di-t-butoxydichlorosilane
di-t-butoxydiacetoxysilane
Conditions | Yield |
---|---|
With pyridine; acetic acid | 76% |
With pyridine; sodium acetate | 76% |
With NaCH3COO; pyridine | 76% |
With CH3COOH; pyridine | 76% |
Conditions | Yield |
---|---|
With pyridine |
Conditions | Yield |
---|---|
In tetrahydrofuran at 20℃; for 48h; Schlenk technique; Glovebox; Inert atmosphere; | 95% |
Conditions | Yield |
---|---|
In tetrahydrofuran at 20℃; for 72h; Schlenk technique; Glovebox; Inert atmosphere; | 93% |
di-t-butoxydichlorosilane
di-t-butoxydiacetoxysilane
Conditions | Yield |
---|---|
With pyridine; acetic acid | 76% |
With pyridine; sodium acetate | 76% |
With NaCH3COO; pyridine | 76% |
With CH3COOH; pyridine | 76% |
Conditions | Yield |
---|---|
With pyridine |
Conditions | Yield |
---|---|
In tetrahydrofuran at 20℃; for 48h; Schlenk technique; Glovebox; Inert atmosphere; | 95% |
Conditions | Yield |
---|---|
In tetrahydrofuran at 20℃; for 72h; Schlenk technique; Glovebox; Inert atmosphere; | 93% |
Conditions | Yield |
---|---|
In tetrahydrofuran at 20℃; for 48h; Schlenk technique; Glovebox; Inert atmosphere; | 92% |
Conditions | Yield |
---|---|
In tetrahydrofuran at 20℃; for 72h; Schlenk technique; Glovebox; Inert atmosphere; | 91% |
Conditions | Yield |
---|---|
In tetrahydrofuran at 20℃; for 16h; Schlenk technique; Glovebox; Inert atmosphere; | 91% |
Conditions | Yield |
---|---|
In tetrahydrofuran at 20℃; for 72h; Schlenk technique; Glovebox; Inert atmosphere; | 90% |
di-t-butoxydiacetoxysilane
silica gel
Conditions | Yield |
---|---|
Irradiation (UV/VIS); film formation by pulsed laser deposition at 248 nm on quartz substrate; |
di-t-butoxydiacetoxysilane
di-t-butoxymethoxysilanol
Conditions | Yield |
---|---|
Multi-step reaction with 2 steps 1: tetrahydrofuran / 16 h / 20 °C / Schlenk technique; Glovebox; Inert atmosphere 2: ammonium hydroxide / water / 1 h / 20 °C View Scheme |
di-t-butoxydiacetoxysilane
Conditions | Yield |
---|---|
Multi-step reaction with 2 steps 1: tetrahydrofuran / 48 h / 20 °C / Schlenk technique; Glovebox; Inert atmosphere 2: ammonium hydroxide / water / 2 h / 20 °C View Scheme |
di-t-butoxydiacetoxysilane
Conditions | Yield |
---|---|
Multi-step reaction with 2 steps 1: tetrahydrofuran / 72 h / 20 °C / Schlenk technique; Glovebox; Inert atmosphere 2: ammonium hydroxide / water / 4 h / 20 °C View Scheme |
di-t-butoxydiacetoxysilane
bis(tert-butoxy)(iso-propoxy)silanol
Conditions | Yield |
---|---|
Multi-step reaction with 2 steps 1: tetrahydrofuran / 48 h / 20 °C / Schlenk technique; Glovebox; Inert atmosphere 2: ammonium hydroxide / water / 6 h / 20 °C View Scheme |
di-t-butoxydiacetoxysilane
Conditions | Yield |
---|---|
Multi-step reaction with 2 steps 1: tetrahydrofuran / 72 h / 20 °C / Schlenk technique; Glovebox; Inert atmosphere 2: ammonium hydroxide / water / 4 h / 20 °C View Scheme |
di-t-butoxydiacetoxysilane
Conditions | Yield |
---|---|
Multi-step reaction with 2 steps 1: tetrahydrofuran / 72 h / 20 °C / Schlenk technique; Glovebox; Inert atmosphere 2: ammonium hydroxide / water / 4 h / 20 °C View Scheme |
di-t-butoxydiacetoxysilane
Conditions | Yield |
---|---|
Multi-step reaction with 3 steps 1: tetrahydrofuran / 72 h / 20 °C / Schlenk technique; Glovebox; Inert atmosphere 2: ammonium hydroxide / water / 4 h / 20 °C 3: toluene / 3 h / 100 °C View Scheme |
di-t-butoxydiacetoxysilane
Conditions | Yield |
---|---|
Multi-step reaction with 3 steps 1: tetrahydrofuran / 72 h / 20 °C / Schlenk technique; Glovebox; Inert atmosphere 2: ammonium hydroxide / water / 4 h / 20 °C 3: toluene / 24 h / 100 °C View Scheme |
di-t-butoxydiacetoxysilane
Conditions | Yield |
---|---|
Multi-step reaction with 3 steps 1: tetrahydrofuran / 72 h / 20 °C / Schlenk technique; Glovebox; Inert atmosphere 2: ammonium hydroxide / water / 4 h / 20 °C 3: toluene / 24 h / 100 °C View Scheme |
The Di-tert-butoxydiacetoxysilane, with the CAS registry number 13170-23-5, is also known as Diacetyl di-tert-butyl orthosilicate. It belongs to the product categories of Organics; Silicone series; Acetoxy Silanes; Crosslinkers; Crosslinking Agents. Its EINECS number is 236-112-3. This chemical's molecular formula is C12H24O6Si and formula weight is 292.40. What's more, both its IUPAC name and systematic name are the same which is called [Acetyloxy-bis[(2-methylpropan-2-yl)oxy]silyl] acetate. This chemical is colorless or yellowish transparent liquid.
Physical properties about this chemical are: (1)ACD/LogP: 4.66; (2)# of Rule of 5 Violations: 0; (3)ACD/LogD (pH 5.5): 4.66; (4)ACD/LogD (pH 7.4): 4.66; (5)ACD/BCF (pH 5.5): 2057.19; (6)ACD/BCF (pH 7.4): 2057.19; (7)ACD/KOC (pH 5.5): 8189.13; (8)ACD/KOC (pH 7.4): 8189.13; (9)#H bond acceptors: 6; (10)#H bond donors: 0; (11)#Freely Rotating Bonds: 8; (12)Polar Surface Area: 71.06 Å2; (13)Index of Refraction: 1.433; (14)Molar Refractivity: 73.33 cm3; (15)Molar Volume: 282.1 cm3; (16)Surface Tension: 27.7 dyne/cm; (17)Density: 1.036 g/cm3; (18)Flash Point: 100.8 °C; (19)Enthalpy of Vaporization: 51.54 kJ/mol; (20)Boiling Point: 276.8 °C at 760 mmHg; (21)Vapour Pressure: 0.00469 mmHg at 25°C; (22)Melting Point: -4 °C .
When you are using this chemical, please be cautious about it as the following:
This chemical may destroy living tissue on contact and may causes burns. Besides, it can irritate to eyes, respiratory system and skin. In case of contact with eyes, you should rinse immediately with plenty of water and seek medical advice. Whenever you will contact it, please wear suitable protective clothing, gloves and eye/face protection. In case of accident or if you feel unwell seek medical advice immediately (show the label where possible).
You can still convert the following datas into molecular structure:
(1)SMILES: O=C(O[Si](OC(=O)C)(OC(C)(C)C)OC(C)(C)C)C
(2)InChI: InChI=1/C12H24O6Si/c1-9(13)15-19(16-10(2)14,17-11(3,4)5)18-12(6,7)8/h1-8H3
(3)InChIKey: OPARTXXEFXPWJL-UHFFFAOYAX
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