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silicic acid tetrabenzyl ester
silicic Acid
Conditions | Yield |
---|---|
With palladium-platinum; hydrogen; aniline In N,N-dimethyl acetamide at 20℃; for 2h; Concentration; Solvent; | 96% |
Conditions | Yield |
---|---|
With palladium-platinum; hydrogen; aniline at 20℃; for 2h; Concentration; Reagent/catalyst; Time; | A 6% B 92% |
With palladium-platinum; hydrogen In N,N-dimethyl acetamide at 20℃; for 2h; | A 34% B 13% |
A
pyrosilicic acid
B
cyclo trisiloxanehexaol
C
(HO)3SiOSi(OH)2OSi(OH)3
D
(HO)2SiOSi(OH)2OSi(OH)2O(Si(OH)2O)
E
silicic Acid
Conditions | Yield |
---|---|
With sulfuric acid Kinetics; byproducts: H10Si6O17, H10Si8O21, polysilicate; Na2H2SiO4*8H2O added to zeolite ion-exchange/H2SO4 at 2°C; filtered, product yield dependence to ageing time at room temp.; | A 14% B n/a C n/a D 5% E 51% |
silicic acid tetrabenzyl ester
A
pyrosilicic acid
B
cyclo trisiloxanehexaol
C
silicic Acid
Conditions | Yield |
---|---|
With palladium-platinum; hydrogen at 20℃; for 2h; | A 36% B 47% C 8% |
A
pyrosilicic acid
B
cyclo trisiloxanehexaol
C
(HO)3SiOSi(OH)2OSi(OH)3
D
(HO)2SiOSi(OH)2OSi(OH)2O(Si(OH)2O)
E
silicic Acid
Conditions | Yield |
---|---|
With sulfuric acid Kinetics; byproducts: H10Si6O17, H10Si8O21, polysilicate; Na2SiO3 added to zeolite ion-exchange/H2SO4 at 2°C; filtered, product yield dependence to ageing time at room temp.; | A 8% B n/a C n/a D 4% E 28% |
tin(IV) chloride
B
silicic Acid
Conditions | Yield |
---|---|
In water pH=5 - 7; |
tetramethylorthosilicate
silicic Acid
Conditions | Yield |
---|---|
In neat (no solvent) Kinetics; solid SiO2 reacted with H2O vapor; |
Conditions | Yield |
---|---|
With water; mercury dichloride In water |
tetraethoxy orthosilicate
silicic Acid
Conditions | Yield |
---|---|
In hydrogenchloride saponification of distd. Si(OC2H5)4 in n/500-HCl-soln.;; | |
In water by a hydrolytic process;; | |
In hydrogenchloride saponification of distd. Si(OC2H5)4 in n/500-HCl-soln.;; |
silicic Acid
Conditions | Yield |
---|---|
In water salt dissolved in a minimum amount of water added under vigorous stirring to an acidic medium with excess H(1+); not isolated;; |
Conditions | Yield |
---|---|
In water boiling MgSiF6 with NaOH;; |
Conditions | Yield |
---|---|
In water Kinetics; investigation of the kinetics of quartz dissoln. at 25°C: pH range 4.5-10.5, 25°C, ionic strength 0.010 mol/l; concn. of dissolved silicon was measured by react. with NH4-molybdate and reduction to form silicomolybdenum compounds; determination of silicon concn. from the absorbance of soln. at 810 nm; |
Conditions | Yield |
---|---|
In gaseous matrix react. of H2O/O2-stream with quartz frit at 1300°C; not isolated, MS; |
water
silica gel
sodium hydroxide
silicic Acid
Conditions | Yield |
---|---|
In water the soln. of sodium silicate passed through the cation-exchanger; |
Conditions | Yield |
---|---|
In water introduction of SiF4 into H2O;; not isolated (in soln.);; | |
In water introduction of SiF4 into H2O;; not isolated (in soln.);; |
water
silicon tetrafluoride
A
hydrogen fluoride
B
silicic Acid
Conditions | Yield |
---|---|
In neat (no solvent) |
Conditions | Yield |
---|---|
In water byproducts: HCl; dry N2 and vapor of SiCl4 is slowly passed into water in presence of Ag2O under vigorous stirring at 0°C;; | |
In water |
Conditions | Yield |
---|---|
In water hydrolysis;; |
Conditions | Yield |
---|---|
In ethanol; water by diln. in deionised water of tetraethyl orthosilicate dissolved in ethanol; | |
In ethanol; water byproducts: C2H5OH; reaction of hydrolysis; | |
With hydrogenchloride for 0.5h; |
silicon tetrafluoride
B
silicic Acid
Conditions | Yield |
---|---|
With water In ethanol; water byproducts: HCl; |
Conditions | Yield |
---|---|
With water In water byproducts: H2; | |
With sodium hydroxide In sodium hydroxide byproducts: H2; decompn. with formation of vapor;; | |
With NaOH In sodium hydroxide byproducts: H2; aq. NaOH; decompn. with formation of vapor;; | |
With H2O In water byproducts: H2; |
Conditions | Yield |
---|---|
In not given decompn. with NaOH-soln.;; | |
In not given decompn. with NaOH-soln.;; |
Conditions | Yield |
---|---|
With H2O |
Conditions | Yield |
---|---|
With water; mercury dichloride In water HSiCl3 dissolved in dry dibutylether;; |
silicic Acid
Conditions | Yield |
---|---|
With cation exchange resin diluted after cation exchange; |
silicic Acid
Conditions | Yield |
---|---|
In sulfuric acid solution of fine powdered Li orthosilicate in aq. H2SO4 and treatment by liquid NH3 at -17 °C;; pptn. in the solution;; |
Conditions | Yield |
---|---|
With H2O In water byproducts: H2; reaction by hydrolysis in moist air;; |
tetraisocyanatosilane
silicic Acid
Conditions | Yield |
---|---|
With H2O In water byproducts: HNCO; decompn. by hydrolysis;; | |
With H2O In water byproducts: HNCO; decompn. by hydrolysis;; |
Conditions | Yield |
---|---|
With ammonium molybdate; nitric acid In water at 650℃; for 1h; pH=2 - 4; |
silicic Acid
silica gel
Conditions | Yield |
---|---|
In neat (no solvent) calcination at 773 K for 5 h; | |
poly(L-lysine) Conversion of starting material; | |
In neat (no solvent) H4SiO4 heated at 300°C in vacuum; |
Conditions | Yield |
---|---|
With aq. Na3PO4 or aq. NaOAc; polyamine In water Kinetics; aq. solns. of Na3PO4, polyamine, mono/disilicic acid mixed at 25°C; aliquots removed and centrifuged; precipitated SiO2 dissolved in NaOH (5min at 90°C), quantified by molybdate method; |
Conditions | Yield |
---|---|
In not given stirring with freshly pptd. H2SiO3; | |
In not given stirring with freshly pptd. H2SiO3; |
Conditions | Yield |
---|---|
In neat (no solvent) mixing, grinding, pressing, heating (1300°C); |
Conditions | Yield |
---|---|
In neat (no solvent) mixing, grinding, pressing, heating (1300°C); |
Conditions | Yield |
---|---|
In neat (no solvent) mixing, grinding, pressing, heating (1300°C); |
silicic Acid
A
Si(OH)3F
B
SiF6(2-)*H(1+)=HSiF6(1-)
C
Si(OH)2F(1+)
D
silicon tetrafluoride
E
hexafluorosilicate anion
Conditions | Yield |
---|---|
With water; lithium perchlorate In water 25°C, 3 m LiClO4 medium, fluorosilicate equilibria followed by potentiometric titration;; products not isolated; |
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