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Trimethylsilane CAS NO.993-07-7 Application:Trimethylsilane CAS NO.993-07-7
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Trimethylsilane CAS NO.993-07-7Appearance:detailed see specifications Storage:Keep in dry and cool place Package:according to clients requirement Application:It is an important raw material and intermediate used in Organic Synthesis,Pharmaceuticals,
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Conditions | Yield |
---|---|
aluminum (III) chloride; lithium chloride In xylene at 80℃; for 0.166667h; Product distribution / selectivity; | 95.4% |
In toluene at 80℃; for 0.166667h; Product distribution / selectivity; | 92.5% |
lithium tetrachloroaluminate In toluene at 80℃; for 0.166667h; Product distribution / selectivity; | 92.7% |
Conditions | Yield |
---|---|
With hydrogen; [RuCl(η2-H2)(dppe)2]OTf In 1,2-dichloro-ethane at 50℃; under 760 Torr; for 48h; Product distribution; Further Variations:; Catalysts; | A n/a B 95% |
With hydrogen; [RuCl(dppe)2]OTf In benzene-d6 at 50℃; for 3h; Hydrogenolysis; Title compound not separated from byproducts; |
trimethylsilyl trifluoromethanesulfonate
trimethylsilan
Conditions | Yield |
---|---|
With C35H37IrN2P(1+)*C24BF20(1-); hydrogen; N-ethyl-N,N-diisopropylamine; triphenylphosphine In (2)H8-toluene at 20℃; under 760.051 Torr; for 4.5h; | 94% |
With [N-[4-(dimethylamino)phenyl]-2-pyridinecarboxamidato](pentamethylcyclopentadienyl)iridium trifluorometanesulfonate; hydrogen; N-ethyl-N,N-diisopropylamine In benzene-d6 at -196 - 60℃; under 3040.2 Torr; for 48h; | 95 %Spectr. |
With 1,4-bis-(trimethylsilyl)benzene; [N-[4-(dimethylamino)phenyl]-2-pyridinecarboxamidato](pentamethylcyclopentadienyl)iridium trifluorometanesulfonate; hydrogen; N-ethyl-N,N-diisopropylamine In benzene-d6 at 60℃; under 3040.2 Torr; for 48h; Reagent/catalyst; | 95 %Spectr. |
With [Ru(H)2CO(HN(CH2CH2P(iPr)2)2)]; hydrogen; triethylamine In benzene-d6 at 20℃; under 3000.3 Torr; for 18h; Catalytic behavior; Pressure; | 85 %Spectr. |
Conditions | Yield |
---|---|
With lithium aluminium tetrahydride; calcium hydride In diethylene glycol dimethyl ether for 11h; Inert atmosphere; Reflux; | 92% |
With lithium aluminium tetrahydride In toluene at 80℃; for 0.916667h; Inert atmosphere; | 82% |
With lithium aluminium tetrahydride In hexane at 40℃; for 3h; Irradiation; ultrasonic irradiation; | 80% |
C10H26OSi3
A
trimethyl(prop-1-ynyl)silane
B
trimethylsilan
C
Methoxytrimethylsilane
D
ethenyltrimethylsilane
Conditions | Yield |
---|---|
at 650℃; under 0.0001 Torr; | A 18% B n/a C 87% D 28% |
1,1,2,2-tetramethyldisilane
A
chloro-trimethyl-silane
B
dimethylmonochlorosilane
C
dimethylsilane
D
trimethylsilan
Conditions | Yield |
---|---|
With tetra-n-butylphosphonium chloride at 180℃; for 17h; Sealed tube; | A 2% B 4% C 87% D 7% |
Conditions | Yield |
---|---|
With 2-methylimidazole; tetra-n-butylphosphonium chloride at 175℃; for 89h; Sealed tube; | A 85% B 11% |
Dimethylphenylsilane
3-dimethylaminophenyl-trimethylsilane
A
trimethylsilan
Conditions | Yield |
---|---|
With tris(pentafluorophenyl)borate In chlorobenzene at 100℃; for 24h; Mechanism; Glovebox; Inert atmosphere; chemoselective reaction; | A n/a B 81% |
A
trimethylsilan
Conditions | Yield |
---|---|
With trimethylphenylsilane; tris(pentafluorophenyl)borate In chlorobenzene at 100℃; for 24h; Mechanism; Glovebox; chemoselective reaction; | A n/a B 78% |
2-cyclopropyl-2-methoxyhexamethyltrisilane
A
trimethyl(prop-1-ynyl)silane
B
trimethylsilan
C
Methoxytrimethylsilane
D
ethenyltrimethylsilane
Conditions | Yield |
---|---|
at 590℃; under 0.0001 Torr; | A 18% B n/a C 72% D 27% |
Conditions | Yield |
---|---|
With lithium aluminium tetrahydride In hexane at 40℃; for 3h; Irradiation; ultrasonic irradiation; | 70% |
Conditions | Yield |
---|---|
In hexane combining Ph2PH soln. with (Me3Si)Al.Et2O soln. at -78 °C, warming to 25 °C, evapn. after several h, redissolution of resulting oil in hexane, refluxing for 48 h ; under inert gas; cooling, decantation, washing of residue with hexane twice (improvement of yield by collection of decanted liquids and filtrates and crystn. from hexane at -20 °C) ; elem. anal.; | A 65% B n/a |
(C6H5)3PNP(C6H5)3(1+)*(CO)4FeSi(CH3)3(1-)=(C6H5)3PNP(C6H5)3[(CO)4FeSi(CH3)3]
trifluorormethanesulfonic acid
A
dihydridotetracarbonyliron
B
trimethylsilan
C
(CO)4FeH(Si(CH3)3)
Conditions | Yield |
---|---|
With Hexamethylbenzene In dichloromethane-d2 mixt. of Fe-complex, hexamethylbenzene standard (molar ratio 1:0.25) and CD2Cl2 cooled to -40°C, 1 equiv of CF3SO3H added; without isolation; monitored by (1)H NMR spectra; | A n/a B 0% C 65% |
Conditions | Yield |
---|---|
With N,N,N,N,N,N-hexamethylphosphoric triamide; borane-THF In tetrahydrofuran at 20℃; for 48h; | 64% |
trimethylsilyl iodide
trimethylsilan
Conditions | Yield |
---|---|
With C35H37IrN2P(1+)*C24BF20(1-); hydrogen; N-ethyl-N,N-diisopropylamine; triphenylphosphine In (2)H8-toluene at 20℃; under 760.051 Torr; for 432h; | 61% |
With [N-[4-(dimethylamino)phenyl]-2-pyridinecarboxamidato](pentamethylcyclopentadienyl)iridium trifluorometanesulfonate; hydrogen; N-ethyl-N,N-diisopropylamine In benzene-d6 at -196 - 60℃; under 3040.2 Torr; for 48h; Mechanism; Reagent/catalyst; | 91 %Spectr. |
With 1,4-bis-(trimethylsilyl)benzene; [N-[4-(dimethylamino)phenyl]-2-pyridinecarboxamidato](pentamethylcyclopentadienyl)iridium trifluorometanesulfonate; hydrogen; N-ethyl-N,N-diisopropylamine In benzene-d6 at 60℃; under 3040.2 Torr; for 48h; Reagent/catalyst; | 91 %Spectr. |
1,1-Dimethyl-2,3-bis-trimethylsilanyl-[1,3]disiletane
2,3-dimethyl-buta-1,3-diene
A
trimethylsilan
B
2,2,6,7-Tetramethyl-1-trimethylsilanyl-2,4-disila-spiro[3.4]oct-6-ene
Conditions | Yield |
---|---|
In benzene at 450℃; in a vertical Pyrex tube packed with Pyrex chips; | A n/a B 57% |
C10H26OSi3
A
trimethyl(prop-1-ynyl)silane
B
trimethylsilan
C
Methoxytrimethylsilane
D
ethenyltrimethylsilane
Conditions | Yield |
---|---|
at 650℃; under 0.0001 Torr; | A 17% B n/a C 55% D 16% |
trimethylsilyldiethylgermane
triethylgermylcesium
A
pentaethyldigermane
B
trimethylsilan
C
Triethylgerman
D
hexaethyldigermane
E
trimethylsilyltriethylgermane
Conditions | Yield |
---|---|
With water In benzene byproducts: Me3SiGeEt2H; Mixt. of Me3SiGe(H) and Et3GeCs in benzene is stirred for 72 h at 25°C.; After hydrolysis mixt. is examined by GLC, gas chromy. and mass spectrometry.; | A 53.2% B 7.7% C 18.9% D 4.4% E 3% |
1,1,1,2,2,2-hexamethyldisilane
N-Benzylidenemethylamine
A
trimethylsilan
Conditions | Yield |
---|---|
tris(dibenzylideneacetone)diplatinum(0); 3 P(OCH2)3CEt In toluene at 160℃; for 120h; | A n/a B 23% C 52% |
tris(dibenzylideneacetone)diplatinum(0); 3 P(OCH2)3CEt In toluene at 160℃; for 120h; Product distribution; Mechanism; var. of ratio imine:silane, time; | A n/a B 38% C 27% |
tris(dibenzylideneacetone)diplatinum(0); 3 P(OCH2)3CEt In toluene at 160℃; for 120h; Yield given. Yields of byproduct given; |
phenyl(trimethylsilyl)phosphine
A
{((CH3)3Si)2AlP(C6H5)Si(CH3)3}2
B
trimethylsilan
Conditions | Yield |
---|---|
In hexane combining (Me3Si)PhPH soln. with (Me3Si)Al.Et2O soln. at -78 °C, warming to 25 °C, stirring 4 h, evapn. of solvent, redissolution of resulting oil in hexane, refluxing for 48 h ; under inert gas; concn., decantation, washing of residue with cold hexane (improvement of yield by collection of decanted liquids and filtrates and crystn. from hexane at -20 °C), drying in vacuo; | A 50% B n/a |
1,1,1,3,3,3-hexamethyltrisilane
A
trimethylsilan
B
1-methyl-1,3-disilacyclobutane
Conditions | Yield |
---|---|
at 750℃; under 0.05 Torr; | A n/a B 45% |
1,2-dichlorotetramethylsilane
A
chloro-trimethyl-silane
B
dimethylmonochlorosilane
C
trimethylsilan
D
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With tetra-n-butylphosphonium chloride at 220℃; for 24h; Sealed tube; | A 16% B 30% C 5% D 44% |
bis(trimethylsilyl)mercury
bis(trifluoromethyl)phosphine
B
trimethylsilan
C
trimethylsilyl fluoride
D
Trimethylsilyl-bis-(trifluormethyl)-phosphin
Conditions | Yield |
---|---|
A n/a B n/a C n/a D 40% E n/a |
bis(trimethylsilyl)mercury
bis(trifluoromethyl)phosphinic chloride
A
chloro-trimethyl-silane
B
trimethylsilan
C
bis(trifluoromethyl)chlorophosphine
D
Bistrifluormethyltrimethylsiloxyphosphinoxid
Conditions | Yield |
---|---|
warming up from -84°C to 20°C; | A n/a B n/a C n/a D 38% |
warming up from -84°C to 20°C; | A n/a B n/a C n/a D 38% |
(dimethylphenylgermyl)trimethylsilane
A
1,1,1,2,2,2-hexamethyldisilane
B
trimethylsilan
C
trimethylphenylsilane
D
dimethylphenylgermane
E
1,1,2,2-tetramethyl-1,2-diphenyldigermane
Conditions | Yield |
---|---|
With methanol In benzene Irradiation (UV/VIS); irradiation of catenate in benzene containing an excess of methanol with a 110 W low pressure Hg arc lamp at room temp. under Ar for 1-4 h; identification by GC and GC-MS; | A <1 B n/a C 37% D <1 E <1 |
In cyclohexane Irradiation (UV/VIS); irradiation of catenate in cyclohexane with a 110 W low pressure Hg arc lamp at room temp. under Ar for 1-4 h; identification by GC and GC-MS; | A <1 B 4% C 24% D <1 E <1 |
triethylsilane
2-(pentamethyldisilanyl)furan
A
2-furyltrimethylsilane
B
trimethylsilan
C
triethyldimethyldisilane
Conditions | Yield |
---|---|
In cyclohexane at 19.9℃; Rate constant; Irradiation; | A 1% B 35% C 2% |
1,2-dichlorotetramethylsilane
A
chloro-trimethyl-silane
B
dimethylmonochlorosilane
C
dimethylsilane
D
trimethylsilan
E
dichloro[(chlorodimethylsilyl)methyl]methylsilane
F
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With n-Butyl chloride; tributylphosphine at 220℃; for 70h; Sealed tube; | A 13% B 30% C 2% D 2% E 18% F 35% |
Conditions | Yield |
---|---|
from -196°C to 135°C, 48 h at 135°C; fractionated by trap-to-trap destillation; | A 33.4% B n/a C n/a |
chloro-trimethyl-silane
1,1-Dilithioethan
A
trimethylsilan
B
1,1-bis(trimethylsilyl)ethane
C
ethenyltrimethylsilane
Conditions | Yield |
---|---|
In tetrahydrofuran for 24h; Ambient temperature; | A 19% B 30% C n/a |
1,1,2,2-tetramethyl-1,2-disilacyclohex-4-ene
A
1,1-Dimethylsilacyclopent-3-en
B
trimethylsilan
C
1,1-dimethyl-1,3-disilacyclobutanes
D
1,3-dimethyl-1,3-disilacyclobutane
Conditions | Yield |
---|---|
at 750℃; under 0.01 Torr; Further byproducts given; | A 25% B 0.5% C 16% D 9% |
trimethylsilan
A
Trimethyl-((E)-2-methyl-but-1-enyl)-silane
Conditions | Yield |
---|---|
In benzene-d6 for 2h; Irradiation; | A 100% B n/a |
5-tert-butoxy-7-(tert-butyl-dimethyl-silanyloxy)-3-hydroxy-4-methyl-bicyclo[2.2.2]octan-2-one
trimethylsilan
5-tert-butoxy-7-(tert-butyl-dimethyl-silanyloxy)-4-methyl-3-(trimethyl-silanyloxy)-bicyclo[2.2.2]octan-2-one
Conditions | Yield |
---|---|
With 1H-imidazole In dichloromethane at 0 - 20℃; for 1h; | 100% |
trimethylsilan
A
cyclopentadienyl iron(II) dicarbonyl dimer
Conditions | Yield |
---|---|
In benzene-d6 Irradiation (UV/VIS); Fe complex and trimethylsilane were photolyzed (black light bulb, emission max. 366 nm) for 2 h; monitored by NMR, 4,4'-dimethylbiphenyl as internal standard; | A 53% B 100% C 37% |
Conditions | Yield |
---|---|
In benzene inert atmosphere; evapn. (reduced pressure); detd. by NMR spectroscopy; | 100% |
Conditions | Yield |
---|---|
In tetrahydrofuran N2-atmosphere; -10°C (0.25 - 0.5 h); detd. by (11)B NMR spectroscopy; | 100% |
Conditions | Yield |
---|---|
In tetrahydrofuran N2-atmosphere; stirring (15 min); detd. by (11)B NMR spectroscopy; | 100% |
Conditions | Yield |
---|---|
In tetrahydrofuran N2-atmosphere; -10°C (0.25 - 0.5 h); detd. by (11)B NMR spectroscopy; | 100% |
Conditions | Yield |
---|---|
In tetrahydrofuran N2-atmosphere; -10°C (0.25 - 0.5 h); detd. by (11)B NMR spectroscopy; | 100% |
Conditions | Yield |
---|---|
In tetrahydrofuran N2-atmosphere; -10°C (0.25 - 0.5 h); detd. by (11)B NMR spectroscopy; | 100% |
Conditions | Yield |
---|---|
In tetrahydrofuran N2-atmosphere; -10°C (0.25 - 0.5 h); detd. by (11)B NMR spectroscopy; | 100% |
trimethylsilan
Ru(CO)2(CH3P(C(CH3)3)2)2
cis,cis,trans-Ru(H)2(CO)2(P((t)Bu)2Me)2
Conditions | Yield |
---|---|
15 h; | 100% |
In benzene-d6 (Ar); room temp. (2 days); |
trimethylsilan
Conditions | Yield |
---|---|
In methanol | 100% |
Conditions | Yield |
---|---|
In not given room temp.; | 99% |
trimethylsilan
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: (C6H5)3CH; B-compd. treated in the fitration apparatus with (CH3)3SiH; washed with (CH3)3SiH, sublimed at 110°C under high vac. (p<1E-2 mbar); | 99% |
trimethylsilan
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: (C6H5)3CH; B-compd. treated in the fitration apparatus with (CH3)3SiH; washed with (CH3)3SiH, sublimed at 110°C under high vac. (p<1E-2 mbar); | 99% |
trimethylsilan
A
3-phenyl-propionaldehyde
D
Propylbenzene
E
trimethyl(3-phenylpropoxy)silane
Conditions | Yield |
---|---|
In benzene-d6 react. of Fe complex and HSiMe3 in benzene, 90°C, 9 h; yields detd. by (1)H-NMR (C5H5Fe(CO)H(SiMe3)2; elem. anal.) and GL-chromy. (other products); | A 0% B 91% C 10% D 0% E 98% |
trimethylsilan
A
cyclopentadienyl iron(II) dicarbonyl dimer
D
trimethyl(3-phenylpropoxy)silane
Conditions | Yield |
---|---|
In benzene-d6 under Ar; 90°C, 9 h; not isolated; NMR; | A 10% B 90% C 10% D 98% |
[((Me)Cp)2MoH2]
trimethylsilan
Conditions | Yield |
---|---|
In benzene Irradiation (UV/VIS); soln. of starting materials in benzene is photolyzed (350 nm, N2) for 36 h at 10°C; removal of volatiles under vac., purified by sublimation (60°C 1E-3 Torr), elem. anal.; | 98% |
trimethylsilan
Conditions | Yield |
---|---|
In methanol byproducts: CH4, CH3OSi(CH3)3; at room temp. for 5 h; detd. by NMR; | 98% |
Conditions | Yield |
---|---|
In benzene inert atmosphere; freezing, evacuation, warming (1 d, room temp.), colorchange; removal of volatile materials (vac.), vac. (overnight), extn. (pentane),filtration, concn.(vac.), cooling (-30°C); elem. anal.; | 97% |
Conditions | Yield |
---|---|
96.9% |
Conditions | Yield |
---|---|
150-180°C; sublimation at 50°C; | 96.5% |
150-180°C; sublimation at 50°C; | 96.5% |
trimethylsilan
bis(trifluoromethyl)ketene
A
(1-hydrohexafluoroisobutenyloxy)trimethylsilane
C
trimethylsilyl 2-hydrohexafluoroisobutyrate
Conditions | Yield |
---|---|
With dihydrogen hexachloroplatinate at -78 - 40℃; Title compound not separated from byproducts; | A 96% B 0.4 % Spectr. C 0.2 % Spectr. |
trimethylsilan
Tris(phenylseleno)borane
A
phenyl trimethylsilyl selenide
B
diborane
Conditions | Yield |
---|---|
In neat (no solvent) excess of SiMe3H, 60°C (closed ampoule); low-temp. fractionation (traps at -23, -126 and -196°C); | A 96% B n/a |
trimethylsilan
1,4-bis(trimethylsilyl)-1,3-butadiyne
1,1,3,4-tetrakis(trimethylsilyl)-1,2-butadiene
Conditions | Yield |
---|---|
RhCl(PPh3)3 at 100℃; for 19h; | 95% |
Conditions | Yield |
---|---|
With sodium hydroxide; ethanol at 60℃; for 4h; | 95% |
trimethylsilan
methacrylic acid methyl ester
acetone
A
1-methoxy-2-methyl-1-trimethylsiloxy-1-propene
B
3-trimethylsiloxy-2,2,3-trimethylbutyrate
Conditions | Yield |
---|---|
rhodium(III) chloride Ambient temperature; | A 5% B 95% |
With BTH; rhodium(III) chloride Ambient temperature; | A 5% B 95% |
rhodium(III) chloride Mechanism; Ambient temperature; other catalysts; |
trimethylsilan
(E)-4-bromo-4'-methoxystilbene
Conditions | Yield |
---|---|
Stage #1: (E)-4-bromo-4'-methoxystilbene With n-butyllithium In diethyl ether at 3℃; for 2h; Metallation; Stage #2: trimethylsilan With water at -40 - 20℃; Substitution; hydrolysis; | 95% |
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