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Conditions | Yield |
---|---|
With Montmorillonite KSF In water at 20℃; | A n/a B 99% |
trimethylsilyl-2-hydroxypropane
A
Trimethylsilanol
B
propene
C
Hexamethyldisiloxane
Conditions | Yield |
---|---|
With hydrogenchloride In methanol at 40℃; Rate constant; var. +>; | A n/a B 98% C n/a |
N-trimethylsilylaniline
A
Trimethylsilanol
B
benzenediazonium tetrafluoroborate
Conditions | Yield |
---|---|
With nitrosonium tetrafluoroborate In dichloromethane Ambient temperature; | A n/a B 98% |
benzyloxy-trimethylsilane
Trimethylsilanol
Conditions | Yield |
---|---|
With palladium-platinum; hydrogen; aniline In N,N-dimethyl acetamide at 20℃; for 2h; | 97% |
N-trimethylsilylaniline
A
Trimethylsilanol
B
benzene diazonium chloride
Conditions | Yield |
---|---|
With nitrosylchloride In dichloromethane for 0.166667h; Ambient temperature; | A n/a B 96% |
N-trimethylsilylaniline
A
Trimethylsilanol
B
benzenediazonium bromide
Conditions | Yield |
---|---|
With nitrosyl bromide In dichloromethane for 0.166667h; Ambient temperature; | A n/a B 94% |
N-trimethylsilylaniline
nitrosonium trifluoromethanesulfonate
A
Trimethylsilanol
B
benzenediazonium trifluoromethanesulfonate
Conditions | Yield |
---|---|
In dichloromethane Ambient temperature; | A n/a B 93% |
Conditions | Yield |
---|---|
With water In hexane deaerated water addn. to Pr-compd. soln., soln. decanting from ppt.; GLC, IR spectroscopy; | A <1 B 92.3% C 73.8% |
1,1,1,2,2,2-hexamethyldisilane
10-methylacridinium perchlorate
A
Trimethylsilanol
B
9,10-dihydro-10-methylacridine
Conditions | Yield |
---|---|
With water In [D3]acetonitrile; acetonitrile for 4h; Irradiation; | A n/a B 88% |
carbon monoxide
1-Phenyl-2-(trimethylsilyl)acetylene
A
Trimethylsilanol
B
inden-1-one
Conditions | Yield |
---|---|
With water; triethylamine; triphenylphosphine; chloro(1,5-cyclooctadiene)rhodium(I) dimer In tetrahydrofuran at 160℃; under 51485.6 Torr; for 4h; Product distribution; other phosphine ligand, other rhodium complex, other temp., other additives, other solv.; | A n/a B 86% |
bis-1,3-trimethylsilyl-2-hydroxypropane
A
Trimethylsilanol
B
propene
C
Hexamethyldisiloxane
D
allyl-trimethyl-silane
Conditions | Yield |
---|---|
With hydrogenchloride In methanol at 40℃; Rate constant; var. +>; | A n/a B 85% C n/a D n/a |
4-Nitro-N-(trimethylsilyl)anilin
A
Trimethylsilanol
B
trimethyl(isopentyloxy)silane
C
4-nitrobenzenediazonium chloride
Conditions | Yield |
---|---|
With chloro-trimethyl-silane; isopentyl nitrite In dichloromethane for 10h; Ambient temperature; | A n/a B n/a C 82% |
Conditions | Yield |
---|---|
With water; ammonium carbonate; sodium chloride In diethyl ether | 78% |
With NaOH In diethyl ether; water fast addn. of (CH3)3SiCl to a 0.25N aq. NaOH-soln. in presence of a large amt. of ether at 0°C;; | 35% |
With 1,4-dioxane; acridine at 25℃; Rate constant; | |
With ammonia In water; acetone Product distribution; various chloroorganosilanes under different reaction conditions; | |
With water In diethyl ether |
Conditions | Yield |
---|---|
With NaOH In diethyl ether; water addn. of aq. NaOH to a cooled soln. of (CH3)3SiF in ether under vigorous stirring (neutral soln.);; drying of the ether phase; evapn. of ether; distn. of the residue;; | 70% |
With NaOH In diethyl ether; water addn. of aq. NaOH to a cooled soln. of (CH3)3SiF in ether under vigorous stirring (neutral soln.);; drying of the ether phase; evapn. of ether; distn. of the residue;; | 70% |
With sodium hydroxide; diethyl ether | |
With sodium hydroxide In diethyl ether Yield given; |
methyltrimethicone
A
Trimethylsilanol
B
trimethylsilyl fluoride
C
methyltrifluorosilane
D
1,1-difluorotetramethyldisiloxane
E
3-fluoroheptamethyltrisiloxane
Conditions | Yield |
---|---|
With NaHF2 at 190℃; for 0.0333333h; Product distribution; | A 0.3% B 62.9% C 18.1% D 1.5% E 2.5% |
diphenyl hydrogen phosphate
1-(Trimethylsilyl)imidazole
A
Trimethylsilanol
B
diphenyl (1H-imidazol-1-yl)phosphonate
Conditions | Yield |
---|---|
In tetrahydrofuran for 8h; Reflux; | A n/a B 50% |
(N-phenyliminovinylidene)triphenylphosphorane
1-(Trimethylsilyl)imidazole
A
Trimethylsilanol
Conditions | Yield |
---|---|
In tetrahydrofuran for 5h; Reflux; | A n/a B 35% |
Bestmann ylide
1-(Trimethylsilyl)imidazole
A
Trimethylsilanol
B
2-triphenyl(α-carboxymethylene)phosphorane imidazolide
Conditions | Yield |
---|---|
In tetrahydrofuran for 6h; Reflux; | A n/a B 30% |
diethyl ether
bis(trimethylsilyl)sulphate
1-methyl-4-nitrosobenzene
A
Trimethylsilanol
B
Hexamethyldisiloxane
Conditions | Yield |
---|---|
With hydrogenchloride | |
With hydrogenchloride; dibutyl ether | |
With hydrogenchloride |
Trimethylsilanol
Conditions | Yield |
---|---|
Zersetzung; |
(2-picolyl)trimethylsilane
N-(4-chlorobenzylidene)aniline
A
Trimethylsilanol
B
4-chloro-aniline
C
2-[(E)-2-phenylethenyl]pyridine
Conditions | Yield |
---|---|
With ammonium chloride; lithium diisopropyl amide 1.) THF, -75 deg C 2.) -75 deg C, 1 h and room temp. 2 h; Yield given. Multistep reaction; |
(2-picolyl)trimethylsilane
(E)-N-(2-pyridylmethylene)aniline
A
Trimethylsilanol
B
aniline
C
(E)-1,2-bis(2-pyridyl)ethene
Conditions | Yield |
---|---|
With ammonium chloride; lithium diisopropyl amide 1.) THF, -75 deg C 2.) -75 deg C, 1 h and room temp. 2 h; Yield given. Multistep reaction; |
(2-picolyl)trimethylsilane
N-(1-phenylethylidene)aniline
A
Trimethylsilanol
B
(E)-2-(2-phenylprop-1-en-1-yl)pyridine
C
2-(2-phenylprop-1-en-1-yl)pyridine
D
aniline
Conditions | Yield |
---|---|
With ammonium chloride; lithium diisopropyl amide 1.) THF, -75 deg C 2.) -75 deg C, 1 h and room temp. 2 h; Yield given. Multistep reaction. Yields of byproduct given; |
(2-picolyl)trimethylsilane
(E)-N-cinnamylideneaniline
A
Trimethylsilanol
B
1-phenyl-4-(2-pyridyl)-1,3-butadiene
C
aniline
Conditions | Yield |
---|---|
With ammonium chloride; lithium diisopropyl amide 1.) THJF, -75 deg C 2.) -75 deg C, 1 h and room temp. 2 h; Yield given. Multistep reaction; |
(2-picolyl)trimethylsilane
N-Benzylidenemethylamine
A
(Z)-2-(2-phenylethenyl)pyridine
B
Trimethylsilanol
C
methylamine
D
2-[(E)-2-phenylethenyl]pyridine
Conditions | Yield |
---|---|
With ammonium chloride; lithium diisopropyl amide 1.) THF, -75 deg C 2.) -75 deg C, 1 h and room temp. 2 h; Yield given. Multistep reaction. Yields of byproduct given; |
(2-picolyl)trimethylsilane
(E)-N-benzylidenebenzenamine
A
(Z)-2-(2-phenylethenyl)pyridine
B
Trimethylsilanol
C
aniline
D
2-[(E)-2-phenylethenyl]pyridine
Conditions | Yield |
---|---|
With ammonium chloride; lithium diisopropyl amide 1.) THF, -75 deg C 2.) -75 deg C, 1 h and room temp. 2 h; Yield given. Multistep reaction. Yields of byproduct given; |
(2-picolyl)trimethylsilane
(E)-N-benzylidenebenzenamine
A
Trimethylsilanol
B
aniline
C
2-[(E)-2-phenylethenyl]pyridine
Conditions | Yield |
---|---|
With ammonium chloride; lithium diisopropyl amide 1.) THF, -75 deg C 2.) -75 deg C, 1 h and room temp. 2 h; Yield given. Multistep reaction; |
(2-picolyl)trimethylsilane
(E)-N-benzylidene-2-methylpropan-2-amine
A
Trimethylsilanol
B
tert-butylamine
C
2-[(E)-2-phenylethenyl]pyridine
Conditions | Yield |
---|---|
With ammonium chloride; lithium diisopropyl amide 1.) THF, -75 deg C 2.) -75 deg C, 1 h and room temp. 2 h; Yield given. Multistep reaction; |
Conditions | Yield |
---|---|
With sodium hydroxide; formic acid; water; sodium chloride In acetonitrile at 25℃; Rate constant; Mechanism; |
Conditions | Yield |
---|---|
With C31H26F6N4O2 In Hexafluorobenzene for 3h; | 100% |
Trimethylsilanol
phenylsilane
1,1,1,5,5,5-hexamethyl-3-phenyl-trisiloxane
Conditions | Yield |
---|---|
With C40H36FeN2P2 In tetrahydrofuran at 20℃; for 12h; Reagent/catalyst; Solvent; | 99% |
With [FeCl2(2,9-bis((diphenylphosphino)methyl)-1,10-phenanthroline)]; sodium triethylborohydride In tetrahydrofuran at 20℃; for 12h; Catalytic behavior; Inert atmosphere; Schlenk technique; Glovebox; | > 99 %Spectr. |
Conditions | Yield |
---|---|
In hexane byproducts: (Me3Si)2NH; (Ar); addn. of soln. of Me3SiOH (2 equiv.) in hexane to soln. of ((Me3Si)2N)2Fe (1 equiv.) in hexane; pptn., filtration, washing with hexane, removal of solvent in vac. at 50°C, elem. anal.; | 98% |
Trimethylsilanol
2-phenylheptamethyltrisilane
A
1,1,1,3-tetramethyl-3-phenyldisiloxane
B
3-phenyl-1,1,1,3,5,5,5-heptamethyltrisiloxane
Conditions | Yield |
---|---|
Mechanism; Irradiation; other silanes; | A 96% B 4% |
Trimethylsilanol
[1-(2-aminoethyl)-3-aminopropyl]trimethoxysilane
1-[3-N-(2-aminoethyl)aminopropyl]-1,1-dimethoxy-3,3,3-trimethyldisiloxane
Conditions | Yield |
---|---|
at 20℃; | 95.5% |
Conditions | Yield |
---|---|
In pentane | 95% |
Trimethylsilanol
Conditions | Yield |
---|---|
With pyridine In toluene at 25℃; for 24h; | 95% |
Conditions | Yield |
---|---|
With chlorobis(cyclooctene)-iridium(I) dimer In toluene at 20℃; for 3h; Inert atmosphere; | 94% |
With [FeCl2(2,9-bis((diphenylphosphino)methyl)-1,10-phenanthroline)]; sodium triethylborohydride In tetrahydrofuran at 20℃; for 12h; Catalytic behavior; Inert atmosphere; Schlenk technique; Glovebox; | 77 %Spectr. |
Trimethylsilanol
Conditions | Yield |
---|---|
In benzene 70°C (3 d); evapn. (reduced pressure); elem. anal.; | 93% |
Trimethylsilanol
dimethoxymethylstibane
methyl-bis(trimethylsiloxy)stibane
Conditions | Yield |
---|---|
In dichloromethane byproducts: MeOH; Ar; org. compd. soln. addn. dropwise to Sb-compd. soln. at room temp., stirring for 30 min, solvent vac. removal; elem. anal.; | 93% |
Conditions | Yield |
---|---|
In benzene at 60℃; for 72h; Inert atmosphere; Schlenk technique; Glovebox; | 93% |
Trimethylsilanol
2-methyl a l l y l t r i s-(trimethylsiloxy)silane
1,1,1,5,5,5-hexamethyl-3,3-bis(trimethylsiloxy)trisiloxane
Conditions | Yield |
---|---|
With Amberlyst-15 In acetonitrile at 20℃; for 1h; Solvent; chemoselective reaction; | 93% |
Conditions | Yield |
---|---|
Heating; | 92.5% |
Conditions | Yield |
---|---|
In toluene Addn. of trimethylsilanol soln. to soln. of Pr-complex, heating at 90°c for 1.5-2 h.; Evapn. in vac., addn. of hexane, crystn. at -30 to -50°C, elem. anal.; | A 84.6% B 90.3% |
Trimethylsilanol
Conditions | Yield |
---|---|
In pentane Me3SiOH was added rapidly under an inert atmosphere to a pentane soln. of (Al(O-i-Pr)2(acac))2; volatiles were removed, residue was recrystd. from pentane; elem. anal.; | 90% |
Conditions | Yield |
---|---|
In pentane Me3SiOH was added rapidly under an inert atmosphere to a pentane soln. of (Al(O-i-Pr)2(etac))2; volatiles were removed, residue was vac. distilled (130°C, >0.1 mm Hg); several isomers are observed in the NMR spectra; elem. anal.; | 90% |
Conditions | Yield |
---|---|
In toluene byproducts: cyclopentadiene; (under exclusion of air and moisture) to a soln. of (C5H5)2Sn in toluene is added Me3SiOH, soln. is warmed (2 h); soln. is evapd. under vac., elem. anal.; | 90% |
In not given |
Trimethylsilanol
Conditions | Yield |
---|---|
In toluene at -40 - 25℃; for 16h; Schlenk technique; | 90% |
Trimethylsilanol
trifluoromethylsulfonic anhydride
trimethylsilyl trifluoromethanesulfonate
Conditions | Yield |
---|---|
Stage #1: Trimethylsilanol; trifluoromethylsulfonic anhydride at 45℃; for 3.5h; Stage #2: With chloro-trimethyl-silane at 15℃; for 2.5h; Temperature; | 89% |
Trimethylsilanol
phenylsilane
A
1,1,1,5,5,5-hexamethyl-3-phenyl-trisiloxane
Conditions | Yield |
---|---|
With [FeCl2(2,9-bis((diphenylphosphino)methyl)-1,10-phenanthroline)]; sodium triethylborohydride In tetrahydrofuran at 20℃; for 12h; Reagent/catalyst; Solvent; | A 88.9% B 8.1% |
With nickel(II) bis(2,2,6,6-tetramethylheptane-3,5-dionate) In dichloromethane at 20℃; for 6.5h; Schlenk technique; Inert atmosphere; | A 25% B 50% |
With [FeBr2(2,9-bis((dicyclohexylphosphino)methyl)-1,10-phenanthroline)]; sodium triethylborohydride In tetrahydrofuran at 20℃; for 12h; Catalytic behavior; Reagent/catalyst; Inert atmosphere; Schlenk technique; Glovebox; | A 20 %Spectr. B 28 %Spectr. |
Trimethylsilanol
3-(trimethoxysilyl)propan-1-amine
1,1,1-trimethyl-3,3-dimethoxy-3-(3-aminopropyl)disiloxane
Conditions | Yield |
---|---|
at 20℃; for 3h; | 88.8% |
Trimethylsilanol
3-aminopropyltriethoxysilane
(3-aminopropyl)tris(trimethylsiloxy)silane
Conditions | Yield |
---|---|
Heating; | 88% |
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