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Good Price, prompt shipment Application:Catalytic agent; Petrochemical additive; Used in organic synthesis
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Purity Grade customized Formula SiF4 Application This volatile compound finds limited use in microelectronics and organic synthesis. Mol…
high purity Application:Drug intermediates Materials intermediates and active molecules
polytetrafluoroethylene
(1,1,2,2-tetrafluoroethyl)trifluorosilane
A
pentafloropropylene
B
1,1,2,2,3,3-Hexafluoro-cyclopropane
C
1,2,2,3,3-pentafluoro-1-difluoromethylcyclopropane
D
silicon tetrafluoride
Conditions | Yield |
---|---|
at 150℃; for 18h; Further byproducts given; | A 5% B n/a C 74% D 100% |
at 200℃; for 10h; Further byproducts given; | A 19% B n/a C 71% D 98% |
(1,1,2,2-tetrafluoroethyl)trifluorosilane
A
pentafloropropylene
B
1,2,2,3,3-pentafluoro-1-difluoromethylcyclopropane
C
silicon tetrafluoride
D
1,1,2-trifluoroethylene
Conditions | Yield |
---|---|
With polytetrafluoroethylene at 150℃; for 18h; Further byproducts given; | A 5% B 74% C 100% D 10% |
Carbonyl fluoride
silica gel
A
carbon dioxide
B
silicon tetrafluoride
Conditions | Yield |
---|---|
In neat (no solvent) slight excess over the stoich. amt. of COF2 required; reaction mixt. heated in a stainless steel or monel cylinder at 160°C for 36 h; | A n/a B 100% |
silicon tetrafluoride
Conditions | Yield |
---|---|
In neat (no solvent) salt dried at 250°C in vac. or in N2 flow; thermal dissocn. at 500-620°C in vac. in stainless steel reactor; fed into metallic cylinder cooled with liq. N2; filtration, IR, atomic emission and mass spectrometry; | 100% |
With water In neat (no solvent) byproducts: Si2OF6, SiF3OH, SiF3H; predrying of Na2SiF6 at 250-300.C in vac. or N2 for several hours, heating at 500 to 620°C in stainless steel reactor; cooling with liquid N2; | |
With sulfuric acid In sulfuric acid reaction by use of concd. H2SO4;; |
(2,2-dichloro trifluoro ethyl) trifluoro silane
A
1,1'-dichloro-2,2'-difluoroethene
B
1,2-dichloro-1,2-difluoroethene
C
silicon tetrafluoride
Conditions | Yield |
---|---|
In neat (no solvent) pyrolysis at 140°C, 3 hours;; | A 8% B 90% C 100% |
In neat (no solvent) pyrolysis at 140°C, 3 hours;; | A 8% B 90% C 100% |
diphenylfluorostibine
phenyltrifluorosilane
A
triphenylantimony
B
silicon tetrafluoride
Conditions | Yield |
---|---|
reflux for 3 d; | A 100% B n/a |
reflux for 3 d; | A 100% B n/a |
2,3-Dimethyl-2-butene
(1,1,2,2-tetrafluoroethyl)trifluorosilane
A
1-fluoro-1-difluoromethyl-2,2,3,3-tetramethylcyclopropane
B
silicon tetrafluoride
C
1,1,2-trifluoroethylene
Conditions | Yield |
---|---|
at 150℃; for 16h; | A 86% B 99% C 6% |
1,2,2,3,3-pentafluoro-1-difluoromethylcyclopropane
cyclohexene
A
polytetrafluoroethylene
B
pentafloropropylene
C
carbon monoxide
D
Octafluorocyclobutane
E
7,7-difluoronorcarane
F
silicon tetrafluoride
Conditions | Yield |
---|---|
With Pyrex tube at 200℃; for 320h; Product distribution; Mechanism; further periods of contact time, other temperatures; | A 14% B 99% C 11% D n/a E 47% F 13% |
polytetrafluoroethylene
(1,1,2,2-tetrafluoroethyl)trifluorosilane
A
pentafloropropylene
B
1,2,2,3,3-pentafluoro-1-difluoromethylcyclopropane
C
silicon tetrafluoride
D
1,1,2-trifluoroethylene
Conditions | Yield |
---|---|
at 200℃; for 10h; Further byproducts given; | A 19% B 71% C 98% D 8% |
phosgene
A
Carbonyl fluoride
B
fluoroformyl chloride
C
carbon dioxide
D
silicon tetrafluoride
Conditions | Yield |
---|---|
In acetonitrile condensation, 20°C in a sealed Pyrex tube, staying 24 h at 20°C; | A 97% B 0% C n/a D <1 |
Caesium-trans-bis(trifluormethyl)-tetrafluorphosphat
silicon tetrafluoride
Conditions | Yield |
---|---|
With glass; acid In not given | 97% |
2-methyl-but-2-ene
(1,1,2,2-tetrafluoroethyl)trifluorosilane
A
silicon tetrafluoride
B
1,1,2-trifluoroethylene
1-fluoro-r-1-difluoromethyl-c-2,3-t-2-trimethylcyclopropane
1-fluoro-r-1-difluoromethyl-c-2-t-2,3-trimethylcyclopropane
Conditions | Yield |
---|---|
at 150℃; for 18h; Further byproducts given; | A 96% B 16% C 34% D 47% |
diphenylfluorostibine
trichloromethyltrifluorosilane
A
diphenylantimony trichloride
B
silicon tetrafluoride
Conditions | Yield |
---|---|
at 15°C; | A n/a B 90% |
at 15°C; | A n/a B 90% |
tetramethylorthosilicate
N,N-dimethyl-n-octadecylamine
Nonafluorobutanesulfonyl fluoride
A
silicon tetrafluoride
B
N,N,N,-trimethyloctadecyl ammonium nonafluorobutanesulfonate
Conditions | Yield |
---|---|
In tetrahydrofuran 50°C , 6 h; | A n/a B 84% |
In tetrahydrofuran 50°C , 6 h; | A n/a B 84% |
antimony(III) fluoride
Dichlorosilane
A
difluorosilane
B
trifluorosilane
C
silicon tetrafluoride
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: H2; reaction in presence of SbCl5 at room temperature;; | A 80% B n/a C 10% |
antimony(III) fluoride
Dichlorosilane
A
difluorosilane
B
hydrogen
C
trifluorosilane
D
silicon tetrafluoride
Conditions | Yield |
---|---|
In neat (no solvent) fluorination of SiH2Cl2 with SbF3 at room temp. for a longer period of time;; | A 80% B n/a C n/a D n/a |
disilicon hexafluoride
trimethylstannane
A
F3SiSiH3
B
trimethyl(trifluorsilyl)stannane
C
trifluorosilane
D
silicon tetrafluoride
E
Trimethylstannylsilan
Conditions | Yield |
---|---|
In neat (no solvent) N2 atmosphere, high vac. line; condensing, warming (room temp., 1.5 h); passing through traps (-78°C and -46°C); | A n/a B 77% C n/a D n/a E 5% |
Conditions | Yield |
---|---|
In melt placing of mixt. of Si with SnF2 (molar ratio SnF2:Si=2.00) in Fluoroplast-4 ampule, closing by screwed stopper, exposition for 1.00 h at 250°C; various product ratio yields for various conditions; cooling, stirring up in water, collection, drying; | A 76.8% B n/a |
hexafluorodisilthiane
C
silicon tetrafluoride
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: CF3SiBr; under dry N2, in a sealed tube, 60 h at room temp., molar ratio of silane and HBr was 1:1, an other non-volatile product was also formed; fractionated distn. at a low-temp. column, S-compds. were trapped at 143K, SiF4 at 77 K; | A n/a B 68% C 1% |
iodo-bis-trifluoromethyl-arsine
A
bis(trifluoromethyl)fluoroarsine
B
silicon tetrafluoride
Conditions | Yield |
---|---|
with well dried AgF; | A 60% B n/a |
with well dried AgF; | A 60% B n/a |
disilicon hexabromide
A
disilicon hexafluoride
B
silicon tetrafluoride
Conditions | Yield |
---|---|
In 1,2-dichloro-ethane; acetonitrile Si2Cl6 dissolved in C2H4Cl2 added dropwise over 2 h to suspn. of KF in boiling MeCN, allowed to reflux for 30 min in slow stream of N2; gaseous products trapped in cooled (liq. N2) trap, anlyzed by IR; | A 60% B n/a |
iodo-trifluoro-silane
A
hexafluorodisilthiane
C
hexafluorodisiloxane
D
silicon tetrafluoride
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: HgI2; CF3SiI:HgS molar ratio was 1:2, in a sealed tube, 300 K for 7 days, under dry N2; low temp. fractionated distn., less volatile fraction was purified by passing it through a 198 K trap into a trap held at 173 K, the (F3SiS)2SiF2 was identified by NMR, its purity was 98 %;; | A 54% B n/a C 1% D n/a |
(1,2-dibromotrifluoroethyl)pentafluorosulfur(VI)
A
fluorosulfonyl fluoride
B
disulfur decafluoride
C
1,2,2-tribromo-1,1,2-trifluoroethane
D
silicon tetrafluoride
E
thionyl fluoride
Conditions | Yield |
---|---|
Irradiation (UV/VIS); irradiated (Hanovia S 500 lamp) in silica ampule, 20 h, further products; | A n/a B n/a C 49% D n/a E n/a |
lithium aluminium tetrahydride
SiF3SiHBr2
B
trifluorosilane
C
silicon tetrafluoride
Conditions | Yield |
---|---|
React. occurs at room temp. (N2 or Ar, 15 min).; IR spectrum of volatile material indicates resulting compounds and 5% unreacted SiF3SiHBr2.; | A 5% B 45% C 45% |
hexachlorodisilane
A
hydrogenchloride
B
disilicon hexafluoride
C
silicon tetrafluoride
Conditions | Yield |
---|---|
In 1,2-dichloro-ethane; acetonitrile Si2Cl6 dissolved in C2H4Cl2 added dropwise over 2 h to suspn. of KF in boiling MeCN, allowed to reflux for 30 min in slow stream of N2; gaseous products trapped in cooled (liq. N2) trap, analyzed by IR; | A n/a B 45% C n/a |
SiF3SiHBr2
i-Bu2AlH
A
trifluorosilane
B
silicon tetrafluoride
C
monosilane
Conditions | Yield |
---|---|
In carbon dioxide; isopropyl alcohol; toluene Condensing of Si-compd. at -196°C, warming to -78°C (2-propanol/CO2), addn. of i-Bu2AlH (toluene) in portions over 30 min (N2 or Ar), warming of mixt. (room temp., 15 min).; Removal of volatile compounds under vac., IR identification.; | A 40% B 20% C 40% |
SiF3SiHBr2
Na(1+)*AlH2(1+)*2OCH2CH2OCH3(1-)=NaAlH2(OCH2CH2OCH3)2
A
trifluorosilane
B
silicon tetrafluoride
C
monosilane
Conditions | Yield |
---|---|
In carbon dioxide; isopropyl alcohol; toluene Condensing of Si-compd. at -196°C, warming to -78°C (2-propanol/CO2), addn. of vitride (toluene) in portions over 30 min (N2 or Ar), warming of mixt. (room temp., 15 min).; Removal of volatile compounds under vac., IR identification.; | A 40% B 20% C 40% |
Conditions | Yield |
---|---|
excess of SiF4, heating up to 400°C in a quartz tube; | 100% |
phosgene
silicon tetrafluoride
A
Carbonyl fluoride
B
fluoroformyl chloride
Conditions | Yield |
---|---|
In gaseous matrix molar ratio of educts 1:1, 400°C in a quartz tube; | A 0% B 100% |
trimethyltin fluoride
silicon tetrafluoride
tris(trimethylstannyl)phosphane
Conditions | Yield |
---|---|
In tetrahydrofuran elem. anal., MAS; | A 100% B n/a |
Conditions | Yield |
---|---|
In diethylene glycol dimethyl ether byproducts: CH4; SiF4 was bubbled through soln. of NaAlH4 in diglyme at atmospheric pressure, heated at 0-60°C in He; chromy.; elem. anal.; | 99% |
ethanol
silicon tetrafluoride
magnesium
B
tetraethoxy orthosilicate
Conditions | Yield |
---|---|
Stage #1: ethanol; magnesium With iodine at 20℃; for 3.5h; Inert atmosphere; Reflux; Stage #2: silicon tetrafluoride for 2.5h; Inert atmosphere; Reflux; Stage #3: at 300℃; for 2h; Catalytic behavior; Reagent/catalyst; Temperature; Calcination; | A 98% B 82% |
methanol
silicon tetrafluoride
magnesium
B
tetramethylorthosilicate
Conditions | Yield |
---|---|
Stage #1: methanol; magnesium With iodine at 20℃; for 1.5h; Inert atmosphere; Reflux; Stage #2: silicon tetrafluoride Inert atmosphere; Stage #3: at 300℃; for 2h; Catalytic behavior; Reagent/catalyst; Temperature; Calcination; | A 98% B 85% |
Stage #1: methanol; magnesium at 20℃; for 3h; Stage #2: silicon tetrafluoride at 20℃; for 0.5h; Temperature; |
Conditions | Yield |
---|---|
With CH3OH; NH3 In methanol introduction of NH3 into CH3OH in absence of air; introduction of SiF4;; filtration; distn. of the filtrate;; | A n/a B 95% |
With methanol; ammonia In methanol introduction of NH3 into CH3OH in absence of air; introduction of SiF4;; filtration; distn. of the filtrate;; | A n/a B 95% |
Conditions | Yield |
---|---|
With C2H5OH SiF4 and C2H5OH in presence of NH3;; | 92% |
With ethanol SiF4 and C2H5OH in presence of NH3;; | 92% |
Conditions | Yield |
---|---|
With hydrogen In neat (no solvent) in flow reactor at 180°C; the diluent used was H2; | 90% |
In neat (no solvent) Kinetics; byproducts: CaF2; mech. activated in rotating flow-through reactor; rotation frequency 100-150 rpm, CaF2 heated at temp. of 180-190°C, SiF4+H2 (1/1 v/v) flow through; gaseous products frozen out with liq. N2; detd. by gas-chromy.; |
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