2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane
A
octamethylcyclotetrasiloxane
B
decamethylcyclopentasiloxane
D
copoly(dimethylsiloxane/divinylsiloxane), prepared by anionic polymerization of 2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane; monomer(s): 2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxanecopoly(dimethylsiloxane/divinylsiloxane), prepared by anionic polymerization of 2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane; monomer(s): 2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane
Conditions | Yield |
---|---|
With P4-t-Bu at 80℃; for 0.333333h; Further byproducts given; | A n/a B n/a C n/a D 80% |
dimethyl sulfoxide
dimethylsilicon dichloride
A
chloro-methylsulfanyl-methane
B
Hexamethylcyclotrisiloxane
C
octamethylcyclotetrasiloxane
D
decamethylcyclopentasiloxane
E
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
at 0℃; Mechanism; other diorganyldichlorosilanes; reactions in the presence of hexamethyldisiloxane, trimethylchlorosilane, tetramethoxysilane, tetraethoxysilane; | A 79% B 48% C 35% D 12% E 5% |
dimethyl sulfoxide
A
chloro-methylsulfanyl-methane
B
Hexamethylcyclotrisiloxane
C
octamethylcyclotetrasiloxane
D
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
With dimethylsilicon dichloride at 0℃; Further byproducts given; | A 79% B 48% C 35% D 5% |
phenyltrimethylsilyl ether
A
decamethylcyclopentasiloxane
B
dimethyl-diphenoxy-silane
C
C13H26O3Si3
Conditions | Yield |
---|---|
With gallium(III) iodide at 175 - 180℃; for 3h; Yield given; Further byproducts given. Title compound not separated from byproducts; | A n/a B 79% C n/a D n/a |
diiododimethylsilane
A
octamethylcyclotetrasiloxane
B
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
With 3,3-dimethyl-butan-2-one; zinc In dichloromethane for 0.166667h; Ambient temperature; | A 60% B 18% |
dimethylsilicon dichloride
A
Hexamethylcyclotrisiloxane
B
octamethylcyclotetrasiloxane
C
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
With pyridine; sodium hydrogencarbonate In ethyl acetate at 20℃; for 3h; | A 60% B 20% C 15% |
With water Autoclave; | A 51.3% B 29.2% C 8% |
With composite catalyst at 150℃; under 675.068 Torr; for 0.5h; Temperature; Pressure; Reagent/catalyst; Large scale; | A n/a B 43% C n/a |
dimethylsilicon dichloride
A
Hexamethylcyclotrisiloxane
B
octamethylcyclotetrasiloxane
C
decamethylcyclopentasiloxane
D
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With dimethyl sulfoxide at 0℃; Further byproducts given; | A 48% B 35% C 12% D 5% |
With tetrahydrofuran; lithium at 40 - 45℃; for 1h; Yield given. Further byproducts given. Yields of byproduct given; | |
With hydrogenchloride In toluene at 20℃; for 4h; Yield given. Further byproducts given. Yields of byproduct given; |
dimethylsilicon dichloride
A
tetradecamethylcycloheptasiloxane
B
Hexamethylcyclotrisiloxane
C
octamethylcyclotetrasiloxane
D
decamethylcyclopentasiloxane
E
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With H2O In water slow addn. of 4l (CH3)2SiCl2 to 12l H2O at 15-20°C withorous stirring; further products;; distn.;; | A n/a B 0.5% C 42% D 6.7% E 1.6% |
With hydrogenchloride In toluene at 20℃; for 4h; Product distribution; diff. concentration of aq. HCl; diff. reaction time; other difunctional organochlorosilanes; | |
With H2O In diethyl ether; water addn. of (CH3)2SiCl2 to ether-H2O; further products;; distn.;; |
dimethylsilicon dichloride
A
octamethylcyclotetrasiloxane
B
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
With water at 15 - 20℃; Autoclave; | A 42% B 6.7% |
trimethyl phosphite
dimethylsilicon dichloride
A
methylene chloride
B
decamethylcyclopentasiloxane
C
dodecamethyl-cyclohexasiloxane
D
C7H21O6PSi3
E
C9H27O7PSi4
Conditions | Yield |
---|---|
at 20℃; for 10h; Inert atmosphere; | A n/a B 15% C 10% D 38% E 33% |
1,1,3,3-Tetramethyldisiloxane
A
tetradecamethylcycloheptasiloxane
B
octamethylcyclotetrasiloxane
C
decamethylcyclopentasiloxane
D
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With iodine In dichloromethane for 0.333333h; Heating; Further byproducts given; | A 14% B 26% C 21% D 15% |
Conditions | Yield |
---|---|
With hydrogenchloride |
Conditions | Yield |
---|---|
With water at 15 - 20℃; | |
With water Erhitzen der gebildeten nicht destillierbaren Produkte mit NaOH auf 230-240grad unter 1 mm; |
Hexamethylcyclotrisiloxane
A
tetradecamethylcycloheptasiloxane
B
octamethylcyclotetrasiloxane
C
decamethylcyclopentasiloxane
D
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With hydrogenchloride for 72h; Yield given. Yields of byproduct given. Title compound not separated from byproducts; |
1,1,3,3,5,5,7,7,9,9-decamethylpentasiloxane-1,9-diol
A
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
With trifluorormethanesulfonic acid In 1,4-dioxane at 35℃; Product distribution; Kinetics; var. of reagent, solvent; |
chloro(2-chloroethoxy)dimethylsilane
A
Hexamethylcyclotrisiloxane
B
octamethylcyclotetrasiloxane
C
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
With potassium Sodium at 280 - 300℃; under 0.1 - 1 Torr; Yield given. Yields of byproduct given; | |
With potassium Sodium In gaseous matrix at 280 - 320℃; under 0.1 - 1 Torr; Product distribution; |
Conditions | Yield |
---|---|
In benzene at 26.9℃; Equilibrium constant; |
dimethylsilicon dichloride
A
tetradecamethylcycloheptasiloxane
B
Hexamethylcyclotrisiloxane
C
octamethylcyclotetrasiloxane
D
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
With hydrogenchloride In toluene at 20℃; for 4h; Yield given. Further byproducts given. Yields of byproduct given; |
dimethylsilicon dichloride
A
tetradecamethylcycloheptasiloxane
B
Hexamethylcyclotrisiloxane
C
decamethylcyclopentasiloxane
D
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With hydrogenchloride In toluene at 20℃; for 4h; Yield given. Further byproducts given. Yields of byproduct given; |
dimethylsilicon dichloride
A
Hexamethylcyclotrisiloxane
B
octamethylcyclotetrasiloxane
C
decamethylcyclopentasiloxane
D
Tetradecamethylcycloheptasilan
E
decamethylcyclopentasilane
F
dodecamethylcyclohexasilane
Conditions | Yield |
---|---|
With tetrahydrofuran; lithium at 40 - 45℃; Product distribution; Mechanism; various temperature, various reactant ratios; |
A
Hexamethylcyclotrisiloxane
B
octamethylcyclotetrasiloxane
C
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
at 50℃; Product distribution; |
trimethylsilyl iodide
octamethylcyclotetrasiloxane
A
Octamethyltrisiloxane
B
decamethyltetrasiloxane
C
dodecamethylpentasiloxane
D
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
at 190℃; for 10h; Yield given; Further byproducts given. Yields of byproduct given. Title compound not separated from byproducts; |
octamethylcyclotetrasiloxane
A
Hexamethyldisiloxane
B
decamethylcyclopentasiloxane
C
tetradecamethylhexasiloxane
D
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With aluminium(III) iodide at 140 - 170℃; for 5h; Yield given; Title compound not separated from byproducts; | A 0.12 g B n/a C n/a D n/a |
1,3,5,7,9-pentachloro-1,3,5,7,9-pentamethylcyclopentasiloxane
methyllithium
A
octamethylcyclotetrasiloxane
B
decamethylcyclopentasiloxane
C
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
In diethyl ether at 0℃; Product distribution; other organometallic reagent and reaction conditions; |
dimethylsilicon dichloride
A
1,1,3,3-tetramethyl-1,3-dichlorodisiloxane
B
octamethylcyclotetrasiloxane
C
decamethylcyclopentasiloxane
D
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With sodium nitrate at 0℃; for 2h; Yield given; Further byproducts given. Yields of byproduct given. Title compound not separated from byproducts; |
dimethylsilicon dichloride
A
Octamethyltrisiloxane
B
decamethyltetrasiloxane
C
dodecamethylpentasiloxane
D
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
With sodium nitrate; 1,1,1,3,3,3-hexamethyl-disilazane at 65℃; for 2h; Yield given; Yields of byproduct given. Title compound not separated from byproducts; | |
With sodium nitrate; 1,1,1,3,3,3-hexamethyl-disilazane at 20℃; for 2h; Yield given; Further byproducts given. Yields of byproduct given. Title compound not separated from byproducts; |
dimethylsilicon dichloride
A
Octamethyltrisiloxane
B
decamethyltetrasiloxane
C
decamethylcyclopentasiloxane
D
tetradecamethylhexasiloxane
Conditions | Yield |
---|---|
With sodium nitrate; 1,1,1,3,3,3-hexamethyl-disilazane at 20℃; for 2h; Yield given; Further byproducts given. Yields of byproduct given. Title compound not separated from byproducts; |
dimethylsilicon dichloride
A
1,5-dichlorohexamethyltrisiloxane
B
octamethylcyclotetrasiloxane
C
decamethylcyclopentasiloxane
D
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With sodium nitrate at 0℃; for 2h; Yield given; Further byproducts given. Yields of byproduct given. Title compound not separated from byproducts; |
dimethylsilicon dichloride
A
1,7-dichlorooctamethyltetrasiloxane
B
octamethylcyclotetrasiloxane
C
decamethylcyclopentasiloxane
D
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With sodium nitrate at 0℃; for 2h; Yield given; Further byproducts given. Yields of byproduct given. Title compound not separated from byproducts; |
dimethylsilicon dichloride
A
octamethylcyclotetrasiloxane
B
1,9-dichlorodecamethylpentasiloxane
C
decamethylcyclopentasiloxane
D
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With sodium nitrate at 0℃; for 2h; Yield given; Further byproducts given. Yields of byproduct given. Title compound not separated from byproducts; |
decamethylcyclopentasiloxane
Li(dimethylsiloxane)5[Al(OC(CF3)3)4]
Conditions | Yield |
---|---|
In dichloromethane in Schlenk flask; mixed soln. concd. to saturation by stirring overnightat room temp.; stand for 1 d at -20°C; solvent removed under vac.; washed 3 times with n-hexane; elem. anal.; | 90% |
decamethylcyclopentasiloxane
diisobutylaluminium hydride
(H(CH3)2Si(OAl(CH2CH(CH3)2)2)2Si(CH3)2)2O
Conditions | Yield |
---|---|
In n-heptane stirring (3 d); evapn.; elem. anal.; | 84% |
decamethylcyclopentasiloxane
dimethylaluminum hydride
(CH3)2Si((OAl(CH3)2)2Si(CH3)2H)2
Conditions | Yield |
---|---|
In hexane stirring (4 d); evapn. (vac.); elem. anal.; | 68% |
tetrahydrofuran
decamethylcyclopentasiloxane
di(tert-butyl)aluminium hydride
HSi(CH3)2(OAl(C(CH3)3)2)2(Si(CH3)2O)2Al(C4H8O)(C(CH3)3)2
Conditions | Yield |
---|---|
In hexane stirring (3 d); filtering, recrystn. (hexane, -23°C); elem. anal.; | 66% |
1,1,3,3-Tetramethyldisiloxane
decamethylcyclopentasiloxane
1,1,3,3,5,5,7,7,9,9,11,11,13,13-tetradecamethylheptasiloxane
Conditions | Yield |
---|---|
With potassium hydroxide In water; toluene at 50℃; for 2h; | 61% |
1,1,3,3-tetraethoxy-1,3-dimethyldisiloxane
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
With cesium hydroxide at 100 - 130℃; | 58% |
1,1,3,3-Tetramethyldisiloxane
decamethylcyclopentasiloxane
A
iododimethylsilane
B
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With iodine | A n/a B 50% |
dimethylmonochlorosilane
decamethylcyclopentasiloxane
1,1,3,3,5,5,7,7,9,9,11,11,13,13-tetradecamethylheptasiloxane
Conditions | Yield |
---|---|
With water; sulfur dioxide In hexane Ambient temperature; | 45% |
decamethylcyclopentasiloxane
di(tert-butyl)aluminium hydride
(H(CH3)2Si(OAl(C(CH3)3)2)2Si(CH3)2)2O
Conditions | Yield |
---|---|
In hexane stirring (4 d); filtering, evapn. (vac.), recrystn. (pentane, -78°C);; | 44% |
decamethylcyclopentasiloxane
B
[((CH3)2SiO)7Ag](1+)*SbF6(1-)=[((CH3)2SiO)7Ag][SbF6]
Conditions | Yield |
---|---|
In sulfur dioxide Ag. compd treated with ligand (3.6:2.58 molar ratio), cooled to 77 K, SO2 added, warmed to room temp., pptd.; filtered off, MAS, NMR; | A n/a B 23% |
Conditions | Yield |
---|---|
In water at 20℃; Sonication; | 11% |
decamethylcyclopentasiloxane
2,7-dimethyl-2,3:7,8-diepoxy-5-silaspiro<4.4>nonane
2,2,4,4,8,8,10,10,12,12-decamethyl-2,4,6,8,10,12-hexasila-1,3,5,7,9,11,13-heptaoxaspiro<5.7>tridecane
Conditions | Yield |
---|---|
at 520℃; under 0.0001 Torr; for 3.25h; | 9% |
decamethylcyclopentasiloxane
A
octamethylcyclotetrasiloxane
B
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With dodecylbenzene-sulphonic acid; acetic acid at 120℃; for 4 - 24h; Product distribution / selectivity; | A 1.08% B 2.05% |
With toluene-4-sulfonic acid at 120℃; for 4 - 24h; Product distribution / selectivity; | A 0.56% B 0.59% |
With molecular sieve; dodecylbenzene-sulphonic acid at 20 - 120℃; for 0.014 - 24h; Product distribution / selectivity; | A 0% B 0% |
With molecular sieve at 20 - 120℃; for 0.017 - 24h; Product distribution / selectivity; | A 0.67% B 0.92% |
With acetic acid at 120℃; for 4 - 24h; Product distribution / selectivity; | A 0.1% B 0.48% |
Conditions | Yield |
---|---|
With toluene-4-sulfonic acid at 20 - 120℃; for 0.017 - 24h; Product distribution / selectivity; | 0.68% |
With dodecylbenzene-sulphonic acid at 20 - 120℃; for 0.017 - 24h; Product distribution / selectivity; | 0.74% |
With dodecylbenzene-sulphonic acid at 20 - 120℃; for 0.017 - 24h; Product distribution / selectivity; | 0.7% |
Conditions | Yield |
---|---|
With hydrogenchloride at 120℃; for 4 - 24h; Product distribution / selectivity; | 0.1% |
Conditions | Yield |
---|---|
With hydrogen fluoride; copper(II) sulfate |
dimethylmonochlorosilane
decamethylcyclopentasiloxane
1-chloro-1,1,3,3,5,5,7,7,9,9,11,11-dodecamethylhexasiloxane
Conditions | Yield |
---|---|
With water; pyrographite for 5h; Ambient temperature; Yield given; |
The Decamethylcyclopentasiloxane, with the cas register number 541-02-6, has its systematic name of 2,2,4,4,6,6,8,8,10,10-decamethyl-1,3,5,7,9,2,4,6,8,10-pentoxapentasilecane. This is a kind of liquid, and incompatible with strong oxidizing agents. And its product categories are various, including siloxanes;organics;si (classes of silicon compounds);si-o compounds;organometallic reagents;organosilicon. As to its usage, it is widely applied in the cosmetic and personal nursing care products.
The characteristics of Decamethylcyclopentasiloxane are as follows: (1)#H bond acceptors: 5; (2)Polar Surface Area: 46.15; (3)Index of Refraction: 1.427; (4)Molar Refractivity: 98.78 cm3; (5)Molar Volume: 384.3 cm3; (6)Polarizability: 39.16 ×10-24 cm3; (7)Surface Tension: 19 dyne/cm; (8)Density: 0.96 g/cm3; (9)Flash Point: 95.6 °C; (10)Enthalpy of Vaporization: 42.81 kJ/mol; (11)Boiling Point: 210 °C at 760 mmHg; (12)Vapour Pressure: 0.285 mmHg at 25°C; (13)Exact Mass: 370.093957; (14)MonoIsotopic Mass: 370.093957; (15)Topological Polar Surface Area: 46.2; (16)Heavy Atom Count: 20; (17)Complexity: 258.
Use of Decamethylcyclopentasiloxane: Decamethylcyclopentasiloxane reacts with chloro-dimethyl-silane to produce 1,13-Dihydrotetradecamethylheptasiloxan, with the following condition: reagent: H2O; catalytic agent: SO2; solution: hexane; yield: 45%; other condition: ambient temperature.
Production method of Decamethylcyclopentasiloxane: Diiodo-dimethyl-silane reacts with octamethyl-cyclotetrasiloxane to produce Decamethylcyclopentasiloxane, with the following condition: reagent: pinacolone, Zn; solution: CH2Cl2; reaction time: 10 min; yield: 60%; other condition: ambient temperature.
While dealing with Decamethylcyclopentasiloxane, you should be very cautious. For being a kind of harmful chemical, it may cause damage to health, and it has limited evidence of a carcinogenic effect. Therefore, you had better wear suitable protective clothing while using this chemical and remember not to breathe dust.
In addition, you could obtain the molecular structure by converting the following datas:
(1)SMILES:O1[Si](O[Si](O[Si](O[Si](O[Si]1(C)C)(C)C)(C)C)(C)C)(C)C;
(2)Std. InChI:InChI=1S/C10H30O5Si5/c1-16(2)11-17(3,4)13-19(7,8)15-20(9,10)14-18(5,6)12-16/h1-10H3 CopyCopied ;
(3)Std. InChIKey:XMSXQFUHVRWGNA-UHFFFAOYSA-N.
Below are the toxicity information of Decamethylcyclopentasiloxane:
Organism | Test Type | Route | Reported Dose (Normalized Dose) | Effect | Source |
---|---|---|---|---|---|
rabbit | LD50 | skin | > 16mL/kg (16mL/kg) | Toxicology and Applied Pharmacology. Vol. 28, Pg. 313, 1974. | |
rat | LC | inhalation | > 2700mg/m3/4H (2700mg/m3) | National Technical Information Service. Vol. OTS0572802, | |
rat | LD50 | oral | > 24134mg/kg (24134mg/kg) | National Technical Information Service. Vol. OTS0572801, |
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