Conditions | Yield |
---|---|
With aluminium trichloride | |
With hydrogenchloride; aluminum oxide In melt melt of NaCl in graphite crucible; Al2O3 tube affected; |
Conditions | Yield |
---|---|
With sodium In neat (no solvent) passing excess AlCl3 vapor over Na in a iron tube at 200-300°C;completion of the reaction by heating the mixture of Al and NaAlCl3 in pots of clay or cast iron until beginning vaporization of NaAlCl3;; removal and melting of Al balls;; | |
With Na In neat (no solvent) passing excess AlCl3 vapor over Na in a iron tube at 200-300°C;completion of the reaction by heating the mixture of Al and NaAlCl3 in pots of clay or cast iron until beginning vaporization of NaAlCl3;; removal and melting of Al balls;; |
Conditions | Yield |
---|---|
In not given |
Conditions | Yield |
---|---|
In neat (no solvent) drybox and vac. line techniques; fused together in an ampoule; recrystd., decanted, zone-refining; | |
pre-electrolysis and filtration; | |
In neat (no solvent, solid phase) stoich. quant. of AlCl3 and NaCl (previously fused at 1023 K) were fused together under Ar; |
Conditions | Yield |
---|---|
With NaCl In melt AlCl3/NaCl melt (170-240°C), NaCl satd.; |
tetrachlorosilane
A
sodium tetrachloroaluminate
Conditions | Yield |
---|---|
byproducts: NaCl, AlCl3; Under N2, the dehydrated zeolite is heated in a flow of a SiCl4 and N2 mixt. for 1 h at 450°C.; Flushing for addnl. 2 h at the same temp. to remove excess SiCl4 and volatile AlCl3, cooling to room temp., washing with deionized water, ion exchange with NH4Cl; detn. of Si/Al ratio by IR, (29)Si-, (27)Al-NMR and X-ray diffraction.; |
tetrachlorosilane
A
sodium tetrachloroaluminate
Conditions | Yield |
---|---|
byproducts: NaCl, AlCl3; Under N2, the dehydrated zeolite is heated in a flow of a SiCl4 and N2 mixt. for 1 h at 375°C.; Flushing for addnl. 2 h at the same temp. to remove excess SiCl4 and volatile AlCl3, cooling to room temp., washing with deionized water, ion exchange with NH4Cl; detn. of Si/Al ratio by IR, (29)Si-, (27)Al-NMR and X-ray diffraction.; |
tetrachlorosilane
A
sodium tetrachloroaluminate
Conditions | Yield |
---|---|
byproducts: NaCl, AlCl3; Under N2, the dehydrated zeolite is heated in a flow of a SiCl4 and N2 mixt. for 1 h at 300°C.; Flushing for addnl. 2 h at the same temp. to remove excess SiCl4 and volatile AlCl3, cooling to room temp., washing with deionized water, ion exchange with NH4Cl; detn. of Si/Al ratio by IR, (29)Si-, (27)Al-NMR and X-ray diffraction.; |
tetrachlorosilane
A
sodium tetrachloroaluminate
Conditions | Yield |
---|---|
byproducts: NaCl, AlCl3; Under N2, the dehydrated zeolite is heated in a flow of a SiCl4 and N2 mixt. for 1 h at 350°C.; Flushing for addnl. 2 h at the same temp. to remove excess SiCl4 and volatile AlCl3, cooling to room temp., washing with deionized water, ion exchange with NH4Cl; detn. of Si/Al ratio by IR, (29)Si-, (27)Al-NMR and X-ray diffraction.; |
tetrachlorosilane
A
sodium tetrachloroaluminate
Conditions | Yield |
---|---|
byproducts: NaCl, AlCl3; Under N2, the dehydrated zeolite is heated in a flow of a SiCl4 and N2 mixt. for 1 h at 250°C.; Flushing for addnl. 2 h at the same temp. to remove excess SiCl4 and volatile AlCl3, cooling to room temp., washing with deionized water, ion exchange with NH4Cl; detn. of Si/Al ratio by IR, (29)Si-, (27)Al-NMR and X-ray diffraction.; |
tetrachlorosilane
A
sodium tetrachloroaluminate
Conditions | Yield |
---|---|
byproducts: NaCl, AlCl3; Under N2, the dehydrated zeolite is heated in a flow of a SiCl4 and N2 mixt. for 1 h at 200°C.; Flushing for addnl. 2 h at the same temp. to remove excess SiCl4 and volatile AlCl3, cooling to room temp., washing with deionized water, ion exchange with NH4Cl; detn. of Si/Al ratio by IR, (29)Si-, (27)Al-NMR and X-ray diffraction.; |
aluminium trichloride
Na(1+)*NbCl6(1-)=NaNbCl6
A
sodium tetrachloroaluminate
B
niobium pentachloride
Conditions | Yield |
---|---|
In not given |
aluminium trichloride
sodium tantalum hexachloride
A
sodium tetrachloroaluminate
B
tantalum pentachloride
aluminium trichloride
sodium tri-tert-butylsilanide
A
sodium tetrachloroaluminate
Conditions | Yield |
---|---|
In benzene-d6 (inert conditions); heating for 1 week; |
sodium tetrachloroaluminate
2-(difluorochloromethyl)-6-(fluoro-dichloromethyl)-chlorobenzene
1-trifluoromethyl-2-chloro-3-trichloromethyl-benzene
Conditions | Yield |
---|---|
In liquid sulphur dioxide -15°C; |
Conditions | Yield |
---|---|
In gaseous matrix Kinetics; heating mixture of NaAlCl4 and Nb2O5 (annealed at 400°C, fine powdered) in stream of Ar at 350°C;; | |
In melt byproducts: AlOCl, NaCl; Nb2O5 and molten NaAlCl4 below 600°C;; | |
In neat (no solvent) 275-450°C;; |
Conditions | Yield |
---|---|
With sodium In neat (no solvent) by bringing a mixture of powdered NaAlCl3 and Na3AlF6 with pieces of Na (ratio=10:5:2) into a warm furnace; violent reaction, mass and furnace getting white-hot, for completion of reaction further heating;; tapping, Al flows out in liquid slag; yields Al pieces of 6-8 kg;; | |
With Na In neat (no solvent) by bringing a mixture of powdered NaAlCl3 and Na3AlF6 with pieces of Na (ratio=10:5:2) into a warm furnace; violent reaction, mass and furnace getting white-hot, for completion of reaction further heating;; tapping, Al flows out in liquid slag; yields Al pieces of 6-8 kg;; |
Conditions | Yield |
---|---|
In neat (no solvent) reduction with sodium potassium alloy;; | |
With sodium In neat (no solvent) by heating a mixture of NaAlCl3 and Na using CaF2 as flux;; Al castings;; | |
With sodium In neat (no solvent) by heating a mixture of NaAlCl3 and Na using Na3AlF6 as flux;; Al casting;; |
sodium tetrachloroaluminate
uranium(IV) tetrafluoride
uranium(IV) chloride
sodium tetrachloroaluminate
carbonylgold(I) chloride
Conditions | Yield |
---|---|
In thionyl chloride |
sodium tetrachloroaluminate
B
AlClF3(1-)
C
AlCl2F2(1-)
D
AlCl3F(1-)
Conditions | Yield |
---|---|
With NaF In further solvent(s) byproducts: NaCl; dissolved in molten NaF at 820 ° C (ratio F:Al = 3.0); product ratio detd. by Raman spectroscopy; |
sodium tetrachloroaluminate
B
AlClF3(1-)
C
AlCl2F2(1-)
D
AlCl3F(1-)
Conditions | Yield |
---|---|
With LiCl; NaF In further solvent(s) byproducts: NaCl; various amounts dissolved in 80 mol-% LiCl and 20 mol-% NaF (temp. >490 ° C); | |
With NaF In further solvent(s) byproducts: NaCl; dissolved in molten NaF at 820 ° C, various amounts of NaAlCl4 (ratio F:Al = 2.0 or 2.5); product ratio detd. by Raman spectroscopy; |
sodium tetrachloroaluminate
A
AlClF3(1-)
B
AlCl2F2(1-)
C
AlCl3F(1-)
Conditions | Yield |
---|---|
With NaF In further solvent(s) byproducts: NaCl; dissolved in molten NaF at 820 ° C (ratio F:Al = 1.44); product ratio detd. by Raman spectroscopy; |
Conditions | Yield |
---|---|
With NaCl; NaF In further solvent(s) various amounts dissolved in 60 mol-% NaCl and 40 mol-% NaF (820 ° C); |
Conditions | Yield |
---|---|
With NaF In further solvent(s) byproducts: NaCl; dissolved in molten NaF at 820 ° C (ratio F:Al = 0.99); product ratio detd. by Raman spectroscopy; |
Conditions | Yield |
---|---|
In neat (no solvent) 100% H2SO4; 100°C; several days at 80°C; | |
In liquid sulphur dioxide molar ratio H2SO4 : NaAlCl4 = 4:1; |
The Aluminium sodium tetrachloride is an organic compound with the formula AlCl4Na. The IUPAC name of this chemical is sodium tetrachloroalumanuide. With the CAS registry number 7784-16-9, the product's categories are AluminumMetal and Ceramic Science; Catalysis and Inorganic Chemistry; Chemical Synthesis; Salts; Sodium Salts. Besides, it should be stored in a closed cool and dry place.
When you are using this chemical, please be cautious about it as the following:
It reacts violently with water. In case of contact with eyes, rinse immediately with plenty of water and seek medical advice. Besides, this chemical can cause burns. When you are using it, wear suitable gloves and eye/face protection and do not breathe dust. Please take off immediately all contaminated clothing. In case of accident or if you feel unwell seek medical advice immediately (show the label where possible).
You can still convert the following datas into molecular structure:
(1)SMILES: [Na+].Cl[Al-](Cl)(Cl)Cl
(2)InChI: InChI=1/Al.4ClH.Na/h;4*1H;/q+3;;;;;+1/p-4/rAlCl4.Na/c2-1(3,4)5;/q-1;+1
(3)InChIKey: CMLRNXGMTZKKSR-MLBQZSPTAH
(4)Std. InChI: InChI=1S/Al.4ClH.Na/h;4*1H;/q+3;;;;;+1/p-4
(5)Std. InChIKey: CMLRNXGMTZKKSR-UHFFFAOYSA-J
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