Chemwill Asia Co., Ltd.
Our main production base is located in Xuzhou industry park. We are certified both to the ISO 9001 and ISO 14001 Standards, have a safety management system in place.Our R&D team masters core technology for process-design of target building block
Henan Wentao Chemical Product Co., Ltd.
Henan Wentao Chemical Product Co.,Ltd is Located in Zhengzhou High-tech Development Zone with import and export license, We passed ISO 9001:2008 as well, Henan Wentao has developed more than 1000 compounds, which are widely used in the fields of prod
Cas:13981-56-1
Min.Order:0
Negotiable
Type:Lab/Research institutions
inquiryZibo Hangyu Biotechnology Development Co., Ltd
Zibo Hangyu Biotechnology Development Co., Ltd is a leading manufacturer and supplier of chemicals in China. We develop produce and distribute high quality pharmaceuticals, intermediates, special chemicals and OLED intermediates and other fine chemi
Cas:13981-56-1
Min.Order:10 Gram
Negotiable
Type:Lab/Research institutions
inquiryHenan Tianfu Chemical Co., Ltd.
Our advantage:Our company was built in 2009 with an ISO certificate.In the past 5 years, we have grown up as a famous fine chemicals supplier in China and we had established stable business relationships with Samsung,LG,Merck,Thermo Fisher Scient
Cas:13981-56-1
Min.Order:1 Kilogram
Negotiable
Type:Lab/Research institutions
inquiryAntimex Chemical Limied
factory?direct?sale Application:healing drugs
Cas:13981-56-1
Min.Order:0
Negotiable
Type:Lab/Research institutions
inquirySynova( Tianjin ) Chemical Technology Co,.Ltd
The company have effective management team, professional technical R & D personnel, the service spirit of customer oriented. We have long-term cooperation with famous domestic manufacturer, and excellent customer resources overseas. We are skilled in
Synthetic route
-
-
14797-71-8
18O-labeled water
-
-
13981-56-1
[18F]-hydrofluoric acid
| Conditions | Yield |
|---|---|
| With proton source In water Radiochemical reaction; | |
| Radiochemical reaction; |
| Conditions | Yield |
|---|---|
| In neat (no solvent) at about 200°C (catalyzed by material of vessel);; | |
| In neat (no solvent) Irradiation (UV/VIS); at room temp.;; | 0% |
| In neat (no solvent) at room temp.;; | 0% |
-
-
594-27-4
tetramethylstannane
-
A
-
13981-56-1
[18F]-hydrofluoric acid
-
B
-
20670-29-5
Sn(CH3)3CH2
-
C
-
17272-57-0
trimethylstannane radical
| Conditions | Yield |
|---|---|
| In gaseous matrix Kinetics; byproducts: CH3(18)F; other Radiation; SF6 gaseous matrix, 3000 torr, 287 +/- 2 K; content determination by radio gas chromatography; |
| Conditions | Yield |
|---|---|
| Kinetics; reaction of H2S with photolytically created (18)F atoms; |
| Conditions | Yield |
|---|---|
| In gas Kinetics; byproducts: CH3Hg, CH3(18)F, CH3HgCH2; at 920-3990 Torr, also in presence CH4; |
-
-
13981-56-1
[18F]-hydrofluoric acid
| Conditions | Yield |
|---|---|
| 400°C; |
-
-
13981-56-1
[18F]-hydrofluoric acid
| Conditions | Yield |
|---|---|
| With HF or F2 400°C, in a nickel or copper vessel; |
| Conditions | Yield |
|---|---|
| With sulfuric acid In water; acetonitrile other Radiation; by thermal neutrons irradiated (6)Li2CO3 was dissolved in H2SO4/water, H(18)F was distd. off, neutralized with n-Bu4NOH, evapd. in vac., dissolved in MeCN, evapd. in vac., dissolved in SO2ClF at -196°C, distd. into the XeF2, 20 min at 40°C; evapd. in vac. at -48°C; laser Raman spectr. at -196°C; | 88% |
-
-
13981-56-1
[18F]-hydrofluoric acid
-
-
13709-36-9
xenon difluoride
-
A
-
331810-71-0
XeF(18)F
-
B
-
7664-39-3
hydrogen fluoride
| Conditions | Yield |
|---|---|
| In water 0°C, 2h; | A n/a B 0.8% |
-
-
13981-56-1
[18F]-hydrofluoric acid
-
-
13709-36-9
xenon difluoride
-
-
53612-91-2
K(18)F
-
A
-
331810-71-0
XeF(18)F
-
B
-
7664-39-3
hydrogen fluoride
| Conditions | Yield |
|---|---|
| In water 0°C, 2h; | A n/a B 0.8% |
| Conditions | Yield |
|---|---|
| In water; acetonitrile |
| Conditions | Yield |
|---|---|
| In [18O]-water |
| Conditions | Yield |
|---|---|
| In 18O-labeled water at 250℃; for 0.0833333h; |
| Conditions | Yield |
|---|---|
| complete within 3 min.; | A >90 B >90 |
| Conditions | Yield |
|---|---|
| 100°C; |
| Conditions | Yield |
|---|---|
| In gas in 3 min;; | A >90 B n/a |
| In neat (no solvent) in 10 min;; | A >90 B n/a |
| In neat (no solvent) in 10 min;; | A >90 B n/a |
| In neat (no solvent, gas phase) in 3 min;; | A >90 B n/a |
-
-
13981-56-1
[18F]-hydrofluoric acid
| Conditions | Yield |
|---|---|
| Stage #1: [18F]-hydrofluoric acid; aluminium(III) chloride hexahydrate With acetic acid In aq. acetate buffer pH=4; Stage #2: 2,2'-(7-(2-((4-((2-(diethylamino)ethyl)carbamoyl)benzyl)amino)-2-oxoethyl)-1,4,7-triazonane-1,4-diyl)diacetic acid In aq. acetate buffer at 110℃; for 0.166667h; |
-
-
13981-56-1
[18F]-hydrofluoric acid
| Conditions | Yield |
|---|---|
| With potassium carbonate; 18O-labeled water; [2.2.2]cryptande In acetonitrile |
| Conditions | Yield |
|---|---|
| In dimethyl sulfoxide pH=2 - 2.5; |
| Conditions | Yield |
|---|---|
| In dimethyl sulfoxide pH=2 - 2.5; |
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