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inquiryFluvoxamine maleate Product Name: Fluvoxamine maleate Synonyms: (E)-5-Methoxy-1-[4-(trifluoromethyl)phenyl]-1-pentanone-O-(2-a
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inquirySuperior quality, moderate price & quick delivery. Appearance:white crystalline powder Storage:stored in a cool, dry and ventilated place to provent sun and rain Package:25kg/drum, or as per your request. Application:Used in organic synthes
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Jinhua huayi chemical co., ltd. is dedicated to the development, production and marketing of chemicals. On the basis of equality and mutual benefit, and under the principle of customer first, credit first, quality first, we are ready to join hands
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Our clients, like BASF,CHEMO,Brenntag,ASR,Evonik,Merck and etc.Appearance:COA Storage:in stock Application:MSDS/TDS
Hunan chemfish Pharmaceutical co.,Ltd.located in Lugu High-tech industral park ,Hunan province . with its own R&D center and more than 10000㎡manufacture plant . Chemfish owns 40 reactors from 1000L to 8000L. With complete auxiliary equipment as
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Cas:67-72-1
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inquiryProduct name : Hexachloroethane Chemical Name : Hexachlorethane Molecular Formula : C2Cl6 Molecular Weight : 236.74 Standard : HG/T 3261-89
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dimanganese decacarbonyl
A
pentacarbonylchloromanganese(I)
B
hexachloroethane
Conditions | Yield |
---|---|
With tetrachloromethane In tetrachloromethane byproducts: CCl3; Irradiation (UV/VIS); Irradiation λ >350 nm, CCl4, Ar atm.;; detected by IR spectra and GCA;; | A n/a B 100% |
B
hexachloroethane
Conditions | Yield |
---|---|
With tetrachloromethane In tetrachloromethane Irradiation (UV/VIS); Irradiation λ >490 nm, CCl4, Ar atm.;; detected by IR spectra and GCA;; | A n/a B 100% |
With tetrachloromethane In tetrachloromethane; acetone Irradiation (UV/VIS); Irradiation λ >490 nm, acetone:CCl4=3:1, Ar atm.;; detected by IR spectra and GCA;; | A >99 B 70% |
hexachloroethane
Conditions | Yield |
---|---|
With 2,2'-azobis(isobutyronitrile); chlorine at 130℃; under 11251.1 Torr; Reagent/catalyst; Temperature; Pressure; | 99% |
A
benzophenone
B
hexachloroethane
C
p-chlorophenyl isocyanide
D
benzophenone azine
Conditions | Yield |
---|---|
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given; | A n/a B n/a C 98% D n/a |
Conditions | Yield |
---|---|
With carbon monoxide In further solvent(s) Irradiation (UV/VIS); Irradiation of complex at 350-380 nm under 20 atm of CO in CBrCl3;; | A 81-87 B 97% C 78-85 D <4 E >65 |
tetrachloromethane
N-acyloxyphthalimide
A
phthalimide
B
hexachloroethane
Conditions | Yield |
---|---|
With 1,4-diaza-bicyclo[2.2.2]octane In water; tert-butyl alcohol for 3h; Product distribution; Quantum yield; Irradiation; ratio, without DABCO; | A 95% B 70% C 74% D n/a |
(2,5,6-trimethylbenzyl)bis(dimethylglyoximato)pyridinecobalt(III)
Bromotrichloromethane
B
hexachloroethane
C
2-(Bromomethyl)-1,3,4-trimethylbenzene
Conditions | Yield |
---|---|
In chloroform Excess of CHCl3, 50°C for 5 h;; detected by NMR spectra and GLC;; | A n/a B n/a C 5% D 95% |
tetrachloromethane
1,4-diphenyl-2,3-benzo-7,7,8,8-tetramethyl-7,8-digermabicyclo<2,2,2>octadiene
A
hexachloroethane
B
1,4-diphenylnaphthalene
C
1,2-dichlorotetramethyldigermane
D
dichlorodimethylgermanium
Conditions | Yield |
---|---|
In benzene Irradiation (UV/VIS); UV irradn. of a soln. of germanium compd. and CCl4 in C6H6 in a degassed sealed Pyrex tube for 3 h at room temp.; not isolated, detected by NMR, analyzed by GC and GC-MS; | A 38% B 95% C 71% D 27% |
C24H22N2O3
A
benzophenone
B
hexachloroethane
C
N-(β-Chlor-isopropyl)benzamid
D
benzophenone azine
Conditions | Yield |
---|---|
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given; | A n/a B n/a C 92% D n/a |
C26H19NO2
A
benzophenone
B
hexachloroethane
C
benzophenone azine
D
4'-biphenyl chloride
Conditions | Yield |
---|---|
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given; | A n/a B n/a C n/a D 88% |
C24H17NO2
A
benzophenone
B
hexachloroethane
C
2-chloronaphthalene
D
benzophenone azine
Conditions | Yield |
---|---|
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given; | A n/a B n/a C 87% D n/a |
tetrachloromethane
tetraphenyltin(IV)
dibenzoyl peroxide
A
hexachloroethane
B
tin(IV) chloride
C
chlorobenzene
D
benzene-1,2-dicarboxylic acid
E
benzoic acid
Conditions | Yield |
---|---|
50h boiling; | A n/a B 84.1% C n/a D n/a E n/a |
Conditions | Yield |
---|---|
With photoreduced H2W10O324- In acetonitrile at 60℃; for 24h; Product distribution; Mechanism; other halocarbons, other redox-active polyoxotungstate complexes; other temperature, also with irradiation; other solvents; | A 82% B 2% |
With pentaerythritol tetracaproate; dibenzoyl peroxide at 99.9℃; Product distribution; Rate constant; effect of concentration of pentaerythritol tetracaproate; dependence of rate constant from the number of (CH2) fragments in the molecule of esters; |
diphenylmethanone O-(4-phenylbutanoyl) oxime
A
benzophenone
B
hexachloroethane
C
phenylpropyl chloride
D
benzophenone azine
Conditions | Yield |
---|---|
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given; | A n/a B n/a C 82% D n/a |
diphenylmethanone O-(adamantane-1-carbonyl) oxime
A
benzophenone
B
hexachloroethane
C
1-chloroadamantane
D
benzophenone azine
Conditions | Yield |
---|---|
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given; | A n/a B n/a C 82% D n/a |
C31H45NO2
A
benzophenone
B
hexachloroethane
C
1-chloroheptadecane
D
benzophenone azine
Conditions | Yield |
---|---|
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given; | A n/a B n/a C 82% D n/a |
C19H14N2O2
A
3-Chloropyridine
B
benzophenone
C
hexachloroethane
D
benzophenone azine
Conditions | Yield |
---|---|
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given; | A 82% B n/a C n/a D n/a |
C37H49NO3
A
benzophenone
B
hexachloroethane
C
(3R,5S,8R,9S,10S,13R,14S,17R)-17-((R)-3-Chloro-1-methyl-propyl)-10,13-dimethyl-hexadecahydro-cyclopenta[a]phenanthren-3-ol
D
benzophenone azine
Conditions | Yield |
---|---|
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given; | A n/a B n/a C 81% D n/a |
Benzophenon-O-(p-chlorbenzoyl)-oxim
A
benzophenone
B
para-dichlorobenzene
C
hexachloroethane
D
benzophenone azine
Conditions | Yield |
---|---|
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given; | A n/a B 80% C n/a D n/a |
C24H17NO2
A
benzophenone
B
hexachloroethane
C
benzophenone azine
D
1-Chloronaphthalene
Conditions | Yield |
---|---|
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given; | A n/a B n/a C n/a D 80% |
C23H16N2O2
A
4-chloroquinoline
B
benzophenone
C
hexachloroethane
D
benzophenone azine
Conditions | Yield |
---|---|
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given; | A 80% B n/a C n/a D n/a |
C35H53NO2
A
benzophenone
B
hexachloroethane
C
1-chloroheneicosane
D
benzophenone azine
Conditions | Yield |
---|---|
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given; | A n/a B n/a C 80% D n/a |
C19H14N2O2
A
2-chloropyridine
B
benzophenone
C
hexachloroethane
D
benzophenone azine
Conditions | Yield |
---|---|
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given; | A 80% B n/a C n/a D n/a |
acetyl-triphenylgermane
A
hexachloroethane
B
1,1,1-trichloroacetone
C
chlorotriphenylgermane
D
acetyl chloride
Conditions | Yield |
---|---|
With tetrachloromethane In tetrachloromethane Irradiation (UV/VIS); Ph3GeCOMe photolyzed in CCl4; | A 53% B 10% C 78% D 74% |
C23H16N2O2
A
4-chloroisoquinoline
B
benzophenone
C
hexachloroethane
D
benzophenone azine
Conditions | Yield |
---|---|
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given; | A 77% B n/a C n/a D n/a |
C19H14N2O2
A
4-Chloropyridine
B
benzophenone
C
hexachloroethane
D
benzophenone azine
Conditions | Yield |
---|---|
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given; | A 77% B n/a C n/a D n/a |
C23H16N2O2
A
2-Chloroquinoline
B
benzophenone
C
hexachloroethane
D
benzophenone azine
Conditions | Yield |
---|---|
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given; | A 76% B n/a C n/a D n/a |
C26H24N2O3
A
benzophenone
B
hexachloroethane
C
(4-chloropiperidin-1-yl)(phenyl)methanone
D
benzophenone azine
Conditions | Yield |
---|---|
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given; | A n/a B n/a C 76% D n/a |
C22H15N3O2
A
2-chloroquinoxaline
B
benzophenone
C
hexachloroethane
D
benzophenone azine
Conditions | Yield |
---|---|
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given; | A 74% B n/a C n/a D n/a |
C27H25NO3
A
benzophenone
B
hexachloroethane
C
(2-chloro-cyclohexyl)-phenyl ketone
D
benzophenone azine
Conditions | Yield |
---|---|
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given; | A n/a B n/a C 74% D n/a |
4-(1-Phenyl-1-hydrazinocarbonyl-methylene)piperidine-1-carboxylic acid tert-butyl ester
hexachloroethane
2,2-dimethylpropanoic anhydride
Conditions | Yield |
---|---|
With IPr2NEt; triphenylphosphine In acetonitrile | 100% |
Conditions | Yield |
---|---|
With LisBu In diethyl ether; cyclohexane (inert atm.); Ru complex in Et2O cooled to -78°C, treated with LisBu in cyclohexane (1:1.70) at -78°C within 20-30 s, stirred at -78°C for 3.5 h, treated with suspn. of ligand in Et2O, warmed to room temp. within 2.5 h, stirred for; evapd.(vac.), extd.(pentane), filtered (kieselghur), freed of volatiles,elem. anal.; | 100% |
Conditions | Yield |
---|---|
With Oxone; II(H2O)2(Me2SO)4>(BF4)2; Hexadecyltrimethylammonium hydrogen sulfate In water at 20℃; Product distribution; other chloro- and bromoolefins; | 99% |
Conditions | Yield |
---|---|
In tetrahydrofuran byproducts: C2Cl4; Sonication; inert atmosphere; mass ratio metal : C2Cl6 = 1 : 3, 30 h; pptn. on pentane addn., decantation, washing (pentane), drying (room temp., dry box); elem. anal.; | 99% |
hexachloroethane
Co(C5H4B(N(CH3)2)2)2
Co(C5H4B(N(CH3)2)2)2(1+)*Cl(1-)=[Co(C5H4B(N(CH3)2)2)2]Cl
Conditions | Yield |
---|---|
In toluene N2-atmosphere; stirring (4 h); filtering, drying (vac.), crystn. (CH2Cl2 / hexane = 1 : 1); elem. anal.; | 99% |
hexachloroethane
5-(trimethylsilyl)-methyl-2,2′-bipyridine
5-chloromethyl-2,2'-bipyridine
Conditions | Yield |
---|---|
With cesium fluoride In acetonitrile at 60℃; for 4h; | 98% |
Conditions | Yield |
---|---|
In tetrahydrofuran; diethyl ether byproducts: PEt3HCl, Et3PO; under N2 for 12 h, filtration, adding of PMe3; react. time 10 min; filtration; elem. anal.; | 98% |
hexachloroethane
W(6+)*CC(CH3)3(3-)*3Cl(1-)*OP(C2H5)3 = [W(CC(CH3)3)Cl3(PO(C2H5)3)]
Conditions | Yield |
---|---|
In tetrahydrofuran byproducts: PEt3HCl; under N2 for 10 h; filtration, pptn. of PEt3HCl with pentane, filtration, evapn.; | 98% |
hexachloroethane
Co(C5H4B(N(C2H5)2)2)2
Co(C5H4B(N(C2H5)2)2)2(1+)*Cl(1-)=[Co(C5H4B(N(C2H5)2)2)2]Cl
Conditions | Yield |
---|---|
In toluene N2-atmosphere; stirring (4 h); filtering, drying (vac.), crystn. (CH2Cl2 / hexane = 1 : 1); elem. anal.; | 98% |
Conditions | Yield |
---|---|
With n-butyllithium; sodium hydrogencarbonate In diethyl ether; water | 97.6% |
Conditions | Yield |
---|---|
With aluminum(III) fluoride; hydrogen fluoride at 120℃; under 11251.1 Torr; for 10h; Reagent/catalyst; Temperature; Autoclave; | 97.06% |
With CFC-112a; antimonypentachloride; fluorine at 32℃; unter vermindertem Druck; | |
With antimonypentachloride; antimony(III) fluoride at 48℃; |
Conditions | Yield |
---|---|
In tetrachloromethane at 300℃; for 0.000555556h; Temperature; Flow reactor; Pyrolysis; | 97% |
at 600℃; | |
With pyrographite at 700℃; |
Conditions | Yield |
---|---|
In tetrahydrofuran byproducts: C2Cl4; Sonication; inert atmosphere; mass ratio metal : C2Cl6 = 1 : 3, 6 h; solvent evapn. (vac.), pentane addn., filtration, washing (pentane), drying (vac., 70 - 80°C, 10 - 15 min); elem. anal.; | 97% |
Conditions | Yield |
---|---|
In tetrahydrofuran byproducts: C2Cl4; Sonication; inert atmosphere; mass ratio metal : C2Cl6 = 1 : 3, 45 h; pptn. on pentane addn., decantation, washing (pentane), drying (room temp., dry box); elem. anal.; | 96% |
Conditions | Yield |
---|---|
In tetrahydrofuran byproducts: C2Cl4; Sonication; inert atmosphere; mass ratio metal : C2Cl6 = 1 : 3, 12 h; solvent evapn. (vac.), pentane addn., filtration, washing (pentane), drying (vac., 70 - 80°C, 10 - 15 min); elem. anal.; | 96% |
hexachloroethane
Rh((P(C6H5)2CH2)4N2)(1+)*BF4(1-)=[Rh((P(C6H5)2CH2)4N2)]BF4
RhCl2((P(C6H5)2CH2)4N2)(1+)*BF4(1-)=[RhCl2((P(C6H5)2CH2)4N2)]BF4
Conditions | Yield |
---|---|
In dichloromethane under N2 or Ar; C2Cl6 added to soln. of rhodium complex in CH2Cl2, mixt. stirred at room temp. for 3 h; evapn. under vac., residue washed with hexanes; elem. anal.; | 96% |
hexachloroethane
bis(N,N-dimethylamino)chlorophosphine
A
N,N-dimethylaminodichlorophosphane
B
chlorotris(dimethylamino)phosphonium chloride
Conditions | Yield |
---|---|
In diethyl ether for 480h; | A 90% B 95% |
hexachloroethane
6’-[(trimethylsilyl)methyl]-2’,2-bipyridine
6-(chloromethyl)-2,2’-bipyridine
Conditions | Yield |
---|---|
With cesium fluoride In acetonitrile at 60℃; for 4h; | 95% |
hexachloroethane
η6-(4-triisopropylsiloxymethyl-1-methoxymethoxybenzene)tricarbonylchromium(0)
(+)-(S)-η6-(2-chloro-4-triisopropylsiloxymethyl-1-methoxymethoxybenzene)tricarbonylchromium(0)
Conditions | Yield |
---|---|
With (-)-sparteine; n-butyllithium In diethyl ether N2; soln. of Cr-contg. compd. (4.3 mmol) in ether at -78°C was added to soln. of (-)-sparteine (3 equiv.) and n-BuLi (1.1 equiv.) in ether at the same temp.; stirring for 1 h and quenching with C2Cl6 (8.6 mmol); warming to -10°C overnight; treatment with water; the org. layer was washed twice with water and once with brine, dried (MgSO4) and concd. under reduced pressure; flash column chromy. (Sorbisil C-60; eluant: 10% ether-hexane); | 95% |
Conditions | Yield |
---|---|
In dichloromethane at 50℃; for 1h; Solvent; | 95% |
hexachloroethane
4-(trimethylsilyl)-methyl-2,2'-bipyridine
4-chloromethyl-2,2'-bipyridine
Conditions | Yield |
---|---|
With cesium fluoride In acetonitrile at 60℃; for 4h; | 94% |
bis[N,N-bistrimethylsilylamido]bis(tetrahydrofuran)ytterbium(II)
hexachloroethane
Conditions | Yield |
---|---|
In tetrahydrofuran at 20℃; for 18h; Inert atmosphere; Glovebox; | 93% |
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