Conditions | Yield |
---|---|
With chloro-trimethyl-silane; aluminium trichloride | 88% |
With aluminium trichloride; acetyl chloride at 0℃; for 20h; | 78% |
With aluminium trichloride; acetyl chloride In dichloromethane at 40℃; for 12h; | 76% |
chloro-trimethyl-silane
pentamethylchlorodisilane
1,2-dichlorotetramethylsilane
Conditions | Yield |
---|---|
With aluminum (III) chloride at 70℃; | 74% |
dodecamethylcyclohexasilane
A
1,3-dichloro-1,1,2,2,3,3-hexamethyltrisilane
B
1,2-dichlorotetramethylsilane
C
1,4-dichloropermethyltetrasilane
D
1,5-dichlorodecamethylpentasilane
Conditions | Yield |
---|---|
With tin(IV) chloride at 175℃; for 1h; Product distribution; Further Variations:; Reagents; Temperatures; reaction times; | A 16.5% B 10% C 12.7% D 49.5% |
dodecamethylcyclohexasilane
A
1,3-dichloro-1,1,2,2,3,3-hexamethyltrisilane
B
1,2-dichlorotetramethylsilane
C
1,4-dichloropermethyltetrasilane
D
1,6-dichlorododecamethylhexasilane
Conditions | Yield |
---|---|
With thionyl chloride In 1,1,2,2-tetrachloroethylene at 146℃; for 4h; Product distribution; other permethylated cyclosilane; var. solvents, time, temp.; | A 24% B 20% C 18% D 28% |
With tin(IV) chloride at 175℃; for 0.5h; Further byproducts given; | A 11.3% B 7.5% C 9.6% D 46.1 % Chromat. |
With mercury dichloride at 210℃; for 2h; | A 40.8 % Chromat. B 30.0 % Chromat. C 21.9 % Chromat. D 2.1 % Chromat. |
A
1,3-dichloro-1,1,2,2,3,3-hexamethyltrisilane
B
1,2-dichlorotetramethylsilane
C
1,4-dichloropermethyltetrasilane
D
1,5-dichlorodecamethylpentasilane
Conditions | Yield |
---|---|
With tin(IV) chloride at 180℃; for 3h; Product distribution; Further Variations:; Reagents; Temperatures; reaction times; | A 27.9% B 10.1% C 25.5% D 18.3% |
1,2-diethoxy-1,1,2,2-tetramethyldisilane
1,2-dichlorotetramethylsilane
Conditions | Yield |
---|---|
With pyridine |
Conditions | Yield |
---|---|
With hydrogenchloride Ambient temperature; |
Conditions | Yield |
---|---|
With chlorine |
1,1,1,2,2,2-hexamethyldisilane
A
chloro-trimethyl-silane
B
1,2-dichlorotetramethylsilane
C
1,1,2-trichloro-1,2,2-trimethyldisilane
D
1,1,2,2-tetrachloro-1,2-dimethyldisilane
E
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With hexachlorodisilane; aluminium trichloride In benzene-d6 at 200℃; for 120h; Product distribution; var. temp.; | A 15 % Spectr. B 6 % Spectr. C 15 % Spectr. D 3 % Spectr. E 60 % Spectr. |
1,1,2-trichloro-1,2,2-trimethyldisilane
benzyl chloride
A
1,2-dichlorotetramethylsilane
B
benzyl(methyl)dichlorosilane
Conditions | Yield |
---|---|
tetrakis(triphenylphosphine) palladium(0) In 1,3,5-trimethyl-benzene at 80℃; for 2h; Heating; | A 2 % Chromat. B 98 % Chromat. |
dodecamethylcyclohexasilane
A
1,3-dichloro-1,1,2,2,3,3-hexamethyltrisilane
B
1,2-dichlorotetramethylsilane
C
1,4-dichloropermethyltetrasilane
D
1,5-dichlorodecamethylpentasilane
Conditions | Yield |
---|---|
With chlorine In tetrachloromethane also chlorination of 1,4-Cl2Si4Me8; |
dimethylsilicon dichloride
A
1,3-dichloro-1,1,2,2,3,3-hexamethyltrisilane
B
1,2-dichlorotetramethylsilane
C
1,4-dichloropermethyltetrasilane
Conditions | Yield |
---|---|
With samarium diiodide In tetrahydrofuran also methylphenyldichlorosilane; |
dodecamethylcyclohexasilane
A
1,3-dichloro-1,1,2,2,3,3-hexamethyltrisilane
B
1,2-dichlorotetramethylsilane
C
chloroundecamethylcyclohexasilane
D
1,4-dichloropermethyltetrasilane
E
1,6-dichlorododecamethylhexasilane
Conditions | Yield |
---|---|
With tin(IV) chloride In dichloromethane for 30h; Product distribution; further reagent: TiCl4; |
tetrachloromethane
dimethylsilylene
A
chloroform
B
1,2-dichlorotetramethylsilane
C
(trichloromethyl)dimethylchlorosilane
D
dimethylsilicon dichloride
Conditions | Yield |
---|---|
Addition; Insertion; |
dodecamethylcyclohexasilane
A
1,3-dichloro-1,1,2,2,3,3-hexamethyltrisilane
B
1,2-dichlorotetramethylsilane
C
chloroundecamethylcyclohexasilane
D
1,4-dichloropermethyltetrasilane
Conditions | Yield |
---|---|
With antimonypentachloride at 25℃; for 0.002h; Product distribution; Further Variations:; Temperatures; Reagents; | A 11.4 % Chromat. B 43.4 % Chromat. C 4.5 % Chromat. D 10.8 % Chromat. |
With tin(IV) chloride at 175℃; for 1h; Further byproducts given; | A 34.7 % Chromat. B 29.9 % Chromat. C 2 % Chromat. D 25.8 % Chromat. |
dodecamethylcyclohexasilane
A
1,3-dichloro-1,1,2,2,3,3-hexamethyltrisilane
B
1,2-dichlorotetramethylsilane
C
chloroundecamethylcyclohexasilane
D
1,6-dichlorododecamethylhexasilane
Conditions | Yield |
---|---|
With molybdenum(V) chloride at 185℃; for 3h; Further byproducts given; | A 6.3 % Chromat. B 10.9 % Chromat. C 14.0 % Chromat. D 17.8 % Chromat. |
1,1,2,2-tetramethyldisilane
dimethylsilicon dichloride
A
dimethylmonochlorosilane
B
dimethylsilane
C
1,2-dichlorotetramethylsilane
D
1-chloro-2-hydro-1,1,2,2-tetramethyldisilane
Conditions | Yield |
---|---|
With tetra-n-butylphosphonium chloride In diethylene glycol dimethyl ether at -196 - 120℃; Sealed tube; | A 50 %Spectr. B 7 %Spectr. C 9 %Spectr. D 7 %Spectr. |
With tetra-n-butylphosphonium chloride In diethylene glycol dimethyl ether at -196 - 120℃; Sealed tube; | A 45 %Spectr. B 11.3 %Spectr. C 11.4 %Spectr. D 12.3 %Spectr. |
Methyltrichlorosilane
1,1,2,2-tetramethyldisilane
A
Dichloromethylsilane
B
1,2-dichlorotetramethylsilane
C
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With tetra-n-butylphosphonium chloride In diethylene glycol dimethyl ether at -196 - 80℃; Temperature; Sealed tube; | A 37.9 %Spectr. B 6.7 %Spectr. C 13.8 %Spectr. |
Methyltrichlorosilane
1,1,2,2-tetramethyldisilane
A
Dichloromethylsilane
B
1,2-dichlorotetramethylsilane
Conditions | Yield |
---|---|
With tetra-n-butylphosphonium chloride In diethylene glycol dimethyl ether at -196 - 80℃; Temperature; Sealed tube; | A 38.7 %Spectr. B 11.9 %Spectr. |
1,1,2,2-tetramethyldisilane
A
Dichloromethylsilane
B
dimethylmonochlorosilane
C
1,2-dichlorotetramethylsilane
Conditions | Yield |
---|---|
With hydrogenchloride In dibutyl ether; water at 80℃; for 24h; Temperature; Solvent; | A 10.1 %Spectr. B 84.7 %Spectr. C 5.2 %Spectr. |
1,1,2,2-tetramethyldisilane
A
dimethylmonochlorosilane
B
1,2-dichlorotetramethylsilane
Conditions | Yield |
---|---|
With hydrogenchloride In dibutyl ether; water at 100℃; for 24h; | A 94.1 %Spectr. B 5.9 %Spectr. |
With hydrogenchloride In dibutyl ether; benzene-d6 at 100℃; for 24h; Sealed tube; |
Conditions | Yield |
---|---|
With hydrogenchloride; tetra-n-butylphosphonium chloride In dibutyl ether; benzene-d6 at 80℃; for 18h; Reagent/catalyst; Sealed tube; |
1,1,2,2-tetramethyldisilane
A
dimethylmonochlorosilane
B
1,2-dichlorotetramethylsilane
C
1-chloro-2-hydro-1,1,2,2-tetramethyldisilane
Conditions | Yield |
---|---|
With hydrogenchloride In dibutyl ether; benzene-d6 at 40℃; for 144h; Temperature; Time; Sealed tube; |
1,1,2-trichloro-1,2,2-trimethyldisilane
1,1,2,2-tetrachloro-1,2-dimethyldisilane
1,1-dichlorotetramethyldisilane
A
Dichloromethylsilane
B
chloro-trimethyl-silane
C
Methyltrichlorosilane
D
dimethylmonochlorosilane
E
methylsilane
F
chloro-methyl-silane
G
1,2-dichlorotetramethylsilane
H
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With diethylene glycol dimethyl ether; lithium hydride at 60℃; for 0.25h; Sealed tube; |
1,2-dichlorotetramethylsilane
phenyllithium
1,2-diphenyltetramethyldisilane
Conditions | Yield |
---|---|
In tetrahydrofuran; diethyl ether; cyclohexane at 0 - 20℃; for 1h; | 100% |
1,2-dichlorotetramethylsilane
Conditions | Yield |
---|---|
With n-butyllithium In tetrahydrofuran at -30℃; for 4h; | 99% |
1,2-dichlorotetramethylsilane
1,2-bis(2,6-diisopropylphenylamino)tetramethyldisilane
Conditions | Yield |
---|---|
In diethyl ether at -35 - 20℃; for 12h; Inert atmosphere; | 98% |
1,2-dichlorotetramethylsilane
Conditions | Yield |
---|---|
With n-butyllithium In tetrahydrofuran at -30℃; for 4h; | 98% |
1-methyl-o-carborane
1,2-dichlorotetramethylsilane
1,2-bis(1'-methyl-o-carboranyl)-1,1,2,2-tetramethyl-1,2-disilane
Conditions | Yield |
---|---|
With n-BuLi In diethyl ether; hexane; benzene (Ar); standard Schlenk technique; soln. of n-BuLi in hexane was added tosoln. of carborane in C6H6 at -78°C; mixt. was warmed to room te mp. and stirred for 2 h; transferred via cannula to suspn. of Si compd. (0.5 equiv.) in Et2O at -78°C; mixt. warmed to room temp.; stirred for 2 h; volatiles removed (vac.); residue dissolved in Et2O; filtered through silica gel; volatiles removed; crystd. (toluene, -5°C); elem. anal.; | 96% |
1,2-dichlorotetramethylsilane
1,1'-ansa-[1,1,4,4-tetrakis(trimethylsilyl)-2,2,3,3-tetramethyltetrasilanylene]ferrocene
Conditions | Yield |
---|---|
In tetrahydrofuran (N2); Schlenk technique; soln. of Fe complex in THF was added to soln. of Si compd. (1 equi.) in THF at -40°C; mixt. was warmed to room temp.; stirred for 12 h; aq. H2SO4 added; extd. (Et2O); org. layers dried (Na2SO4); solvent removed (vac.); residue treated with hot isopropanol; slowly cooled to room temp.; elem. anal.; | 96% |
1,2-dichlorotetramethylsilane
C12H24KO6(1+)*C13H39Si7(1-)
C30H90Si16
Conditions | Yield |
---|---|
In benzene for 2.25h; | 96% |
1,2-dichlorotetramethylsilane
1,1,4,4-tetrakis(trimethylsilyl)-1,4-bis[(trimethylsilyl)methyl]-2,2,3,3-tetramethyltetrasilane
Conditions | Yield |
---|---|
In benzene at 0℃; for 2h; | 96% |
1,2-dichlorotetramethylsilane
Triphenylsilyl chloride
1,1,1,4,4,4-hexaphenyltetramethyltetrasilane
Conditions | Yield |
---|---|
With lithium In toluene at -30 - 20℃; for 0.5h; Inert atmosphere; Schlenk technique; | 95% |
Stage #1: Triphenylsilyl chloride With lithium In tetrahydrofuran at 0 - 20℃; for 10h; Stage #2: 1,2-dichlorotetramethylsilane In tetrahydrofuran at 0 - 80℃; for 30h; Stage #3: With water In hexane for 0.25h; |
1,2-dichlorotetramethylsilane
N,N’-Bis(2,6-diisopropylphenyl)-N-trimethylsilylformamidine
trimethylsilyl trifluoromethanesulfonate
[(Me2SiNDipp)2CH]OTf
Conditions | Yield |
---|---|
Stage #1: 1,2-dichlorotetramethylsilane; N,N’-Bis(2,6-diisopropylphenyl)-N-trimethylsilylformamidine In dichloromethane at 20℃; for 1h; Inert atmosphere; Stage #2: trimethylsilyl trifluoromethanesulfonate In dichloromethane at 0 - 20℃; Inert atmosphere; | 95% |
1,2-dichlorotetramethylsilane
1,1,1,3,3,4,4,6,6,6-decamethyl-2,2,5,5-tetrakis(trimethylsilyl)-hexasilane
Conditions | Yield |
---|---|
In toluene at -78 - 20℃; Inert atmosphere; | 95% |
1,2-dichlorotetramethylsilane
2,2,5,5-tetrakis(trimethylsilyl)-2,5-digermadecamethylhexasilane
Conditions | Yield |
---|---|
In toluene at -78 - 20℃; Inert atmosphere; | 95% |
1,2-dichlorotetramethylsilane
Conditions | Yield |
---|---|
In tetrahydrofuran at 0 - 20℃; for 5h; | 95% |
dichloromethyl[(trimethylsilyl)methyl]silane
pentamethylchlorodisilane
1,2-dichlorotetramethylsilane
1-chloro-1,1,3,3,3-pentamethyldisiloxane
Me3SiSiMe2OSiMe2H
Conditions | Yield |
---|---|
Stage #1: dichloromethyl[(trimethylsilyl)methyl]silane; pentamethylchlorodisilane; 1,2-dichlorotetramethylsilane; 1-chloro-1,1,3,3,3-pentamethyldisiloxane With water at 80 - 90℃; for 3h; Stage #2: perfluorobutanesulfonic acid at 100℃; for 3 - 4h; Heating / reflux; | 94.8% |
1,2-dichlorotetramethylsilane
bis(phenylthio)methane
1,2-bis-(bis-phenylsulfanyl-methyl)-1,1,2,2-tetramethyl-disilane
Conditions | Yield |
---|---|
With n-butyllithium In tetrahydrofuran at -78 - 20℃; | 94% |
1-phenyl-1,2-closo-C2B10H11
1,2-dichlorotetramethylsilane
1,2-bis(1'-phenyl-o-carboranyl)-1,1,2,2-tetramethyl-1,2-disilane
Conditions | Yield |
---|---|
With n-BuLi In diethyl ether; hexane; benzene (Ar); standard Schlenk technique; soln. of n-BuLi in hexane was added tosoln. of carborane in C6H6 at -78°C; mixt. was warmed to room te mp. and stirred for 2 h; transferred via cannula to suspn. of Si compd. (0.5 equiv.) in Et2O at -78°C; mixt. warmed to room temp.; stirred for 2 h; volatiles removed (vac.); residue dissolved in Et2O; filtered through silica gel; volatiles removed; crystd. (toluene, -5°C); elem. anal.; | 94% |
1,2-dichlorotetramethylsilane
1,1,2,2-tetramethyl-3,4-[1,2-dicarba-closo-dodecaborano(12)]-1,3-disila-cyclobutane
Conditions | Yield |
---|---|
In diethyl ether suspn. of carborane deriv. in Et2O cooled to 0°C, (Me2SiCl)2 injected through syringe for 30 min; stirred for 3 h at room temp.; insol. material separated by centrifugation; remaining insol. residue washed with Et2O and centrifuged; solns. combined; liquid evapd. in vac.; | 94% |
1,2-dichlorotetramethylsilane
2-methoxyphenyllithium
1,2-bis(2-methoxyphenyl)-1,1,2,2-tetramethyldisilane
Conditions | Yield |
---|---|
In tetrahydrofuran at 20℃; | 93% |
1,2-dichlorotetramethylsilane
3,5-di-tert-butyl-4-trimethylsiloxyphenyllithium
1,2-bis-(3,5-di-tert-butyl-4-trimethylsilanyloxy-phenyl)-1,1,2,2-tetramethyl-disilane
Conditions | Yield |
---|---|
In diethyl ether at 20℃; for 2h; | 93% |
1,2-dichlorotetramethylsilane
octamethyl-1,4-dioxa-2,3,5,6-tetrasilacyclohexane
Conditions | Yield |
---|---|
With sodium hydrogencarbonate In diethyl ether; water for 6h; Inert atmosphere; Schlenk technique; Sealed tube; | 92% |
With water In pentane Glovebox; Inert atmosphere; | 80% |
With water In diethyl ether; acetone for 2h; | 72% |
With pyridine In various solvents at 20℃; for 1h; | 72% |
With water |
1,2-dichlorotetramethylsilane
1,1-dibromomethane
1,2-bis(bromomethyl)-1,1,2,2-tetramethyldisilane
Conditions | Yield |
---|---|
With n-butyllithium; lithium bromide In tetrahydrofuran; hexane at -78 - 20℃; | 92% |
With n-butyllithium; lithium bromide In tetrahydrofuran; hexane at -78 - 20℃; | 69% |
1,2-dichlorotetramethylsilane
1,1,4,4-tetra(tert-butyl)-tetramethyl-1,4-distanna-2,3-disilabutane
Conditions | Yield |
---|---|
In tetrahydrofuran (inert atmosphere); stirring (-50°C, 2 h); warming to -30°C, addn. of petroleum ether, stirring (30 min), warming to 0°C, addn. of oxygen-free water, phase sepn., drying (CaCl2, 12 h), filtration, solvent removal (vac.), recrystn. (n-hexane); | 92% |
1,2-dichlorotetramethylsilane
2-bromoindene
1,2-di(1H-inden-1-yl)-1,1,2,2-tetramethyldisilane
Conditions | Yield |
---|---|
With magnesium In tetrahydrofuran; ethylene dibromide Cooling with ice; | 92% |
Conditions | Yield |
---|---|
In diethyl ether at -78℃; Inert atmosphere; | 92% |
Conditions | Yield |
---|---|
With triphenylphosphine | 91% |
1,2-dichlorotetramethylsilane
4-phenoxyphenylmagnesium bromide
Conditions | Yield |
---|---|
Stage #1: 1,2-dichlorotetramethylsilane; 4-phenoxyphenylmagnesium bromide In tetrahydrofuran at -78℃; for 2h; Inert atmosphere; Stage #2: With lithium aluminium tetrahydride In tetrahydrofuran at 0 - 20℃; Inert atmosphere; | 91% |
1,2-dichlorotetramethylsilane
Conditions | Yield |
---|---|
In tetrahydrofuran for 6h; | 91% |
Conditions | Yield |
---|---|
90% |
1,2-dicarba-closo-dodecaborane(12)
1,2-dichlorotetramethylsilane
1,2-bis(o-carboranyl)-1,1,2,2-tetramethyl-1,2-disilane
Conditions | Yield |
---|---|
With n-BuLi In tetrahydrofuran; diethyl ether; hexane (Ar); standard Schlenk technique; soln. of n-BuLi in hexane was added tosoln. of carborane in THF at -78°C; mixt. was warmed to room tem p. and stirred for 2 h; transferred via cannula to suspn. of Si compd. (0.5 equiv.) in Et2O at -78°C; mixt. warmed to room temp.; stirred for 2 h; volatiles removed (vac.); residue dissolved in Et2O; filtered through silica gel; volatiles removed; crystd. (toluene, -5°C); elem. anal.; | 90% |
1,2-dichlorotetramethylsilane
Conditions | Yield |
---|---|
In benzene at 0 - 20℃; | 90% |
The Disilane,1,2-dichloro-1,1,2,2-tetramethyl-, with the CAS registry number 4342-61-4, is also known as 1,1,2,2-Tetramethyldichlorodisilane. It belongs to the product categories of Si-Si Compounds; Dichlorosilanes (for Polysilanes); Electroluminescence; Functional Materials; Monochlorosilanes; Reagent for High-Performance Polymer Research; Si (Classes of Silicon Compounds); Si-Cl Compounds; Silicon Compounds (for Synthesis); Synthetic Organic Chemistry; Precursors by Metal; Vapor Deposition Precursors. Its EINECS registry number is 224-400-1. This chemical's molecular formula is C4H12Cl2Si2 and molecular weight is 187.22. Its systematic name is called 1,2-dichloro-1,1,2,2-tetramethyldisilane. The product should be sealed and stored in dry, well-ventilated place.
Physical properties of Disilane,1,2-dichloro-1,1,2,2-tetramethyl-: (1)ACD/LogP: 4.52; (2)ACD/LogD (pH 5.5): 4.52; (3)ACD/LogD (pH 7.4): 4.52; (4)ACD/BCF (pH 5.5): 1594.32; (5)ACD/BCF (pH 7.4): 1594.32; (6)ACD/KOC (pH 5.5): 6823.42; (7)ACD/KOC (pH 7.4): 6823.42; (8)#Freely Rotating Bonds: 1; (9)Index of Refraction: 1.419; (10)Molar Refractivity: 47.71 cm3; (11)Molar Volume: 188.8 cm3; (12)Surface Tension: 17.5 dyne/cm; (13)Density: 0.991 g/cm3; (14)Flash Point: 38.8 °C; (15)Enthalpy of Vaporization: 37.1 kJ/mol; (16)Boiling Point: 150.1 °C at 760 mmHg; (17)Vapour Pressure: 4.97 mmHg at 25°C.
Preparation: this chemical can be prepared by hexamethyl-disilane. This reaction will need reagent AlCl3, AcCl and solvent CH2Cl2. The reaction time is 12 hours with reaction temperature of 40 °C. The yield is about 76%.
Uses of Disilane,1,2-dichloro-1,1,2,2-tetramethyl-: it can be used to produce Octamethyl-1,4-dithia-2,3,5,6-tetrasilacyclohexan. This reaction will need reagent H2S and Et3N.
When you are using this chemical, please be cautious about it as the following:
This chemical may destroy living tissue on contact and may cause burns. In case of contact with eyes, you should rinse immediately with plenty of water and seek medical advice. Whenever you will contact it, please wear suitable protective clothing, gloves and eye/face protection. In case of accident or if you feel unwell seek medical advice immediately (show the label where possible).
You can still convert the following datas into molecular structure:
(1)SMILES: Cl[Si](C)(C)[Si](Cl)(C)C
(2)InChI: InChI=1/C4H12Cl2Si2/c1-7(2,5)8(3,4)6/h1-4H3
(3)InChIKey: SFAZXBAPWCPIER-UHFFFAOYAO
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