1,1,2,2-tetrachloro-1,2-dimethyldisilane
A
Dichloromethylsilane
B
Methyltrichlorosilane
Conditions | Yield |
---|---|
silica gel; 3,5-Dimethyl-1-<(2-triethoxysilyl)ethyl>-1H-pyrazol Product distribution; Mechanism; Heating; var. of catalyst, also with HCl; | A 0.4% B 99.6% |
Conditions | Yield |
---|---|
With hydrogenchloride In diethyl ether at 80℃; for 36h; Temperature; Solvent; Reagent/catalyst; | A 7% B 87% |
With hydrogenchloride In 1,4-dioxane at 100℃; for 49.33h; Time; | A 87% B 9% |
With HCl In neat (no solvent) heating of CH3SiH3 and HCl in a closed tube at 100°C in presence of AlCl3 for several hours;; | |
With hydrogenchloride; diethyl ether In benzene-d6 at 80℃; Reagent/catalyst; Schlenk technique; Inert atmosphere; | A 7 %Spectr. B 87 %Spectr. |
methylene chloride
silicon
A
Dichloromethylsilane
B
Methyltrichlorosilane
C
dimethylsilicon dichloride
Conditions | Yield |
---|---|
tin; aluminum silicide; zinc(II) oxide; copper dichloride at 280 - 300℃; for 6h; Rochow reaction; | A 1.7% B n/a C 83.8% |
zinc(II) oxide; copper dichloride at 280 - 300℃; for 6h; Rochow reaction; | A 4.5% B n/a C 83.7% |
zinc(II) oxide; aluminium; copper dichloride at 280 - 300℃; for 6h; Rochow reaction; | A 2.8% B n/a C 82.1% |
With PdSi at 400℃; for 6h; |
Methyltrichlorosilane
1,1,2,2-tetrachloro-1,2-dimethyldisilane
A
Dichloromethylsilane
B
chloro-methyl-silane
Conditions | Yield |
---|---|
With tetra-n-butylphosphonium chloride; lithium hydride In diethylene glycol dimethyl ether at -196 - 160℃; for 35h; Reagent/catalyst; Sealed tube; | A 64% B 24% |
With tetra-n-butylphosphonium chloride; lithium hydride In diethylene glycol dimethyl ether at -196 - 160℃; Temperature; Reagent/catalyst; Sealed tube; | A 64 %Spectr. B 24 %Spectr. |
Conditions | Yield |
---|---|
With tetra-n-butylphosphonium chloride; lithium hydride In diethylene glycol dimethyl ether at -196 - 160℃; for 62h; Temperature; Reagent/catalyst; Sealed tube; | A 63% B 19% |
With lithium hydride; triphenylphosphine In diethylene glycol dimethyl ether at -196 - 160℃; for 62h; Time; Reagent/catalyst; Temperature; Sealed tube; | A 62% B 23% |
With Dichlorosilane; Aliquat 336 at 70℃; under 1650.17 Torr; Product distribution / selectivity; | |
With Dichlorosilane; 1-butyl-3-methylimidazolium chloride at 80℃; under 1500.15 Torr; Product distribution / selectivity; | |
With tetra-n-butylphosphonium chloride; lithium hydride at -196 - 120℃; for 2.5h; Time; Temperature; Sealed tube; |
Methyltrichlorosilane
A
Dichloromethylsilane
B
methylsilane
C
chloro-methyl-silane
Conditions | Yield |
---|---|
With Tetraethylene glycol dimethyl ether; tetra-n-butylphosphonium chloride; lithium hydride In 1,4-dioxane at -196 - 120℃; for 70.75h; Temperature; Reagent/catalyst; Sealed tube; | A 60% B 5% C 32% |
With tri-n-butyl-tin hydride; [2,2]bipyridinyl In diethylene glycol dimethyl ether for 1h; Ambient temperature; | A n/a B n/a C 55% |
With Tetraethylene glycol dimethyl ether; tetra-n-butylphosphonium chloride; lithium hydride In 1,4-dioxane at -196 - 120℃; for 70.75h; Sealed tube; | A 40% B 15% C 44% |
dimethylmonochlorosilane
dimethylsilicon dichloride
A
Dichloromethylsilane
B
chloro-trimethyl-silane
C
Methyltrichlorosilane
D
chloro-methyl-silane
Conditions | Yield |
---|---|
With aluminium trichloride at 140℃; for 15h; | A 0.092 mol B 59% C 0.01 mol D 0.055 mol |
Conditions | Yield |
---|---|
With Tetraethylene glycol dimethyl ether; tetra-n-butylphosphonium chloride; lithium hydride In 1,4-dioxane at -196 - 160℃; for 26h; Reagent/catalyst; Sealed tube; | 57% |
With hydrogen; aluminium at 450℃; | |
With trichlorosilane; chlorosilane; Dichlorosilane; tetra-n-butylphosphonium chloride at 78℃; under 1425.14 Torr; Product distribution / selectivity; |
methylene chloride
A
Dichloromethylsilane
B
Methyltrichlorosilane
C
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With silicon; zinc at 325℃; for 24h; Reagent/catalyst; Inert atmosphere; | A n/a B n/a C 41.1% |
With copper(II) oxide; silicon; zinc at 325℃; for 24h; Reagent/catalyst; Inert atmosphere; | A n/a B n/a C 17.5% |
With silicon; bronze; cesium chloride; copper(l) chloride at 200 - 360℃; for 8h; Product distribution / selectivity; |
Conditions | Yield |
---|---|
With Si-Cu; HCl In neat (no solvent) Si-Cu (10:2) and a mixt. of CH4 and HCl at 350°C;; | A 38.8% B 9.4% |
With hydrogenchloride; copper; silicon In neat (no solvent) Si-Cu (10:2) and a mixt. of CH4 and HCl at 350°C;; | A 38.8% B 9.4% |
trimethylsilyl(dimethylchlorosilyl)methane
bis(chlorodimethylsilyl)methane
dichloro[(chlorodimethylsilyl)methyl]methylsilane
bis(methyldichlorosilyl)methane
dimethylsilicon dichloride
A
Dichloromethylsilane
B
dimethylmonochlorosilane
C
methylsilane
D
dimethylsilane
E
chloro-methyl-silane
Conditions | Yield |
---|---|
With tetra-n-butylphosphonium chloride; lithium hydride In diethylene glycol dimethyl ether at -196 - 220℃; for 31h; Sealed tube; | A 7% B 34% C 9% D 5% E 7% |
Methyltrichlorosilane
A
Dichloromethylsilane
B
tetrachlorosilane
C
trichlorosilane
Conditions | Yield |
---|---|
With hydrogen; Rh/C at 700℃; Product distribution / selectivity; | A 5.5% B 28.2% C 22.9% |
Methyltrichlorosilane
dimethylsilicon dichloride
A
Dichloromethylsilane
B
dimethylmonochlorosilane
C
methylsilane
D
chloro-methyl-silane
Conditions | Yield |
---|---|
With Tetraethylene glycol dimethyl ether; tetra-n-butylphosphonium chloride; lithium hydride at 80 - 120℃; for 86.25h; | A 17% B 19% C 11% D 23% |
1,1,1,2,2,2-hexamethyldisilane
pentamethylchlorodisilane
1,2-dichlorotetramethylsilane
1,1,2-trichloro-1,2,2-trimethyldisilane
1,1,2,2-tetrachloro-1,2-dimethyldisilane
1,1-dichlorotetramethyldisilane
A
Dichloromethylsilane
B
chloro-trimethyl-silane
C
Methyltrichlorosilane
D
dimethylmonochlorosilane
E
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With hydrogenchloride at 430 - 750℃; for 72h; Conversion of starting material; | A 4 %Chromat. B 12 %Chromat. C 7 %Chromat. D 6 %Chromat. E 21% |
Methyltrichlorosilane
A
Dichloromethylsilane
B
tetrachlorosilane
Conditions | Yield |
---|---|
With hydrogen; Rh/C at 600℃; Product distribution / selectivity; | A 6.4% B 5.1% |
Conditions | Yield |
---|---|
With aluminium trichloride at 100℃; |
Methyltrichlorosilane
methylsilane
A
Dichloromethylsilane
B
chloro-methyl-silane
Conditions | Yield |
---|---|
With aluminium trichloride | |
With triphenylphosphine In diethylene glycol dimethyl ether at -196 - 120℃; Reagent/catalyst; Solvent; Temperature; Sealed tube; |
Conditions | Yield |
---|---|
With copper; silicon at 300℃; | |
With hydrogenchloride; copper-doped silicon at 300℃; | |
With hydrogen; copper; silicon at 390℃; |
Conditions | Yield |
---|---|
With hydrogenchloride; aluminium trichloride at 100℃; |
Conditions | Yield |
---|---|
With dibutyl ether; trichlorosilane |
methylene chloride
A
Dichloromethylsilane
B
Methyltrichlorosilane
C
dimethylmonochlorosilane
Conditions | Yield |
---|---|
With trichlorosilane; silicon; copper In chloroform at 324.9℃; under 760 Torr; Product distribution; variation of catalists; |
Conditions | Yield |
---|---|
at 100℃; Equilibrium constant; Thermodynamic data; -ΔG; |
allyldichloromethylsilane
benzaldehyde
A
Dichloromethylsilane
B
styrene
C
Methyltrichlorosilane
D
dimethylsilicon dichloride
E
toluene
Conditions | Yield |
---|---|
at 725℃; for 0.00277778h; Product distribution; |
Conditions | Yield |
---|---|
With dihydrogen hexachloroplatinate; trichlorosilane Yield given. Yields of byproduct given; |
Conditions | Yield |
---|---|
With dihydrogen hexachloroplatinate; trichlorosilane Yield given. Yields of byproduct given; |
methylene chloride
buta-1,3-diene
A
1,1-Dichloro-2,5-dihydro-1H-silole
B
Dichloromethylsilane
C
1-chloro-1-methyl-silacyclopent-3-ene
D
Methyltrichlorosilane
E
but-2-enyl-dichloro-methyl-silane
F
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With silicon powder with ca. 4percent copper loading at 291.9℃; Product distribution; Mechanism; |
Methyltrichlorosilane
A
Dichloromethylsilane
B
dimethylmonochlorosilane
C
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With aluminium trichloride; titanium(II) hydride at 300℃; for 20h; Product distribution; var. reaction partners and times; other silicon compounds; | A 0.001 mol B 0.002 mol C 0.02 mol |
methylene chloride
A
Dichloromethylsilane
B
chloro-trimethyl-silane
C
Methyltrichlorosilane
D
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With copper(l) chloride; zinc(II) chloride; silicon at 399.9℃; under 720.06 Torr; Further byproducts given; |
methylene chloride
A
Dichloromethylsilane
B
Methyltrichlorosilane
C
dimethylmonochlorosilane
D
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With copper(l) chloride; zinc(II) chloride; silicon at 399.9℃; under 720.06 Torr; Further byproducts given; |
methane
Dichloromethylsilane
Conditions | Yield |
---|---|
With trichlorosilane at 647.9℃; under 8.5 Torr; Product distribution; Rate constant; Mechanism; other pressures; |
Conditions | Yield |
---|---|
at 90℃; for 5h; Inert atmosphere; | 100% |
at 90℃; for 5h; Inert atmosphere; | 100% |
Stage #1: 1-hexene With diethylenetriaminepentaacetic acid (DTPA)-functionalized silica supported Pt at 60℃; for 0.5h; Stage #2: Dichloromethylsilane at 60℃; for 4h; Catalytic behavior; Temperature; Reagent/catalyst; | 99.6% |
Conditions | Yield |
---|---|
Pt-thiourea Product distribution; Ambient temperature; various catalysts; | 100% |
Pt-thiourea | 100% |
Stage #1: 1-Heptene With diethylenetriaminepentaacetic acid (DTPA)-functionalized silica supported Pt at 60℃; for 0.5h; Stage #2: Dichloromethylsilane at 60℃; for 4h; Reagent/catalyst; | 98.9% |
Conditions | Yield |
---|---|
In hexane at -5℃; | 100% |
In pentane at 0 - 20℃; Inert atmosphere; | 90% |
In pentane at -30 - 20℃; for 24h; Inert atmosphere; | 87% |
In diethyl ether | |
Inert atmosphere; |
Dichloromethylsilane
(4S,5S)-4-<(allyloxy)methyl>-2-methyl-5-phenyloxazol-2-ine
Conditions | Yield |
---|---|
With dihydrogen hexachloroplatinate; isopropyl alcohol for 5h; Heating; | 100% |
Dichloromethylsilane
tetravinylsilane
tetra-2-(dichloromethylsilyl)ethylsilane
Conditions | Yield |
---|---|
dihydrogen hexachloroplatinate In tetrahydrofuran at 20℃; | 100% |
bis(tetrabutylammonium) hexachloroplatinate(IV) In ethanol | 97% |
platinum Addition; |
Dichloromethylsilane
bis-allyloxy-dimethyl-silane
Conditions | Yield |
---|---|
dihydrogen hexachloroplatinate In diethyl ether at 25℃; for 1.25h; | 100% |
Conditions | Yield |
---|---|
dihydrogen hexachloroplatinate In diethyl ether at 25℃; for 3.25h; | 100% |
Conditions | Yield |
---|---|
dihydrogen hexachloroplatinate In diethyl ether at 25℃; for 3.25h; | 100% |
Conditions | Yield |
---|---|
dihydrogen hexachloroplatinate In diethyl ether at 25℃; for 3.25h; | 100% |
Conditions | Yield |
---|---|
dihydrogen hexachloroplatinate In diethyl ether at 25℃; for 1.25h; | 100% |
Dichloromethylsilane
3-[allyloxy-(3-{[3-(bis-allyloxy-methyl-silanyl)-propoxy]-dimethyl-silanyloxy}-propyl)-methyl-silanyloxy]-propene
Conditions | Yield |
---|---|
dihydrogen hexachloroplatinate at 25℃; for 1.25h; | 100% |
Dichloromethylsilane
Conditions | Yield |
---|---|
dihydrogen hexachloroplatinate at 25℃; for 1.25h; | 100% |
Conditions | Yield |
---|---|
bis(tetrabutylammonium) hexachloroplatinate(IV) In ethanol | 100% |
Dichloromethylsilane
Conditions | Yield |
---|---|
chloroplatinic acid 1,1,3,3-tetramethyl-1,3-divinyldisiloxane complex In benzene at 55℃; for 16h; | 100% |
Dichloromethylsilane
Conditions | Yield |
---|---|
chloroplatinic acid 1,1,3,3-tetramethyl-1,3-divinyldisiloxane complex In benzene at 55℃; for 16h; | 100% |
Dichloromethylsilane
tri(allyl)phenylsilane
{tris-[3-(dichloro-methyl-silanyl)-propyl]-silanyl}-benzene
Conditions | Yield |
---|---|
chloroplatinic acid 1,1,3,3-tetramethyl-1,3-divinyldisiloxane complex In benzene at 55℃; for 16h; | 100% |
Dichloromethylsilane
Conditions | Yield |
---|---|
With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex In 5,5-dimethyl-1,3-cyclohexadiene; diethyl ether at 40℃; for 72h; regioselective reaction; | 100% |
Dichloromethylsilane
Conditions | Yield |
---|---|
With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex In 5,5-dimethyl-1,3-cyclohexadiene; diethyl ether at 40℃; for 72h; regioselective reaction; | 100% |
Conditions | Yield |
---|---|
With lithium aluminium tetrahydride; calcium hydride In diethylene glycol dimethyl ether at 50℃; for 7h; Inert atmosphere; | 100% |
Conditions | Yield |
---|---|
PtCl2*(III)2 In octane at 40 - 45℃; for 8h; Product distribution; examination of regio- and stereo-selectivity of products by catalytic activity; | 99% |
Dichloromethylsilane
Conditions | Yield |
---|---|
platinum on activated charcoal In diethyl ether for 2.5h; Addition; Heating; | 99% |
Conditions | Yield |
---|---|
platinum on activated charcoal In diethyl ether for 2.5h; Addition; Heating; | 99% |
Conditions | Yield |
---|---|
With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex In toluene at 20℃; for 2h; | 99% |
Conditions | Yield |
---|---|
With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex In hexane at 60℃; for 4h; Inert atmosphere; | 99% |
Conditions | Yield |
---|---|
With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex In 5,5-dimethyl-1,3-cyclohexadiene at 20℃; for 48h; | 99% |
Conditions | Yield |
---|---|
With bis-triphenylphosphine-palladium(II) chloride In neat (no solvent) at 120℃; for 10h; | 99% |
Conditions | Yield |
---|---|
Stage #1: styrene With Pt loaded on nitrolotriacetic acid-functionalized silica gel at 60℃; for 0.5h; Stage #2: Dichloromethylsilane at 60℃; for 4h; Reagent/catalyst; | 98.8% |
With tetrakis(triphenylphosphine)platinum at 90 - 130℃; for 2h; Reagent/catalyst; Large scale; regiospecific reaction; | 93% |
With N-heterocyclic carbene fuctionalized with methyl(trimethylsilane) and methoxypolyethylene glycol Pt(II) complex at 90℃; for 10h; | 93.7% |
Conditions | Yield |
---|---|
Stage #1: oct-1-ene With diethylenetriaminepentaacetic acid (DTPA)-functionalized silica supported Pt at 60℃; for 0.5h; Stage #2: Dichloromethylsilane at 60℃; for 4h; Reagent/catalyst; | 98.6% |
at 300℃; | |
tetrakis(triphenylphosphine) palladium(0) at 120℃; for 6h; |
Conditions | Yield |
---|---|
With H2PtCl6 | 98.3% |
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