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Conditions | Yield |
---|---|
With mesoporous silica MCM-4l/Al at 399.84℃; under 21.0021 - 94.5095 Torr; for 50h; Inert N2; | 100% |
With H-USY zeolite at 299.84℃; under 760.051 Torr; for 1.5h; Catalytic behavior; Reagent/catalyst; Time; Temperature; Inert atmosphere; Flow reactor; | 100% |
With water at 380℃; under 1500.15 Torr; Reagent/catalyst; | 99% |
Conditions | Yield |
---|---|
In dichloromethane for 1h; Yields of byproduct given; | A n/a B 100% |
Conditions | Yield |
---|---|
In dichloromethane for 1h; Yields of byproduct given; | A n/a B 100% |
5-cyclopentylidene-2,2-dimethyl-1,3-dioxane-4,6-dione
A
butatriene
B
ethene
C
carbon dioxide
D
cyclohexa-1,3-diene
E
acetone
F
benzene
Conditions | Yield |
---|---|
With variation of temp. at 550℃; Product distribution; | A 4% B 11.9% C 100% D 39.2% E 101.9 % F 3.3% |
Conditions | Yield |
---|---|
With tungsten In octane; chlorobenzene at 80℃; for 1h; | A 100% B n/a |
With chloroaryloxide neopentylidene complex of tungsten (1) | A 90% B n/a |
(2,6-Ph2C6H3O)2W(Cl)=CHC(CH3)3*OEt2 In chlorobenzene at 80℃; for 3h; | A 88% B n/a |
Conditions | Yield |
---|---|
With bis(1,5-cyclooctadiene)nickel (0); triphenylphosphine at 54℃; for 20h; Product distribution; Rate constant; Thermodynamic data; other solvents, reagents, reagents ratio, time, temperature; activation energy, ΔH<*>, ΔS<*>; | A 100% B n/a C 100% |
Conditions | Yield |
---|---|
With trifluoroacetic acid at 120℃; | 100% |
Conditions | Yield |
---|---|
With tungsten In octane; chlorobenzene at 80℃; for 2h; | A 100% B n/a |
With Grubbs catalyst first generation In dichloromethane |
3-allylsulfanyl-2-methyl-propene
A
3-methyl-2,5-dihydro-thiophene
B
ethene
Conditions | Yield |
---|---|
With tungsten In octane; chlorobenzene at 80℃; for 1h; | A 100% B n/a |
2-phenylethanol
ethenyltrimethylsilane
A
ethene
B
trimethyl(phenethyloxy)silane
Conditions | Yield |
---|---|
hydrogenchloride; chlorobis(ethylene)rhodium(I) dimer In 1,4-dioxane; chloroform at 20℃; for 2h; Product distribution / selectivity; | A n/a B 100% |
chlorobis(cyclooctene)rhodium(I) dimer In toluene at 70℃; for 3h; Product distribution / selectivity; | A n/a B 100% |
hydrogenchloride; chlorobis(cyclooctene)rhodium(I) dimer In 1,4-dioxane; chloroform at 20℃; for 2h; Product distribution / selectivity; | A n/a B 96% |
ethanol
dimethylphenylvinylsilane
A
ethene
B
dimethyl(ethoxy)phenylsilane
Conditions | Yield |
---|---|
hydrogenchloride; chlorobis(cyclooctene)rhodium(I) dimer In 1,4-dioxane; chloroform at 20℃; for 18h; Kinetics; | A n/a B 100% |
isopropyl alcohol
dimethylphenylvinylsilane
A
ethene
B
dimethyl(isopropoxy)phenylsilane
Conditions | Yield |
---|---|
hydrogenchloride; chlorobis(cyclooctene)rhodium(I) dimer In 1,4-dioxane; chloroform at 20℃; for 24h; Kinetics; | A n/a B 100% |
Conditions | Yield |
---|---|
With oxygen In acetonitrile byproducts: {Co(2,2'-bipyridine)2}(2+); one-electron oxidn. of cis-Co complex by (Fe(phen)3(3+) in presence of O2 at 298 K; monitored by (1)H-NMR; | A <1 B <1 C 100% |
In acetonitrile byproducts: {Co(2,2'-bipyridine)2}(2+); one-electron oxidn. of cis-Co complex by (Fe(phen)3(3+) at 298 K; monitored by (1)H-NMR; | A <1 B <1 C 98% |
Conditions | Yield |
---|---|
In acetonitrile byproducts: {Co(2,2'-bipyridine)2}(2+); one-electron oxidn. of cis-Co complex by (Fe(bpy)3(3+) at 298 K; monitored by (1)H-NMR; | A <1 B <1 C 100% |
diethylbis(triethylphosphine)platinum(II)
A
(ethylene)bis(triethylphosphine)platinum(0)
B
ethene
Conditions | Yield |
---|---|
In cyclohexane Pt-complex evacuated to 0.1 torr, flushed with Ar, dry degassed cyclohexane added, cooled (liq. N2), evacuated (0.1 torr), sealed, warmed to room temp., heated at 118°C (oil bath) for 30 min; | A 100% B 0% |
bis(1,5-cyclooctadiene)nickel (0)
tetrakis(triphenylphosphine)nickel(0)
B
(triphenylphosphine)3(CO)nickelk
C
ethene
D
phenol
Conditions | Yield |
---|---|
With triphenylphosphine In neat (no solvent) (N2 or Ar or vac.), EtCOOPh added to Ni(cod)2 and Ni(PPh3)4, mixture stirred at 54°C for 20 h; GLC; | A 73% B n/a C 100% D 91% |
bis(1,5-cyclooctadiene)nickel (0)
phenyl propionate
A
(triphenylphosphine)3(CO)nickelk
B
ethene
C
phenol
Conditions | Yield |
---|---|
With triphenylphosphine In neat (no solvent) Kinetics; byproducts: diethyl ketone, 1,3-cyclooctadiene, 1,4-cyclooctadiene; further byproducts: 1,5-cyclooctadiene, bicyclooctene-1, bicyclooctene-2, (N2 or Ar or vac.), EtCOOPh added to Ni(cod)2 and PPh3 (PPh3/Ni = 10), mixture stirred at 54°C for 21 h; gas chromy., volatile removed in vac., recrystd. from THF-hexane; | A 80% B 100% C 100% |
With triphenylphosphine In neat (no solvent) Kinetics; byproducts: diethyl ketone, 1,3-cyclooctadiene, 1,4-cyclooctadiene; further byproducts: 1,5-cyclooctadiene, bicyclooctene-1, bicyclooctene-2, (N2 or Ar or vac.), EtCOOPh added to Ni(cod)2 and PPh3 (PPh3/Ni = 4),mixture stirred at 54°C for 20 h; gas chromy., volatile removed in vac., recrystd. from THF-hexane; | A 60% B 100% C 100% |
With triphenylphosphine In neat (no solvent) Kinetics; byproducts: diethyl ketone, 1,3-cyclooctadiene, 1,4-cyclooctadiene; further byproducts: 1,5-cyclooctadiene, bicyclooctene-1, bicyclooctene-2, (N2 or Ar or vac.), EtCOOPh added to Ni(cod)2 and PPh3 (PPh3/Ni = 3),mixture stirred at 54°C for 20 h; gas chromy., volatile removed in vac., recrystd. from THF-hexane; | A 60% B 90% C 90% |
With triphenylphosphine In neat (no solvent) Kinetics; byproducts: diethyl ketone, 1,3-cyclooctadiene, 1,4-cyclooctadiene; further byproducts: 1,5-cyclooctadiene, bicyclooctene-1, bicyclooctene-2, (N2 or Ar or vac.), EtCOOPh added to Ni(cod)2 and PPh3 (PPh3/Ni = 2),mixture stirred at 54°C for 12 h; gas chromy., volatile removed in vac., recrystd. from THF-hexane; | A 30% B 60% C 60% |
With triphenylphosphine In neat (no solvent) Kinetics; byproducts: diethyl ketone, 1,3-cyclooctadiene, 1,4-cyclooctadiene; further byproducts: 1,5-cyclooctadiene, bicyclooctene-1, bicyclooctene-2, (N2 or Ar or vac.), EtCOOPh added to Ni(cod)2 and PPh3 (PPh3/Ni = 1),mixture stirred at 54°C for 12 h; gas chromy., volatile removed in vac., recrystd. from THF-hexane; | A n/a B 40% C 50% |
bis(1,5-cyclooctadiene)nickel (0)
phenyl propionate
Tri(p-tolyl)phosphine
A
ethene
B
Ni(CO)(P(C6H4CH3)3)3
C
phenol
Conditions | Yield |
---|---|
In further solvent(s) Kinetics; (N2 or Ar or vac.), EtCOOPh added to Ni(cod)2 and P(C6H4CH3)3 (P(Ph-CH3)3/Ni = 3) in acetophenone, mixture stirred at 65°C for 50 h; | A 80% B 85% C 100% |
N,N-Diallyltosylamide
A
ethene
B
1-[(4-methylphenyl)sulfonyl]-2,5-dihydro-1H-pyrrole
Conditions | Yield |
---|---|
With Hoveyda-Grubbs catalyst second generation In dichloromethane at 40℃; for 1h; Concentration; Solvent; Temperature; Grubbs Olefin Metathesis; Flow reactor; | A n/a B 100% |
With Hoveyda-Grubbs catalyst second generation In (2)H8-toluene at 29.84℃; Reagent/catalyst; |
1,3-dithiolane-2-thione
dimethyl acetylenedicarboxylate
A
4,5-bis(methoxycarbonyl)-1,3-dithiole-2-thione
B
ethene
Conditions | Yield |
---|---|
at 120 - 140℃; | A 99.6% B n/a |
Conditions | Yield |
---|---|
With triethylamine In water at 20℃; for 2h; Inert atmosphere; Irradiation; | 99% |
With vanadocene In hexane Product distribution; vanadocene monobromide, vanadocene monochloride; other temperature and reaction time.; | 62% |
Electrolysis; |
Conditions | Yield |
---|---|
In chlorobenzene for 24h; Heating; | A 99% B n/a |
7-Aza-bicyclo[2.2.1]hept-2-ene-1,2,3,4-tetracarboxylic acid diisopropyl ester dimethyl ester
A
ethene
B
1H-Pyrrole-2,3,4,5-tetracarboxylic acid diisopropyl ester dimethyl ester
Conditions | Yield |
---|---|
at 90 - 120℃; for 3h; | A n/a B 99% |
Conditions | Yield |
---|---|
With alumina at 449.84℃; Catalytic behavior; Reagent/catalyst; Temperature; Inert atmosphere; Overall yield = 100 %; | A 0.1% B 98.9% |
C2I2O2Rh(1-)*C8H20N(1+); tetraethylammonium iodide; hydrogen iodide In water at 110℃; Product distribution / selectivity; Inert atmosphere; Autoclave; | A 10% B 50% |
1-methyl-3-(propyl-3-sulfonyl)imidazolium trifluoromethanesulfonate; CF3O3S(1-)*CHF3O3S*C7H13N2O3S(1+) at 240 - 260℃; for 4h; Product distribution / selectivity; | A n/a B 12% |
methane
ethene
Conditions | Yield |
---|---|
under 760.051 Torr; Recess waveguide; Gas phase; | 98.53% |
With hydrogen under 760.051 Torr; Product distribution / selectivity; Microwave irradiation; | 96.4% |
Stage #1: methane Stage #2: With alumina at 125℃; Reagent/catalyst; Temperature; | 55% |
Conditions | Yield |
---|---|
With oxygen; V-Mo-Nb-Te oxide | 98% |
at 800℃; under 760.051 Torr; for 1h; Catalytic behavior; Gas phase; Flow reactor; | 84% |
With disulfur; iron(II,III) oxide at 940℃; Reagent/catalyst; Temperature; Flow reactor; | 75.9% |
Conditions | Yield |
---|---|
With iron sulfide at 800 - 900℃; other metal sulfides; | A 2% B 98% |
With SAPO-34/HZSM-5 nanostructure In water at 370℃; for 20h; Reagent/catalyst; Inert atmosphere; |
7-Aza-bicyclo[2.2.1]hept-2-ene-1,2,3,4-tetracarboxylic acid tetramethyl ester
A
ethene
B
tetramethyl 1H-pyrrole-2,3,4,5-tetracarboxylate
Conditions | Yield |
---|---|
at 90 - 120℃; for 3h; | A n/a B 98% |
7-Aza-bicyclo[2.2.1]hept-2-ene-1,2,3,4-tetracarboxylic acid di-tert-butyl ester dimethyl ester
A
ethene
B
1H-Pyrrole-2,3,4,5-tetracarboxylic acid di-tert-butyl ester dimethyl ester
Conditions | Yield |
---|---|
at 90 - 120℃; for 3h; | A n/a B 98% |
7-Aza-bicyclo[2.2.1]hept-2-ene-1,2,3,4-tetracarboxylic acid dicyclohexyl ester dimethyl ester
A
ethene
B
1H-Pyrrole-2,3,4,5-tetracarboxylic acid dicyclohexyl ester dimethyl ester
Conditions | Yield |
---|---|
at 90 - 120℃; for 3h; | A n/a B 98% |
Conditions | Yield |
---|---|
With trimethylamine-N-oxide; [N(4-C6H4Br)3][B(C6F5)4]; triethylaluminum; [Cr(CO)4(2-C6H4(MeO))2PN(Me)P(2-C6H4(MeO))2] In toluene at 60℃; under 30002.4 Torr; for 1h; | 100% |
In chlorobenzene at 45℃; under 36201.3 Torr; for 4h; Product distribution / selectivity; | 99% |
In chlorobenzene at 60℃; under 36201.3 Torr; for 4h; Product distribution / selectivity; | 99% |
Conditions | Yield |
---|---|
With hydrogen; [Ru2(μ-O2C-C6H4-CO2)2] at 20℃; for 5.4h; Kinetics; Product distribution; Further Variations:; Catalysts; reaction times; | 100% |
With [1,1-(1,3-dimethylimidazol-2-ylidene)(PPh3)-3-(Py)-1,2-RhSB9H8]; hydrogen In dichloromethane-d2 under 3750.38 Torr; for 12h; Catalytic behavior; Time; Inert atmosphere; | 73% |
With hydrogen; palladium | 25% |
ethene
bis(2-chloroethyl)selenium dichloride
Conditions | Yield |
---|---|
With selenium tetrachloride In benzene | 100% |
With tetrachlorosilane; chloroform | |
With diselenium dichloride; benzene |
Conditions | Yield |
---|---|
With bis(benzonitrile)palladium(II) dichloride; py.Co(N,N'-bis(alicylidene-o-phenylene)diamino).NO2 In tetrahydrofuran at 50℃; under 760 Torr; for 0.916667h; | 100% |
With bis(benzonitrile)palladium(II) dichloride; py.Co(N,N'-bis(alicylidene-o-phenylene)diamino).NO2 In tetrahydrofuran at 50℃; under 760 Torr; for 0.916667h; Product distribution; influence of Pd/Co ratio, solvent, further olefins; | 100% |
With aluminum(III) sulfate; water at 350 - 360℃; |
Conditions | Yield |
---|---|
With silver trifluoromethanesulfonate; triphenylphosphine; bi(allylnickel bromide) In dichloromethane at -55℃; under 760 Torr; for 2h; | 100% |
With bi(allylnickel bromide); silver trifluoromethanesulfonate; triphenylphosphine In dichloromethane at -55℃; under 760 Torr; for 2h; Addition; Hydrovinylation; | 95% |
With 2; diethylaluminium chloride; triphenylphosphine In dichloromethane; toluene under 7500.6 Torr; for 0.5h; | 90% |
Conditions | Yield |
---|---|
Irradiation (UV/VIS); 44 h; | 100% |
Irradiation (UV/VIS); 44 h; | 100% |
Irradiation; |
ethene
1,4-Dithia-7-azanorbornylium hexafluoroarsenate
Conditions | Yield |
---|---|
With dithionitronium hexafluoroarsenate In liquid sulphur dioxide Ambient temperature; | 100% |
With dithionitronium hexafluoroarsenate In liquid sulphur dioxide for 1h; Ambient temperature; | 100% |
Conditions | Yield |
---|---|
di(rhodium)tetracarbonyl dichloride In ethanol at 115℃; under 37503 Torr; for 1.5h; | 100% |
ethene
4-ethoxyphenylacetic acid chloride
6-ethoxy-3,4-dihydro-2(1H)-naphthalenone
Conditions | Yield |
---|---|
With aluminium trichloride In dichloromethane for 4h; Ambient temperature; | 100% |
ethene
Conditions | Yield |
---|---|
With triphenylphosphine; bis(1,5-cyclooctadiene)nickel (0) In toluene at 25℃; under 22502.3 Torr; for 70h; | 100% |
With tetramethyldialuminoxane; N,N'-(1,1-Me2-ethylene)bis(salicylideneaminato)Zr(IV)Cl2*THF In toluene at 25℃; under 7500.6 Torr; for 24h; Polymerization; | |
Pd-2 at 22℃; under 4137.18 Torr; for 12h; Polymerization; |
ethene
3-acetoxy-3-(4-methoxyphenyl)prop-1-yne
Conditions | Yield |
---|---|
With RuCl2(P(C6H11)3)(1,3-dimesityl-4,5-dihydroimidazol-2-ylidene)(=CHC6H5) In toluene at 80℃; under 760 Torr; for 0.5h; | 100% |
With tricyclohexylphosphine[1,3-bis(2,4,6-trimethylphenyl)-4,5-dihydroimidazol-2-ylidine][benzylidene]ruthenium(II) dichloride In toluene at 80℃; under 760.051 Torr; for 0.5h; | 100% |
ethene
Conditions | Yield |
---|---|
With RuCl2(P(C6H11)3)(1,3-dimesityl-4,5-dihydroimidazol-2-ylidene)(=CHC6H5) In toluene at 80℃; under 760 Torr; for 0.5h; | 100% |
With tricyclohexylphosphine[1,3-bis(2,4,6-trimethylphenyl)-4,5-dihydroimidazol-2-ylidine][benzylidene]ruthenium(II) dichloride In toluene at 80℃; under 760.051 Torr; for 2h; | 94% |
ethene
(1S,4R,5S,6R)-5,6-Bis-prop-2-ynyloxy-bicyclo[2.2.1]hept-2-ene
(4aS,4bR,8aS,9aR)-2,7-Divinyl-4a,4b,6,8a,9,9a-hexahydro-3H-4,5-dioxa-fluorene
Conditions | Yield |
---|---|
Grubbs catalyst first generation In dichloromethane at 20℃; for 4h; | 100% |
Grubbs catalyst first generation In dichloromethane at 20℃; for 4h; | 53% |
ethene
N-(cyclopentenylmethyl)-4-methyl-N-(prop-2-ynyl)benzenesulfonamide
Conditions | Yield |
---|---|
Cl2(PCy3)(N,N'-(Mes)2-imidazolidin-2-yl)Ru=CHC6H5 In dichloromethane under 760.051 Torr; for 26h; Heating; | 100% |
ethene
8,8-dimethyl-4-phenyl-6,10-dioxa-spiro[4.5]deca-1,3-diene-1,2-dicarboxylic acid dimethyl ester
Conditions | Yield |
---|---|
In toluene at 100℃; for 192h; Diels-Alder reaction; ambient pressure; | 100% |
Conditions | Yield |
---|---|
With Vazo64 | 100% |
With triethyl phosphite | 71% |
With hydrazine hydrate; copper (I) acetate In isopropyl alcohol at 30℃; under 22800 Torr; for 4h; | 69% |
copper at 80℃; under 6000.6 - 7500.75 Torr; for 1.33333h; Product distribution / selectivity; | |
With VAZO 64 at 65 - 81℃; under 4897.34 - 8931.21 Torr; for 3h; Industry scale; Autoclave; | 97.3 %Chromat. |
ethene
Conditions | Yield |
---|---|
tricyclohexylphosphine[1,3-bis(2,4,6-trimethylphenyl)-4,5-dihydroimidazol-2-ylidine][benzylidene]ruthenium(II) dichloride In toluene at 80℃; | 100% |
ethene
Conditions | Yield |
---|---|
tricyclohexylphosphine[1,3-bis(2,4,6-trimethylphenyl)-4,5-dihydroimidazol-2-ylidine][benzylidene]ruthenium(II) dichloride In toluene at 80℃; | 100% |
ethene
Conditions | Yield |
---|---|
tricyclohexylphosphine[1,3-bis(2,4,6-trimethylphenyl)-4,5-dihydroimidazol-2-ylidine][benzylidene]ruthenium(II) dichloride In toluene at 80℃; | 100% |
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