CAS No.10025-78-2,Trichlorosilane Suppliers,MSDS download

Simagchem Corporation

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High quality Trichlorosilane supplier in China

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Hangzhou Dingyan Chem Co., Ltd

Items Standard Result Appearance Colorless,transparent liquid Complies Content% ≥99.90

Top purity Trichlorosilane with high quality and best price cas:10025-78-2

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EAST CHEMSOURCES LIMITED

Trichlorosilane Product Name Trichlorosilane Standard Of Product Q/320482DDH002-2011 CAS NO. 10025-78-2 Specification 99%

Trichlorosilane

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Ality Chemical Corporation

The above product is Ality Chemical's strong item with best price, good quality and fast supply. Ality Chemical has been focusing on the research and production of this field for over 14 years. At the same time, we are always committed to providi

Factory Supply Trichlorosilane

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Dayang Chem (Hangzhou) Co.,Ltd.

DayangChem exported this product to many countries and regions at best price in China. If you are looking for the product’s supplier in China, DayangChem is your best choice. Pls contact with us freely for getting detailed product specifica

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Chemwill Asia Co., Ltd.

Our main production base is located in Xuzhou industry park. We are certified both to the ISO 9001 and ISO 14001 Standards, have a safety management system in place.Our R&D team masters core technology for process-design of target building block

Trichlorosilane

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Henan Tianfu Chemical Co., Ltd.

Our company was built in 2009 with an ISO certificate.In the past 6 years, we have grown up as a famous fine chemicals supplier in China and we had established stable business relationships with Samsung,LG,Merck,Thermo Fisher Scientific and so on.O

10025-78-2 Trichlorosilane

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Henan Sinotech Import&Export Corporation

Name: Trichlorosilane CAS: 10025-78-2 Appearance: Liquid Application: The synthesis of organosilanes and alkyl, aryl and organofunctional chlorosilanes is the most basic monomer in organic silane coupling agents. It is also the r

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Hubei Langyou International Trading Co., Ltd

1. Guaranteed purity; 2. Large quantity in stock; 3. Largest manufacturer; 4. Best service after shipment with email; 5. High quality & competitive price; Appearance:liquid Storage:Store in sealed containers at cool & dry plac

silicon Hydrosilane Trichlorosilane CAS No 10025-78-2

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Baoji Guokang Healthchem co.,ltd

Our company has been in existence for 10 years since its establishment. We have our own unique team. The company integrates independent research and development, production and sales. We have established famous brands at home and abroad. At present

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Cas:10025-78-2

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Triumph International Development Limilted

Triumph has the complete production of G- KG - MT service chain,we can make the new technology into productivity quickly in the research and development of new products. Main Business Custom Synthesis: Trading(Raw Mater

Silane,trichloro-

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Changchun Artel lmport and Export trade company

Minimum Order Qty. 10 Gram Supply Ability 500 Kilograms/Month Storage store in cool, dry, ventilated place 20℃ Delivery Time 3 business days after payment Payment Term TT,western union,Paypal,MoneyGram Package 10g,20g,50g,100g,500g,1KGS,

Trichlorosilane CAS NO.10025-78-2

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Hangzhou Keyingchem Co.,Ltd

Hangzhou KeyingChem Co., Ltd. exported this product to many countries and regions at best price. If you are looking for the material’s manufacturer or supplier in China, KeyingChem is your best choice. Pls contact with us freely for getting det

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Hangzhou J&H Chemical Co., Ltd.

J&H CHEM R&D center can offer custom synthesis according to the contract research and development services for the fine chemicals, pharmaceutical, biotechnique and some of the other chemicals. J&H CHEM has some Manufacturing base in Jia

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Zibo Hangyu Biotechnology Development Co., Ltd

Zibo Hangyu Biotechnology Development Co., Ltd is a leading manufacturer and supplier of chemicals in China. We develop produce and distribute high quality pharmaceuticals, intermediates, special chemicals and OLED intermediates and other fine chemi

Trichlorosilane

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Min.Order:10 Gram

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Wuhan Kemi-Works Chemical Co., Ltd

10025-78-2 Chemical name：Trichlorosilane Synonyms：silici-chloroforme; siliciumchloroform Formula：HSiCl3 Description：Colorless transparent liquid Superiority 1.Powerful R & D team 2.The ability of quantized production,from grams to ton

Trichlorosilane

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Hebei yanxi chemical co.,LTD.

CHENGDU YANXI is a comprehensive manufacturer and an international distribution of products throughout the world. Specialized in Scrap metal, Chemical raw materials, Paper products and color industry. We aim to become leading position in global dis

10025-78-2 Trichlorosilane---Silane Coupling Agent--- Silibase-6101

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Kono Chem Co.,Ltd

high purity lowest priceAppearance:solid or liquid Storage:in sealed air resistant place Package:drum and bag Application:for pharma use Transportation:by sea or air Port:Beijing or Guangzhou

Trichlorosilane

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Henan Allgreen Chemical Co.,Ltd

high quality Storage:Sealed, dry, microtherm , avoid light and smell. Package:According to the demand of customer Application:Organic synthesis Transportation:by air or by sea

Trichlorosilane

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Aecochem Corp.

Our clients, like BASF,CHEMO,Brenntag,ASR,Evonik,Merck and etc.Appearance:COA Storage:in stock Application:MSDS/TDS

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Zhuozhou Wenxi import and Export Co., Ltd

Product Description Description & Specification Category Pharmaceutical Raw Materials, Fine Chemicals, Bulk drug Standard Medical standard

factory directly supply CAS 10025-78-2 with best price

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Antimex Chemical Limied

Ansciep Chemical is a professional enterprise manufacturing and distributing fine chemicals and speciality chemicals. We have been dedicated to heterocycle compounds and phenyl rings for tens of years. This is our mature product for export. Our quali

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Xiamen AmoyChem Co.,Ltd

Amoychem is committed to providing the top-quality chemical products and services Internationally. We offer our customers with friendly, professional service and reliable, high performance products that have been manufactured according to the accredi

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Hangzhou ZeErRui Chemical Co., Ltd.

Known for its best quality and competitve price, this chemicals we offered is widely appreciated by our customers. Prompt reaction, good quality and best service make us reliable and outstanding in this industry.Appearance:Colorless transparent liqui

Trichlorosilane manufacture

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Hunan Longxianng Runhui Trading Co.,Ltd

Trichlorosilane CAS.10025-78-2Appearance:ask jude for details Storage:Dry and ventilated Package:in foil bag or customized Application:Pharmaceutical intermediates/Food additive Transportation:By express (Door to door) such as FEDEX, DHL, EMS for sm

Trichlorosilane CAS.10025-78-2

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Hunan Russell Chemicals Technology Co.,Ltd

high purity lowest priceAppearance:solid or liquid Storage:in sealed air resistant place Package:Foil bag; Drum; Plastic bottle Application:Pharma;Industry;Agricultural Transportation:by sea or air Port:any port in China

Trichlorosilane 10025-78-2

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Beantown Chemical

in stock Application:10025-78-2

Trichlorosilane, 98%

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HENAN SUNLAKE ENTERPRISE CORPORATION

Henan Sunlake Enterprise Corporation Our Advantages 1, Any inquiry about ch

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Hangzhou Weck Chemical Industry Co., Ltd.

span lang="EN-US" style="font-size: 9.0pt;font-family:"Arial",sans-serif;color:#4D4D4D">As a leading manufacturer and supplier of chemicals in china, weckchem not only supply popular chemicals, but also weckchem’s r&d center off

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Zhengzhou Kingorgchem Chemical Technology Co., Ltd.

Zhengzhou Kingorgchem Chemical Technology Co., Ltd. was founded on the basis of Organophosphorus Chemistry Lab of Institute of Chemistry Henan Academy of Sciences in 2015. The laboratory covers 600 m2 and the pilot plant covers 2000 m2. Kingorgchem i

National Research Platform ISO 9001 10025-78-2

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Synthetic route

: 7440-21-3
silicon

A: 75-79-6
Methyltrichlorosilane

B: 10026-04-7, 53609-55-5
tetrachlorosilane

C: 10025-78-2
trichlorosilane

D: 75-78-5
dimethylsilicon dichloride

Conditions

Conditions	Yield
With methylene chloride; copper In neat (no solvent) mixt. of CH3Cl/N2 (2:5) and Si-Cu (9:1) at 300°C;;	A 4% B n/a C n/a D 86.5%
With methylene chloride; copper In neat (no solvent) mixt. of CH3Cl/N2 (2:5) and Si-Cu (9:1) at 300°C;;	A 4% B n/a C n/a D 86.5%
With methylene chloride; copper In neat (no solvent) CH3Cl and Si-Cu mixt. (8:2) at 350°C;;

...Expand

: 141-57-1
n-propyltrichlorosilane

: 10025-78-2
trichlorosilane

Conditions

Conditions	Yield
With hydrogen; Rh, Re/C at 550℃; under 5807.73 Torr; for 10.1h; Product distribution / selectivity;	82%

: 7647-01-0
hydrogenchloride

Cu(b),Si(20) (X%): Cu(b),Si(20) (X%)

A: 10026-04-7, 53609-55-5
tetrachlorosilane

B: 10025-78-2
trichlorosilane

Conditions

Conditions	Yield
In neat (no solvent) reaction at 300 °C;;	A 20% B 80%
In neat (no solvent) reaction at 300 °C;;	A 20% B 80%

...Expand

: 115-21-9
ethyltrichlorosilane

: 10025-78-2
trichlorosilane

Conditions

Conditions	Yield
With hydrogen; Rh, Re/C at 700℃; under 5947.36 Torr; for 17.8833h; Product distribution / selectivity;	75.3%

: 75-79-6
Methyltrichlorosilane

A: 10026-04-7, 53609-55-5
tetrachlorosilane

B: 10025-78-2
trichlorosilane

Conditions

Conditions	Yield
With hydrogen; Rh/C at 800℃; Product distribution / selectivity;	A 73.3% B 25.1%

: 10026-04-7, 53609-55-5
tetrachlorosilane

: 1333-74-0
hydrogen

: 10025-78-2
trichlorosilane

Conditions

Conditions	Yield
In neat (no solvent) SiCl4 reacted with H2 in thermo-plasma at 50 kW at 3500-5000 K;	72.9%
In neat (no solvent) Kinetics; byproducts: hydrogen chloride; bubbling H2 through liq. SiCl4 at constant temp.; introducing into the discharge zone; various product ratios yield various H2:SiCl4 molar ratio, molar energy input, and pressure; gas chromy.;	60%
at 900 - 1300℃; under 1125.11 - 3750.38 Torr; Product distribution / selectivity;

: 75-79-6
Methyltrichlorosilane

: 10025-78-2
trichlorosilane

Conditions

Conditions	Yield
With hydrogen; Rh, Re/C at 550℃; under 4556.19 Torr; for 4.55h; Product distribution / selectivity;	70.8%

: 7647-01-0
hydrogenchloride

: 7440-21-3
silicon

: 10025-78-2
trichlorosilane

Conditions

Conditions	Yield
With CuO-ZnO-In2O3 mesocrystal microspheres Reagent/catalyst;	61.2%
In not given heating of silicon washed with HCl and dried in a stream of HCl at 450-500 °C;;
In not given heating of silicon washed with HCl and dried in a stream of HCl at 450-500 °C;;
at 230 - 260℃;

: 75-79-6
Methyltrichlorosilane

A: 75-54-7
Dichloromethylsilane

B: 10026-04-7, 53609-55-5
tetrachlorosilane

C: 10025-78-2
trichlorosilane

Conditions

Conditions	Yield
With hydrogen; Rh/C at 700℃; Product distribution / selectivity;	A 5.5% B 28.2% C 22.9%

...Expand

: 10026-04-7, 53609-55-5
tetrachlorosilane

: 1333-74-0
hydrogen

: 7440-21-3
silicon

: 10025-78-2
trichlorosilane

Conditions

Conditions	Yield
copper(l) chloride at 525℃; Product distribution / selectivity;	6.14%
at 525℃; Product distribution / selectivity;	4.6%
at 500℃; under 22502.3 Torr; Product distribution / selectivity; Industry scale;

...Expand

: 26198-63-0, 78-87-5
1,2-Dichloropropane

nitrogen: nitrogen

copper containing silicon: copper containing silicon

A: 10026-04-7, 53609-55-5
tetrachlorosilane

B: 107-37-9
allyltrichlorosilane

C: 18171-37-4
1,2-bis-trichlorosilanyl-propane

D: 10025-78-2
trichlorosilane

Conditions

Conditions	Yield
at 300℃; Produkt 5: 2-Dichlorsilyl-1-trichlorsilyl-propan;

...Expand

: 67-66-3
chloroform

silicon-copper: silicon-copper

A: 10026-04-7, 53609-55-5
tetrachlorosilane

B: 4142-85-2
1,1,1,3,3,3-hexachloro-1,3-disilapropane

C: 4775-56-8
tris(trichlorosilyl)methane

D: 10025-78-2
trichlorosilane

Conditions

Conditions	Yield
at 300℃;

...Expand

: 7647-01-0
hydrogenchloride

: 10026-04-7, 53609-55-5
tetrachlorosilane

: 1333-74-0
hydrogen

: 7440-21-3
silicon

: 10025-78-2
trichlorosilane

Conditions

Conditions	Yield
copper(l) chloride at 300℃; Product distribution / selectivity;

...Expand

: 82146-27-8
dibromochlorosilane

: 1631-73-8
trimethylstannane

A: 7789-57-3
tribromosilane

B: 21479-75-4
SiClBrH2

C: 82146-25-6
SiCl2HBr

D: 10025-78-2
trichlorosilane

E: 7440-21-3
monosilane

Conditions

Conditions	Yield
In neat (no solvent) condensing of equimolar amts. of tinhydride and SiClHBr2 (trace of SiCl2HBr present) into cold finger, reaction at room temp. (30 min); further products; not isolated; IR spectroscopy;

...Expand

: 7647-01-0
hydrogenchloride

: 67-66-3
chloroform

: 7440-21-3
silicon

A: 10026-04-7, 53609-55-5
tetrachlorosilane

B: 10025-78-2
trichlorosilane

Conditions

Conditions	Yield
With methylene chloride; cadmium; copper mixing of Cu and Si; drying (300°C, 5 h, dry nitrogen), rising temp. to 350°C, addn. of MeCl (4 h), removal of MeSiCl3 and Me2SiCl2, Cd addn. at room temp., rising temp. to 300°C, CHCl3 and HCl addn., 40 h; product collection, distn., receiver cooled to -20.degree, dist. of remains in flask,;

...Expand

: 7647-01-0
hydrogenchloride

: 7440-21-3
silicon

A: 10026-04-7, 53609-55-5
tetrachlorosilane

B: 10025-78-2
trichlorosilane

Conditions

Conditions	Yield
In solid Kinetics; gas-solid react.; temp. 200 - 600°C; not isolated; detn. by DSC, XRD;
In gas Kinetics; (H2) reacted at pressure 9.0E+4 Pa, and at temp. 623, 673, or 723 K, Q=300 sccm and concd. HCl=1.0, 3.3, 10 vol %;
In neat (no solvent) dried HCl is used; glowing heat;; product mixture obtained;;

...Expand

: 10026-04-7, 53609-55-5
tetrachlorosilane

: 1631-73-8
trimethylstannane

A: 10025-78-2
trichlorosilane

B: 1066-45-1
trimethyltin(IV)chloride

C: 7440-21-3
monosilane

D: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
In neat (no solvent) inert atmosphere (N2, Ar or high vac.), room temperature, equimolar amts. of halosilane/tinhydride, reactn. time 36 h; not isolated; IR spectroscopy (identified 25-30% SiCl3H, 15% SiCl2H2 and 10% SiH4 in product mixt.);

...Expand

: 1631-73-8
trimethylstannane

: 13465-74-2
bromo trichloro silane

A: 10026-04-7, 53609-55-5
tetrachlorosilane

B: 10025-78-2
trichlorosilane

C: 7440-21-3
monosilane

Conditions

Conditions	Yield
In neat (no solvent) inert atmosphere (N2, Ar or high vac.), room temperature, equimolar amts. of halosilane/tinhydride, reactn. time 3 h; not isolated; IR spectroscopy (identified 85% SiCl3H, 5% SiH4 and 5% SiCl4 in product mixt.);

...Expand

: 1631-73-8
trimethylstannane

: 13465-75-3
dibromo dichlorosilane

A: 82146-25-6
SiCl2HBr

B: 10025-78-2
trichlorosilane

C: 1066-44-0
trimethyltin bromide

D: 7440-21-3
monosilane

Conditions

Conditions	Yield
In neat (no solvent) inert atmosphere (N2, Ar or high vac.), room temperature, two equiv. of tinhydride, reactn. time 2 h; not isolated; IR spectroscopy (identified 35-40% SiCl3H, 40% SiH4 and 10% SiCl2HBr in product mixt.);

...Expand

: 7789-78-8
calcium hydride

: 10026-04-7, 53609-55-5
tetrachlorosilane

A: 10025-78-2
trichlorosilane

B: 13966-57-9
chlorosilane

C: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
In neat (no solvent) byproducts: H2, HCl; passing SiCl4 vapor over CaH2 below red heat;;	A n/a B 0% C 0%
In neat (no solvent) byproducts: H2, HCl; passing SiCl4 vapor over CaH2 below red heat;;	A n/a B 0% C 0%

...Expand

: 10025-85-1
nitrogen trichloride

: 7440-21-3
monosilane

A: 10025-78-2
trichlorosilane

B: 13966-57-9
chlorosilane

Conditions

Conditions	Yield
In gaseous matrix byproducts: HCl, H2; Ar carrier gas, room temp., static vac. glass reactor with quartz window (reaction mixt. made up in reactor); manometric monitoring, chemiluminescence spectroscopy;

...Expand

: 10026-04-7, 53609-55-5
tetrachlorosilane

: 10025-78-2
trichlorosilane

Conditions

Conditions	Yield
With Cu; H2S In neat (no solvent) byproducts: Cu sulfide, H2O; passing H2S through a mixture SiCl4 and Cu powder on boiling;;	0%
With H2 In neat (no solvent) reaction at glowing heat;;
With Zn; HCl In neat (no solvent) byproducts: H2; heating of SiCl4 with Zn powder in a HCl stream up to boiling;;
With hydrogen; silica gel; zinc In water at 450℃; for 48h;
With hydrogen; copper at 750℃; for 1h;

: 10026-04-7, 53609-55-5
tetrachlorosilane

: 7440-21-3
monosilane

A: 10025-78-2
trichlorosilane

B: 13966-57-9
chlorosilane

C: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
In gas reactor temp.: 250 - 500°C; detn. by gas chromy.;

...Expand

: 10026-04-7, 53609-55-5
tetrachlorosilane

: 7783-06-4
hydrogen sulfide

: 10025-78-2
trichlorosilane

Conditions

Conditions	Yield
With Cu In neat (no solvent) byproducts: H2; treatment of the mixture in a liquid air cooled bomb tube;;	0%

: 7647-01-0
hydrogenchloride

: 10026-04-7, 53609-55-5
tetrachlorosilane

: 10025-78-2
trichlorosilane

Conditions

Conditions	Yield
With Zn In neat (no solvent) byproducts: H2; heating of SiCl4 with Zn and liquid HCl in a sealed tube at 100 °C;;	0%

: 10026-04-7, 53609-55-5
tetrachlorosilane

: 1333-74-0
hydrogen

A: 7647-01-0
hydrogenchloride

B: 10025-78-2
trichlorosilane

C: 7440-21-3
silicon

Conditions

Conditions	Yield
byproducts: HCl; equil. reaction, at 1170-1540 K;

...Expand

: 10026-04-7, 53609-55-5
tetrachlorosilane

: 1333-74-0
hydrogen

A: 7446-70-0
aluminium trichloride

B: 10025-78-2
trichlorosilane

C: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
With aluminium In neat (no solvent) byproducts: SiCl4; reaction by passing SiCl4 vapor with H2 (1:1) over Al at 400 °C;; distn.;;
With Al In neat (no solvent) byproducts: SiCl4; reaction by passing SiCl4 vapor with H2 (1:1) over Al at 400 °C;; distn.;;

...Expand

: 10026-04-7, 53609-55-5
tetrachlorosilane

: 1333-74-0
hydrogen

A: 10025-78-2
trichlorosilane

B: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
With co-catalyst: pyrimidine or P(OPh)3; tri-n-butyl-tin hydride In toluene absence of air; H2-stream; further alternate co-catalysts: PCy3 or PBu3 or N-methylimidazole or pyridine or chinoline; gas chromy.;
tri-n-butyl-tin hydride In acetonitrile absence of air; H2-stream; gas chromy.;
With Al or Mg or Zn In neat (no solvent, gas phase) passing SiCl4 vapor and H2 over granulated Al, Mg or Zn at 350-450 °C;; condensation of the gaseous reaction product by dry ice, separation of the mixture by fractionation;;
With Al or Mg or Zn In gas passing SiCl4 vapor and H2 over granulated Al, Mg or Zn at 350-450 °C;; condensation of the gaseous reaction product by dry ice, separation of the mixture by fractionation;;

...Expand

: 10025-78-2
trichlorosilane

: 5-((4-dodec-11-en-1-yl)phenyl)-5’-(4-hexylphenyl)-2,2’-bithiophene

: trichloro(12-(4-(5’-(4-hexylphenyl)-[2,2’-bithiophen]-5-yl)phenyl)dodecyl)silane

Conditions

Conditions	Yield
With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex In toluene at 90℃; Glovebox; Sealed tube;	100%

: 100-43-6
4-vinylpyridine

: 10025-78-2
trichlorosilane

: 1154061-81-0
trichloro(hydrido)bis(4-vinylpyridine)silicon

Conditions

Conditions	Yield
In toluene at -78 - 20℃;	99.5%

: 111-67-1
2-octene

: 10025-78-2
trichlorosilane

: 18225-07-5
(n-hep-1-me)SiCl3

Conditions

Conditions	Yield
In not given HSiCl3 and 2-octene at 50-60°C with peroxide;;	99%

: 111-66-0
oct-1-ene

: 10025-78-2
trichlorosilane

: 5283-66-9
octyltrichlorosilane

Conditions

Conditions	Yield
In not given HSiCl3 and 1-octene at about 55°C with diacetylperoxide;;	99%
In neat (no solvent) HSiCl3 and 1-octene at 150°C in presence of Cu;;
In neat (no solvent) HSiCl3 and 1-octene at 300°C under pressure;;
In neat (no solvent) HSiCl3 and 1-octene at 300°C under pressure;;

: 30620-32-7
1.2-CH2CHCH2-1.2-C2B10H10

: 10025-78-2
trichlorosilane

: 888501-94-8
1,2-[(CH2)3SiCl3]2-1,2-C2B10H10

Conditions

Conditions	Yield
With catalyst:Karstedt platinum catalyst (3-3.5percent Pt) In neat (no solvent) (Ar); stirred for 2 h at room temp.; evapd., obtained as oil;	99%

: 939-23-1
p-phenylpyridine

: 10025-78-2
trichlorosilane

: 1154061-84-3
trichloro(hydrido)bis(4-phenylpyridine)silicon

Conditions

Conditions	Yield
In toluene at -78 - 20℃;	99%

: 110-86-1
pyridine

: 10025-78-2
trichlorosilane

: 17748-48-0, 38685-10-8
trichloro(hydrido)bis(pyridine)silicon

Conditions

Conditions	Yield
In toluene at -78 - 20℃;	98.8%

: 1421683-29-5
C5H10Cl4N2Si

: 10025-78-2
trichlorosilane

: 1610766-37-4
C5H12Cl2N2Si

Conditions

Conditions	Yield
In tetrahydrofuran at 20℃; for 12h; Inert atmosphere; Schlenk technique;	98%

: 1122-58-3
dmap

: 10025-78-2
trichlorosilane

: 1154061-83-2
trichlorobis[4-(dimethylamino)pyridine](hydrido)silicon

Conditions

Conditions	Yield
In tetrahydrofuran at -78 - 20℃;	97.4%

: 1355962-66-1
[(1',1'-diallyloxycarbonyl)-1,2-methano]-1,2-dihydro-C60-fullerene

: 10025-78-2
trichlorosilane

: 1443224-20-1
TSMC

Conditions

Conditions	Yield
With dicyclopentadienyl platinum dichloride In toluene at 70℃; for 24h; Inert atmosphere; Schlenk technique;	97%

: 10025-78-2
trichlorosilane

: 7440-21-3
silicon

Conditions

Conditions	Yield
Stage #1: trichlorosilane under 3.75038 Torr; for 6h; Pulsed microwave radiation (25-50W); Stage #2: With hydrogen at 900℃;	96.7%
With hydrogen chemical vapor deposition (8% SiHCl3 in H2, 1100°C);
With hydrogen chemical vapor deposition (hot-wall reactor, basic pressure 10 or 76 Torr, 1223 K);

: 108-89-4
picoline

: 10025-78-2
trichlorosilane

: 1154061-79-6
trichloro(hydrido)bis(4-methylpyridine)silicon

Conditions

Conditions	Yield
In toluene at -78 - 20℃;	96.3%

: 3978-81-2
4-tert-butylpyridine

: 10025-78-2
trichlorosilane

: 1154061-82-1
bis(4-tert-butylpyridine)trichloro(hydrido)silicon

Conditions

Conditions	Yield
In toluene at -78 - 20℃;	96.1%

: 10025-78-2
trichlorosilane

: 108-95-2
phenol

: 3898-65-5
triphenoxysilane

Conditions

Conditions	Yield
at 50℃; for 4h;	96%

: 96-05-9
allyl methacrylate

: 10025-78-2
trichlorosilane

: 7351-61-3
3-(trichlorosilyl)propyl 2-methylprop-2-enoate

Conditions

Conditions	Yield
With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex In toluene at 70℃; for 3h;	96%

: 10025-78-2
trichlorosilane

: 1333-74-0
hydrogen

: 7440-21-3
monosilane

Conditions

Conditions	Yield
With titanium tetrachloride In melt melting NaCl, KCl and AlCl3 at ca. 150°C, heating to ca. 300°C, addn. of TiCl4 and Al under H2 within 2 h, addn. of more Al at 230°C, then addn. of SiHCl3 under H2 with stirring within 1 h; sepn. of the chlorosilane/silane mixture by fractional condensation and rectification;	96%

: 157072-60-1, 61521-25-3, 166941-05-5, 16971-33-8
(carbonyl)(chloro)(hydrido)tris(triphenylphosphine)ruthenium(II)

: 10025-78-2
trichlorosilane

: Ru(SiCl3)Cl(CO)(P(C6H5)3)2

Conditions

Conditions	Yield
In toluene at 60℃; for 0.333333h; Inert atmosphere; Schlenk technique;	96%

KRYTOX allyl ether KDP-4599: KRYTOX allyl ether KDP-4599

: 10025-78-2
trichlorosilane

KRYTOX 3-trichlorosilylpropyl KDP-4599: KRYTOX 3-trichlorosilylpropyl KDP-4599

Conditions

Conditions	Yield
dihydrogen hexachloroplatinate at 165℃; for 6h;	95%
dihydrogen hexachloroplatinate at 175℃; for 8h;	95%

: 14285-68-8
decacarbonyldirhenium(0)

: 10025-78-2
trichlorosilane

: Re(CO)5(SiCl3)

Conditions

Conditions	Yield
In hexane under N2; Re2(CO)10 and the silane in hexane was pressurized with CO (70 atm., autoklave), heated at 200°C for 16 h; cooled, gases were vented, washed with hexane, dried with a stream of N2, sublimation;	95%

: 10025-78-2
trichlorosilane

: 879-05-0
2,3,4,5,6-pentafluorophenylmagnesium bromide

: 20160-40-1
tris(pentafluorophenyl)silane

Conditions

Conditions	Yield
In diethyl ether reaction at -12°C (1hour) and heating under reflux for 12 hours;;	95%
In diethyl ether reaction at -12°C (1hour) and heating under reflux for 12 hours;;	95%

: 15243-33-1
dodecacarbonyl-triangulo-triruthenium

: 10025-78-2
trichlorosilane

: 36570-60-2
cis-Ru(CO)4(SiCl3)2

Conditions

Conditions	Yield
In hexane byproducts: CO; Irradiation (UV/VIS); in a closed quartz tube filled with CO gas (2 atm) irradiation during 3d with stirring; cooling at -78°C, 2h, drying the crystals in vac., sublimation at 40°C, 0.02 Torr onto a probe cooled to -78°C;	95%

: 10025-78-2
trichlorosilane

: 7732-18-5
water

: hidrogen-silsesquioxane

Conditions

Conditions	Yield
In water addn. of water to silicon compd. at -78°C with stirring; filtration, washing ppt. with water, drying in vac. at 85°C overnight;	95%
In diethyl ether cooling (ice), stirring (1 d, room temp.); filtn., washing, drying (vac. 1E-3 mbar, 2 d, 80°C);

: 57158-83-5
bis(ethylene)(tricyclohexylphosphine)platinum

: 10025-78-2
trichlorosilane

: [(Pt(μ-H)(SiCl3)[P(C6H11)3])2] * toluene

Conditions

Conditions	Yield
In toluene N2-atmosphere; condensing of excess silane into soln. of Pt-complex (-196°C), warming to room temp. (pptn.); filtration, washing (hexane), drying (vac.); elem. anal.;	95%

: 536-75-4
4-Ethylpyridine

: 10025-78-2
trichlorosilane

: 1154061-80-9
trichlorobis(4-ethylpyridine)(hydrido)silicon

Conditions

Conditions	Yield
In toluene at -78 - 20℃;	95%

: 112-88-9
octadec-1-ene

: 10025-78-2
trichlorosilane

: 112-04-9
octadecyltrichlorosilane

Conditions

Conditions	Yield
In neat (no solvent) HSiCl3 and 1-octadecene at about 300°C under pressure;;	94%
In neat (no solvent) HSiCl3 and octadecene at 300°C under pressure;;	94%
In neat (no solvent) HSiCl3 and 1-octadecene at about 300°C under pressure;;	94%
In neat (no solvent) HSiCl3 and octadecene at 300°C under pressure;;	94%
With SiliaCat Pt(0) - mesoporous organosilica microspheres doped with Pt nanoparticles In neat (no solvent) at 65℃; for 1h;	87 %Spectr.

: 129134-01-6
chloro-carbonyl-hydrido-bis(triphenylphosphine)osmium

: 10025-78-2
trichlorosilane

: 129133-98-8
OsCl(triphenylphosphine)2(CO)(trichlorosilyl)

Conditions

Conditions	Yield
In toluene N2-atmosphere; addn. of excess HSiCl3 to soln. of Os-complex, stirring for 20 min at 60°C; concn., crystn. on addn. of hexane;	94%

: 56800-92-1
[Os(κ2-dimethyldithiocarbamate)H(CO)(PPh3)2]

: 10025-78-2
trichlorosilane

: 895138-95-1
[Os(κ2-dimethyldithiocarbamate)(SiCl3)(CO)(PPh3)2]

Conditions

Conditions	Yield
In toluene toluene and HSiCl3 were added to Os complex in Schlenk tube; sealed; cooled in liq. N2; evacuated; warmed to ambient temp.; heated at 100°C for 12 h; cooled; concd. (vac.); hexane added; filtered; recrystd. (CH2Cl2/hexane); elem. anal.;	94%

: 114674-46-3
(η5-cyclopentadienyl)methylbis(methyldiphenylphosphine)ruthenium

: 10025-78-2
trichlorosilane

: 475635-32-6
Cp(PMePh2)2RuSiCl3

Conditions

Conditions	Yield
In further solvent(s) byproducts: CH4; (Ar); mixing ruthenium complex with HSiCl3, freezing with liq. N2, swarming to room temp., sealing, heating at 100°C for 16 h, cooling toroom temp.; evapn., dissolving in CH2Cl2, filtration through glass wool, addn. of hexanes, concn., filtration, drying; elem. anal.;	92%

: 292638-84-7
styrene

: 10025-78-2
trichlorosilane

: 940-41-0
1-phenyl-2-(trichlorosilyl)ethane

Conditions

Conditions	Yield
Stage #1: trichlorosilane; C17H36N2OPtSi2 for 0.0833333h; Inert atmosphere; Cooling with water bath; Stage #2: styrene at 16℃; for 7h; Product distribution / selectivity; Inert atmosphere;	92%
C17H36N2OPtSi2 In dodecane for 7h; Product distribution / selectivity; Inert atmosphere;

: 10025-78-2
trichlorosilane

: 67206-59-1
sodium dioctylphosphinate

: 7539-86-8
dioctylphosphinyl chloride

Conditions

Conditions	Yield
In chloroform at 80℃; for 16h;	91.5%

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