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Cas:541-02-6
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inquiryDayi Chemical Group, famous for its high technology, is an important organosilane production base in North China and Shandong hi-tech enterprise. Specializing in the development, production, sales and service of organosiliane pro
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inquiryStock products, own laboratory Stock products, own laboratory Product number 22474 English Name Decamethylcyclopentasiloxane CAS Number 541-02-6 Purity 9
Cas:541-02-6
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inquiryItems Standard Test Result Appearance Colorless Transparent fluid Colorless Transparent fluid Odor
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inquiryFactory supply Decamethylcyclopentasiloxane Cas 541-02-6 with best purity Company profile Wuhan Fortuna Chemical Co.,Ltd established in 2006, is a big integrative chemical enterprise being engaged in Pharmaceutical & its intermediates, Food/
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inquiryZorui combines R&D, production and sales into its operations, While continuously providing high-quality raw materials, we also provide and optimize technical solutions for customers to achieve mutual benefit. We adhere to the "quality, integ
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Min.Order:1 Kilogram
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Cas:541-02-6
Min.Order:1 Metric Ton
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Type:Manufacturers
inquiryOur company was built in 2009 with an ISO certificate. In the past 5 years, we have grown up as a famous fine chemicals supplier in China and we had established stable business relationships with Samsung,LG,Merck,Thermo Fisher Scientific and so o
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Min.Order:1 Gram
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inquiryWith our good experience, we offer detailed technical support and advice to assist customers. We communicate closely with customers to establish their quality requirements. Consistent Quality Our plant has strict quality control in each manufacturin
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Type:Trading Company
inquiryWITH US,YOUR MONEY IN SAFE,YOUR BUSINESS IN SAFE 1)Quick Response Within 12 hours; 2)Quality Guarantee: All products are strictly tested by our QC, confirmed by QA and approved by third party lab in China, USA, Canada, Germany, UK, Italy, France et
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inquiry1. Product advantages ♦ High purity, all above 98.5%, no impurities after dissolution ♦ We will test each batch to ensure quality ♦ OEM and private brand services designed for free ♦ Various cap colors available ♦ W
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inquiryWe are the manufacturers and suppliers of API in China, and warehouse in Germany and USA of California, which can quickly and safely deliver to your address 1.High quality and competitive price. 2.Free sample for your evaluation. 3.Promptly delivery
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Min.Order:10 Gram
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Type:Trading Company
inquiryWuhan hanweishi Pharmchem Co., Ltd(Hanways chempharm) is a specialized company concentrating on the R&D, production, marketing and technical service of APIs and pharmaceutical intermediates. The leading products range are APIs, Hormones, Peptides
Cas:541-02-6
Min.Order:100 Kilogram
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Type:Trading Company
inquiryPacking: According to customer requirements Delivery time: In stock or depands Port of shipment: Ningbo/Shanghai/Qingdao OEM/ODM:Welcome Sample:We can offer our existing samples at once Appearance:Colorless liquid / Refer to COA Storage:Store b
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Min.Order:1 Kilogram
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Type:Trading Company
inquiryAbout Our Group Since 1996 when our factory was put into production to year of 2020, our group has successively invested in more than 52 factories with shares and subordinates.We focus on manufacture Pharm & c
Cas:541-02-6
Min.Order:500 Kilogram
FOB Price: $1.0 / 2.0
Type:Lab/Research institutions
inquiryBeluga chemical professional supply Decamethylcyclopentasiloxane Why choose Beluga chemical 1. Beluga Chemical has a professional RESEARCH and development team and strong technical force to ensure technical support and research capabilities. 2. M
Cas:541-02-6
Min.Order:1 Kiloliter
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Type:Lab/Research institutions
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Min.Order:1 Kilogram
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Cas:541-02-6
Min.Order:10 Gram
Negotiable
Type:Trading Company
inquiryFactory supply Decamethylcyclopentasiloxane CAS:541-02-6 Specification Item Specification Appearance Clear Colorless Liquid Assay 98%min Density 0.958 g/mL at 25 °C (lit.) Boiling Poin
Cas:541-02-6
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Type:Other
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Min.Order:100 Kilogram
Negotiable
Type:Trading Company
inquiryHenan Wentao Chemical Product Co.,Ltd is Located in Zhengzhou High-tech Development Zone with import and export license, We passed ISO 9001:2008 as well, Henan Wentao has developed more than 1000 compounds, which are widely used in the fields of prod
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Type:Lab/Research institutions
inquiry2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane
A
octamethylcyclotetrasiloxane
B
decamethylcyclopentasiloxane
D
copoly(dimethylsiloxane/divinylsiloxane), prepared by anionic polymerization of 2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane; monomer(s): 2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxanecopoly(dimethylsiloxane/divinylsiloxane), prepared by anionic polymerization of 2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane; monomer(s): 2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane
Conditions | Yield |
---|---|
With P4-t-Bu at 80℃; for 0.333333h; Further byproducts given; | A n/a B n/a C n/a D 80% |
dimethyl sulfoxide
dimethylsilicon dichloride
A
chloro-methylsulfanyl-methane
B
Hexamethylcyclotrisiloxane
C
octamethylcyclotetrasiloxane
D
decamethylcyclopentasiloxane
E
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
at 0℃; Mechanism; other diorganyldichlorosilanes; reactions in the presence of hexamethyldisiloxane, trimethylchlorosilane, tetramethoxysilane, tetraethoxysilane; | A 79% B 48% C 35% D 12% E 5% |
dimethyl sulfoxide
A
chloro-methylsulfanyl-methane
B
Hexamethylcyclotrisiloxane
C
octamethylcyclotetrasiloxane
D
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
With dimethylsilicon dichloride at 0℃; Further byproducts given; | A 79% B 48% C 35% D 5% |
phenyltrimethylsilyl ether
A
decamethylcyclopentasiloxane
B
dimethyl-diphenoxy-silane
C
C13H26O3Si3
Conditions | Yield |
---|---|
With gallium(III) iodide at 175 - 180℃; for 3h; Yield given; Further byproducts given. Title compound not separated from byproducts; | A n/a B 79% C n/a D n/a |
diiododimethylsilane
A
octamethylcyclotetrasiloxane
B
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
With 3,3-dimethyl-butan-2-one; zinc In dichloromethane for 0.166667h; Ambient temperature; | A 60% B 18% |
dimethylsilicon dichloride
A
Hexamethylcyclotrisiloxane
B
octamethylcyclotetrasiloxane
C
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
With pyridine; sodium hydrogencarbonate In ethyl acetate at 20℃; for 3h; | A 60% B 20% C 15% |
With water Autoclave; | A 51.3% B 29.2% C 8% |
With composite catalyst at 150℃; under 675.068 Torr; for 0.5h; Temperature; Pressure; Reagent/catalyst; Large scale; | A n/a B 43% C n/a |
dimethylsilicon dichloride
A
Hexamethylcyclotrisiloxane
B
octamethylcyclotetrasiloxane
C
decamethylcyclopentasiloxane
D
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With dimethyl sulfoxide at 0℃; Further byproducts given; | A 48% B 35% C 12% D 5% |
With tetrahydrofuran; lithium at 40 - 45℃; for 1h; Yield given. Further byproducts given. Yields of byproduct given; | |
With hydrogenchloride In toluene at 20℃; for 4h; Yield given. Further byproducts given. Yields of byproduct given; |
dimethylsilicon dichloride
A
tetradecamethylcycloheptasiloxane
B
Hexamethylcyclotrisiloxane
C
octamethylcyclotetrasiloxane
D
decamethylcyclopentasiloxane
E
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With H2O In water slow addn. of 4l (CH3)2SiCl2 to 12l H2O at 15-20°C withorous stirring; further products;; distn.;; | A n/a B 0.5% C 42% D 6.7% E 1.6% |
With hydrogenchloride In toluene at 20℃; for 4h; Product distribution; diff. concentration of aq. HCl; diff. reaction time; other difunctional organochlorosilanes; | |
With H2O In diethyl ether; water addn. of (CH3)2SiCl2 to ether-H2O; further products;; distn.;; |
dimethylsilicon dichloride
A
octamethylcyclotetrasiloxane
B
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
With water at 15 - 20℃; Autoclave; | A 42% B 6.7% |
trimethyl phosphite
dimethylsilicon dichloride
A
methylene chloride
B
decamethylcyclopentasiloxane
C
dodecamethyl-cyclohexasiloxane
D
C7H21O6PSi3
E
C9H27O7PSi4
Conditions | Yield |
---|---|
at 20℃; for 10h; Inert atmosphere; | A n/a B 15% C 10% D 38% E 33% |
1,1,3,3-Tetramethyldisiloxane
A
tetradecamethylcycloheptasiloxane
B
octamethylcyclotetrasiloxane
C
decamethylcyclopentasiloxane
D
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With iodine In dichloromethane for 0.333333h; Heating; Further byproducts given; | A 14% B 26% C 21% D 15% |
Conditions | Yield |
---|---|
With hydrogenchloride |
Conditions | Yield |
---|---|
With water at 15 - 20℃; | |
With water Erhitzen der gebildeten nicht destillierbaren Produkte mit NaOH auf 230-240grad unter 1 mm; |
Hexamethylcyclotrisiloxane
A
tetradecamethylcycloheptasiloxane
B
octamethylcyclotetrasiloxane
C
decamethylcyclopentasiloxane
D
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With hydrogenchloride for 72h; Yield given. Yields of byproduct given. Title compound not separated from byproducts; |
1,1,3,3,5,5,7,7,9,9-decamethylpentasiloxane-1,9-diol
A
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
With trifluorormethanesulfonic acid In 1,4-dioxane at 35℃; Product distribution; Kinetics; var. of reagent, solvent; |
chloro(2-chloroethoxy)dimethylsilane
A
Hexamethylcyclotrisiloxane
B
octamethylcyclotetrasiloxane
C
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
With potassium Sodium at 280 - 300℃; under 0.1 - 1 Torr; Yield given. Yields of byproduct given; | |
With potassium Sodium In gaseous matrix at 280 - 320℃; under 0.1 - 1 Torr; Product distribution; |
Conditions | Yield |
---|---|
In benzene at 26.9℃; Equilibrium constant; |
dimethylsilicon dichloride
A
tetradecamethylcycloheptasiloxane
B
Hexamethylcyclotrisiloxane
C
octamethylcyclotetrasiloxane
D
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
With hydrogenchloride In toluene at 20℃; for 4h; Yield given. Further byproducts given. Yields of byproduct given; |
dimethylsilicon dichloride
A
tetradecamethylcycloheptasiloxane
B
Hexamethylcyclotrisiloxane
C
decamethylcyclopentasiloxane
D
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With hydrogenchloride In toluene at 20℃; for 4h; Yield given. Further byproducts given. Yields of byproduct given; |
dimethylsilicon dichloride
A
Hexamethylcyclotrisiloxane
B
octamethylcyclotetrasiloxane
C
decamethylcyclopentasiloxane
D
Tetradecamethylcycloheptasilan
E
decamethylcyclopentasilane
F
dodecamethylcyclohexasilane
Conditions | Yield |
---|---|
With tetrahydrofuran; lithium at 40 - 45℃; Product distribution; Mechanism; various temperature, various reactant ratios; |
A
Hexamethylcyclotrisiloxane
B
octamethylcyclotetrasiloxane
C
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
at 50℃; Product distribution; |
trimethylsilyl iodide
octamethylcyclotetrasiloxane
A
Octamethyltrisiloxane
B
decamethyltetrasiloxane
C
dodecamethylpentasiloxane
D
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
at 190℃; for 10h; Yield given; Further byproducts given. Yields of byproduct given. Title compound not separated from byproducts; |
octamethylcyclotetrasiloxane
A
Hexamethyldisiloxane
B
decamethylcyclopentasiloxane
C
tetradecamethylhexasiloxane
D
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With aluminium(III) iodide at 140 - 170℃; for 5h; Yield given; Title compound not separated from byproducts; | A 0.12 g B n/a C n/a D n/a |
1,3,5,7,9-pentachloro-1,3,5,7,9-pentamethylcyclopentasiloxane
methyllithium
A
octamethylcyclotetrasiloxane
B
decamethylcyclopentasiloxane
C
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
In diethyl ether at 0℃; Product distribution; other organometallic reagent and reaction conditions; |
dimethylsilicon dichloride
A
1,1,3,3-tetramethyl-1,3-dichlorodisiloxane
B
octamethylcyclotetrasiloxane
C
decamethylcyclopentasiloxane
D
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With sodium nitrate at 0℃; for 2h; Yield given; Further byproducts given. Yields of byproduct given. Title compound not separated from byproducts; |
dimethylsilicon dichloride
A
Octamethyltrisiloxane
B
decamethyltetrasiloxane
C
dodecamethylpentasiloxane
D
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
With sodium nitrate; 1,1,1,3,3,3-hexamethyl-disilazane at 65℃; for 2h; Yield given; Yields of byproduct given. Title compound not separated from byproducts; | |
With sodium nitrate; 1,1,1,3,3,3-hexamethyl-disilazane at 20℃; for 2h; Yield given; Further byproducts given. Yields of byproduct given. Title compound not separated from byproducts; |
dimethylsilicon dichloride
A
Octamethyltrisiloxane
B
decamethyltetrasiloxane
C
decamethylcyclopentasiloxane
D
tetradecamethylhexasiloxane
Conditions | Yield |
---|---|
With sodium nitrate; 1,1,1,3,3,3-hexamethyl-disilazane at 20℃; for 2h; Yield given; Further byproducts given. Yields of byproduct given. Title compound not separated from byproducts; |
dimethylsilicon dichloride
A
1,5-dichlorohexamethyltrisiloxane
B
octamethylcyclotetrasiloxane
C
decamethylcyclopentasiloxane
D
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With sodium nitrate at 0℃; for 2h; Yield given; Further byproducts given. Yields of byproduct given. Title compound not separated from byproducts; |
dimethylsilicon dichloride
A
1,7-dichlorooctamethyltetrasiloxane
B
octamethylcyclotetrasiloxane
C
decamethylcyclopentasiloxane
D
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With sodium nitrate at 0℃; for 2h; Yield given; Further byproducts given. Yields of byproduct given. Title compound not separated from byproducts; |
dimethylsilicon dichloride
A
octamethylcyclotetrasiloxane
B
1,9-dichlorodecamethylpentasiloxane
C
decamethylcyclopentasiloxane
D
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With sodium nitrate at 0℃; for 2h; Yield given; Further byproducts given. Yields of byproduct given. Title compound not separated from byproducts; |
decamethylcyclopentasiloxane
Li(dimethylsiloxane)5[Al(OC(CF3)3)4]
Conditions | Yield |
---|---|
In dichloromethane in Schlenk flask; mixed soln. concd. to saturation by stirring overnightat room temp.; stand for 1 d at -20°C; solvent removed under vac.; washed 3 times with n-hexane; elem. anal.; | 90% |
decamethylcyclopentasiloxane
diisobutylaluminium hydride
(H(CH3)2Si(OAl(CH2CH(CH3)2)2)2Si(CH3)2)2O
Conditions | Yield |
---|---|
In n-heptane stirring (3 d); evapn.; elem. anal.; | 84% |
decamethylcyclopentasiloxane
dimethylaluminum hydride
(CH3)2Si((OAl(CH3)2)2Si(CH3)2H)2
Conditions | Yield |
---|---|
In hexane stirring (4 d); evapn. (vac.); elem. anal.; | 68% |
tetrahydrofuran
decamethylcyclopentasiloxane
di(tert-butyl)aluminium hydride
HSi(CH3)2(OAl(C(CH3)3)2)2(Si(CH3)2O)2Al(C4H8O)(C(CH3)3)2
Conditions | Yield |
---|---|
In hexane stirring (3 d); filtering, recrystn. (hexane, -23°C); elem. anal.; | 66% |
1,1,3,3-Tetramethyldisiloxane
decamethylcyclopentasiloxane
1,1,3,3,5,5,7,7,9,9,11,11,13,13-tetradecamethylheptasiloxane
Conditions | Yield |
---|---|
With potassium hydroxide In water; toluene at 50℃; for 2h; | 61% |
1,1,3,3-tetraethoxy-1,3-dimethyldisiloxane
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
With cesium hydroxide at 100 - 130℃; | 58% |
1,1,3,3-Tetramethyldisiloxane
decamethylcyclopentasiloxane
A
iododimethylsilane
B
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With iodine | A n/a B 50% |
dimethylmonochlorosilane
decamethylcyclopentasiloxane
1,1,3,3,5,5,7,7,9,9,11,11,13,13-tetradecamethylheptasiloxane
Conditions | Yield |
---|---|
With water; sulfur dioxide In hexane Ambient temperature; | 45% |
decamethylcyclopentasiloxane
di(tert-butyl)aluminium hydride
(H(CH3)2Si(OAl(C(CH3)3)2)2Si(CH3)2)2O
Conditions | Yield |
---|---|
In hexane stirring (4 d); filtering, evapn. (vac.), recrystn. (pentane, -78°C);; | 44% |
decamethylcyclopentasiloxane
B
[((CH3)2SiO)7Ag](1+)*SbF6(1-)=[((CH3)2SiO)7Ag][SbF6]
Conditions | Yield |
---|---|
In sulfur dioxide Ag. compd treated with ligand (3.6:2.58 molar ratio), cooled to 77 K, SO2 added, warmed to room temp., pptd.; filtered off, MAS, NMR; | A n/a B 23% |
Conditions | Yield |
---|---|
In water at 20℃; Sonication; | 11% |
decamethylcyclopentasiloxane
2,7-dimethyl-2,3:7,8-diepoxy-5-silaspiro<4.4>nonane
2,2,4,4,8,8,10,10,12,12-decamethyl-2,4,6,8,10,12-hexasila-1,3,5,7,9,11,13-heptaoxaspiro<5.7>tridecane
Conditions | Yield |
---|---|
at 520℃; under 0.0001 Torr; for 3.25h; | 9% |
decamethylcyclopentasiloxane
A
octamethylcyclotetrasiloxane
B
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With dodecylbenzene-sulphonic acid; acetic acid at 120℃; for 4 - 24h; Product distribution / selectivity; | A 1.08% B 2.05% |
With toluene-4-sulfonic acid at 120℃; for 4 - 24h; Product distribution / selectivity; | A 0.56% B 0.59% |
With molecular sieve; dodecylbenzene-sulphonic acid at 20 - 120℃; for 0.014 - 24h; Product distribution / selectivity; | A 0% B 0% |
With molecular sieve at 20 - 120℃; for 0.017 - 24h; Product distribution / selectivity; | A 0.67% B 0.92% |
With acetic acid at 120℃; for 4 - 24h; Product distribution / selectivity; | A 0.1% B 0.48% |
Conditions | Yield |
---|---|
With toluene-4-sulfonic acid at 20 - 120℃; for 0.017 - 24h; Product distribution / selectivity; | 0.68% |
With dodecylbenzene-sulphonic acid at 20 - 120℃; for 0.017 - 24h; Product distribution / selectivity; | 0.74% |
With dodecylbenzene-sulphonic acid at 20 - 120℃; for 0.017 - 24h; Product distribution / selectivity; | 0.7% |
Conditions | Yield |
---|---|
With hydrogenchloride at 120℃; for 4 - 24h; Product distribution / selectivity; | 0.1% |
Conditions | Yield |
---|---|
With hydrogen fluoride; copper(II) sulfate |
dimethylmonochlorosilane
decamethylcyclopentasiloxane
1-chloro-1,1,3,3,5,5,7,7,9,9,11,11-dodecamethylhexasiloxane
Conditions | Yield |
---|---|
With water; pyrographite for 5h; Ambient temperature; Yield given; |
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