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Conditions | Yield |
---|---|
In neat (no solvent) Xe and F2 condensed into nickel can (-196°C), warmed (room temp., pressure 34 atm.), preheated electric furnace (400°C) placed around the nickel can (7 h, pressure 78 atm.), quenched to room temp. in water, cooled (-78°C); excess Xe condensed into a storage cylinder (-196°C), evapn. (through a cold trap, -78°C); | 99.3% |
In gas react. temp. of 400°C, Xe:F2 about 2.0, Monel vessel with volume between 95 and 1200 ml; cooling down with H2O;; | >95 |
Electric Arc; react. of F2 with an excess of Xe in an electrical discharge; sublimation in vac., discarding the leading fraction; |
boron trifluoride
fluorine
A
silver tetrafluoroborate
B
xenon difluoride
Conditions | Yield |
---|---|
In hydrogen fluoride HF (liquid); treatment AgF with BF3 in HF, pptn. of AgBF4, adnn. of F2, removal of volatiles, addn. of Hf, BF3 and xenon (condensed in reactor, -100°C), warming to 20°C with stirring (thermal cycling repeated 3-4 times, in 2 h); removal of volatile (vac., -45°C, 5 h), XeF2 (U trap, -78°C); x-ray photography; | A n/a B 66% |
Conditions | Yield |
---|---|
With HF In hydrogen fluoride HF (liquid); mixing of AgF2 and BF3 in HF (-100°C), warming(to room temp., stirring), addn. of xenon (stirring 12 h); removal of volatile (-45°C, vac.), XeF2 (U trap, -78°C); x-ray powder photography and Raman spectroscopy; novolatile AgBF4; x-ray powder photography; | A n/a B 57.9% |
heptafluorobutyronitrile
xenon difluoride * AsF5
A
xenon difluoride
B
n-C3F7CNXeF cation
Conditions | Yield |
---|---|
In further solvent(s) BrF5 as solvent, equimolar amts., low temp.,; |
xenon difluoride * AsF5
trifluoroacetonitrile
A
xenon difluoride
B
CF3CNXeF(1+)
Conditions | Yield |
---|---|
In further solvent(s) BrF5 as solvent, equimolar amts., low temp.,; |
xenon difluoride * AsF5
pentafluoropropionitrile
A
xenon difluoride
B
C2F5CNXeF(1+)
Conditions | Yield |
---|---|
In further solvent(s) BrF5 as solvent, equimolar amts., low temp.,; |
Conditions | Yield |
---|---|
With oxygen fluorides on fluorination of Xe by oxygen fluoride;; XeF4 is polluted with XeF2;; | |
on react. of Xe with excess N2F2 (N2F2 : Xe = 2:1) in Monel vessels (24h/90-100°C);; | |
With oxygen fluorides |
Conditions | Yield |
---|---|
In further solvent(s) solvent: anhydrous HF; AgF3 in solvent exposed to large excess of Xe gas at 20 ° C, mixture allowed to ionteract at ca. 20 ° C for 1 h,; tube cooled to -78 ° C,excess Xe and solvent removed under vac.,mixture warmed to ca. 20 ° C,XeF2 on the walls of the tube and AgF2 in the bottom (X-ray powder photograph identical with that of authentic sample); |
hypofluorous acid trifluoromethyl ester
xenon difluoride
Conditions | Yield |
---|---|
byproducts: CF3OOCF3; on heating;; | |
byproducts: CF3OOCF3; on heating;; |
Conditions | Yield |
---|---|
on exposure of OF2-Xe (1:1) mixtures;; |
xenon(II)fluoromanganate(IV)
A
xenon difluoride
B
xenon hexafluoride
C
xenon(IV) fluoride
Conditions | Yield |
---|---|
byproducts: F2, Mn2F5; thermal decompn.; |
Conditions | Yield |
---|---|
byproducts: F2, Mn2F5; thermal decompn.; |
xenon(IV) fluoride
water
A
xenon difluoride
B
xenon trioxide
Conditions | Yield |
---|---|
small increments of water were distd. in XeF4 by using liq. N2; after each increment the tube was allowed to warm to ambient temp. and the vapors were examined with mass spectrometer; |
Conditions | Yield |
---|---|
terbium(III) fluoride In neat (no solvent) byproducts: ClF; 300-345°C; Xe/ClF3 = 0.38; weighing; chem. anal.; | |
2Cs(1+)*CuF4(2-)=Cs2CuF4 In neat (no solvent) byproducts: ClF; 360-460°C; Xe/ClF3 = 0.50-2.20; weighing; chem. anal.; | |
NiF(2+x) x:0.12-0.33; In neat (no solvent) byproducts: ClF; 170-250°C; Xe/ClF3 = 0.76-5.00; weighing; chem. anal.; |
Conditions | Yield |
---|---|
silver(II) fluoride In neat (no solvent) byproducts: ClF; 440°C; Xe/ClF3 = 0.31; weighing; chem. anal.; DTA; (19)F NMR; (129)Xe NMR; | |
NiF(2+x) x:0.12-0.33; In neat (no solvent) byproducts: ClF; 295-410°C; Xe/ClF3 = 0.08-2.00; content of XeF4 increased with rise in temp. and with decrease in Xe/ClF3 ratio; weighing; chem. anal.; DTA; (19)F NMR; (129)Xe NMR; | |
palladium (III) fluoride In neat (no solvent) byproducts: ClF; 295-440°C; Xe/ClF3 = 0.31-1.13; content of XeF4 increased with rise in temp. and with decrease in Xe/ClF3 ratio; weighing; chem. anal.; DTA; (19)F NMR; (129)Xe NMR; |
Conditions | Yield |
---|---|
on react. of O2F2 at -118°C with Xe, formation of a light yellow solid compd., from which XeF2 is sublimated off at 50°C;; | |
on react. of O2F2 at -118°C with Xe, formation of a light yellow solid compd., from which XeF2 is sublimated off at 50°C;; |
Conditions | Yield |
---|---|
In neat (no solvent) Kinetics; fluorination kinetics of noble gas crystals studied at 77 K; |
Conditions | Yield |
---|---|
With oxygen fluorides | |
With oxygen fluorides on fluorination of Xe by oxygen fluoride;; XeF4 is polluted with XeF2;; |
Conditions | Yield |
---|---|
on react. with excess Xe;; |
Conditions | Yield |
---|---|
on high voltage discharge (6000V, 120mA);; |
Conditions | Yield |
---|---|
small amt. of XeF4 beside large amt. of XeF2 are obtained;; |
Conditions | Yield |
---|---|
In further solvent(s) solvent: anhydrous HF; soln. of KAgF4 exposed to excess Xe gas (2atm of pressure at ca. 20 ° C), all color in the supernatant soln. dissappeared within 10 min;; soln. removed under vac. at -30 ° C, AgF2 in the bottom of the tube, colorless ppt. of XeF2 on the walls of the tube; |
Conditions | Yield |
---|---|
In gas using O2 as carrier gas;; | |
other Radiation; on bombardement of Xe-F2 mixtures with γ-rays or very energetic electrons at temp. higher than -35°C;; | |
other Radiation; on radiation of mixture of F2:Xe = 2.6 in perfluorinated Ni vessels with γ-rays (130h) of a (60)Co source;; mixture of XeF2 and XeF4 is obtained (emipirical formula: XeF3.0);; |
fluorine
A
xenon difluoride
B
xenon hexafluoride
xenon tetrafluoride
Conditions | Yield |
---|---|
on react. of fluorine with Xe in varying ratio of 6 - 40 and react. temp. of 200 up to 450°C, compd. XeF5 seemed to be formed, but in a further detailed work (250 - 500°C) it was shown, that only the di-, tetra-and hexafloride was formed;; IR studies under equilibrium conditions;; | A n/a B n/a C n/a D 0% |
on react. of fluorine with Xe in varying ratio of 6 - 40 and react. temp. of 200 up to 450°C, compd. XeF5 seemed to be formed, but in a further detailed work (250 - 500°C) it was shown, that only the di-, tetra-and hexafloride was formed;; IR studies under equilibrium conditions;; | A n/a B n/a C n/a D 0% |
on react. of fluorine with Xe in varying ratio of 6 - 40 and react. temp. of 200 up to 450°C, compd. XeF5 seemed to be formed, but in a further detailed work (250 - 500°C) it was shown, that only the di-, tetra-and hexafloride was formed;; IR studies under equilibrium conditions;; | A n/a B n/a C n/a D 0% |
Conditions | Yield |
---|---|
In gas Kinetics; Irradiation (UV/VIS); | |
In gaseous matrix Kinetics; Irradiation (UV/VIS); |
xenon oxide tetrafluoride
xenon trioxide
A
xenon difluoride
B
xenon dioxide difluoride
Conditions | Yield |
---|---|
In water formation of homogenous liquid on cautious heating of aq. soln. of XeO3 in polytrichloro ethylene vessel (vacuum, dehydration), condensation of XeOF4 on educt during cooling at -78°C, 12h;; fractionating distn. of liquid (which contains XeO2F2, XeOF4 and XeF2), purification of XeO2F2 on mass spectroscopy;; |
Conditions | Yield |
---|---|
In water formation of homogenous liquid on cautious heating of aq. soln. of XeO3 in polytrichloro ethylene vessel (vacuum, dehydration), condensation of XeF6 on educt during cooling at -78°C, 12h;; fractionating distn. of liquid (which contains XeO2F2, XeOF4 and XeF2), purification of XeO2F2 on mass spectroscopy;; |
xenon tetrafluoride
xenon difluoride
Conditions | Yield |
---|---|
byproducts: F2; at 300-500°C; |
uranium(IV) tetrafluoride
xenon tetrafluoride
A
xenon difluoride
B
uranium hexafluoride
xenon dioxide difluoride
xenon difluoride
Conditions | Yield |
---|---|
byproducts: O2; decompn.;; |
Conditions | Yield |
---|---|
In trichlorofluoromethane (Ar); XeF2 filled into a PFA tube; CFCl3 added, and finally freshly prepared ReO3Cl; warming to -30°C and 0°C results in a gas evolution and formation of a slightly yellow colored solid; all volatile materials pumped off at room temp. in vacuum; identified byRaman spectroscopy; | 100% |
xenon difluoride
cis-bis(triphenylphosphino)diphenylplatinum(II)
trans-PtF2(PPh3)2
Conditions | Yield |
---|---|
In dichloromethane byproducts: biphenyl; | 100% |
xenon difluoride
(1,3-bis(dicyclohexylphosphino)propane)dimethylpalladium(II)
[PdF2(di(cyclohexylphosphino)propane)]
Conditions | Yield |
---|---|
In dichloromethane byproducts: C2H6, Xe; Pd dimethyl complex was treated with an equiv. of XeF2 in dry CH2Cl2; -30°C - room temp.; triturating of concd. CH2Cl2 soln. with pentane; | 100% |
xenon difluoride
(1,3-bis(diisopropylphosphino)propane)palladium(methyl)2
[PdF2(di(i-propylphosphino)propane)]
Conditions | Yield |
---|---|
In dichloromethane byproducts: C2H6, Xe; Pd dimethyl complex was treated with an equiv. of XeF2 in dry CH2Cl2; -30°C - room temp.; triturating of concd. CH2Cl2 soln. with pentane; | 100% |
xenon difluoride
[Pt(C6H5)2(di(i-propylphosphino)propane)]
[PtF2(di(i-propylphosphino)propane)]
Conditions | Yield |
---|---|
In dichloromethane byproducts: biphenyl; | 100% |
xenon difluoride
Conditions | Yield |
---|---|
In dichloromethane byproducts: biphenyl; | 100% |
xenon difluoride
[Pt(II)(bis(2-diphenylphosphinoethyl)phenylphosphine)((C6H4)(C5H4N))]BF4
Pt((C6H5)2PCH2CH2P(C6H5)(CH2CH2PF2(C6H5)2))((C6H4)(C5H4N))(1+)*BF4(1-) =PtC45H41F6NP3B
Conditions | Yield |
---|---|
In [D3]acetonitrile react. of Pt complex with XeF2 at room temp. for <3 min; detd. by NMR; | 100% |
xenon difluoride
tris(pentafluorophenyl)antimony
tris(pentafluorophenyl)antimony difluoride
Conditions | Yield |
---|---|
In acetonitrile addn. of XeF2 to a soln. of Sb(C6F5)3 in CH3CN at -30°C under N2, warming up to room temp., standing for 2 days; evapn. of solvent and volatiles; | 99.6% |
xenon difluoride
perfluoro-trans-hex-1-enyldifluoroborane
[H2F](1+)*[CF3(CF2)5BF3](1-)=[H2F][CF3(CF2)5BF3]
Conditions | Yield |
---|---|
In hydrogen fluoride byproducts: Xe; HF (liquid); solid XeF2 added in small portions at -30°C to soln. of B compd. in HF; | 99% |
xenon difluoride
bis(triphenylphosphine)(cycloocta-1,5-diene)iridium(I) tetrafluoroborate
dichloromethane
Conditions | Yield |
---|---|
In dichloromethane byproducts: xenon; (Schlenk, N2) Ir-complex and XeF2 were placed into separate passivated vials in dry box, evacuated, CH2Cl2 was transferred by distillation at -196°C, warmed, XeF2soln. was added at -196°C to complex, warmed to -90°C, agatated; the soln. was removed in vac.; elem. anal.; | 99% |
xenon difluoride
bis(methyldiphenylphosphine)(cycloocta-1,5-diene)iridium(I) tetrafluoroborate
bis(methyldiphenylphosphine)(cycloocta-1,5-diene)iridiumdifluoride tetrafluoroborate
Conditions | Yield |
---|---|
In dichloromethane byproducts: xenon; (Schlenk, N2) Ir-complex and XeF2 were placed into separate passivated vials in dry box, evacuated, CH2Cl2 was transferred by distillation at -196°C, warmed, XeF2soln. was added at -196°C to complex, warmed to room temp., agatated; the soln. was removed in vac.; elem. anal.; | 99% |
xenon difluoride
(tricyclohexylphosphine)(cycloocta-1,5-diene)(pyridine)iridiumdifluoride tetrafluoroborate
Conditions | Yield |
---|---|
In dichloromethane byproducts: xenon; (Schlenk, N2) Ir-complex and XeF2 were placed into separate passivated vials in dry box, evacuated, CH2Cl2 was transferred by distillation at -196°C, warmed, XeF2soln. was added at -196°C to complex, warmed to -80°C, agatated; the soln. was removed in vac.; | 99% |
xenon difluoride
(cycloocta-1,5-diene)bis(pyridine)iridium tetrafluoroborate
(cycloocta-1,5-diene)bis(pyridine)iridiumdifluoride tetrafluoroborate
Conditions | Yield |
---|---|
In dichloromethane byproducts: xenon; (Schlenk, N2) Ir-complex and XeF2 were placed into separate passivated vials in dry box, evacuated, CH2Cl2 was transferred by distillation at -196°C, warmed, XeF2 soln. was added at -196°C to complex, warmed to -90°C, agatated; the soln. was removed in vac.; elem. anal.; | 99% |
xenon difluoride
glyoxal-bis(2,4,6-trimethylphenylimine)(cycloocta-1,5-diene)iridium tetrafluoroborate
glyoxal-bis-(2,4,6-trimethylphenylimine)(cycloocta-1,5-diene)iridiumdifluoride tetrafluoroborate
Conditions | Yield |
---|---|
In dichloromethane byproducts: xenon; (Schlenk, N2) Ir-complex and XeF2 were placed into separate passivated vials in dry box, evacuated, CH2Cl2 was transferred by distillation at -196°C, warmed, XeF2 soln. was added at -196°C to complex, warmed to -90°C, agatated; the soln. was removed in vac.; elem. anal.; | 99% |
xenon difluoride
glyoxal-bis(2,6-diisopropylphenylimine)(cycloocta-1,5-diene)iridium tetrafluoroborate
glyoxal-bis-(2,6-diisopropylphenylimine)(cycloocta-1,5-diene)iridiumdifluoride tetrafluoroborate
Conditions | Yield |
---|---|
In dichloromethane byproducts: xenon; (Schlenk, N2) Ir-complex and XeF2 were placed into separate passivated vials in dry box, evacuated, CH2Cl2 was transferred by distillation at -196°C, warmed, XeF2 soln. was added at -196°C to complex, warmed to -90°C, agatated; the soln. was removed in vac.; elem. anal.; | 99% |
xenon difluoride
bis(ethyldiphenylphosphine)(cycloocta-1,5-diene)iridium(I) tetrafluoroborate
trans,cis-bis(ethyldiphenylphosphine)(cycloocta-1,5-diene)iridiumdifluoride tetrafluoroborate
Conditions | Yield |
---|---|
In dichloromethane byproducts: xenon; (Schlenk, N2) Ir-complex and XeF2 were placed into separate passivated vials in dry box, evacuated, CH2Cl2 was transferred by distillation at -196°C, warmed, XeF2soln. was added at -196°C to complex, warmed to -90°C, agatated; the soln. was removed in vac.; | 99% |
xenon difluoride
bis(phenylethynyldiphenylphosphine)(cycloocta-1,5-diene)iridium(I) tetrafluoroborate
trans,cis-bis(phenylethynyldiphenylphosphine)(cycloocta-1,5-diene)iridiumdifluoride tetrafluoroborate
Conditions | Yield |
---|---|
In dichloromethane byproducts: xenon; (Schlenk, N2) Ir-complex and XeF2 were placed into separate passivated vials in dry box, evacuated, CH2Cl2 was transferred by distillation at -196°C, warmed, XeF2soln. was added at -196°C to complex, warmed to -90°C, agatated; the soln. was removed in vac.; elem. anal.; | 99% |
Conditions | Yield |
---|---|
In neat (no solvent, gas phase) byproducts: Xe, HF; at 50°C for 3 h; fractional distn. at low temp.; | 99% |
Conditions | Yield |
---|---|
In neat (no solvent, gas phase) byproducts: Xe, HF; at 50°C for 3 h; fractional distn. at low temp.; | 99% |
Conditions | Yield |
---|---|
In dichloromethane for 0.166667h; Inert atmosphere; Schlenk technique; | 99% |
Conditions | Yield |
---|---|
In dichloromethane for 2h; Inert atmosphere; Schlenk technique; Glovebox; | 99% |
xenon difluoride
p-(ethoxycarbonyl)phenylselenotrimethylstannane
hex-3-yne
A
trimethyltin fluoride
B
(E)-3-[(p-ethoxycarbonyl)phenylseleno]-4-fluorohex-3-ene
Conditions | Yield |
---|---|
In dichloromethane XeF2 added in small portions under Ar to a soln. of selenide in CH2Cl2 at -20°C, stirred for 30 min, the acetylene added, stirred for 1 h at -20°C and for 1 h at room temp.; precipitate separated, washed with n-pentane, solvent removed under vacuum, crude product purified by column chromy., elem. anal.; | A 98% B 26% |
xenon difluoride
boron tris{pentafluoro-oxotellurate(VI)}
xenon bis{pentafluoro-oxotellurate(VI)}
Conditions | Yield |
---|---|
In further solvent(s) byproducts: BF3; under anhydrous conditions; to the boron compound was added XeF2 at -196°C, dissolved in Freon 114, pressurized with N2 (1 atm) at -78°C, warmed to -8°C over a period of 1 h; warmed to room temp., solvent was pumped away; | 98% |
heptafluoropent-1-yn-1-yldifluoroborane
xenon difluoride
heptafluoropent-1-ynylxenon(II) tetrafluoroborate
Conditions | Yield |
---|---|
In further solvent(s) Ar, XeF2 added to a soln. of B compd. (1,1,1,3,3-pentafluoropropane) at -40°C, stirred for 2 h at -40°C; volatiles removed (vac., -40°C, 0.13 hPa); | 98% |
Conditions | Yield |
---|---|
In toluene byproducts: C2H6, C2H4, Xe; ratio organoaluminum comp.:XeF2 = 2:1, 300 K; chromy., elem. anal., gas volumetric anal., potentiometry, chemiluminescence; | 97% |
xenon difluoride
teflic acid
xenon bis{pentafluoro-oxotellurate(VI)}
Conditions | Yield |
---|---|
on react. of 2.12g XeF2 and 14g HOTeF5;; 7.40g of compd. are obtained;; | 97% |
xenon difluoride
benzo[h]quinoline
Conditions | Yield |
---|---|
In dichloromethane at -50℃; for 0.0833333h; Glovebox; Inert atmosphere; | 97% |
xenon difluoride
4-Octyne
trimethylstannyl phenyl selenide
A
(E)-4-fluoro-5-(phenylseleno)oct-4-ene
B
trimethyltin fluoride
Conditions | Yield |
---|---|
In dichloromethane XeF2 added in small portions under Ar to a soln. of selenide in CH2Cl2 at -20°C, stirred for 30 min, the acetylene added, stirred for 1 h at -20°C and for 1 h at room temp.; precipitate separated, washed with n-pentane, solvent removed under vacuum, crude product purified by column chromy., elem. anal.; | A 66% B 96% |
Conditions | Yield |
---|---|
byproducts: HF; on react. of 2.35g XeF2 (13.9mmol) and 3.33g HOTeF5 (13.9mmol) in a Monel or polychlorotrifluoroethylene vessel;; 5.20g of compd. are obtained;; | 96% |
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