Inert atmosphere; | 100% |
trimethoxysilane
2-bromo-5-(t-butyl)-1,3-bis[bis(trimethylsilyl)methyl]benzene
Conditions | Yield |
---|---|
Stage #1: 2-bromo-5-(t-butyl)-1,3-bis[bis(trimethylsilyl)methyl]benzene With tert.-butyl lithium In pentane at -75℃; for 1h; Inert atmosphere; Stage #2: trimethoxysilane In pentane at -75 - 20℃; Inert atmosphere; | 100% |
Conditions | Yield |
---|---|
With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex at 65℃; for 20h; | 100% |
trimethoxysilane
4,4-bis(ethoxycarbonyl)-1-hepten-6-yne
Conditions | Yield |
---|---|
With carbon monoxide; dodecacarbonyltetrarhodium(0) In hexane at 20℃; under 760.051 Torr; for 0.0833333h; | 99% |
trimethoxysilane
Conditions | Yield |
---|---|
With palladium on activated charcoal In not given | 99% |
trimethoxysilane
4,4'-di(5-iodothien-2-yl)biphenyl
4,4'-di(5-trimethoxysilylthien-2-yl)biphenyl
Conditions | Yield |
---|---|
With N-ethyl-N,N-diisopropylamine; bis(dibenzylideneacetone)-palladium(0); johnphos In N,N-dimethyl-formamide at 80℃; for 0.5h; Inert atmosphere; | 99% |
trimethoxysilane
1,4-di(5-trimethoxysilylthien-2-yl)benzene
Conditions | Yield |
---|---|
With N-ethyl-N,N-diisopropylamine; bis(dibenzylideneacetone)-palladium(0); johnphos In N,N-dimethyl-formamide at 80℃; for 0.5h; Inert atmosphere; | 99% |
trimethoxysilane
1-bromo-2,4,6-tris[bis(trimethylsilyl)methyl]benzene
C29H66O2Si7
Conditions | Yield |
---|---|
Stage #1: 1-bromo-2,4,6-tris[bis(trimethylsilyl)methyl]benzene With tert.-butyl lithium In tetrahydrofuran at -78℃; for 0.5h; Inert atmosphere; Stage #2: trimethoxysilane In tetrahydrofuran at 20℃; Inert atmosphere; | 99% |
Conditions | Yield |
---|---|
With dichloro(dicyclopentadienyl)platinum(II) In tetrahydrofuran at 60℃; for 24h; | 99% |
Conditions | Yield |
---|---|
With (dcp)PtCl2 In toluene at 80℃; for 24h; Inert atmosphere; | 99% |
Conditions | Yield |
---|---|
With (dcp)PtCl2 In toluene at 80℃; for 24h; Inert atmosphere; | 99% |
Conditions | Yield |
---|---|
In toluene at 100℃; for 16h; Temperature; Solvent; Inert atmosphere; | 99% |
Conditions | Yield |
---|---|
With platinum 1,3-divinyl-1,1,3,3-tetramethyldisiloxane; formamide In toluene at 60℃; for 2h; | 98.84% |
trimethoxysilane
3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooct-1-ene
Conditions | Yield |
---|---|
With chloroplatinic acid In isopropyl alcohol at 25℃; for 0.133333h; | 98.2% |
Conditions | Yield |
---|---|
With acetylacetonatodicarbonylrhodium(l) at 20℃; for 1h; | 98% |
at 88℃; under 225.023 - 375.038 Torr; Temperature; | 94.2% |
dichlorotetraammine platinum; silica gel In various solvent(s) at 150℃; under 412.533 Torr; | 67% |
at 150℃; | 51% |
dihydrogen hexachloroplatinate at 120℃; under 1670.26 Torr; Product distribution / selectivity; Inert atmosphere; |
trimethoxysilane
1,4-dimethoxy-2-butyne
Conditions | Yield |
---|---|
Rh(I)-catalyst In tetrahydrofuran for 2h; Ambient temperature; | 98% |
trimethoxysilane
tris (4-(5-iodothiophen-2-yl)phenyl)amine
tri(4-(5-trimethoxysilylthien-2-yl)phenyl)amine
Conditions | Yield |
---|---|
With N-ethyl-N,N-diisopropylamine; bis(dibenzylideneacetone)-palladium(0); johnphos In N,N-dimethyl-formamide at 80℃; for 0.5h; Inert atmosphere; | 98% |
trimethoxysilane
5,5'-(2,5-dimethyl-1,4-phenylene)bis(2-iodothiophene)
2,5-di(5-trimethoxysilylthien-2-yl)-1,4-dimethylbenzene
Conditions | Yield |
---|---|
With N-ethyl-N,N-diisopropylamine; bis(dibenzylideneacetone)-palladium(0); johnphos In N,N-dimethyl-formamide at 80℃; for 0.5h; Inert atmosphere; | 98% |
trimethoxysilane
Conditions | Yield |
---|---|
With methyllithium In tetrahydrofuran at -78℃; for 6h; | 98% |
Conditions | Yield |
---|---|
In tetrahydrofuran at -78℃; for 6h; | 98% |
Conditions | Yield |
---|---|
With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex In toluene at 75 - 85℃; for 1.5h; | 98% |
Conditions | Yield |
---|---|
With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex In toluene at 75 - 85℃; for 1.5h; | 98% |
trimethoxysilane
1H,1H,2H-perfluorodecene
Conditions | Yield |
---|---|
With chloroplatinic acid In isopropyl alcohol at 25℃; for 0.125h; Temperature; | 98% |
The Trimethoxy silane, with the CAS registry number 2487-90-3, is also known as Silane, trimethoxy-. It belongs to the product categories of Alkoxy Silanes; Organometallic Reagents; Organosilicon; Trialkoxysilanes; OthersSilsesquioxanes: Poss Nanohybrids; Poss Precursors and Intermediates; RSi(OR)3Organometallic Reagents. Its EINECS registry number is 219-637-2. Its IUPAC name is called trimethoxysilane. This chemical's classification code is Skin / Eye Irritant. It is colorless clear liquid. In addition, it should be stored in a closed containers in a cool, dry place. This chemical can be used as intermediates for the synthesis of silicon and a variety of silane coupling agent.
Physical properties of Trimethoxy silane: (1)ACD/LogP: 3.11; (2)# of Rule of 5 Violations: 0; (3)ACD/LogD (pH 5.5): 3.11; (4)ACD/LogD (pH 7.4): 3.11; (5)ACD/BCF (pH 5.5): 134.98; (6)ACD/BCF (pH 7.4): 134.98; (7)ACD/KOC (pH 5.5): 1165.34; (8)ACD/KOC (pH 7.4): 1165.34; (9)#H bond acceptors: 3; (10)#H bond donors: 0; (11)#Freely Rotating Bonds: 3; (12)Density: 0.96 g/mL at 25 °C(lit.); (13)Flash Point: 24 °F; (14)Melting Point: -115 °C(lit.); (15)Enthalpy of Vaporization: 30.83 kJ/mol; (16)Boiling Point: 81 °C at 760 mmHg; (17)Vapour Pressure: 92.6 mmHg at 25°C.
Preparation: this chemical can be prepared by silica fume and methanol. This reaction will need the catalyst copper.
Uses of Trimethoxy silane: it can be used to produce (E)-1,4-dimethoxy-2-trimethoxysilyl-2-buten at ambient temperature. This reaction will need Rh(I)-catalyst and solvent tetrahydrofuran with reaction time of 2 hours. The yield is about 98%.
When you are using this chemical, please be cautious about it as the following:
This chemical may catch fire in contact with air which only need brief contact with an ignition source and has a very low flash point or evolve highly flammable gases in contact with water. This chemical that at very low levels may cause damage to health. Highly flammable. It is very toxic by inhalation. It is irritating to eyes. Keep away from sources of ignition - No smoking. Whenever you will contact it, please wear suitable protective clothing, gloves and eye/face protection. In case of accident or if you feel unwell seek medical advice immediately (show the label where possible).
You can still convert the following datas into molecular structure:
(1)Canonical SMILES: CO[Si](OC)OC
(2)InChI: InChI=1S/C3H9O3Si/c1-4-7(5-2)6-3/h1-3H3
(3)InChIKey: PZJJKWKADRNWSW-UHFFFAOYSA-N
The toxicity data is as follows:
Organism | Test Type | Route | Reported Dose (Normalized Dose) | Effect | Source |
---|---|---|---|---|---|
rabbit | LD50 | skin | 6300uL/kg (6.3mL/kg) | American Industrial Hygiene Association Journal. Vol. 30, Pg. 470, 1969. | |
rat | LC50 | inhalation | 42ppm/4H (42ppm) | Toxicologist. Vol. 13, Pg. 152, 1993. | |
rat | LD50 | oral | 1560uL/kg (1.56mL/kg) | Journal of Toxicology, Cutaneous and Ocular Toxicology. Vol. 15, Pg. 261, 1996. |
About|Contact|Cas|Product Name|Molecular|Country|Encyclopedia
Message|New Cas|MSDS|Service|Advertisement|CAS DataBase|Article Data|Manufacturers | Chemical Catalog
©2008 LookChem.com,License: ICP
NO.:Zhejiang16009103
complaints:service@lookchem.com Desktop View