pentacarbonyl(methoxyphenylmethylene)tungsten(0)
A
benzoic acid methyl ester
B
tungsten(IV) oxychloride
C
hexachloroethane
D
carbon monoxide
E
tungsten(VI) chloride
Conditions | Yield |
---|---|
In tetrachloromethane byproducts: HCl, Cl2; further products; N2; stirred; gas-chromy., MAS; elem. anal.; | A 4.1% B n/a C 28% D 70% E n/a |
tungsten
tungsten(VI) chloride
Conditions | Yield |
---|---|
With chlorine dry chlorine free of oxygen, 250-300°C; | |
With chlorine dry chlorine free of oxygen, 250-300°C; |
Conditions | Yield |
---|---|
With chlorine In not given |
disulfur dichloride
chlorine
tungsten
tungsten(VI) chloride
Conditions | Yield |
---|---|
heating in dry H2-stream, then removal of hydrogen by air-free chlorine, red heat, explosion-like react.; repeated sublimation in Cl2-stream; | |
heating in dry H2-stream, then removal of hydrogen by air-free chlorine, red heat, explosion-like react.; | |
increasing of reaction rate by 0.1% platinum black in case of pure metal; |
tungsten(VI) chloride
Conditions | Yield |
---|---|
heating; | |
heating; |
tungsten(VI) chloride
Conditions | Yield |
---|---|
With chlorine In tetrachloromethane 280°C; |
Conditions | Yield |
---|---|
In neat (no solvent) passing stream of COCl2 over WO3 at 350 °C;; |
disulfur dichloride
B
tungsten(VI) chloride
C
tungsten dioxydichloride
Conditions | Yield |
---|---|
In neat (no solvent) below 500°C;; | A n/a B 0% C n/a |
In neat (no solvent) below 500°C;; | A n/a B 0% C n/a |
tetrachloromethane
B
tungsten(VI) chloride
Conditions | Yield |
---|---|
In neat (no solvent) reaction of WO3 with CCl4 at 250°C formation of WOCl4, at 400°C formation of WCl6;; | |
heating for 3-4 h in a closed tube at 280°C; washing with CCl4, exhausting of CCl4 by suction, heating at 150°C, drying in vac.; | |
heating for 3-4 h in a closed tube at 280°C; washing with CCl4, exhausting of CCl4 by suction, heating at 150°C, drying in vac.; | |
In neat (no solvent) reaction of WO3 with CCl4 at 250°C formation of WOCl4, at 400°C formation of WCl6;; |
phosphorus pentachloride
A
tungsten(V) chloride
B
tungsten(VI) chloride
C
trichlorophosphate
Conditions | Yield |
---|---|
heating in CO2 atm.; |
phosphorus pentachloride
A
tungsten(VI) chloride
B
trichlorophosphate
Conditions | Yield |
---|---|
170°C; inclusion tube; |
phosphorus pentachloride
A
tungsten(V) chloride
B
tungsten(VI) chloride
Conditions | Yield |
---|---|
In carbon disulfide heating for several d at 30-40°C then for 8-10 d at 80-90°C under pressure, evapn. of CS2 in CO2-stream; | |
heating of equiv. amts. of educts in CO2-athmosphere; | |
In carbon disulfide under pressure; |
phosphorus pentachloride
tungsten(VI) chloride
Conditions | Yield |
---|---|
byproducts: POCl3; heating of a homogeneous mixt. of educts (molar ratio 1:3) in a closed glass tube by melting, at 170-200°C; distn. of POCl3, heating in CO2-stream at 120°C; | |
byproducts: POCl3; heating of a homogeneous mixt. of educts (molar ratio 1:3) in a closed glass tube by melting, at 170-200°C; distn. of POCl3, heating in CO2-stream at 120°C; |
Conditions | Yield |
---|---|
heating chlorine-free CCl4, in a closed tube at 240°C; | |
heating chlorine-free CCl4, in a closed tube at 240°C; |
tetrachloromethane
B
tungsten(VI) chloride
C
tungsten(IV) chloride
D
tungsten dioxydichloride
Conditions | Yield |
---|---|
In neat (no solvent) reaction on heating WO2 with CCl4 to 250°C in a closed tube for 8h;; | |
In neat (no solvent) reaction on heating WO2 with CCl4 to 250°C in a closed tube for 8h;; |
tungsten(V) chloride
molybdenum(V) chloride
A
tungsten(VI) chloride
B
molybdenum(IV) chloride
Conditions | Yield |
---|---|
In neat (no solvent) |
phosphorus pentachloride
tungsten(VI) chloride
Conditions | Yield |
---|---|
byproducts: chlorine, WCl5; heating of equimolar amts. of educts in a closed tube at 170°C; | |
heating in closed tube at 170°C; | |
heating in closed tube at 170°C; | |
byproducts: chlorine, WCl5; heating of equimolar amts. of educts in a closed tube at 170°C; |
Conditions | Yield |
---|---|
In neat (no solvent) treatment (200 K), warming to 320 K (Cl2 atmosphere); elem. anal.; |
Conditions | Yield |
---|---|
heating with dry chlorine, under red heat; heating to melting; | |
heating with dry chlorine, under red heat; heating to melting; |
Conditions | Yield |
---|---|
only oxychloride formation; | 0% |
400°C; | |
only oxychloride formation; | 0% |
400°C; |
Conditions | Yield |
---|---|
With Cl2 dry Cl2 at 200-300°C; |
Conditions | Yield |
---|---|
heated at 130 °C; |
Dichlorodifluoromethane
C
carbon dioxide
D
carbon monoxide
E
tungsten(VI) chloride
Conditions | Yield |
---|---|
In neat (no solvent) reaction below 525°C; further products;; |
A
tungsten(VI) chloride
B
phosphorus trichloride
Conditions | Yield |
---|---|
With Cl2 at red heat; |
phosgene
tungsten
A
tungsten(V) chloride
C
tungsten(VI) chloride
Conditions | Yield |
---|---|
trace formation; | |
trace formation; |
chlorine
tungsten
A
tungsten(V) chloride
B
tungsten(VI) chloride
Conditions | Yield |
---|---|
red heat; | |
red heat; |
tungsten(VI) chloride
Conditions | Yield |
---|---|
With chlorine byproducts: Br2; below m.p.; | |
With Cl2 byproducts: Br2; below m.p.; |
phosphorus pentachloride
A
tungsten(V) chloride
C
tungsten(VI) chloride
Conditions | Yield |
---|---|
heating of equiv. amts. of educts in a CO2-atmosphere; | |
heating of equiv. amts. of educts in a CO2-atmosphere; |
iodine
tungsten(VI) chloride
Conditions | Yield |
---|---|
In neat (no solvent) Ar atmosphere, sealed ampoule, formation of black melt at 300°C, tube furnace (150°C), crystn. (3 months); | 100% |
1,2-dihydro-3,3,5,5,7,7-hexaphenyl-1,2,4,6,3λ5,5λ5,7λ5-tetraazatriphosphepinium chloride
tungsten(VI) chloride
diphenyl-bis(chlorodiphenylphosphoranylideneamino)phosphonium hexachlorotungstate (V)
Conditions | Yield |
---|---|
With chlorine In dichloromethane byproducts: nitrogen; To the soln. obtained from the reaction of the tetraazatriphosphepinium chloride chlorine was added at 0°C.; removal of the volatile components, recrystn. at -25°C from CH2Cl2; | 100% |
Conditions | Yield |
---|---|
In dichloromethane byproducts: (CH3)3SiCl; under N2, dropwise addn. of a CH2Cl2 soln. of (Me3Si)2O to WCl6 in CH2Cl2 at room temp. over a period of 15 min, stirred for 60 min; filtered, washed with petroleum ether, dried in vac.; elem. anal.; | 99% |
Hexamethyldisiloxane
tungsten(VI) chloride
tungsten oxytetrachloride
Conditions | Yield |
---|---|
In dichloromethane byproducts: Me3SiCl; under inert atm.; soln. of Si-compd. added dropwise to a stirred suspension of W-compd. at room temp. over a period of 15 min, deposition of crystals, mixt. stirred at room temp. for 60 min; supernatant decanted, solid collected, washed (petroleum ether), dried (vac.); elem. anal.; | 99% |
In octane byproducts: M3SiCl; yielding amorphous powder; |
Conditions | Yield |
---|---|
With 1-methyl-3,6-bis(trimethylsilyl)-1,4-cyclohexadiene at -78 - 20℃; for 1h; Inert atmosphere; | 99% |
With cyclopentene In dichloromethane under Ar: addn. of 306 mmol cyclopentene to a stirred suspension of 29.8 mmol WCl6; filtration of the soln. after 15 min at room temperature; addn. of tetrahydrofuran after cooling to ice-bath temperature; pptn. after a few minutes at room temperature;; filtration after 1 h; washing with dichloromethyne; drying under vac.; elem. anal.;; | 36% |
tungsten(VI) chloride
Conditions | Yield |
---|---|
With pyridine In pyridine 1 d stirring; filtration, elem. anal.; | 99% |
tungsten(VI) chloride
B
tungsten(III) chloride
Conditions | Yield |
---|---|
In neat (no solvent) mixt. of educts held at 300-350°C for 2-3 h; WOCl4 sepd. by sublimation at 250°C; the residue held at 450-470°C for 3-4 h; WOCl4 sepd. once more by sublimation at 350-370°C; cooled; elem.anal., XRD; | A n/a B 98.1% |
tungsten(VI) chloride
tungsten(IV) chloride
Conditions | Yield |
---|---|
With Sn In 1,2-dichloro-ethane byproducts: SnCl4; absence of air and moisture; stirring with Sn-powder at room temp. for 17 h, then at 80-90°C for 2 d; centrifugation, washing (CH2Cl2), drying (vac., room temp.); elem. anal.; | 98% |
With Sb In neat (no solvent) byproducts: SbCl3, WOCl4, WCl5; absence of air and moisture; sealed evacuated glass tube, 75-80°C(12 h), 105°C (12 h), 130°C (12 h); distn. off of byproducts (130°C, 1d; then 160°C, 1 d; then215°C, 1 d); elem. anal.; | 97% |
With red phosphorus In neat (no solvent) byproducts: PCl3, WOCl4, WCl5; absence of air and moisture; sealed evacuated glass tube, slow heating to 200°C (over 12 h), then to 300°C (over further 12 h); sublimation off of byproducts (230-240°C, 1 d, trap at liquid N2-temp.; further byproduct: POCl3); elem. anal.; | 94% |
Conditions | Yield |
---|---|
In benzene byproducts: HCl; under N2; WCl6 and PhCONH2 in benzene heated under reflux for 16 h; solvent removed; washed with hexane; dried in vac.; elem. anal.; | 98% |
Conditions | Yield |
---|---|
at 120℃; for 16h; Inert atmosphere; Glovebox; Schlenk technique; | 98% |
at 120℃; for 16h; |
Conditions | Yield |
---|---|
With H2O2 In dichloromethane; water WCl6 and methyl(diphenyl)phosphine oxide dissolved in CH2Cl2 together with H2O, stirred, treated with H2O2 soln., stirred for ca 1 h; concd. (vac.), pptd. (hexanes), filtered off, dissolved in CH2Cl2, stirred for ca 1-2 h, concd., pptd. (hexanes), dried (vac.); elem. anal.; | 96% |
chloropicrin
tungsten(VI) chloride
tungsten(VI) oxychloride
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: NOCl, CCl4; under exclusion of moisture, refluxed for 10 min, cooled quickly to 0°C; filtered; dried under vac.; elem. anal.; | 95.3% |
Conditions | Yield |
---|---|
With carbon In N,N-dimethyl-formamide Sonication; a soln. of WCl6 in DMF was added to a dispersed carbon microspheres in DMF at a speed of 20 s per drop while being ultrasonicated, after 30 min and small amounts H2O was added dropwise, ultrasonication for 1 h, aged at room temp. for 1 d; filtered, washed with alcohol and distilled water, dried in vac. at 80°C for 12 h, the carbon spheres were removed in a conventional muffle furnace, calcination at 450°C for 2 h in air, cooled to room temp.; | 95% |
In ethanol deposited on SnO2; EtOH soln. of WCl6, heated at 373 K for 20 h in the absence of moistute, washed with water, dried at 393 K; SEM, XRD; | |
With pluronic F127 In water WCl6 added to a soln. of pluronic F127 in water, mixt. stirred for 3 h, heated at 120 °C for 24 h in autoclave, cooled to 25°C, residue centrifugated, washed with water/EtOH, dried at 80 °C for 12 h, heated at 550 °C, for 3 h; | |
Stage #1: water; tungsten(VI) chloride With Pluronic P-127 In ethanol at 40℃; Stage #2: With air at 450℃; for 6h; Calcination; |
Conditions | Yield |
---|---|
In tetrachloromethane (under exclusion of moisture); dropwise addn. of the acetylene in CCl4 to WCl6 in CCl4, reflux for 12 h; filtn., ppt. is washed, dried in vac., elem. anal.; | 95% |
1,4-bis(trimethylsilyl)-1,3-butadiyne
tungsten(VI) chloride
Conditions | Yield |
---|---|
With 1,1,2,2-tetrachloroethylene In tetrachloromethane byproducts: C2Cl6, C4Cl2(SiMe3)2; under Ar; WCl6 suspensed in CCl4; the butadiyne added; refluxed for 12 h; filtered; washed with CCl4 and CH2Cl2; dried in vacuo for 3 h; elem. anal.; | 95% |
Conditions | Yield |
---|---|
In dichloromethane at 0℃; for 1.5h; | 95% |
In dichloromethane (Ar); dropwise addn. of a soln. of silicon compd. in CH2Cl2 to a suspn. of WCl4 in CH2Cl2 at room temp. over 15 min, stirring for 60 min; sepn., washing with hexane, drying in vac.; |
Conditions | Yield |
---|---|
In dichloromethane N2, W compd. stirred with Si compd. (2 equiv.) for 2 h, P compd. (light excess) added, stirred for ca. 2 h; filtered, solvent removed (vac.), ppt. washed (hexane), dried (vac.); elem. anal.; | 95% |
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: PCl3; WCl6 and red P (1:1.34) mixed (Ar), sealed (vac.) in silica tube, heatedat 500°C for 24 h; sublimated, XRD; | A 95% B 5% |
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: PCl3; WCl6 and red P (1:1.34) mixed (Ar), sealed (vac.) in silica tube, heatedat 370°C for 24 h; sublimated, XRD; | 95% |
Conditions | Yield |
---|---|
at 150℃; for 16h; Inert atmosphere; Schlenk technique; | 95% |
trimethyl(4-phenylbuta-1,3-diyn-1-yl)silane
tungsten(VI) chloride
Conditions | Yield |
---|---|
With tetrachloroethylene In tetrachloromethane byproducts: Cl3CCCl3, PhC4Cl2SiMe3; under Ar; dissolving PhCCCCSiMe3 in CCl4 and C2Cl4, refluxing (95°C), adding WCl6 by boiling CCl4 via an extraction frit (4.5 h), heating (12 h); filtering, washing (CCl4 and CH2Cl2), drying (high vac.); elem. anal.; | 94% |
tungsten(VI) chloride
toluene-4-sulfonamide
dichlorobis(tosylimido)tungsten(VI)
Conditions | Yield |
---|---|
In toluene byproducts: HCl; Ar atm.; refluxing (2 h); filtn. (hot), washing (hot toluene, 3 times), drying (vac.); elem. anal.; | 94% |
tetraphenylarsonium chloride
tungsten(VI) chloride
tetraphenylarsonium hexachlorotungstate(V)
Conditions | Yield |
---|---|
With C2Cl4 In dichloromethane byproducts: C2Cl6; addn. of CCl4 and CH2Cl2 to WCl6 and arsonium compd. under Ar; heating slowly to 40°C; foaming of soln.; pptn.; refluxing, 2h; cooling ato 20°C; addn. of dry CH2Cl2; heating with stirring, 30 min; cooling; pptn.; filtration; further crystn. of mother liquor at -5°C; elem. anal.; | 93% |
Conditions | Yield |
---|---|
In tetrahydrofuran; pentane oxygen exclusion; mixing solns. (-78 to 0°C), warming to room temp., reflux, 2 h; sublimation (ca. 80°C, 1E-4 Torr); | 93% |
Conditions | Yield |
---|---|
With 1-methyl-3,6-bis(trimethylsilyl)-1,4-cyclohexadiene In toluene at -78 - 20℃; for 1h; Inert atmosphere; | 93% |
Conditions | Yield |
---|---|
In 1,2-dichloro-ethane at 20℃; for 17h; | 93% |
tetraselendinitride
tungsten(VI) chloride
Conditions | Yield |
---|---|
In dichloromethane Se4N2 is suspended in CH2Cl2, WCl6 is added under stirring, stirring at room temp. under exclusion of moisture for 24 h; filtn., washing (CH2Cl2), drying (vac.); | 92% |
N-methyl-N-phenylhydrazine hydrochloride
tungsten(VI) chloride
[WCl4(NNCH3C6H5)]
Conditions | Yield |
---|---|
In dichloromethane (N2); stirring (-78°C, 0.08 h); warming to room temp., solvent removal (vac.), drying (vac., 0.5 h), pentane addn., stirring (0.2 h), filtn., washing (pentane), drying (vac.); | 92% |
Conditions | Yield |
---|---|
Stage #1: tungsten(VI) chloride With 1-methyl-3,6-bis(trimethylsilyl)-1,4-cyclohexadiene In toluene at -78 - 20℃; for 1h; Inert atmosphere; Stage #2: C36H42N2 In toluene at 20℃; for 16h; Inert atmosphere; | 92% |
[2,2]bipyridinyl
1,2-dimethoxyethane
tungsten(VI) chloride
W(O)2Cl2(2,2′-bipyridine)
Conditions | Yield |
---|---|
Stage #1: 1,2-dimethoxyethane; tungsten(VI) chloride With Hexamethyldisiloxane In dichloromethane at 20℃; for 2h; Stage #2: [2,2]bipyridinyl In dichloromethane for 0.5h; | 92% |
The Tungsten hexachloride, with CAS registry number 13283-01-7, has the systematic name of tungsten(+2) cation hexachloride. And its IUPAC name is hexachlorotungsten. Its other registry number is 18715-53-2. What's more, it is a kind of dark grey-violet crystalline powder.
Physical properties about this chemical are: (1)#H bond acceptors: 0; (2)#H bond donors: 0; (3)#Freely Rotating Bonds: 0; (4)Polar Surface Area: Å2.
When you are using this chemical, please be cautious about it as the following:
The Tungsten hexachloride may cause burns. When use it, wear suitable protective clothing, gloves and eye/face protection. If contact with eyes, rinse immediately with plenty of water and seek medical advice. In case of accident or if you feel unwell, seek medical advice immediately (show the label whenever possible.)
You can still convert the following datas into molecular structure:
(1)SMILES: [W+2].[W+2].[W+2].[Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[Cl-]
(2)InChI: InChI=1/6ClH.3W/h6*1H;;;/q;;;;;;3*+2/p-6
(3)InChIKey: IHZJZUWBRYPYFX-CYFPFDDLAE
(4)Std. InChI: InChI=1S/6ClH.3W/h6*1H;;;/q;;;;;;3*+2/p-6
(5)Std. InChIKey: IHZJZUWBRYPYFX-UHFFFAOYSA-H
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