Items Standard Result Assay (Ursolic acid) 98%min 98.22% ----------------------------------------------------------------
Cas:4667-99-6
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inquiryTRIETHOXYCHLOROSILANE Basic information Product Name: TRIETHOXYCHLOROSILANE Synonyms: CHLOROTRIETHOXYSILANE;TRIETHOXYCHLOROSILANE;chlorotriethoxy-silan;Silane,chlorotriethoxy-;Chlorotriethoxysilane,Triethoxychlorosilane;Triethoxychlorosilane, tec
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inquiryHenan Wentao Chemical Product Co.,Ltd is Located in Zhengzhou High-tech Development Zone with import and export license, We passed ISO 9001:2008 as well, Henan Wentao has developed more than 1000 compounds, which are widely used in the fields of prod
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TRIETHOXYCHLOROSILANE 4667-99-6, 80%Appearance:colorless liquid Storage:closed and cool Package:according to customers' requirements Application:intermediates Transportation:By air(EMS or EUB or FedEx or TNT ect...) or by sea(FOB or CIF or CNF ect...
Zhenyu biotech exported this product to many countries and regions at best price. if you are looking for the material's manufacturer or supplier in china, zhenyu biotech is your best choice. pls contact with us freely for getting detailed
Cas:4667-99-6
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inquiryWe are a Union of chemistry in China, consists of chemists,engineers, laboratories,factories in China. We organize surplus capacity of R&D and production as well as custom synthesis for chemical products and chemical business project. We are supp
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inquiryHunan chemfish Pharmaceutical co.,Ltd.located in Lugu High-tech industral park ,Hunan province . with its own R&D center and more than 10000㎡manufacture plant . Chemfish owns 40 reactors from 1000L to 8000L. With complete auxiliary equipment as
Lower price, sample is available,SDS test documents are available,large stock in warehouseAppearance:White powder Storage:Sealed and preserved Package:200/Kilograms Application:Fine chemical intermediates, used as the main raw material for the synthe
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TriethoxychlorosilaneAppearance:white crystalline powder Storage:Store in dry, dark and ventilated place Package:25KG drum Application:pharmaceutical intermediate Transportation:by air, by sea, by express
Stock products, own laboratory Package:Grams, Kilograms Application:For R&D Transportation:According to customer request Port:Shanghai
factory?direct?saleAppearance:White powder Storage:Sealed and preserved Package:200/Kilograms Application:healing drugs Transportation:By sea Port:Shanghai/tianjin
TRIETHOXYCHLOROSILANE 4667-99-6, 80%Appearance:colorless liquid Storage:closed and cool Package:sealed in bottles Application:intermediates Transportation:air, courier and sea
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Min.Order:10 Milligram
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Type:Lab/Research institutions
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Cas:4667-99-6
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inquiry1. Subsidiary of Institute of Chemistry, Henan Academy of Sciences, national research platform;2. About 30 years’ experience in this field since 1983;3. An experienced R&D team consisting of Doctors and Masters;4. Various types of analytical instrume
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inquiryConditions | Yield |
---|---|
With trichloroisocyanuric acid In dichloromethane Heating; | 99.7% |
With trichloroisocyanuric acid; copper(l) chloride In dichloromethane at 25℃; for 4h; Temperature; Reagent/catalyst; Reflux; Inert atmosphere; |
tetraethoxy orthosilicate
acetyl chloride
A
chlorotriethoxysilane
B
ethyl acetate
Conditions | Yield |
---|---|
With aluminium trichloride Heating; | A 92% B n/a |
Conditions | Yield |
---|---|
With tetrachlorosilane at 20 - 25℃; for 2.16667h; Product distribution / selectivity; | 86% |
With thionyl chloride In N,N-dimethyl-formamide at 25℃; for 4h; | 85% |
With tetrachlorosilane at 20℃; Product distribution / selectivity; | 73% |
Methyltrichlorosilane
tetraethoxy orthosilicate
A
ethoxy(methyl)dichlorosilane
B
chloro(diethoxy)(methyl)silane
C
chlorotriethoxysilane
Conditions | Yield |
---|---|
at 20 - 22℃; for 150h; | A 86% B 12% C n/a |
at 20 - 22℃; for 150h; | A n/a B n/a C 5% |
tetrachlorosilane
tetraethoxy orthosilicate
chlorotriethoxysilane
Conditions | Yield |
---|---|
In neat (no solvent) heating of Si(OC2H5)4 and SiCl4 (3:1 mol) at 150°C in a closed tube;; | 85% |
In neat (no solvent) heating of Si(OC2H5)4 and SiCl4 (3:1 mol) at 150°C in a closed tube;; | 85% |
In neat (no solvent) heating of Si(OC2H5)4 and SiCl4 (3:1 mol) at 150°C in a closed tube;; | |
In neat (no solvent) heating of Si(OC2H5)4 and SiCl4 (3:1 mol) at 150°C in a closed tube;; |
tetraethoxy orthosilicate
dichloromethylphenylsilane
A
chlorotriethoxysilane
B
chloro(phenyl)ethoxy(methyl)silane
C
diethoxy-methyl-phenyl-silane
Conditions | Yield |
---|---|
at 20 - 22℃; for 160h; | A 5.13 g B 83% C 15% |
at 20 - 22℃; for 160h; | A 5.13 g B 5.01 g C 0.96 g |
Conditions | Yield |
---|---|
With tetrachlorosilane at 20 - 30℃; for 2.5 - 24h; Product distribution / selectivity; | 14.4% |
dichlorodiethoxysilane
A
trichloroethoxysilane
B
chlorotriethoxysilane
Conditions | Yield |
---|---|
at 160℃; Gleichgewicht; | |
bei der Destillation; |
tetraethoxy orthosilicate
benzoyl chloride
A
chlorotriethoxysilane
B
benzoic acid ethyl ester
Conditions | Yield |
---|---|
at 135℃; | |
at 170 - 180℃; | |
at 160℃; for 1h; |
chloro-trimethyl-silane
tetraethoxy orthosilicate
A
ethoxy(methyl)dichlorosilane
B
chloro(diethoxy)(methyl)silane
C
dichlorodiethoxysilane
D
chlorotriethoxysilane
Conditions | Yield |
---|---|
Product distribution; | A 51.3 % Spectr. B 6.4 % Spectr. C 25.6 % Spectr. D 10.3 % Spectr. |
Methyltrichlorosilane
tetraethoxy orthosilicate
A
ethoxy(methyl)dichlorosilane
B
trichloroethoxysilane
C
chloro(diethoxy)(methyl)silane
D
dichlorodiethoxysilane
E
Methyltriethoxysilan
F
chlorotriethoxysilane
Conditions | Yield |
---|---|
N,N-dimethyl-formamide at 90℃; for 5.5h; Product distribution; Thermodynamic data; Equilibrium constant; ΔG0, ΔH0; |
tetraethoxy orthosilicate
trichlorovinylsilane
A
trichloroethoxysilane
B
dichlorodiethoxysilane
C
chlorotriethoxysilane
D
Triethoxyvinylsilane
E
vinyldi(ethoxy)chlorosilane
F
vinyl(ethoxy)dichlorosilane
Conditions | Yield |
---|---|
N,N-dimethyl-formamide at 90℃; for 5.5h; Product distribution; Thermodynamic data; Equilibrium constant; ΔG0, ΔH0; |
tetraethoxy orthosilicate
Phenyltrichlorosilane
A
trichloroethoxysilane
B
dichlorodiethoxysilane
C
chlorotriethoxysilane
D
phenyldiethoxychlorosilane
E
triethoxyphenylsilane
F
phenylethoxydichlorosilane
Conditions | Yield |
---|---|
N,N-dimethyl-formamide at 90℃; for 5.5h; Product distribution; Thermodynamic data; Equilibrium constant; ΔG0, ΔH0; |
tetraethoxy orthosilicate
Phenyltrichlorosilane
A
trichloroethoxysilane
B
dichlorodiethoxysilane
C
chlorotriethoxysilane
D
phenyldiethoxychlorosilane
E
phenylethoxydichlorosilane
Conditions | Yield |
---|---|
Product distribution; | A 4.4 % Spectr. B 25.6 % Spectr. C 5.0 % Spectr. D 4.3 % Spectr. E 45.0 % Spectr. |
tetraethoxy orthosilicate
1,1,1,3,3,3-hexachloro-1,3-disilapropane
A
chlorotriethoxysilane
Conditions | Yield |
---|---|
at 20 - 22℃; for 160h; | A 8.9 g B 0.74 g C 5.5 g |
ethanol
A
tetraethoxy orthosilicate
B
dichlorodiethoxysilane
C
chlorotriethoxysilane
Conditions | Yield |
---|---|
With tetrachlorosilane In pentane -70 deg C to room t.; Yield given. Yields of byproduct given. Title compound not separated from byproducts; |
chlorotriethoxysilane
2-(1-Hydroxybenzyl)-1,3,2-dioxaphosphorinan-2-oxide
Conditions | Yield |
---|---|
With pyridine In toluene Ambient temperature; | 98% |
chlorotriethoxysilane
Conditions | Yield |
---|---|
With 1H-imidazole; dmap In N,N-dimethyl-formamide at 20℃; for 3h; | 97% |
chlorotriethoxysilane
lithium phenylacetylide
1-triethoxysilyl-2-phenylacetylene
Conditions | Yield |
---|---|
In tetrahydrofuran at 20℃; | 95% |
chlorotriethoxysilane
phenylacetylene
1-triethoxysilyl-2-phenylacetylene
Conditions | Yield |
---|---|
Stage #1: phenylacetylene With n-butyllithium In tetrahydrofuran; hexane at -70 - 20℃; Stage #2: chlorotriethoxysilane In tetrahydrofuran; hexane at 0 - 20℃; Further stages.; | 95% |
Stage #1: phenylacetylene With n-butyllithium In tetrahydrofuran; hexane at 0℃; Stage #2: chlorotriethoxysilane In tetrahydrofuran; hexane at -78 - 20℃; for 16h; |
chlorotriethoxysilane
diethylamine
A
tetraethoxy orthosilicate
B
N-(triethoxysilyl)diethylamine
Conditions | Yield |
---|---|
With triethylamine In n-heptane at 20℃; Product distribution / selectivity; | A 6% B 93% |
Conditions | Yield |
---|---|
Stage #1: C74H54N4O2 With triethylamine In tetrahydrofuran at 20℃; for 0.166667h; Stage #2: chlorotriethoxysilane In tetrahydrofuran at 20℃; for 15h; | 93% |
Conditions | Yield |
---|---|
With triethylamine In tetrahydrofuran at 20℃; for 1h; | 90.6% |
With triethylamine In tetrahydrofuran at 20℃; for 1h; Sealed tube; | 90.6% |
chlorotriethoxysilane
ammonium thiocyanate
triethoxy isothiocyanato silane
Conditions | Yield |
---|---|
In cyclohexane for 30h; Heating; | 90% |
chlorotriethoxysilane
Conditions | Yield |
---|---|
In ethanol; glycerol | 90% |
Conditions | Yield |
---|---|
In tetrahydrofuran at 60℃; for 12h; Inert atmosphere; | 87% |
Conditions | Yield |
---|---|
In tetrahydrofuran at -20 - 20℃; for 1h; | 87% |
Conditions | Yield |
---|---|
With triethylamine In toluene at 20℃; for 1h; Inert atmosphere; Schlenk technique; | 86% |
Conditions | Yield |
---|---|
With pyridine In tetrahydrofuran at 20℃; for 2h; | 85% |
With pyridine In tetrahydrofuran at 20℃; for 2h; Sealed tube; | 85% |
chlorotriethoxysilane
chloroprene
(buta-1,3-dien-2-yl)triethoxysilane
Conditions | Yield |
---|---|
Stage #1: chloroprene With 1,1-Dibromoethane; magnesium; zinc(II) chloride In tetrahydrofuran; xylene for 0.75h; Heating; Stage #2: chlorotriethoxysilane In tetrahydrofuran for 1h; Heating; Further stages.; | 84.7% |
Stage #1: chloroprene With magnesium; ethylene dibromide; zinc(II) chloride In tetrahydrofuran; xylenes for 1.33333h; Heating / reflux; Stage #2: chlorotriethoxysilane In tetrahydrofuran; xylenes at 20℃; for 1h; Heating / reflux; | 84.7% |
Stage #1: chloroprene With magnesium; ethylene dibromide; zinc(II) chloride In tetrahydrofuran; xylenes for 1.25h; Reflux; Stage #2: chlorotriethoxysilane In tetrahydrofuran; xylenes for 1h; Reflux; |
chlorotriethoxysilane
silver thiocyanate
triethoxy isothiocyanato silane
Conditions | Yield |
---|---|
In benzene | 80% |
In benzene | 80% |
With benzene |
3-[(trifluorovinyl)oxy]bromobenzene
chlorotriethoxysilane
[3-[(trifluorovinyl)oxy]phenyl]triethoxysilane
Conditions | Yield |
---|---|
Stage #1: 3-[(trifluorovinyl)oxy]bromobenzene With magnesium In tetrahydrofuran at 0 - 20℃; for 2h; Stage #2: chlorotriethoxysilane In tetrahydrofuran at -48 - 20℃; for 24h; | 80% |
chlorotriethoxysilane
acetylenemagnesium bromide
triethoxyethynylsilane
Conditions | Yield |
---|---|
In tetrahydrofuran at -78 - 50℃; for 5h; | 80% |
Conditions | Yield |
---|---|
With 2-((2,4,6-trimethylphenyl)amino)-4-((2,4,6-trimethylphenyl)imino)-2-pentene; cobalt(II) aceylacetonate; magnesium In tetrahydrofuran at 25℃; for 24h; Inert atmosphere; Glovebox; | 79% |
Conditions | Yield |
---|---|
With pyridine In toluene at 20℃; for 48h; Schlenk technique; Inert atmosphere; | 78% |
chlorotriethoxysilane
4-methyl-4'-fluorobiphenyl
Conditions | Yield |
---|---|
With 2-((2,4,6-trimethylphenyl)amino)-4-((2,4,6-trimethylphenyl)imino)-2-pentene; cobalt(II) aceylacetonate; magnesium In tetrahydrofuran at 25℃; for 16h; Inert atmosphere; Glovebox; | 76% |
chlorotriethoxysilane
(E)-1-(2-iodophenyl)-2-phenyldiazene
triethoxy[2-((E)-phenylazo)phenyl]silane
Conditions | Yield |
---|---|
Stage #1: (E)-1-(2-iodophenyl)-2-phenyldiazene With n-butyllithium In tetrahydrofuran; hexane at -105℃; for 0.0833333h; Stage #2: chlorotriethoxysilane In tetrahydrofuran; hexane at 0℃; for 3h; | 75% |
With n-butyllithium In tetrahydrofuran; hexane at 0℃; for 22h; | 75% |
1-bromo-4-ethenyl-benzene
chlorotriethoxysilane
triethoxy(4-vinylphenyl)silane
Conditions | Yield |
---|---|
Stage #1: 1-bromo-4-ethenyl-benzene With magnesium In tetrahydrofuran for 1h; Stage #2: chlorotriethoxysilane In tetrahydrofuran Further stages.; | 75% |
Conditions | Yield |
---|---|
In n-heptane at 20℃; for 2h; Product distribution / selectivity; | 75% |
at 25 - 30℃; for 2.5h; Product distribution / selectivity; | 8.6% |
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