tetramethylsilane
germaniumtetrachloride
A
chloro-trimethyl-silane
B
chlorotrimethylgermane
C
dimethylsilicon dichloride
Conditions | Yield |
---|---|
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 2/1, at 200°C for 15 h, cooled; NMR, mass spectra, chromy.; | A 50% B 100% C 50% |
tetramethylsilane
germaniumtetrachloride
A
methyltrichlorogermane
B
dimethylsilicon dichloride
C
dichlorodimethylgermanium
Conditions | Yield |
---|---|
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 0.5/1, at 200°C for 28 h, cooled; NMR, mass spectra, chromy.; | A 64% B 100% C 36% |
tetramethylsilane
germaniumtetrachloride
A
chlorotrimethylgermane
B
dimethylsilicon dichloride
C
dichlorodimethylgermanium
Conditions | Yield |
---|---|
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 1/1, at 200°C for 56 h, cooled; NMR, mass spectra, chromy.; | A 14% B 100% C 86% |
methylphosphonic acid dichloroanhydride
methoxydimethylsilyl cyanide
A
methyl (cyano)methylphosphonate
B
dimethylsilicon dichloride
Conditions | Yield |
---|---|
at 40 - 45℃; for 0.0833333h; | A 87.6% B 97% |
Conditions | Yield |
---|---|
With methylene chloride; copper In neat (no solvent) vibrating of the Si-Cu powder;; | 97% |
With methylene chloride; copper In neat (no solvent) CH3Cl and Si-Cu/Cu-oxide at 300-375°C;; | 82.4% |
With methylene chloride; copper In neat (no solvent) CH3Cl and Si purified by treatment with strong acids;; | |
With methylene chloride In neat (no solvent) | |
With CH3Cl In neat (no solvent) |
2,2-dimethyl-1,3-diphenyl-[1,3,2]diazasilolidine
A
dimethylsilicon dichloride
B
2-(1,1-dibutyl-pentyl)-1,3-diphenyl-[1,3,2]diazaborolidine
Conditions | Yield |
---|---|
A n/a B 95% | |
A n/a B 95% |
tetramethylsilane
germaniumtetrachloride
A
chloro-trimethyl-silane
B
chlorotrimethylgermane
C
methyltrichlorogermane
D
dimethylsilicon dichloride
E
dichlorodimethylgermanium
Conditions | Yield |
---|---|
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 1/1, at 200°C for 22 h, cooled; NMR, mass spectra, chromy.; | A 6% B 30% C 15% D 94% E 56% |
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 0.5/1, at 200°C for 6 h, cooled; NMR, mass spectra, chromy.; | A 26% B 33% C 30% D 74% E 37% |
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 1/1, at 200°C for 6 h, cooled; NMR, mass spectra, chromy.; | A 60% B 54% C 11% D 40% E 35% |
Conditions | Yield |
---|---|
With triphenylphosphine | 91% |
tetramethylsilane
germaniumtetrachloride
A
chloro-trimethyl-silane
B
chlorotrimethylgermane
C
tetramethylgermane
D
dimethylsilicon dichloride
Conditions | Yield |
---|---|
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 4/1, at 200°C for 8 h, cooled; NMR, mass spectra, chromy.; | A 91% B 60% C 40% D 9% |
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 0.33/1, at 200°C for 5 h, cooled; NMR, mass spectra, chromy.; | A 89% B 74% C 26% D 11% |
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 3/1, at 200°C for 21 h, cooled; NMR, mass spectra, chromy.; | A 80% B 80% C 20% D 20% |
2,2-dimethyl-1,3-diphenyl-[1,3,2]diazasilolidine
A
dimethylsilicon dichloride
B
2-(1,1-dibenzyl-2-phenyl-ethyl)-1,3-diphenyl-[1,3,2]diazaborolidine
Conditions | Yield |
---|---|
A n/a B 90% | |
A n/a B 90% |
allyl-trimethyl-silane
A
chloro-trimethyl-silane
B
Allylchlorodimethylsilane
C
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With tungsten(VI) oxychloride In benzene at 50℃; for 60h; | A 87% B 7% C 4% |
silicon
A
Methyltrichlorosilane
B
tetrachlorosilane
C
trichlorosilane
D
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With methylene chloride; copper In neat (no solvent) mixt. of CH3Cl/N2 (2:5) and Si-Cu (9:1) at 300°C;; | A 4% B n/a C n/a D 86.5% |
With methylene chloride; copper In neat (no solvent) mixt. of CH3Cl/N2 (2:5) and Si-Cu (9:1) at 300°C;; | A 4% B n/a C n/a D 86.5% |
With methylene chloride; copper In neat (no solvent) CH3Cl and Si-Cu mixt. (8:2) at 350°C;; |
tert-butyldichloroborane
2,2-dimethyl-1,3-diphenyl-[1,3,2]diazasilolidine
A
dimethylsilicon dichloride
B
2-tert-butyl-1,3-diphenyl-[1,3,2]diazaborolidine
Conditions | Yield |
---|---|
A n/a B 86% | |
A n/a B 86% |
dimethylmonochlorosilane
(chloromethyl)trichlorosilane
A
Methyltrichlorosilane
B
dimethylsilicon dichloride
Conditions | Yield |
---|---|
at 500℃; for 0.00833333h; | A 79.1% B 85.6% |
i-C5H11BCl2
2,2-Dimethyl-2-sila-imidazolidin
A
2-i-pentyl-1,3,2-diazaborolane
B
dimethylsilicon dichloride
Conditions | Yield |
---|---|
A 85.5% B n/a |
tetramethylsilane
germaniumtetrachloride
A
chloro-trimethyl-silane
B
chlorotrimethylgermane
C
dimethylsilicon dichloride
D
dichlorodimethylgermanium
Conditions | Yield |
---|---|
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 2/1, at 200°C for 6 h, cooled; NMR, mass spectra, chromy.; | A 85% B 71% C 15% D 29% |
methylene chloride
silicon
A
Dichloromethylsilane
B
Methyltrichlorosilane
C
dimethylsilicon dichloride
Conditions | Yield |
---|---|
tin; aluminum silicide; zinc(II) oxide; copper dichloride at 280 - 300℃; for 6h; Rochow reaction; | A 1.7% B n/a C 83.8% |
zinc(II) oxide; copper dichloride at 280 - 300℃; for 6h; Rochow reaction; | A 4.5% B n/a C 83.7% |
zinc(II) oxide; aluminium; copper dichloride at 280 - 300℃; for 6h; Rochow reaction; | A 2.8% B n/a C 82.1% |
With PdSi at 400℃; for 6h; |
dichloro-propyl-borane
2,2-Dimethyl-2-sila-imidazolidin
A
2-propyl-1,3,2-diazaborolane
B
dimethylsilicon dichloride
Conditions | Yield |
---|---|
A 83.6% B n/a |
methoxydimethylsilyl cyanide
C
dimethylsilicon dichloride
D
methyl dichlorophosphoridate
Conditions | Yield |
---|---|
With trichlorophosphate at 45 - 50℃; for 0.333333h; | A 17.5% B n/a C 82.1% D n/a |
With trichlorophosphate at 45 - 50℃; for 0.333333h; Yield given. Title compound not separated from byproducts; | A 17.5% B n/a C 82.1% D n/a |
Dichloromethylsilane
acetylene
A
Dichloromethylvinylsilane
B
(E)-1,2-bis[dichloro(methyl)silyl]ethene
C
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With bis(tributylphosphine)dichloropalladium(II) In xylene at 80℃; for 3h; | A 10% B 79% C 7% |
With triphenylphosphine In xylene at 80℃; for 3h; | A 51% B 32% C 7% |
With Pd(acac)2Py In xylene at 80℃; for 3h; | A 37% B 5% C 48% |
N,N,N,N,N,N-hexamethylphosphoric triamide
Methyltrichlorosilane
octamethylcyclotetrasiloxane
dimethylsilicon dichloride
Conditions | Yield |
---|---|
In water | 76% |
divinyldimethylsilane
A
Chlorodimethylvinylsilane
B
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With hydrogenchloride; iron(III) chloride at 24 - 52℃; Product distribution; | A 75% B 5% |
Conditions | Yield |
---|---|
With tetrachlorosilane; palladium silicide; hydrogen at 400 - 850℃; for 5h; Product distribution / selectivity; | A 74% B 24% |
With copper; silicon at 300 - 390℃; | |
With nitrogen; copper; silicon at 300 - 390℃; |
diallyl(dimethyl)silane
A
Allylchlorodimethylsilane
B
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With tungsten(VI) oxychloride In benzene at 50℃; for 60h; | A 25% B 74% |
With tungsten(VI) oxychloride In benzene at 50℃; for 60h; | A 25% B 74% |
methyldiphenylsilane
chloromethylmethyldichlorosilane
A
chloromethyldiphenylsilane
B
dimethylsilicon dichloride
Conditions | Yield |
---|---|
at 160 - 230℃; for 12h; | A 71.2% B 69.8% |
at 160 - 230℃; for 12h; | A 69.8% B 71.2% |
(2-Chlor-vinyl)-dimethyl-chlorsilan
A
1,2-Dichloroethylene
B
dimethylsilicon dichloride
C
Chloro-dimethyl-(1,2,2-trichloro-ethyl)-silane
Conditions | Yield |
---|---|
With chlorine for 5h; Further byproducts given; | A 5% B 6% C 70% D 2% |
para-bromotoluene
dimethylsilicon dichloride
bis(4-methylphenyl)dimethylsilane
Conditions | Yield |
---|---|
With magnesium In tetrahydrofuran Grignard Reaction; Inert atmosphere; Schlenk technique; | 100% |
With magnesium In not given | 73% |
With Mg In not given | 73% |
methyl propargyl alcohol
dimethylsilicon dichloride
But-2-ynyloxy-chloro-dimethyl-silane
Conditions | Yield |
---|---|
Ambient temperature; | 100% |
dimethylsilicon dichloride
phenylthio 3,4,6-tri-O-acetyl-β-D-galactopyranoside
Acetic acid (2R,3S,4S,5R,6S)-3-acetoxy-2-acetoxymethyl-5-(chloro-dimethyl-silanyloxy)-6-phenylsulfanyl-tetrahydro-pyran-4-yl ester
Conditions | Yield |
---|---|
With pyridine In dichloromethane | 100% |
With pyridine In toluene at 25 - 110℃; | |
With pyridine In toluene at 25℃; for 1h; Yield given; |
Conditions | Yield |
---|---|
With n-butyllithium; tetrachlorosilane In diethyl ether; hexane at 25℃; | 100% |
1,1,4,4,7,7,10,10-octamethyl-2,3,4,7,8,9,10,12-octahydro-1H-dibenzo[b,h]fluorene
dimethylsilicon dichloride
chlorodimethyl (1,1,4,4,7,7,10,10-octamethyl-2,3,4,7,8,9,10,12-octahydro-1H-dibenzo[b,h]-fluorene-12-yl)silane
Conditions | Yield |
---|---|
Stage #1: 1,1,4,4,7,7,10,10-octamethyl-2,3,4,7,8,9,10,12-octahydro-1H-dibenzo[b,h]fluorene With n-butyllithium In diethyl ether at -78 - 20℃; Schlenk technique; Stage #2: dimethylsilicon dichloride In diethyl ether at -78 - 20℃; Schlenk technique; | 100% |
Stage #1: 1,1,4,4,7,7,10,10-octamethyl-2,3,4,7,8,9,10,12-octahydro-1H-dibenzo[b,h]fluorene With n-butyllithium In diethyl ether at -78 - 20℃; Schlenk technique; Stage #2: dimethylsilicon dichloride In diethyl ether at -78 - 20℃; Schlenk technique; | 100% |
Stage #1: 1,1,4,4,7,7,10,10-octamethyl-2,3,4,7,8,9,10,12-octahydro-1H-dibenzo[b,h]fluorene With n-butyllithium In tetrahydrofuran; hexane for 20h; Stage #2: dimethylsilicon dichloride In tetrahydrofuran; hexane for 17.5h; | 87.7% |
Stage #1: 1,1,4,4,7,7,10,10-octamethyl-2,3,4,7,8,9,10,12-octahydro-1H-dibenzo[b,h]fluorene With n-butyllithium In tetrahydrofuran; diethyl ether; hexane at 0 - 20℃; for 48h; Stage #2: dimethylsilicon dichloride In diethyl ether; hexane at 0 - 20℃; for 24h; |
dimethylsilicon dichloride
Conditions | Yield |
---|---|
Stage #1: 1,4,8-triazacycloundecane trihydrochloride With triethylamine In dichloromethane at 0℃; for 0.25h; Stage #2: dimethylsilicon dichloride In dichloromethane at 20℃; | 100% |
(2-Chlor-vinyl)-dimethyl-chlorsilan
A
1,2-Dichloroethylene
B
dimethylsilicon dichloride
C
Chloro-dimethyl-(1,2,2-trichloro-ethyl)-silane
Conditions | Yield |
---|---|
With chlorine at 22 - 83℃; for 5h; Further byproducts given; | A 5% B 6% C 70% D 3% |
(2-Chlor-vinyl)-dimethyl-chlorsilan
A
1,2-Dichloroethylene
B
dimethylsilicon dichloride
C
Chloro-dimethyl-(1,2,2-trichloro-ethyl)-silane
Conditions | Yield |
---|---|
With chlorine for 5h; Further byproducts given; | A 5% B 6% C 70% D 2% |
(2-Chlor-vinyl)-dimethyl-chlorsilan
A
1,2-Dichloroethylene
B
dimethylsilicon dichloride
C
Chloro-dimethyl-(1,2,2-trichloro-ethyl)-silane
D
1,1,2,2-tetrachloroethane
Conditions | Yield |
---|---|
With chlorine for 5h; Further byproducts given; | A 5% B 6% C 70% D 2% |
3,6-di-tert-butyl-9H-fluorene
dimethylsilicon dichloride
Conditions | Yield |
---|---|
Stage #1: 3,6-di-tert-butyl-9H-fluorene With n-butyllithium In diethyl ether at -78 - 20℃; Schlenk technique; Stage #2: dimethylsilicon dichloride In diethyl ether at -78 - 20℃; Schlenk technique; | 100% |
Stage #1: 3,6-di-tert-butyl-9H-fluorene With n-butyllithium In diethyl ether at -78 - 20℃; Schlenk technique; Stage #2: dimethylsilicon dichloride In diethyl ether at -78 - 20℃; Schlenk technique; | 100% |
Stage #1: 3,6-di-tert-butyl-9H-fluorene With n-butyllithium In diethyl ether; hexane at 20℃; for 3h; Stage #2: dimethylsilicon dichloride In diethyl ether; hexane at 20℃; Further stages.; | 87.9% |
Stage #1: 3,6-di-tert-butyl-9H-fluorene With n-butyllithium In diethyl ether Stage #2: dimethylsilicon dichloride In diethyl ether |
(((CH3)2CH)2N)2BP(H)Li(CH3OCH2CH2OCH3)
dimethylsilicon dichloride
bis([bis(diisopropylamino)boryl]phosphino)dimethylsilane
Conditions | Yield |
---|---|
In hexane byproducts: LiCl, DME; inert atmosphere; mixing stoich. amts. at 0°C, stirring at 23°C for 5 h; filtration off of LiCl, evapn. (reduced pressure); elem. anal.; | 100% |
1-propynyl lithium
dimethylsilicon dichloride
bis(prop-1-ynyl)dimethylsilane
Conditions | Yield |
---|---|
In tetrahydrofuran at 20℃; for 4h; | 100% |
In tetrahydrofuran at 20℃; for 4h; | 100% |
Conditions | Yield |
---|---|
Stage #1: C28H30 With n-butyllithium In tetrahydrofuran; hexane at -78 - 20℃; Inert atmosphere; Stage #2: dimethylsilicon dichloride In tetrahydrofuran; hexane at -78 - 20℃; Inert atmosphere; | 100% |
n-Dodecylamine
dimethylsilicon dichloride
bis(n-dodecylamino)dimethylsilane
Conditions | Yield |
---|---|
In hexane at 20℃; for 24h; Cooling; | 100% |
With triethylamine In pentane at -0.16 - 19.84℃; Inert atmosphere; |
n-Octylamine
dimethylsilicon dichloride
bis(n-octylamino)dimethylsilane
Conditions | Yield |
---|---|
In hexane at 20℃; for 24h; Cooling; | 100% |
With triethylamine In pentane at -0.16 - 19.84℃; Inert atmosphere; |
dimethylsilicon dichloride
Conditions | Yield |
---|---|
Stage #1: 2,2,6-trimethyl-1,2,3,5-tetrahydro-s-indacene With n-butyllithium In tetrahydrofuran; hexane; toluene at 20 - 60℃; for 4h; Stage #2: dimethylsilicon dichloride In tetrahydrofuran; hexane; toluene for 1h; Reflux; | 100% |
dimethylsilicon dichloride
Conditions | Yield |
---|---|
Stage #1: 2,2,7-trimethyl-1,2,3,6-tetrahydro-as-indacene With n-butyllithium In tetrahydrofuran; hexane; toluene at 60℃; for 4h; Stage #2: dimethylsilicon dichloride In tetrahydrofuran; hexane; toluene at 20℃; for 1h; | 100% |
dimethylsilicon dichloride
Conditions | Yield |
---|---|
Stage #1: 1-(2-methyl-1H-inden-4-yl)-1,2,3,4-tetrahydroquinoline With n-butyllithium In diethyl ether at -78 - 20℃; Schlenk technique; Stage #2: dimethylsilicon dichloride In diethyl ether at -78 - 20℃; Schlenk technique; | 100% |
2-methyl-5-tert-Butyl-6-methoxy-7-(3,5-di-tert-butylphenyl)-1H-indene
dimethylsilicon dichloride
Conditions | Yield |
---|---|
Stage #1: 5-tert-butyl-7-(3,5-di-tert-butylphenyl)-6-methoxy-2-methyl-1H-indene With n-butyllithium In diethyl ether; hexane at -50 - 20℃; for 4h; Stage #2: With copper(l) cyanide In diethyl ether at -50 - -25℃; for 0.5h; Stage #3: dimethylsilicon dichloride In diethyl ether at 20℃; | 100% |
Conditions | Yield |
---|---|
Stage #1: 1-(5-methyl-2-furyl)indene With n-butyllithium In tetrahydrofuran; hexane at -78 - 20℃; for 2h; Stage #2: dimethylsilicon dichloride In tetrahydrofuran; hexane at -78 - 20℃; for 2h; Stage #3: Cyclododecylamine Further stages; | 100% |
dimethylsilicon dichloride
Conditions | Yield |
---|---|
In tetrahydrofuran at -25℃; | 100% |
dimethylsilicon dichloride
Conditions | Yield |
---|---|
Stage #1: 4,8-di(3,5-dimethylphenyl)-6-methyl-1,2,3,5-tetrahydro-s-indacene With n-butyllithium In tetrahydrofuran; diethyl ether; hexane at -30 - 20℃; Stage #2: dimethylsilicon dichloride In tetrahydrofuran; diethyl ether; hexane at -50 - 20℃; | 100% |
Stage #1: 4,8-di(3,5-dimethylphenyl)-6-methyl-1,2,3,5-tetrahydro-s-indacene With n-butyllithium In tetrahydrofuran; diethyl ether; hexane at -30 - 20℃; Stage #2: dimethylsilicon dichloride In tetrahydrofuran; diethyl ether; hexane at -50 - 20℃; | 100% |
dimethylsilicon dichloride
η1-8-SiMe2Cl-9-SMe2-7,8-C2B9H10
Conditions | Yield |
---|---|
In tetrahydrofuran byproducts: NaCl; under Ar; mixt. of Me2SiCl2 and soln. of B compd. in THF stirred at roomtemp. for 3 d; filtered; solvent removed from filtrate by evapn. in vac.; dissolved in THF; pptd. by addition of petroleum ether; recrystd. twice; dried overnight under vac.; elem. anal.; | 99.7% |
Conditions | Yield |
---|---|
In methanol at 18 - 57℃; for 3.5h; | 99% |
With diethyl ether |
Conditions | Yield |
---|---|
With triethylamine In diethyl ether Cooling with ice; Inert atmosphere; Schlenk technique; | 99% |
In diethyl ether for 1h; Substitution; aminolysis; | 81% |
With triethylamine In pentane at -0.16 - 19.84℃; Inert atmosphere; | 55% |
2,2′-(ethyne-1,2-diyl)diphenol
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With triethylamine In dichloromethane at 20℃; for 12h; Cyclization; | 99% |
allyl tert-butyldimethylsilane
dimethylsilicon dichloride
Conditions | Yield |
---|---|
Stage #1: allyl tert-butyldimethylsilane With n-butyllithium In hexane at -78 - 20℃; Metallation; Stage #2: dimethylsilicon dichloride In hexane for 15h; silylation; Further stages.; | 99% |
Conditions | Yield |
---|---|
With n-butyllithium In tetrahydrofuran; hexane | 99% |
(tert-butylamino){tert-butyl(trimethylsilyl)amino}borane
dimethylsilicon dichloride
{tert-butyl(chlorodimethylsilyl)amino}{tert-butyl(trimethylsilyl)amino}chloroborane
Conditions | Yield |
---|---|
In hexane addn. of soln. of (CH3)3SiNC(CH3)3BNC(CH3)3 in hexane at 20°C to (CH3)2SiCl2 at 60°C; removal of solvent, distn.; elem. anal.; | 99% |
Conditions | Yield |
---|---|
Stage #1: 4-bromo-2-isopropoxy-1-vinylbenzene With iodine; magnesium In tetrahydrofuran Inert atmosphere; Reflux; Stage #2: dimethylsilicon dichloride In tetrahydrofuran at 0 - 20℃; Inert atmosphere; | 99% |
The Molecular Structure of Dichlorodimethylsilane (CAS NO.75-78-5):
Molecular Formula: C2H6Cl2Si
Molecular Weight: 129.06
EINECS: 200-901-0
Density: 1.06
Melting Point: -76 °C
Boiling Point: 70 °C
Flash Point: -9 °C
Appearance: Colourless liquid
Storage temp: Store at 0-5°C
Water Solubility: reacts
Sensitive: Moisture Sensitive
IUPAC: dichloro(dimethyl)silane
Synonyms: Dichlorodimethyl-silan ; Dichlorodimethylsilicon ; Dimethyldichlorosilicane ; Dimethyl-dichlorsilan ; Dimethyl-dichlorsilan(czech) ; Dimethyldichlorsilane ; Dimethylsilanedichloride
Stability: Stable. Reacts violently with water and alcohols. Highly flammable. Incompatible with strong oxidizing agents, water, alcohols, caustics, ammonia.
Product Categories: Chloro;Silicon Compounds;Organics;Dichlorosilanes;Dichlorosilanes (for Polysilanes);Functional Materials;Reagent for High-Performance Polymer Research;Si (Classes of Silicon Compounds);Si-Cl Compounds;Silicon Compounds (for Synthesis);Synthetic Organic Chemistry;Chloro Silanes
Dichlorodimethylsilane (CAS NO.75-78-5) is used in ethchlorvynol assay.
1. | skn-rbt 20 mg/24H MOD | 85JCAE Prehled Prumyslove Toxikologie; Organicke Latky Marhold, J.,Prague, Czechoslovakia.: Avicenum,1986,1219. | ||
2. | eye-rbt 5 mg/24H SEV | 85JCAE Prehled Prumyslove Toxikologie; Organicke Latky Marhold, J.,Prague, Czechoslovakia.: Avicenum,1986,1219. | ||
3. | orl-rat LD50:5660 µL/kg | JACTDZ Journal of the American College of Toxicology. 12 (1993),573. | ||
4. | ihl-rat LC50:930 ppm/4H | 85JCAE Prehled Prumyslove Toxikologie; Organicke Latky Marhold, J.,Prague, Czechoslovakia.: Avicenum,1986,1219. | ||
5. | ipr-rat LDLo:10 mg/kg | JIDHAN Journal of Industrial Hygiene. 30 (1948),332. | ||
6. | ihl-mus LC50:300 mg/m3/2H | TPKVAL Toksikologiya Novykh Promyshlennykh Khimicheskikh Veshchestv. Toxicology of New Industrial Chemical Sciences. 3 (1961),23. |
EPA Extremely Hazardous Substances List. Reported in EPA TSCA Inventory.
Poison by ingestion and intraperitoneal routes. Moderately toxic by inhalation. A skin and severe eye irritant. Violent reaction on contact with water. When heated to decomposition it emits toxic fumes of Cl−. See also CHLOROSILANES.
Hazard Codes: XiXnFN
Risk Statements: 20-59-36/37/38-11-67-65-63-48/20-38-20/21-50/53
R20: Harmful by inhalation
R59: Dangerous to the ozone layer
R36/37/38: Irritating to eyes, respiratory system and skin
R11: Highly flammable
R67: Vapours may cause drowsiness and dizziness
R65: Harmful: may cause lung damage if swallowed
R63: Possible risk of harm to the unborn child
R38: Irritating to skin
R20/21: Harmful by inhalation and in contact with skin
R50/53: Very toxic to aquatic organisms, may cause long-term adverse effects in the aquatic environment
Safety Statements: 60-61-62-36/37-59
S60: This material and its container must be disposed of as hazardous waste
S61: Avoid release to the environment. Refer to special instructions / safety data sheets
S62: If swallowed, do not induce vomitting; seek medical advice immediately and show this container or label
S36/37: Wear suitable protective clothing and gloves
S59: Refer to manufacturer / supplier for information on recovery / recycling
RIDADR: UN 2924 3/PG 2
WGK Germany: 3
RTECS: VV3150000
F: 3-10-19-21
TSCA: Yes
HazardClass: 3
PackingGroup: II
HS Code: 29310095
DOT Classification: 3; Label: Flammable Liquid, Corrosive
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