Product Name

  • Name

    TRIETHOXYCHLOROSILANE

  • EINECS 225-112-9
  • CAS No. 4667-99-6
  • Article Data55
  • CAS DataBase
  • Density 1.025 g/cm3
  • Solubility
  • Melting Point -51°C
  • Formula C6H15ClO3Si
  • Boiling Point 156 °C at 760 mmHg
  • Molecular Weight 198.722
  • Flash Point 40.1 °C
  • Transport Information UN 2986
  • Appearance
  • Safety 16-26-27-36/37/39
  • Risk Codes 10-34
  • Molecular Structure Molecular Structure of 4667-99-6 (TRIETHOXYCHLOROSILANE)
  • Hazard Symbols CorrosiveC
  • Synonyms Chloro(triethoxy)silane;
  • PSA 27.69000
  • LogP 1.77030

Synthetic route

Triethoxysilane
998-30-1

Triethoxysilane

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

Conditions
ConditionsYield
With trichloroisocyanuric acid In dichloromethane Heating;99.7%
With trichloroisocyanuric acid; copper(l) chloride In dichloromethane at 25℃; for 4h; Temperature; Reagent/catalyst; Reflux; Inert atmosphere;
tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

acetyl chloride
75-36-5

acetyl chloride

A

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

B

ethyl acetate
141-78-6

ethyl acetate

Conditions
ConditionsYield
With aluminium trichloride Heating;A 92%
B n/a
tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

Conditions
ConditionsYield
With tetrachlorosilane at 20 - 25℃; for 2.16667h; Product distribution / selectivity;86%
With thionyl chloride In N,N-dimethyl-formamide at 25℃; for 4h;85%
With tetrachlorosilane at 20℃; Product distribution / selectivity;73%
Methyltrichlorosilane
75-79-6

Methyltrichlorosilane

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

A

ethoxy(methyl)dichlorosilane
1825-75-8

ethoxy(methyl)dichlorosilane

B

chloro(diethoxy)(methyl)silane
18157-20-5

chloro(diethoxy)(methyl)silane

C

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

Conditions
ConditionsYield
at 20 - 22℃; for 150h;A 86%
B 12%
C n/a
at 20 - 22℃; for 150h;A n/a
B n/a
C 5%
tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

Conditions
ConditionsYield
In neat (no solvent) heating of Si(OC2H5)4 and SiCl4 (3:1 mol) at 150°C in a closed tube;;85%
In neat (no solvent) heating of Si(OC2H5)4 and SiCl4 (3:1 mol) at 150°C in a closed tube;;85%
In neat (no solvent) heating of Si(OC2H5)4 and SiCl4 (3:1 mol) at 150°C in a closed tube;;
In neat (no solvent) heating of Si(OC2H5)4 and SiCl4 (3:1 mol) at 150°C in a closed tube;;
tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

dichloromethylphenylsilane
149-74-6

dichloromethylphenylsilane

A

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

B

chloro(phenyl)ethoxy(methyl)silane
17881-37-7

chloro(phenyl)ethoxy(methyl)silane

C

diethoxy-methyl-phenyl-silane
775-56-4

diethoxy-methyl-phenyl-silane

Conditions
ConditionsYield
at 20 - 22℃; for 160h;A 5.13 g
B 83%
C 15%
at 20 - 22℃; for 160h;A 5.13 g
B 5.01 g
C 0.96 g
tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

ethanol
64-17-5

ethanol

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

Conditions
ConditionsYield
With tetrachlorosilane at 20 - 30℃; for 2.5 - 24h; Product distribution / selectivity;14.4%
dichlorodiethoxysilane
4667-38-3

dichlorodiethoxysilane

A

trichloroethoxysilane
1825-82-7

trichloroethoxysilane

B

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

Conditions
ConditionsYield
at 160℃; Gleichgewicht;
bei der Destillation;
tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

benzoyl chloride
98-88-4

benzoyl chloride

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

benzoyl chloride
98-88-4

benzoyl chloride

A

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

B

benzoic acid ethyl ester
93-89-0

benzoic acid ethyl ester

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

acetyl chloride
75-36-5

acetyl chloride

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

Conditions
ConditionsYield
at 135℃;
at 170 - 180℃;
at 160℃; for 1h;
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

A

ethoxy(methyl)dichlorosilane
1825-75-8

ethoxy(methyl)dichlorosilane

B

chloro(diethoxy)(methyl)silane
18157-20-5

chloro(diethoxy)(methyl)silane

C

dichlorodiethoxysilane
4667-38-3

dichlorodiethoxysilane

D

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

Conditions
ConditionsYield
Product distribution;A 51.3 % Spectr.
B 6.4 % Spectr.
C 25.6 % Spectr.
D 10.3 % Spectr.
Methyltrichlorosilane
75-79-6

Methyltrichlorosilane

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

A

ethoxy(methyl)dichlorosilane
1825-75-8

ethoxy(methyl)dichlorosilane

B

trichloroethoxysilane
1825-82-7

trichloroethoxysilane

C

chloro(diethoxy)(methyl)silane
18157-20-5

chloro(diethoxy)(methyl)silane

D

dichlorodiethoxysilane
4667-38-3

dichlorodiethoxysilane

E

Methyltriethoxysilan
2031-67-6

Methyltriethoxysilan

F

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

Conditions
ConditionsYield
N,N-dimethyl-formamide at 90℃; for 5.5h; Product distribution; Thermodynamic data; Equilibrium constant; ΔG0, ΔH0;
tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

trichlorovinylsilane
75-94-5

trichlorovinylsilane

A

trichloroethoxysilane
1825-82-7

trichloroethoxysilane

B

dichlorodiethoxysilane
4667-38-3

dichlorodiethoxysilane

C

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

D

Triethoxyvinylsilane
78-08-0

Triethoxyvinylsilane

E

vinyldi(ethoxy)chlorosilane
18187-22-9

vinyldi(ethoxy)chlorosilane

F

vinyl(ethoxy)dichlorosilane
56124-75-5

vinyl(ethoxy)dichlorosilane

Conditions
ConditionsYield
N,N-dimethyl-formamide at 90℃; for 5.5h; Product distribution; Thermodynamic data; Equilibrium constant; ΔG0, ΔH0;
tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

Phenyltrichlorosilane
98-13-5

Phenyltrichlorosilane

A

trichloroethoxysilane
1825-82-7

trichloroethoxysilane

B

dichlorodiethoxysilane
4667-38-3

dichlorodiethoxysilane

C

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

D

phenyldiethoxychlorosilane
17903-53-6

phenyldiethoxychlorosilane

E

triethoxyphenylsilane
780-69-8

triethoxyphenylsilane

F

phenylethoxydichlorosilane
18236-80-1

phenylethoxydichlorosilane

Conditions
ConditionsYield
N,N-dimethyl-formamide at 90℃; for 5.5h; Product distribution; Thermodynamic data; Equilibrium constant; ΔG0, ΔH0;
tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

Phenyltrichlorosilane
98-13-5

Phenyltrichlorosilane

A

trichloroethoxysilane
1825-82-7

trichloroethoxysilane

B

dichlorodiethoxysilane
4667-38-3

dichlorodiethoxysilane

C

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

D

phenyldiethoxychlorosilane
17903-53-6

phenyldiethoxychlorosilane

E

phenylethoxydichlorosilane
18236-80-1

phenylethoxydichlorosilane

Conditions
ConditionsYield
Product distribution;A 4.4 % Spectr.
B 25.6 % Spectr.
C 5.0 % Spectr.
D 4.3 % Spectr.
E 45.0 % Spectr.
tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

A

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

B

{Chloro-[(dichloro-ethoxy-silanyl)-methyl]-ethoxy-silanyloxy}-ethane

{Chloro-[(dichloro-ethoxy-silanyl)-methyl]-ethoxy-silanyloxy}-ethane

C

bis(diethoxychlorosilyl)methane

bis(diethoxychlorosilyl)methane

Conditions
ConditionsYield
at 20 - 22℃; for 160h;A 8.9 g
B 0.74 g
C 5.5 g
ethanol
64-17-5

ethanol

A

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

B

dichlorodiethoxysilane
4667-38-3

dichlorodiethoxysilane

C

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

Conditions
ConditionsYield
With tetrachlorosilane In pentane -70 deg C to room t.; Yield given. Yields of byproduct given. Title compound not separated from byproducts;
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

2-(1-Hydroxybenzyl)-1,3,2-dioxaphosphorinan-2-oxide
93786-70-0

2-(1-Hydroxybenzyl)-1,3,2-dioxaphosphorinan-2-oxide

2-(1-Triethoxysilyloxybenzyl)-1,3,2-dioxaphosphorinan-2-oxide

2-(1-Triethoxysilyloxybenzyl)-1,3,2-dioxaphosphorinan-2-oxide

Conditions
ConditionsYield
With pyridine In toluene Ambient temperature;98%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

(3S*,4S*,5E,7E)-3,5,7-trimethylnona-1,5,7-trien-4-ol

(3S*,4S*,5E,7E)-3,5,7-trimethylnona-1,5,7-trien-4-ol

(3S*,4S*,5E,7E)-4-(triethylsilyloxy)-3,5,7-trimethylnona-1,5,7-triene

(3S*,4S*,5E,7E)-4-(triethylsilyloxy)-3,5,7-trimethylnona-1,5,7-triene

Conditions
ConditionsYield
With 1H-imidazole; dmap In N,N-dimethyl-formamide at 20℃; for 3h;97%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

lithium phenylacetylide
4440-01-1

lithium phenylacetylide

1-triethoxysilyl-2-phenylacetylene
18402-75-0

1-triethoxysilyl-2-phenylacetylene

Conditions
ConditionsYield
In tetrahydrofuran at 20℃;95%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

phenylacetylene
536-74-3

phenylacetylene

1-triethoxysilyl-2-phenylacetylene
18402-75-0

1-triethoxysilyl-2-phenylacetylene

Conditions
ConditionsYield
Stage #1: phenylacetylene With n-butyllithium In tetrahydrofuran; hexane at -70 - 20℃;
Stage #2: chlorotriethoxysilane In tetrahydrofuran; hexane at 0 - 20℃; Further stages.;
95%
Stage #1: phenylacetylene With n-butyllithium In tetrahydrofuran; hexane at 0℃;
Stage #2: chlorotriethoxysilane In tetrahydrofuran; hexane at -78 - 20℃; for 16h;
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

diethylamine
109-89-7

diethylamine

A

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

B

N-(triethoxysilyl)diethylamine
35077-00-0

N-(triethoxysilyl)diethylamine

Conditions
ConditionsYield
With triethylamine In n-heptane at 20℃; Product distribution / selectivity;A 6%
B 93%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

C74H54N4O2

C74H54N4O2

C86H82N4O8Si2

C86H82N4O8Si2

Conditions
ConditionsYield
Stage #1: C74H54N4O2 With triethylamine In tetrahydrofuran at 20℃; for 0.166667h;
Stage #2: chlorotriethoxysilane In tetrahydrofuran at 20℃; for 15h;
93%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

2'-O-[(triethoxy)silyl]paclitaxel
1335283-69-6

2'-O-[(triethoxy)silyl]paclitaxel

Conditions
ConditionsYield
With triethylamine In tetrahydrofuran at 20℃; for 1h;90.6%
With triethylamine In tetrahydrofuran at 20℃; for 1h; Sealed tube;90.6%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

ammonium thiocyanate
1147550-11-5

ammonium thiocyanate

triethoxy isothiocyanato silane
18301-79-6

triethoxy isothiocyanato silane

Conditions
ConditionsYield
In cyclohexane for 30h; Heating;90%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

1-triethoxysilylglycerol

1-triethoxysilylglycerol

Conditions
ConditionsYield
In ethanol; glycerol90%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

[LiOB{CH(SiMe3)2}2]

[LiOB{CH(SiMe3)2}2]

(EtO)3SiOB{CH(SiMe3)2}2

(EtO)3SiOB{CH(SiMe3)2}2

Conditions
ConditionsYield
In tetrahydrofuran at 60℃; for 12h; Inert atmosphere;87%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

[:C{[N(2,6-Pri2C6H3)]2CHCLi}]

[:C{[N(2,6-Pri2C6H3)]2CHCLi}]

C33H50N2O3Si

C33H50N2O3Si

Conditions
ConditionsYield
In tetrahydrofuran at -20 - 20℃; for 1h;87%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

1,3-diphenylpropanedione
120-46-7

1,3-diphenylpropanedione

triethoxy(1,3-diphenylpropane-1,3-dionato-O)silicon

triethoxy(1,3-diphenylpropane-1,3-dionato-O)silicon

Conditions
ConditionsYield
With triethylamine In toluene at 20℃; for 1h; Inert atmosphere; Schlenk technique;86%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

2',7-di-O-(triethoxysilyl)paclitaxel
1415222-02-4

2',7-di-O-(triethoxysilyl)paclitaxel

Conditions
ConditionsYield
With pyridine In tetrahydrofuran at 20℃; for 2h;85%
With pyridine In tetrahydrofuran at 20℃; for 2h; Sealed tube;85%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

chloroprene
126-99-8

chloroprene

(buta-1,3-dien-2-yl)triethoxysilane
124597-49-5

(buta-1,3-dien-2-yl)triethoxysilane

Conditions
ConditionsYield
Stage #1: chloroprene With 1,1-Dibromoethane; magnesium; zinc(II) chloride In tetrahydrofuran; xylene for 0.75h; Heating;
Stage #2: chlorotriethoxysilane In tetrahydrofuran for 1h; Heating; Further stages.;
84.7%
Stage #1: chloroprene With magnesium; ethylene dibromide; zinc(II) chloride In tetrahydrofuran; xylenes for 1.33333h; Heating / reflux;
Stage #2: chlorotriethoxysilane In tetrahydrofuran; xylenes at 20℃; for 1h; Heating / reflux;
84.7%
Stage #1: chloroprene With magnesium; ethylene dibromide; zinc(II) chloride In tetrahydrofuran; xylenes for 1.25h; Reflux;
Stage #2: chlorotriethoxysilane In tetrahydrofuran; xylenes for 1h; Reflux;
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

silver thiocyanate
1701-93-5

silver thiocyanate

triethoxy isothiocyanato silane
18301-79-6

triethoxy isothiocyanato silane

Conditions
ConditionsYield
In benzene80%
In benzene80%
With benzene
3-[(trifluorovinyl)oxy]bromobenzene
260262-38-2

3-[(trifluorovinyl)oxy]bromobenzene

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

[3-[(trifluorovinyl)oxy]phenyl]triethoxysilane
851681-35-1

[3-[(trifluorovinyl)oxy]phenyl]triethoxysilane

Conditions
ConditionsYield
Stage #1: 3-[(trifluorovinyl)oxy]bromobenzene With magnesium In tetrahydrofuran at 0 - 20℃; for 2h;
Stage #2: chlorotriethoxysilane In tetrahydrofuran at -48 - 20℃; for 24h;
80%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

acetylenemagnesium bromide
4301-14-8

acetylenemagnesium bromide

triethoxyethynylsilane
5700-28-7

triethoxyethynylsilane

Conditions
ConditionsYield
In tetrahydrofuran at -78 - 50℃; for 5h;80%
6-fluoro-1-benzylindole

6-fluoro-1-benzylindole

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

1-benzyl-6-(triethoxysilyl)-1H-indole

1-benzyl-6-(triethoxysilyl)-1H-indole

Conditions
ConditionsYield
With 2-((2,4,6-trimethylphenyl)amino)-4-((2,4,6-trimethylphenyl)imino)-2-pentene; cobalt(II) aceylacetonate; magnesium In tetrahydrofuran at 25℃; for 24h; Inert atmosphere; Glovebox;79%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

12CH3O2Si(1-)*(x)C4H10O*4Cu(2+)*(x)H2O*4Na(1+)

12CH3O2Si(1-)*(x)C4H10O*4Cu(2+)*(x)H2O*4Na(1+)

C84H216O60Si24

C84H216O60Si24

Conditions
ConditionsYield
With pyridine In toluene at 20℃; for 48h; Schlenk technique; Inert atmosphere;78%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

4-methyl-4'-fluorobiphenyl
72093-43-7

4-methyl-4'-fluorobiphenyl

triethoxy(4'-methyl-[1,1'-biphenyl]-4-yl)silane

triethoxy(4'-methyl-[1,1'-biphenyl]-4-yl)silane

Conditions
ConditionsYield
With 2-((2,4,6-trimethylphenyl)amino)-4-((2,4,6-trimethylphenyl)imino)-2-pentene; cobalt(II) aceylacetonate; magnesium In tetrahydrofuran at 25℃; for 16h; Inert atmosphere; Glovebox;76%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

(E)-1-(2-iodophenyl)-2-phenyldiazene
51343-11-4

(E)-1-(2-iodophenyl)-2-phenyldiazene

triethoxy[2-((E)-phenylazo)phenyl]silane
892495-60-2

triethoxy[2-((E)-phenylazo)phenyl]silane

Conditions
ConditionsYield
Stage #1: (E)-1-(2-iodophenyl)-2-phenyldiazene With n-butyllithium In tetrahydrofuran; hexane at -105℃; for 0.0833333h;
Stage #2: chlorotriethoxysilane In tetrahydrofuran; hexane at 0℃; for 3h;
75%
With n-butyllithium In tetrahydrofuran; hexane at 0℃; for 22h;75%
1-bromo-4-ethenyl-benzene
2039-82-9

1-bromo-4-ethenyl-benzene

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

triethoxy(4-vinylphenyl)silane
6026-60-4

triethoxy(4-vinylphenyl)silane

Conditions
ConditionsYield
Stage #1: 1-bromo-4-ethenyl-benzene With magnesium In tetrahydrofuran for 1h;
Stage #2: chlorotriethoxysilane In tetrahydrofuran Further stages.;
75%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

diethylamine
109-89-7

diethylamine

N-(triethoxysilyl)diethylamine
35077-00-0

N-(triethoxysilyl)diethylamine

Conditions
ConditionsYield
In n-heptane at 20℃; for 2h; Product distribution / selectivity;75%
at 25 - 30℃; for 2.5h; Product distribution / selectivity;8.6%

Silane,chlorotriethoxy- Specification

The Silane, chlorotriethoxy-, with the CAS registry number of 4667-99-6, is also known as Triethoxychlorosilane. Its EINECS registry number is 225-112-9. This chemical's molecular formula is C6H15ClO3Si and molecular weight is 198.72. What's more, its IUPAC name is Chloro(triethoxy)silane. In addition, it must be stored in airtight containers filled with Nitrogen and placed in a dry, cool place at 2-8 °C. Meanwhile, it should be avoided contact with oxidant.

Physical properties about Silane, chlorotriethoxy- are: (1)ACD/LogP: 5.12; (2)# of Rule of 5 Violations: 1; (3)ACD/LogD (pH 5.5): 5.12; (4)ACD/LogD (pH 7.4): 5.12; (5)ACD/BCF (pH 5.5): 4618.11; (6)ACD/BCF (pH 7.4): 4618.11; (7)ACD/KOC (pH 5.5): 14608.88; (8)ACD/KOC (pH 7.4): 14608.88; (9)#H bond acceptors: 3; (10)#H bond donors: 0; (11)#Freely Rotating Bonds: 6; (12)Polar Surface Area: 27.69 Å2; (13)Index of Refraction: 1.416; (14)Molar Refractivity: 48.64 cm3; (15)Molar Volume: 193.7 cm3; (16)Surface Tension: 23.6 dyne/cm; (17)Density: 1.025 g/cm3; (18)Flash Point: 40.1 °C; (19)Enthalpy of Vaporization: 37.65 kJ/mol; (20)Boiling Point: 156 °C at 760 mmHg; (21)Vapour Pressure: 3.8 mmHg at 25 °C.

Preparation: this chemical is prepared by Diethoxy-dimethyl-silane. The reaction needs reagent SiCl4. The reaction time is 5 hours with reaction temperature of 165 °C. The yield is about 60.6 %.

Uses: it is used to produce other chemicals. For example, it is used to produce Triethoxy-isothiocyanato-silane by heating. The reaction needs solvent Cyclohexane. The reaction time is 30 hours. The yield is about 90 %.

When you are using this chemical, please be cautious about it as the following:
This chemical may cause burns on contact. During using it, wear suitable protective clothing, gloves and eye/face protection. In case of contact with eyes, rinse immediately with plenty of water and seek medical advice. Besides, this chemical is flammable, and it may catch fire in contact with an ignition source. Hence, keep it away from sources of ignition.

You can still convert the following datas into molecular structure:
(1) SMILES: Cl[Si](OCC)(OCC)OCC
(2) InChI: InChI=1/C6H15ClO3Si/c1-4-8-11(7,9-5-2)10-6-3/h4-6H2,1-3H3
(3) InChIKey: JEZFASCUIZYYEV-UHFFFAOYAI

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