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inquiryBIS(TRICHLOROSILYL)METHANE Basic information Product Name: BIS(TRICHLOROSILYL)METHANE Synonyms: 1,1,1,3,3,3-hexachloro-1,3-disilapropane;bis-trichlorosilanyl-methane;BIS(TRICHLOROSILYL)METHANE;trichloro(trichlorosilylmethyl)silane;Methylenebis(
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inquiryLower price, sample is available,SDS test documents are available,large stock in warehouseAppearance:White powder Storage:Sealed and preserved Package:200/Kilograms Application:Fine chemical intermediates, used as the main raw material for the synthe
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inquirySilane,1,1'-methylenebis[1,1,1-trichloro- Application:Organic Chemicals
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inquirybis-trichlorosilanyl-MethaneAppearance:white crystalline powder Storage:Store in dry, dark and ventilated place Package:25KG drum Application:intermediate Transportation:by air, by sea, by express
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inquiryBIS(TRICHLOROSILYL)METHANE
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inquiryHigh purity Application:Pharmaceutical intermediates, Material synthesis and analyzing the expectant ingredients
Conditions | Yield |
---|---|
With hydrogenchloride; tetrabutyl phosphine chloride In dodecane at 20℃; for 1h; | 87% |
1,2-Dichloroethylene
A
dichloromethane
B
1,2-bis(trichlorosilyl)ethane
C
1,2-bis(trichlorosilyl)ethene
D
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Conditions | Yield |
---|---|
With hexachlorodisilane at 550℃; for 0.00833333h; | A n/a B n/a C 83% D n/a |
3-chloroprop-1-ene
A
allyltrichlorosilane
B
1,1,1,3,3,3-hexachloro-1,3-disilapropane
C
Phenyltrichlorosilane
E
1,1,3,3-tetrachloro-1,3-disilacyclohex-4-ene
Conditions | Yield |
---|---|
With hexachlorodisilane at 500℃; for 0.00833333h; Product distribution; Mechanism; | A 81% B 1.85% C 1.77% D 1.52% E 4.63% |
bis(dichlorosilyl)methane
dichloromethane
A
1,1,3,3,5,5-hexachloro-1,3,5-trisilacyclohexane
B
1,1,1,3,3,3-hexachloro-1,3-disilapropane
C
1,1,1,3,3,5,5,5-octachloro-1,3,5-trisilapentane
Conditions | Yield |
---|---|
tetra-n-butylphosphonium chloride at 180℃; for 2h; Product distribution / selectivity; Inert atmosphere; | A 70.1% B 40.6% C 13% |
Conditions | Yield |
---|---|
With tri-n-propylamine; trichlorosilane In acetonitrile for 21h; Ambient temperature; | 64% |
Conditions | Yield |
---|---|
With tri-n-propylamine; trichlorosilane 1.) r.t., 8 h, 2.) reflux, 10 h; | 63.6% |
With trichlorosilane; triethylamine In acetonitrile at 65 - 70℃; 12-15 h; | 57% |
With copper; silicon at 300 - 400℃; | |
With trichlorosilane; trihexyl(tetradecyl)phosphonium chloride at 50 - 240℃; under 12929 - 33615.5 Torr; for 3.25h; | |
With tri-n-propylamine; trichlorosilane |
Conditions | Yield |
---|---|
With tributylphosphine; trichlorosilane at 150℃; for 2h; Reagent/catalyst; Autoclave; | 54.3% |
With tributylphosphine; trichlorosilane at 150℃; for 2h; Reagent/catalyst; Autoclave; High pressure; Inert atmosphere; | 54.3% |
With trichlorosilane at 150℃; for 2h; Reagent/catalyst; Inert atmosphere; Sealed tube; | 54.3% |
dichloromethane
(dichlorosilylmethyl)trichlorosilane
A
1,1,3,3,5,5-hexachloro-1,3,5-trisilacyclohexane
B
1,1,1,3,3,3-hexachloro-1,3-disilapropane
C
1,1,1,3,3,5,5,5-octachloro-1,3,5-trisilapentane
Conditions | Yield |
---|---|
With tetra-n-butylphosphonium chloride In toluene at 180℃; for 3h; Inert atmosphere; Autoclave; | A 54% B 23% C 8% |
3-Chloro-2-methylpropene
A
trichloro(2-methyl-2-propenyl)silane
B
1,1,1,3,3,3-hexachloro-1,3-disilapropane
C
(Z)-crotyltrichlorosilane
D
Phenyltrichlorosilane
Conditions | Yield |
---|---|
With hexachlorodisilane at 520℃; for 30h; Product distribution; Mechanism; | A 53.4% B 1.5% C 8.6% D 5.3% E 10.2% |
3-Chloro-2-methylpropene
A
trichloro(2-methyl-2-propenyl)silane
B
1,1,1,3,3,3-hexachloro-1,3-disilapropane
C
Phenyltrichlorosilane
Conditions | Yield |
---|---|
With hexachlorodisilane at 520℃; for 0.00833333h; Further byproducts given; | A 53.4% B 10.2% C 8.6% D 5.3% |
With hexachlorodisilane at 520℃; for 0.00833333h; Further byproducts given; | A 53.4% B 8.6% C 5.3% D 10.2% |
With hexachlorodisilane at 520℃; for 0.00833333h; Further byproducts given; | A 53.4% B 10.2% C 5.3% D 8.6% |
silicon
A
tetrachlorosilane
B
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Conditions | Yield |
---|---|
With dichloromethane; copper In neat (no solvent) Si-Cu (4:1) and gaseous CH2Cl2 at 400°C;; | A 53% B n/a |
With CH2Cl2; copper In neat (no solvent) Si-Cu (4:1) and gaseous CH2Cl2 at 400°C;; | A 53% B n/a |
With dichloromethane; copper In neat (no solvent) Si-Cu (4:1) and gaseous CH2Cl2 at 300-350°C;; | |
With CH2Cl2; copper In neat (no solvent) Si-Cu (4:1) and gaseous CH2Cl2 at 300-350°C;; |
2-propynyl chloride
A
allyltrichlorosilane
B
1,1,1,3,3,3-hexachloro-1,3-disilapropane
C
trichloro(prop-2-ynyl)silane
Conditions | Yield |
---|---|
With hexachlorodisilane at 520℃; for 0.00833333h; Further byproducts given; | A 14.4% B 42.7% C 22.1% D 11.8% |
2-propynyl chloride
A
1,1,1,3,3,3-hexachloro-1,3-disilapropane
B
trichloro(prop-2-ynyl)silane
C
Phenyltrichlorosilane
Conditions | Yield |
---|---|
With hexachlorodisilane at 520℃; for 0.00833333h; Further byproducts given; | A 42.7% B 22.1% C 3.8% D 11.8% |
With hexachlorodisilane at 450℃; for 0.00694444h; Further byproducts given; | A 35.7% B 17.2% C 14.1% D 21.1% |
chloroform
A
dichloromethane
B
(dichlorosilylmethyl)trichlorosilane
C
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Conditions | Yield |
---|---|
With trichlorosilane at 100℃; for 8h; | A 42% B 5% C 42% |
2-propynyl chloride
A
allyltrichlorosilane
B
1,1,1,3,3,3-hexachloro-1,3-disilapropane
C
trichloro(prop-2-ynyl)silane
D
Phenyltrichlorosilane
Conditions | Yield |
---|---|
With hexachlorodisilane at 450℃; for 0.00694444h; Product distribution; Mechanism; influence of temperature, ratio of reagents; | A 11.6% B 35.7% C 17.2% D 14.1% E 21.1% |
chloroform
A
1,1,1,3,3,3-hexachloro-1,3-disilapropane
B
tris(trichlorosilyl)methane
Conditions | Yield |
---|---|
With hexachlorodisilane at 550℃; for 0.00833333h; | A 30% B 34% |
With hexachlorodisilane at 550℃; for 0.00833333h; Product distribution; gas-phase reactions of chloroalkanes and chloroalkenes with Si2Cl6; other temperature, molar concentration of Si2Cl6; |
trichloromethyltrichlorosilane
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Conditions | Yield |
---|---|
With tri-n-propylamine; trichlorosilane In acetonitrile 1.) r.t., 18 h, 2.) reflux, 16 h; | 22.7% |
Conditions | Yield |
---|---|
With aluminium trichloride at 450℃; unter Druck; | |
at 710℃; unter vermindertem Druck; |
Conditions | Yield |
---|---|
With copper; silicon at 300 - 400℃; | |
With hexachlorodisilane at 620℃; | |
With tetrachlorosilane; hydrogen at 300 - 750℃; Catalytic behavior; Flow reactor; | |
With copper; silicon at 300℃; |
1,1,3,3-tetrachloro-2,4-bis-trichlorosilanyl-[1,3]disiletane
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Conditions | Yield |
---|---|
With hydrogenchloride; N,N-dimethyl-aniline at 150℃; |
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Conditions | Yield |
---|---|
With hydrogenchloride; aluminium trichloride In benzene at 5 - 15℃; Yield given; |
dichloromethane
A
chloroform
B
(chloromethyl)trichlorosilane
C
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Conditions | Yield |
---|---|
With hexachlorodisilane at 399℃; Product distribution; var. temp. and molar ratio; |
dichloromethane
A
bis(dichlorosilyl)methane
B
(dichlorosilylmethyl)trichlorosilane
C
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Conditions | Yield |
---|---|
With hydrogenchloride; silicon; Cu(10 percent)-Cd(0.5 percent) at 280℃; for 2h; | A 10.1 g B 8.7 g C 2.0 g |
With hydrogenchloride; silicon; Cu(10 percent)-Cd(0.5 percent) at 280℃; for 2h; Product distribution; effects of temperature, mixing ratio and further catalysts investigated; | A 10.2 g B 8.7 g C 2.0 g |
With hydrogenchloride; methylene chloride; copper; cadmium; silicon at 280℃; for 2h; | A 10.1 g B 8.7 g C 2 g |
Conditions | Yield |
---|---|
at 300 - 400℃; |
trichloro(dichloromethyl)silane
A
Methyltrichlorosilane
B
tetrachlorosilane
C
(chloromethyl)trichlorosilane
D
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Conditions | Yield |
---|---|
at 360℃; |
(chloromethyl)trichlorosilane
A
Methyltrichlorosilane
B
1,1,1,3,3,3-hexachloro-1,3-disilapropane
C
1,1,1,3,3,5,5,5-octachloro-1,3,5-trisilapentane
Conditions | Yield |
---|---|
at 300 - 370℃; |
hexa-Si-chloro-Si,Si'-chloromethanediyl-bis-silane
A
tetrachlorosilane
B
1,1,1,3,3,3-hexachloro-1,3-disilapropane
C
tris(trichlorosilyl)methane
D
1,1,2,2-tetrakis-trichlorosilanyl-ethane
Conditions | Yield |
---|---|
at 360℃; |
chloroform
A
tetrachlorosilane
B
1,1,1,3,3,3-hexachloro-1,3-disilapropane
C
tris(trichlorosilyl)methane
D
trichlorosilane
Conditions | Yield |
---|---|
at 300℃; |
trichloromethyltrichlorosilane
B
chloroform
C
trichloro(dichloromethyl)silane
D
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Conditions | Yield |
---|---|
With trichlorosilane; tetrabutyl phosphine chloride In dodecane at 60℃; for 8h; Product distribution; Further Variations:; Temperatures; |
octadec-1-ene
1,1,1,3,3,3-hexachloro-1,3-disilapropane
1,1,1,3,3-pentachloro-1,3-disilaheneicosane
Conditions | Yield |
---|---|
Stage #1: 1,1,1,3,3,3-hexachloro-1,3-disilapropane With trihexyl(tetradecyl)phosphonium chloride; Dichloromethylsilane at 80 - 90℃; Inert atmosphere; Autoclave; Stage #2: octadec-1-ene With dihydrogen hexachloroplatinate In tetrahydrofuran at 90 - 110℃; Inert atmosphere; | 91% |
Conditions | Yield |
---|---|
With lithium aluminium tetrahydride In diethylene glycol dimethyl ether at -78 - 25℃; for 2h; Inert atmosphere; | 82% |
With dibutyl ether; lithium hydride | |
With lithium aluminium tetrahydride | |
With lithium aluminium tetrahydride In various solvent(s) Reduction; |
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Dichloro-bis(trichlorosilyl)methane
Conditions | Yield |
---|---|
With chlorine In tetrachloromethane for 64h; Heating; Irradiation; | 80.8% |
With tetrachloromethane; chlorine Irradiation.UV-Licht; | |
With chlorine at 240℃; Irradiation.UV-licht; | |
With sulfuryl dichloride; dibenzoyl peroxide at 240℃; Irradiation.UV-licht; | |
With chlorine UV-irradiation; |
1,1,1,3,3,3-hexachloro-1,3-disilapropane
allyloxytri(ethylene glycol) monomethyl ether
[2-methoxy(triethyleneoxy)propyl]-1,1,1,3,3-pentachloro-1,3-disilapropane
Conditions | Yield |
---|---|
Stage #1: 1,1,1,3,3,3-hexachloro-1,3-disilapropane With trihexyl(tetradecyl)phosphonium chloride; Dichloromethylsilane at 80 - 90℃; Inert atmosphere; Autoclave; Stage #2: allyloxytri(ethylene glycol) monomethyl ether With dihydrogen hexachloroplatinate In tetrahydrofuran at 85 - 105℃; Inert atmosphere; | 70% |
Conditions | Yield |
---|---|
In dibutyl ether | 63% |
Conditions | Yield |
---|---|
In pentane at -78 - 20℃; | 62% |
1,1,1,3,3,3-hexachloro-1,3-disilapropane
3-Chloro-2-methylpropene
1,1,1,3,3,6-hexachloro-5-methyl-1,3-disilahexane
Conditions | Yield |
---|---|
Stage #1: 1,1,1,3,3,3-hexachloro-1,3-disilapropane With trihexyl(tetradecyl)phosphonium chloride; Dichloromethylsilane at 80 - 90℃; for 10h; Inert atmosphere; Autoclave; Stage #2: 3-Chloro-2-methylpropene With dihydrogen hexachloroplatinate In tetrahydrofuran at 110 - 120℃; Inert atmosphere; | 60% |
(dichlorosilylmethyl)trichlorosilane
1,1,1,3,3,3-hexachloro-1,3-disilapropane
3-Chloro-2-methylpropene
1,1,1,3,3,6-hexachloro-5-methyl-1,3-disilahexane
Conditions | Yield |
---|---|
With hexachloroplatinic acid In tetrahydrofuran at 110 - 130℃; for 3h; | 60% |
1-Decene
1,1,1,3,3,3-hexachloro-1,3-disilapropane
1,1,1,3,3-pentachloro-1,3-disilatridecane
Conditions | Yield |
---|---|
Stage #1: 1,1,1,3,3,3-hexachloro-1,3-disilapropane With trihexyl(tetradecyl)phosphonium chloride; Dichloromethylsilane at 80 - 90℃; for 10h; Inert atmosphere; Autoclave; Large scale; Stage #2: 1-Decene With dihydrogen hexachloroplatinate In tetrahydrofuran at 90 - 110℃; Inert atmosphere; Large scale; | 59% |
1-Decene
(dichlorosilylmethyl)trichlorosilane
1,1,1,3,3,3-hexachloro-1,3-disilapropane
1,1,1,3,3-pentachloro-1,3-disilatridecane
Conditions | Yield |
---|---|
With hexachloroplatinic acid In tetrahydrofuran at 90 - 110℃; for 1.5h; Inert atmosphere; | 59% |
1,1,1,3,3,3-hexachloro-1,3-disilapropane
[dicarbonyl(η5-cyclopentadienyl)ferrio]dichlorosilyl-(trichlorosilyl)methane
Conditions | Yield |
---|---|
In cyclohexane suspn. of Fe-complex in cyclohexane was combined with Si-compound, stirred for 14 h at ambient temp. under exclusion of light; filtered, solvent was removed in vac., washed with n-pentane at -78°C, dried in vac., crystd. from petroleum ether at -78°C; elem.anal.; | 46% |
Conditions | Yield |
---|---|
In pentane at -78 - 20℃; | 41% |
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