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inquiryfluorine
A
xenon hexafluoride
xenon oxide tetrafluoride
xenon tetrafluoride
Conditions | Yield |
---|---|
With NaF byproducts: CF4; NaF dried at 900°C, filled in HP-autoclave, Xe and F2 condensed at -196°C, mixt. warmed at 250°C for 1 d, excess of F2, XeF4, XeOF4 and CF4 removed in vac., Na2XeF8 (residue) warmed to 50-100°C, XeF6 recovered in vac.; | A 84% B n/a C n/a |
sodium nitrate
xenon hexafluoride
A
xenon dioxide difluoride
xenon oxide tetrafluoride
Conditions | Yield |
---|---|
byproducts: FNO2, Na2XeF8, NaXeF7; N2; mixt. prepd. at -196 °C; warmed to room temp.; then reaction at 70 °C for 10h;; cooled to -196 °C (vacuum); sepn. of volatile compounds on warmup to room temp. by fractional condensation; XeOF4 in -78 °C trap;; | A n/a B 82% C n/a |
Conditions | Yield |
---|---|
byproducts: HF; reactn. of XeF6 with air (satd. with H2O) in a flow apparatus until IR absorption of XeF6 decreases to 2% of the initial value and the total pressure reaches 600 Torr; gas mixt. (contg. XeF6 and XeOF4) is condensed into an U-tube at -78°C;; HF/air mixt. is pumped off at -78°C; warming to 20°C; further addn. of moist air; freezing of XeOF4; HF/air is pumped off;; | 80% |
In gas Ni vessel, condensation of H2O onto XeF6, storing at 20°C for 0.5 hours, then cooling to -78°C;; main amt. of HF is pumped off;; | |
byproducts: HF; |
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: HF; H2O condensed in an evacd. Ni vessel above XeF6, warmed to room temp., allowed to stand for 4 h before being agitated (danger of explosion), allowed to remain at room temp. for another 8 h;; vac. disd. into a Kel-F tube contg. NaF; XeOF4 distd. from this storage vesel as required;; | |
In not given (inert atm.); hydrolysis of xenon compd.; Schumacher G.A., Schrobilgen G.J., Inorg. Chem. 1984, 23, 2923-2929; |
Conditions | Yield |
---|---|
further products by reactn. of XeOF4 with CaO;; |
Conditions | Yield |
---|---|
thermal synthesis (Xe:F2:O2=1:2:10) at about 600°C;; low yield;; |
Conditions | Yield |
---|---|
slow react. with liquefaction;; |
Conditions | Yield |
---|---|
react. of XeF6 (about 6g) with wall of quartz vessel in a few days at 50°C;; dry ice /trichloro ethylene bath; SiF4 is pumped off;; | |
byproducts: SiF4; reaction of XeF6 with quartz or glass; |
xenon hexafluoride
uranyl fluoride
A
uranium hexafluoride
xenon oxide tetrafluoride
Conditions | Yield |
---|---|
25°C; | |
25°C; |
caesium fluoride * xenon oxide tetrafluoride
xenon oxide tetrafluoride
Conditions | Yield |
---|---|
In neat (no solvent) in vacuum at 20°C, slow loss of XeOF4; in a stream of N2 (1atm), weight loss is observed only above 60°C;; |
xenon oxide tetrafluoride
Conditions | Yield |
---|---|
In neat (no solvent) on heating of XeF6 in a closed quartz vessel during some days at 50°C untill disappearing of pale yellow color of XeF6; 2XeF6 + SiO2 -> 2XeOF4 + SiF4;; | |
With water byproducts: HF; on hydrolysis with stoechiometric amt. of H2O: XeF6 + H2O -> 2HF + XeOF4;; | |
With glass |
xenon hexafluoride
water
A
xenon dioxide difluoride
xenon oxide tetrafluoride
Conditions | Yield |
---|---|
In hydrogen fluoride enriched water (26.5% (17)O, 37.0% (18)O); mole ratio XeF6:H2O = 1:1.22; |
Conditions | Yield |
---|---|
In further solvent(s) soln. of educts in freon-114 condensed in NMR tube, melted in vac., warmed to room temp., not sepd., detected by NMR; | A <1 B 0% |
xenon oxide tetrafluoride
B
osmium trioxide difluoride
Conditions | Yield |
---|---|
In neat (no solvent, solid phase) (inert atm.); keeping at room temp. for 21 d; Raman spectroscopy; |
xenon oxide tetrafluoride
boron tris{pentafluoro-oxotellurate(VI)}
OXe(OTeF5)4
Conditions | Yield |
---|---|
In further solvent(s) byproducts: BF3; bor compd. filled in FEP reactor, soln. of XeOF4 in freon-114 (condensed in vac. app.) added, mixt. warmed to -65°C, BF3 removed in vac.for -78 to -25°C; sublimation in vac; elem. anal.; | 89% |
In trichlorofluoromethane byproducts: BF3; XeOF4 cooled to -196°C, solvent condensed to the vessel, briefly warmed to -80°C, B(OTeF5)3 added (-196°C, drybox), sealed, evacd., warmed to -80°C, pressurized with N2 (1 atm), slowly warmed, agitated (<0°C);; pumping of volatiles at -80°C overnight;; | |
In further solvent(s) byproducts: BF3; in n-C5F12 at -30°C; |
Conditions | Yield |
---|---|
byproducts: HF; |
xenon oxide tetrafluoride
cesium fluoride
caesium fluoride * xenon oxide tetrafluoride
Conditions | Yield |
---|---|
In neat (no solvent) in poly(trichlorofluoro ethylene) vessels; excess XeOF4 is distd. onto CsF (pretreated with F2); 12h at 50°C in closed vessel; subsequent distn. of excess XeOF4; |
xenon oxide tetrafluoride
xenon trioxide
A
xenon difluoride
B
xenon dioxide difluoride
Conditions | Yield |
---|---|
In water formation of homogenous liquid on cautious heating of aq. soln. of XeO3 in polytrichloro ethylene vessel (vacuum, dehydration), condensation of XeOF4 on educt during cooling at -78°C, 12h;; fractionating distn. of liquid (which contains XeO2F2, XeOF4 and XeF2), purification of XeO2F2 on mass spectroscopy;; |
xenon oxide tetrafluoride
A
xenon difluoride
B
xenon(IV) fluoride
C
oxygen
D
fluorine
Conditions | Yield |
---|---|
400°C; |
xenon oxide tetrafluoride
Conditions | Yield |
---|---|
With hydrogen byproducts: H2O, HF; | |
With hydrogen |
xenon oxide tetrafluoride
xenon trioxide
Conditions | Yield |
---|---|
With water hydrolysis with different intermediates, finally XeO3 is obtained;; | |
With H2O hydrolysis with different intermediates, finally XeO3 is obtained;; | |
With H2O |
Conditions | Yield |
---|---|
300°C; |
sodium nitrate
xenon oxide tetrafluoride
A
xenon dioxide difluoride
B
nitrylfluoride
Conditions | Yield |
---|---|
byproducts: SiF4; slow react. with quartz;; | |
byproducts: SiF4; | |
byproducts: SiF4; slow react. with quartz;; |
xenon oxide tetrafluoride
Conditions | Yield |
---|---|
In neat (no solvent) in poly(trichlorofluoro ethylene) vessels; excess XeOF4 is distd. onto RbF (pretreated with F2); 12h at 50°C in closed vessel; subsequent distn. of excess XeOF4; |
xenon oxide tetrafluoride
Conditions | Yield |
---|---|
In neat (no solvent) in poly(trichlorofluoro ethylene) vessels; excess XeOF4 is distd. onto KF (pretreated with F2); 12h at 50°C in closed vessel; subsequent distn. of excess XeOF4; |
xenon oxide tetrafluoride
antimony pentafluoride
Conditions | Yield |
---|---|
on heating of XeOF4 with SbF5, formation of white ppt.;; on pumping off of excess SbF5 untill constant weight;; |
vanadium pentafluoride
xenon oxide tetrafluoride
Conditions | Yield |
---|---|
storing XeOF4 with fourfold excess of VF5 at 20°C;; volatile components are pumped off until vapor pressure of remaining liquid is about 30 Torr; | |
addition of an excess of VF5 to XeoF4; reaction within several days in a Ni tube at 25°C; evaporation at 25°C;; |
xenon oxide tetrafluoride
boron tris{pentafluoro-oxotellurate(VI)}
OXe(OTeF5)4
OXeF3(OTeF5)
OXeF2(OTeF5)2
OXeF2(OTeF5)2
OXeF(OTeF5)3
Conditions | Yield |
---|---|
In further solvent(s) byproducts: BF3; Bor-compd. filled in NMR-tube, freon-114 and XeOF4 condensed to, mixt. warmed to -40°C, BF3 and teil of solvents removed at -30°C; not sepd.; detected by NMR; |
xenon oxide tetrafluoride
OXe(OTeF5)4
OXeF3(OTeF5)
OXeF2(OTeF5)2
OXeF2(OTeF5)2
OXeF(OTeF5)3
Conditions | Yield |
---|---|
In further solvent(s) OXe(OTeF5)4 filled in NMR tube, XeOF4 and freon 114 condensed to, melted in vac.; not sepd., detected by NMR; |
xenon oxide tetrafluoride
cesium fluoride
A
caesium fluoride * xenon oxide tetrafluoride
Cs(1+)*(XeOF4)3F(1-)=Cs((XeOF4)3F)
Conditions | Yield |
---|---|
In neat (no solvent) an excess of XeOF4 was vac. distd. onto CsF (dried at 350°C under vac. for 1.5 d), 2 d; unreacted XeOF4 was removed at 0°C by static distn. into FEP vessel cooled to -196°C for 1 h; for isolation of Cs(XeOF5) an excess of XeOF4 and Cs((XeOF4)3F) was removed by dynamic vac. distn. at room temp. for 1 h; |
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