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Cas:1719-53-5
Min.Order:1 Kilogram
FOB Price: $3.0
Type:Lab/Research institutions
inquiryOur main production base is located in Xuzhou industry park. We are certified both to the ISO 9001 and ISO 14001 Standards, have a safety management system in place.Our R&D team masters core technology for process-design of target building block
Cas:1719-53-5
Min.Order:5 Kiloliter
FOB Price: $1.2 / 5.0
Type:Manufacturers
inquiryOur company was built in 2009 with an ISO certificate.In the past 5 years, we have grown up as a famous fine chemicals supplier in China and we had established stable business relationships with Samsung,LG,Merck,Thermo Fisher Scientific and so on.O
Cas:1719-53-5
Min.Order:1 Kilogram
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Type:Lab/Research institutions
inquiryJ&H CHEM R&D center can offer custom synthesis according to the contract research and development services for the fine chemicals, pharmaceutical, biotechnique and some of the other chemicals. J&H CHEM has some Manufacturing base in Jia
Zibo Hangyu Biotechnology Development Co., Ltd is a leading manufacturer and supplier of chemicals in China. We develop produce and distribute high quality pharmaceuticals, intermediates, special chemicals and OLED intermediates and other fine chemi
Cas:1719-53-5
Min.Order:10 Gram
FOB Price: $100.0
Type:Lab/Research institutions
inquiryWe are leading fine chemicals supplier in China with ISO certificate, Our main business covers the fields below: 1.Noble Metal Catalysts (Pt.Pd...) 2.Organic Phosphine Ligands (Tert-butyl-phosphine.Cyclohexyl-phosphine...) 3.OLED
Cas:1719-53-5
Min.Order:1 Gram
FOB Price: $2.0
Type:Lab/Research institutions
inquiryhigh qualityAppearance:white crystalline powder Storage:Sealed, dry, microtherm , avoid light and smell. Package:According to the demand of customer Application:Organic synthesis Transportation:by air or by sea
Cas:1719-53-5
Min.Order:0
Negotiable
Type:Manufacturers
inquiryProduct Description Description & Specification Category Pharmaceutical Raw Materials, Fine Chemicals, Bulk drug Standard Medical standard
Cas:1719-53-5
Min.Order:1 Kilogram
FOB Price: $112.0
Type:Trading Company
inquiryAnsciep Chemical is a professional enterprise manufacturing and distributing fine chemicals and speciality chemicals. We have been dedicated to heterocycle compounds and phenyl rings for tens of years. This is our mature product for export. Our quali
Dichlorodiethylsilane Application:Dichlorodiethylsilane
DichlorodiethylsilaneAppearance:liquid Storage:Flammables area Application:They can serve as chlorination agents. Chlorosilanes react vigorously with both organic and inorganic acids and with bases to generate toxic or flammable gases. Transportation
Dichlorodiethylsilane Chemical Properties mp -96 °C bp 125-131 °C(lit.) density 1.05 g/mL at 25 °C(lit.)
Cas:1719-53-5
Min.Order:1 Kilogram
FOB Price: $100.0
Type:Lab/Research institutions
inquiry1. Subsidiary of Institute of Chemistry, Henan Academy of Sciences, national research platform;2. About 30 years’ experience in this field since 1983;3. An experienced R&D team consisting of Doctors and Masters;4. Various types of analytical instrume
Cas:1719-53-5
Min.Order:0
Negotiable
Type:Lab/Research institutions
inquiryProduct Details Keywords Dichlorodiethylsilane 1719-53-5 DIETHYLSILICIUMDICHLORID Quick Details ProName:Dichlorodiethylsilane CasNo:1719-53-5 Molecular Formula:C4H10Cl2
Cas:1719-53-5
Min.Order:10 Gram
Negotiable
Type:Trading Company
inquiryYinghao Pharm products include: leader molecule, heterocyclic compounds,chiral compounds, photoelectric materials, biochemical reagents etc. For example:benzene, pyrimidine, boricacid,pyridine, pyrazole, imidazole, pyrrole, fluorine and other derivat
At Share Chemical Company, we scrupulously abide by our policy of “Excellent Quality at a Reasonable Price”. We strive to satisfy all of our customers by providing the finest quality products supported by the finest in customer servi
Best quality & Attractive price & Professional service; Trial & Pilot & CommercialHenan Fine Chemicals Co., LTD. is a diversified technology - oriented integrated company, which mainly concentrates on fine chemicals. Our company is committed to becom
United Scientific Company Located in Shanghai of China , is a competitive player in the global specialty and fine chemical market. Fenghua has both the expertise and flexibility to produce a wide range of chemicals. Focusing on developing the innovat
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Shanghai, Run-Biotech Co., Ltd is a leading domestic pharmaceutical, biopharmaceutical, and health care products R & D outsourcing services company. As an innovation-driven and customer-focused company, Run Biotech provides a broad and integrated por
DichlorodiethylsilaneAppearance:liquid Storage:Flammables area Application:They can serve as chlorination agents. Chlorosilanes react vigorously with both organic and inorganic acids and with bases to generate toxic or flammable gases. Transportation
Silane,dichlorodiethyl- Storage:keep in dry and cool condition Package:25kg or according to cutomer's demand Application:Chemical research/pharma intermediate Transportation:By Sea,by Air,By courier like DHL or Fedx. Port:Shanghai/Shenzhen
Dichlorodiethylsilane Application:They can serve as chlorination agents. Chlorosilanes react vigorously with both organic and inorganic acids and with bases to generate toxic or flammable gases.
The company have effective management team, professional technical R & D personnel, the service spirit of customer oriented. We have long-term cooperation with famous domestic manufacturer, and excellent customer resources overseas. We are skilled in
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CFTC?PharmaChem?is?a?service?based?company?in?China,?a?pharmachem?division?of?Changzhou?Foreign?Trade?Corp.,supplying?raw?materials,?intermediates,?APIs?and?fine?chemicals?for?the?pharmaceutical?and?specialty?chemical?industries?worldwide. Applicatio
ethyltrichlorosilane
ethyltriethoxy silane
chloroethane
A
ethoxytriethylsilane
B
diethyldiethoxysilane
C
diethyldichlorosilane
Conditions | Yield |
---|---|
With magnesium at 60℃; for 1h; | A 18.5% B 74.2% C 5.2% |
Conditions | Yield |
---|---|
With copper; silicon In neat (no solvent) C2H5Cl and Si-Cu (8:2; heating of the pressed mixt. at 900-930°C in vac. for 2 h) at about 275°C;; | A 17% B 71% |
With Si-Cu In neat (no solvent) C2H5Cl and Si-Cu (8:2; heating of the pressed mixt. at 900-930°C in vac. for 2 h) at about 275°C;; | A 17% B 71% |
With copper; silicon at 300 - 325℃; | |
With copper; silicon at 300 - 325℃; |
ethyldichlorosilane
acetylene
A
(dichloro)(ethyl)vinylsilane
C
diethyldichlorosilane
Conditions | Yield |
---|---|
With bis(tributylphosphine)dichloropalladium(II) In xylene at 80℃; for 3h; | A 23% B 70% C 5% |
With bis-triphenylphosphine-palladium(II) chloride In xylene at 80℃; for 3h; Product distribution; other silanes, var. paladdium complexes and reaction time; | A 62% B 23% C 12% |
With bis-triphenylphosphine-palladium(II) chloride In xylene at 80℃; for 3h; | A 62% B 23% C 12% |
With palladium(II) acetylacetonate In xylene at 80℃; for 3h; | A 6% B 7% C 25% |
ethyltrichlorosilane
tetraethoxy orthosilicate
chloroethane
A
ethyltriethoxy silane
B
ethoxytriethylsilane
C
diethyldiethoxysilane
D
diethyldichlorosilane
Conditions | Yield |
---|---|
With magnesium at 50 - 100℃; | A 5.7% B 17.9% C 63.3% D 9.4% |
With magnesium at 60℃; for 1h; Temperature; | A 15.1% B 21.7% C 46.3% D 14.1% |
ethyltrichlorosilane
tetraethoxy orthosilicate
chloroethane
A
ethoxytriethylsilane
B
diethyldiethoxysilane
C
diethyldichlorosilane
Conditions | Yield |
---|---|
With magnesium at 50 - 100℃; | A 18.4% B 49.8% C 15.6% |
With magnesium at 60℃; for 1h; Temperature; | A 27.3% B 33.7% C 24.7% |
Conditions | Yield |
---|---|
With tetrachlorosilane | 45% |
With tetrachlorosilane | |
With tetrachlorosilane; diethyl ether |
ethyltrichlorosilane
ethyltriethoxy silane
chloroethane
A
triethylsilyl chloride
B
ethoxytriethylsilane
C
diethyldiethoxysilane
D
diethyldichlorosilane
Conditions | Yield |
---|---|
With magnesium at 60℃; for 1h; | A 5.2% B 18% C 43.4% D 29.7% |
Conditions | Yield |
---|---|
With Si-Cu-Co In neat (no solvent) byproducts: (CH3)3SiCl, HSiCl3, SiCl4; C2H5Cl and Si-Cu-Co (88:10:2) activated with CuCl-CuCl2 at 340-360°C;; | A 30% B 40% |
With Si-Cu-Co In neat (no solvent) byproducts: (CH3)3SiCl, HSiCl3, SiCl4; C2H5Cl and Si-Cu-Co (88:10:2) activated with CuCl-CuCl2 at 340-360°C;; | A 30% B 40% |
ethyltrichlorosilane
tetraethoxy orthosilicate
chloroethane
A
triethylsilyl chloride
B
ethoxytriethylsilane
C
diethyldiethoxysilane
D
diethyldichlorosilane
Conditions | Yield |
---|---|
With magnesium at 50 - 100℃; | A 8.5% B 20.7% C 39.4% D 28.8% |
chloroethane
A
ethyltrichlorosilane
B
tetrachlorosilane
C
triethylsilyl chloride
D
diethyldichlorosilane
Conditions | Yield |
---|---|
With Si-Cu In neat (no solvent) Si-Cu (9:1) and C2H5Cl at 300-325°C;; | A 27% B 37% C n/a D 26% |
With Si-Cu In neat (no solvent) Si-Cu (9:1) and C2H5Cl at 300-325°C;; | A 27% B 37% C n/a D 26% |
tetrachlorosilane
tetraethoxy orthosilicate
chloroethane
A
ethyltrichlorosilane
B
ethyltriethoxy silane
C
ethoxytriethylsilane
D
diethyldiethoxysilane
E
diethyldichlorosilane
Conditions | Yield |
---|---|
With magnesium at 60℃; for 1h; | A 5.6% B 12.3% C 21.9% D 33.6% E 15.3% |
ethyltrichlorosilane
tetraethoxy orthosilicate
chloroethane
A
ethoxytriethylsilane
B
diethyldiethoxysilane
C
hexaethyl disiloxane
D
diethyldichlorosilane
Conditions | Yield |
---|---|
With magnesium at 60℃; for 1h; Temperature; | A 29.2% B 25.6% C 11.6% D 13.1% |
tetrachlorosilane
tetraethoxy orthosilicate
chloroethane
A
ethyltrichlorosilane
B
triethylsilyl chloride
C
ethoxytriethylsilane
D
diethyldiethoxysilane
E
diethyldichlorosilane
Conditions | Yield |
---|---|
With magnesium at 60℃; for 1h; | A 28.5% B 7.6% C 7.6% D 14.6% E 21.6% |
Conditions | Yield |
---|---|
With aluminum (III) chloride at 120℃; for 3h; Time; Temperature; | 22% |
Conditions | Yield |
---|---|
With aluminium trichloride |
Conditions | Yield |
---|---|
With tetrachlorosilane; diethyl ether; sodium | |
With tetrachlorosilane; diethyl ether; magnesium |
Conditions | Yield |
---|---|
at 300℃; unter Druck; |
Conditions | Yield |
---|---|
With dihydrogen hexachloroplatinate; Dichlorosilane | |
With Pt/Al2O3; Dichlorosilane |
Conditions | Yield |
---|---|
With dihydrogen hexachloroplatinate; Dichlorosilane | |
With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex; Dichlorosilane at 20 - 60℃; under 4500.45 Torr; Autoclave; Cooling with liquid nitrogen; | A 40 %Chromat. B 45 %Chromat. |
With platinum on activated charcoal; Dichlorosilane |
Conditions | Yield |
---|---|
With copper; silicon at 300 - 325℃; | |
With copper; silicon In neat (no solvent) C2H5Cl and Si-Cu (85:15; prepared from Si and Cu(OH)2 by reduction with H2 at 200°C);; | |
With Si-Cu In neat (no solvent) C2H5Cl and Si-Cu (85:15; prepared from Si and Cu(OH)2 by reduction with H2 at 200°C);; | |
With copper; silicon at 300 - 325℃; |
diethylsilyl difluoride
A
diethyl-chloro-fluoro-silane
B
diethyldichlorosilane
Conditions | Yield |
---|---|
With aluminium trichloride; diethyl ether |
et2(et-1-Cl)SiCl
diethyldichlorosilane
Conditions | Yield |
---|---|
With aluminium trichloride |
Conditions | Yield |
---|---|
With tetrachlorosilane; diethyl ether |
tetraethoxy orthosilicate
ethylmagnesium chloride
A
ethyltrichlorosilane
B
triethylsilane
C
triethylsilyl chloride
D
diethyldiethoxysilane
E
hexaethyl disiloxane
F
diethyldichlorosilane
Conditions | Yield |
---|---|
With tetrachlorosilane Product distribution; multistep reaction; |
Conditions | Yield |
---|---|
at 250℃; im Druckrohr; |
ethyl bromide
diethyl ether
A
triethylsilane
B
triethylsilyl chloride
C
diethyldichlorosilane
quinoline
thionyl chloride
diethyldihydroxysilane
diethyldichlorosilane
Conditions | Yield |
---|---|
at 450℃; |
diethyldichlorosilane
phenylacetylene
diethylbis(phenylethynyl)silane
Conditions | Yield |
---|---|
Stage #1: phenylacetylene With n-butyllithium In tetrahydrofuran at -70℃; Inert atmosphere; Cooling with acetone-dry ice; Stage #2: diethyldichlorosilane In tetrahydrofuran at -5 - 20℃; Cooling with ice; | 100% |
With n-butyllithium In tetrahydrofuran at -70℃; | 96.3% |
Conditions | Yield |
---|---|
With triethylamine In toluene at 100℃; for 12h; Schlenk technique; Inert atmosphere; Glovebox; | 98.5% |
Conditions | Yield |
---|---|
In not given | 98% |
In not given | 98% |
Conditions | Yield |
---|---|
Stage #1: pent-4-enoic acid; diethyldichlorosilane With pyridine In toluene for 0.5h; Inert atmosphere; Stage #2: With chloro-trimethyl-silane In toluene for 0.5h; Inert atmosphere; | 98% |
2-bromo-6-phenylpyridine
diethyldichlorosilane
Conditions | Yield |
---|---|
Stage #1: 2-bromo-6-phenylpyridine With n-butyllithium In tetrahydrofuran; hexane at -78℃; for 0.333333h; Stage #2: diethyldichlorosilane In tetrahydrofuran; hexane at -78 - 20℃; | 98% |
cyclohexanone
diethyldichlorosilane
bis(cyclohexenyloxy)diethylsilane
Conditions | Yield |
---|---|
Stage #1: cyclohexanone With lithium diisopropyl amide In tetrahydrofuran at -78℃; Inert atmosphere; Stage #2: diethyldichlorosilane In tetrahydrofuran at -78 - 20℃; Inert atmosphere; | 97% |
Conditions | Yield |
---|---|
With polyaniline at 55 - 60℃; for 7h; | 95.3% |
With aniline |
{{(C6H4CH3)CC4H2N}4Os}2
diethyldichlorosilane
{(C6H4CH3)CC4H2N}4OsSi(C2H5)2(OC4H8)
Conditions | Yield |
---|---|
With K In tetrahydrofuran byproducts: KCl; (N2), (((C6H4CH3)CC4H2N)4Os)2 stirred in THF with K, filtrated, Cl2SiEt2 in THF added dropwise with stirring at ambient temp., mixt. stirred for 1 h; THF and excess silane removed, residue redissolved in C6H6, filtered, solvent removed, elem. anal.; | 95% |
Conditions | Yield |
---|---|
With triethylamine In tetrahydrofuran at 20℃; for 24h; Inert atmosphere; Glovebox; | 95% |
Conditions | Yield |
---|---|
In diethyl ether at -78 - 20℃; Schlenk technique; | 94.3% |
In diethyl ether at -78 - 20℃; Schlenk technique; | 94.3% |
In diethyl ether | 94.3% |
Conditions | Yield |
---|---|
In diethyl ether; pentane at 0 - 20℃; | 94% |
Conditions | Yield |
---|---|
With lithium In Petroleum ether at 50℃; for 1h; | 92% |
1,1′-bis(hydroperoxy)bis(cyclododecyl)peroxide
diethyldichlorosilane
29,29-diethyl-13,14,27,28,30,31-hexaoxa-29-siladispiro[11.2.11.5]hentriacontane
Conditions | Yield |
---|---|
With 1H-imidazole In tetrahydrofuran at 20 - 25℃; for 12h; | 92% |
1-Hydroxy-2-pyridon
diethyldichlorosilane
Et2Si(1-oxo-2-pyridinone)Cl
Conditions | Yield |
---|---|
With triethylamine In tetrahydrofuran at 20℃; for 1.33333h; Inert atmosphere; Glovebox; | 92% |
diethyldichlorosilane
Conditions | Yield |
---|---|
With lithium selenide In tetrahydrofuran at 25℃; for 15h; Reagent/catalyst; Schlenk technique; | 92% |
Conditions | Yield |
---|---|
With n-butyllithium In diethyl ether; hexane Inert atmosphere; Schlenk technique; Glovebox; | 90% |
diethyldichlorosilane
Conditions | Yield |
---|---|
Stage #1: 2-bromo-3H-cyclopenta[α]naphthalene; diethyldichlorosilane With n-butyllithium In diethyl ether; pentane at -80 - 20℃; for 2h; Stage #2: With diethyldichlorosilane In diethyl ether; pentane at -80℃; for 10h; | 90% |
Conditions | Yield |
---|---|
With n-butyllithium In tetrahydrofuran; hexane 1.) -78 deg C; 2.) up to RT, 3 h; | 88% |
With n-butyllithium In tetrahydrofuran |
5,11,17,23-tetra-t-butyl-25,26,27,28-tetrahydroxycalix-4-arene
diethyldichlorosilane
Conditions | Yield |
---|---|
With triethylamine In toluene for 48h; | 88% |
bis-(1-hydroperoxycyclohexyl)peroxide
diethyldichlorosilane
17,17-diethyl-7,8,15,16,18,19-hexaoxa-17-siladispiro[5.2.5.5]nonadecane
Conditions | Yield |
---|---|
With 1H-imidazole In tetrahydrofuran at 20 - 25℃; for 1h; | 88% |
With 1H-imidazole In tetrahydrofuran at 20 - 25℃; for 3h; | 84% |
Conditions | Yield |
---|---|
With 1H-imidazole In tetrahydrofuran at 20 - 25℃; for 3h; | 88% |
diethylamine
diethyldichlorosilane
1-chloro-N,N,1,1-tetraethylsilanamine
Conditions | Yield |
---|---|
With triethylamine In tetrahydrofuran at 0 - 20℃; for 18h; Inert atmosphere; | 88% |
With n-butyllithium In tetrahydrofuran; diethyl ether; hexane at -8 - 20℃; | 71% |
1,1′-bis(hydroperoxy)bis(cycloheptyl)peroxide
diethyldichlorosilane
19,19-diethyl-8,9,17,18,20,21-hexaoxa-19-siladispiro[6.2.6.5]henicosane
Conditions | Yield |
---|---|
With 1H-imidazole In tetrahydrofuran at 20 - 25℃; for 3h; | 86% |
diethyldichlorosilane
1,1'-dihydroperoxydi(2-adamantyl)peroxide
dispiro(adamantane-2,6'-3',3'-diethyl-1',2',4',5',7',8'-hexaoxasilonane-9',2''-adamantane)
Conditions | Yield |
---|---|
With 1H-imidazole In tetrahydrofuran at 20 - 25℃; for 8h; | 86% |
1,1’-dihydroperoxydi(cyclopentyl)peroxide
diethyldichlorosilane
15,15-diethyl-6,7,13,14,15,16,17-hexaoxa-15-siladispiro[4.2.4.5]heptadecane
Conditions | Yield |
---|---|
With 1H-imidazole In tetrahydrofuran at 20 - 25℃; for 3h; | 85% |
Conditions | Yield |
---|---|
Stage #1: C20H18N2O3S With sodium In methanol for 3h; Inert atmosphere; Reflux; Stage #2: diethyldichlorosilane With triethylamine In methanol Inert atmosphere; Reflux; | 85% |
Conditions | Yield |
---|---|
at 120 - 125℃; for 8h; | 85% |
at 120 - 125℃; for 8h; | 85% |
at 120 - 125℃; for 8h; | 85% |
at 120 - 125℃; for 8h; | 85% |
3,4-dichlorobut-1-ene
diethyldichlorosilane
1,1-diethyl-1-silacyclopent-3-ene
Conditions | Yield |
---|---|
With 4,4'-di-tert-butylbiphenyl; lithium In tetrahydrofuran at 0℃; for 0.75h; | 83% |
Conditions | Yield |
---|---|
With water at 20℃; | 82% |
1-Bromo-2,4-dimethoxybenzene
diethyldichlorosilane
Conditions | Yield |
---|---|
Stage #1: 1-Bromo-2,4-dimethoxybenzene With tert.-butyl lithium In hexane; pentane at -78℃; for 0.5h; Inert atmosphere; Stage #2: diethyldichlorosilane With N,N,N,N,-tetramethylethylenediamine In hexane; pentane at -78 - 20℃; for 0.5h; Inert atmosphere; | 82% |
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