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inquiryProduct Name Nickel Synonyms Nickel;Raney nickel CAS: 7440-02-0 MF: - MW: - EINECS: - Product Categories
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inquiryNickel powder CAS No: 7440-02-0(Ni) Molecular Formula: ZrNi Appearance: Greyish powder Application: used in squibs delay mixtures and initiators. Appearance:Greyish powder Storage:when store in a tightly closed container,below 30℃,the product will
Product Name: Nickel Synonyms: ACTIMET 8040P;ACTIMET C;Nickel wire, 0.01mm (0.0004 in.) dia., Hard, Temper: as drawn;Nickel tubing, OD: 1.59mm (0.0626 in.) ID: 0.51mm (0.02 in.);Nickel wire, 1.0mm (0.04 in.) dia., Annealed;Nickel, p.a.;Nickel,
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Nickel CAS: 7440-02-0 Specification Name Nickel CAS 7440-02-0 EINECS 231-111-4 Molecular Formula Ni Molar Mass 58.69 Density 8.9 g/mL at 25 °C (lit.) Melting Point
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inquirySuperior quality, moderate price & quick delivery. Appearance:silver white, hard, malleable metal chunks or grey powder Storage:Stored in cool, dry and ventilation place; Away from fire and heat Package:1kg/bag, 1kg/drum or 25kg/drum or as per
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Cas:7440-02-0
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inquiryProduct Details Grade: pharmaceutical grade Purity:99%+ ProductionCapacity: 1000 Kilogram/Month Scope of use: For scientific research only(The product must be used legally) Our Advantage 1. Best quality with competitive price. 2. Quick shipping,
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inquiryConditions | Yield |
---|---|
In water N2H4*H2O (80%) added to aq. soln. of NiCl2*6H2O (temp. increased to 65°C) under vigorous stirring, cooling to 50°C, aq. NaOH (50%)added (temp. increased to 54°C), 1 h; ppt. washed with water and dried at room temp. for 16 h; | 100% |
In water; ethylene glycol byproducts: N2, H2O; other Radiation; soln. of Ni compd. in ethylene glycol treated with hydrazine hydrate andNaOH under external magnetic field (0.13-0.35 T) with vigorous stirring , react at 60°C; pptd., septd., washed (ethanol), dried (vac., 40°C, 24 h), SEM, XRD; |
Conditions | Yield |
---|---|
In not given at 205°C, H2 pressure 14 atm, 45 min, form of product is powder; | 99.8% |
In not given at 200-300°C, 10 h, form of product is powder; | 85% |
at 270-320°C; |
Conditions | Yield |
---|---|
Na-emulsion in organic solvent, at 220°C, form of product is powder; | 99.2% |
Na-emulsion in organic solvent, at 220°C, form of product is powder; | 99.2% |
explosive reaction; |
Conditions | Yield |
---|---|
byproducts: CO; thermal dissociation in high vacuum; | A 99% B 99% |
Conditions | Yield |
---|---|
byproducts: CO; thermal dissociation in high vacuum; | A 99% B 99% |
Conditions | Yield |
---|---|
byproducts: CO; thermal dissociation in high vacuum; | A 99% B 99% |
Conditions | Yield |
---|---|
byproducts: CO; thermal dissociation in high vacuum; | A 99% B 99% |
Conditions | Yield |
---|---|
byproducts: CO; thermal dissociation in high vacuum; | A 99% B 99% |
Conditions | Yield |
---|---|
byproducts: CO; thermal dissociation in high vacuum; | A 99% B 99% |
A
bis(triphenylphosphine)nickel(II) chloride
B
nickel
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: triphenylphosphine; Ar-atmosphere; 140-180°C, 1 h; extn. (ether, CH2Cl2, H2O), evapn. of extract; | A 97.7% B 94.7% C 87.5% |
nickel
Conditions | Yield |
---|---|
With sodium carbonate; hydrazine hydrate; sodium dodecylbenzenesulfonate In water mixt. heated at 90 °C at pH 9.6 (Na2CO3) with hydrazine:nickel 2:1 molar ratio, Ni(2+) conc. 0.25 M, sodium citrate:Ni ratio 1:4 for 18 min; metal powder filtered, washed (H2O, ethanol, acetone), dried in vac. at 40 °C; detd. by XRD; | 96% |
With sodium carbonate; hydrazine hydrate; sodium dodecylbenzenesulfonate In water mixt. heated at 90 °C at pH 9.6 (Na2CO3) with hydrazine:nickel 2:1 molar ratio, Ni(2+) conc. 0.25 M, sodium citrate:Ni ratio 1:4 for 120 or 160 min or without citrate for 90 min; metal powder filtered, washed (H2O, ethanol, acetone), dried in vac. at 40 °C; detd. by XRD; | 95% |
With sodium carbonate; hydrazine hydrate; sodium dodecylbenzenesulfonate In water mixt. heated at 90 °C at pH 9.6 (Na2CO3) with hydrazine:nickel 2:1 molar ratio, Ni(2+) conc. 0.25 M, sodium citrate:Ni ratio 1:4 for 140 min; metal powder filtered, washed (H2O, ethanol, acetone), dried in vac. at 40 °C; detd. by XRD; | 94% |
Conditions | Yield |
---|---|
With hydrogen In hexane 1 atm., 20°C, vigorous reaction after induction period; | A 96% B n/a |
With hydrogen In hexane 1 atm., 20°C, vigorous reaction after induction period; | A 96% B n/a |
bis(1,5-cyclooctadiene)nickel (0)
A
nickel
B
tetracarbonyl nickel
C
1,5-dicyclooctadiene
Conditions | Yield |
---|---|
With carbon monoxide In hexane -40°C, warming within 1 h to 0-20°C; | A 0% B 93% C 80.6% |
With carbon monoxide In hexane -40°C, warming within 1 h to 0-20°C; | A 0% B 93% C 80.6% |
Conditions | Yield |
---|---|
In tetrahydrofuran To a soln. of anhydrous salt is added C2H5MgBr at 20°C with stirring. The reaction mixture is left for 5 - 6 h at room temp.; decantation, washing with THF, water and ethanol; electron diffraction; | A n/a B n/a C 90% D n/a |
Conditions | Yield |
---|---|
In 1,2-dimethoxyethane Irradiation (UV/VIS); under Ar; ratio B(3+) : Ni(2+) = 2 : 1; irradn. (254 nm) for 8 h gave deposition of Ni; deposit sepd., washed with acetone and water, and dried in vac. to give pure Ni; | 90% |
A
[Ni(1,5,9-cyclododecatriene)]
B
benzophenone hydrazone
C
nickel
Conditions | Yield |
---|---|
In diethyl ether byproducts: N2; heating cautiously to 20°C; | A 89% B n/a C n/a |
Conditions | Yield |
---|---|
With hydrogen In neat (no solvent) Kinetics; 1000 h, NiO calcinated at 1000°C;; | 85% |
With H2 In neat (no solvent) Kinetics; 1000 h, NiO calcinated at 1000°C;; | 85% |
With hydrogen In neat (no solvent) Kinetics; 180°C, 70 h, NiO prepared be H2O elimination of Ni(OH)2 in vacuum;; | >99 |
tetracarbonyl nickel
nickel
Conditions | Yield |
---|---|
introducing of liq. Ni(CO)4 into heavy oil, vigorous mixing at 250°C, after filtration keep under petroleum ether or N2; | 85% |
Sonication; at 240-260°C; | |
150-250°C. 1-2 at, high-frequency technic, diphenyl and diphenyl oxide used as germ; |
Conditions | Yield |
---|---|
byproducts: N2; -30°C; | A 80.9% B n/a C 13.5% |
nickel
Conditions | Yield |
---|---|
With N2H4*H2O; poly(vinyl pyrrolidone) In ethylene glycol byproducts: NH3, N2, H2; ethylene glycol refluxed for 5 min, treated dropwise with hydrazine monohydrate, treated with Ni salt in ethylene glycol and poly(vinyl pyrrolidone) in ethylene glycol under vigorous stirring, refluxed for 60 min; centrifuged, washed (abs. ethanol) 6 times, evapd.(vac.) at 80°C,XRD; | 80% |
In water Electrolysis; platinum anode and copper cathode were used; the composition of the bath: 50 g/dm3 NiCl2*6H2O, 50 g/dm3(NH4)2SO4 and 250 mol/dm3 NH4OH; the pH of the soln. was 9.5-10.2; at 25°C; the plating time was 15 min;; | |
With (NH2)2CSO2 In pentan-1-ol; water Kinetics; isothermal redn. of Ni-salt with thiourea dioxide, 15 mol-% alcohol, pH4.0 (Britton-Robinson buffer), 1 h, 313+/-0.5 K; gravimetric anal.; |
Conditions | Yield |
---|---|
In 1,2-dimethoxyethane Irradiation (UV/VIS); under Ar; mole ratio NaBPh4 : NiBr2 = 2 : 1; irradn. (254 nm) for 8 h gave deposition of Ni; deposit sepd., washed with acetone and water, and dried in vac. to give pure Ni; | 80% |
sodium tetraphenyl borate
copper(ll) bromide
A
nickel
B
copper
Conditions | Yield |
---|---|
In 1,2-dimethoxyethane Irradiation (UV/VIS); under Ar; mole ratios NaBPh4 : NiBr2 : CuBr2 = 8 : 3 : 1; irradn. (254 nm) for 10 h gave deposition of Ni and Cu; | A 73% B 24% |
In 1,2-dimethoxyethane Irradiation (UV/VIS); under Ar; mole ratios NaBPh4 : NiBr2 : CuBr2 = 4 : 1 : 1; irradn. (254 nm) for 10 h gave deposition of Ni and Cu; | A 48% B 49% |
bis(1,5-cyclooctadiene)nickel (0)
3,6-dimethylene-1,7-octadiene
tris(1-methylethyl)phosphine
A
(η(2),η(2)-3,6-dimethylene-1,7-butadiene)NiPiPr3
B
nickel
Conditions | Yield |
---|---|
In diethyl ether stirring (-30°C, 48 h); filtering (-30°C), crystn. (-78°C), washing (pentane, -78°C); elem. anal.; | A 71% B 1% |
Conditions | Yield |
---|---|
With hydrogen In ethanol byproducts: C7H9(C(O)OCH3); room temp.; normal pressure; | A n/a B 70% |
With H2; catalyst: Pt In ethanol byproducts: C7H9(C(O)OCH3); room temp.; normal pressure; | A n/a B 70% |
With hydrogen In ethanol byproducts: C7H9(C(O)OCH3); room temp.; normal pressure; | A n/a B 70% |
Conditions | Yield |
---|---|
With methanol; benzophenone In neat (no solvent) Kinetics; Irradiation (UV/VIS); photolysis (mercury lamp, 300 nm lamps, merry-go-round unit), irradn. under N2 through a pyrex filter; centrifugation, filtration through a pipette (Celite), detd. by UV; | A 56% B 68% C n/a |
nickel
Conditions | Yield |
---|---|
With Na3C6H5O7*2H2O In water Electrolysis; Ni(II):Cit=1:1, potentiostatic condditions, -1.1 V vs. SHE, Ag/AgCl immersed in 3.3 M KCl used as reference, Cu plate as working, Pt sheet as counter electrodes; soln. stirred at 500 rpm with magnet; temp. 298 K; X-ray fluorometry; | 65% |
With Na or K or Ca or Ba hypophosphite; Na acetate or Na formate In not given 90-92°C , pH=5.0-6.5; | |
Electrolysis; form of product is powder; |
Conditions | Yield |
---|---|
With n-hexyllithium In toluene byproducts: n-hexane, hex-1-en, LiH; under Ar, reduction at room temp. with n-hexyllithium in presence of cyclooctadiene (Li:Ni=4); further byproduct: Ph-Ph, hex-Ph, cycloocta-1,3-diene, cycloocta-1,4-diene, cyclooctene; protolysis of liquid phase with MeOH (H2), gas chromy. of volatile compds.; | A n/a B 65% |
dodecacarbonyl triosmium
C
nickel
Conditions | Yield |
---|---|
With hydrogen In octane Os3(CO)12 refluxed in octane with (CpNi(CO))2 for 30 min under H2 flow,cooled; filtered, evapd. in vac., purified by TLC (Kiselgel PF Merck, light petroleum-Et2O), crystd. from CHCl3/heptane at -10°C; elem. anal.; | A 10% B 60% C n/a |
A
bisacetylbis(2,6-dimethylphenylimin)(1,3-butadiene)nickel
B
Ni(1,4-bis(2,6-dimethylphenyl)-2,3-dimethyl-1,4-diazabuta-1,3-diene)2
C
nickel
Conditions | Yield |
---|---|
In tetrahydrofuran (N2), dry solvents; addn. of Mg compd. to suspn. of Ni compd. in THF room temperature, stirring overnight; | A 40% B 60% C n/a |
2,3,5,6-tetrafluorobenzaldehyde
nickel
1,2-dichloro-benzene
(2,3,5,6-tetrafluorophenyl)methanol
Conditions | Yield |
---|---|
100% |
1,4-dioxane
nickel
1,2-dichloro-benzene
2,3,5,6-tetrafluoroterephthalaldehyde
2,3,5,6-tetrafluoro-1,4-benzenedimethanol
Conditions | Yield |
---|---|
100% |
Conditions | Yield |
---|---|
With sodium methylate In methanol pyrophoric Ni under water layer added to a methanol soln. containing an equivalent quantity of phthalonitrile and 5 drops of 30% soln of CH3ONa in methanol; flask maintained at 25°C for 24-72 h; blue product separated from unreacted metal by shaking and decanting with the solvent, washed with ethanol in Soxhlet equipment and dried in air; purity of 95-97%; elem. anal.; | 100% |
With sodium methylate In methanol; water pyrophoric metal:phthalonitrile=1:4 and few drops of CH3ONa under water layer treated for 24 h at 25°C; septd., washed (ethanol), dried in air, elem. anal.; | 100% |
With sodium methylate In ethanol pyrophoric Ni under water layer added to an ethanol soln. containing an equivalent quantity of phthalonitrile and 5 drops of 30% soln of CH3ONa in methanol; flask maintained at 25°C for 24-72 h; blue product separated from unreacted metal by shaking and decanting with the solvent, washed with ethanol in Soxhlet equipment and dried in air; purity of 95-97%; elem. anal.; | 100% |
triphenylphosphine diiodide
nickel
{(C6H5)3PI}(1+)*{Ni(P(C6H5)3)I3}(1-)={(C6H5)3PI}{Ni(P(C6H5)3)I3}
Conditions | Yield |
---|---|
In diethyl ether under N2: dissoln. of (C6H5)3PI2 (2 equivalents) in dry diethyl ether in a rotoflow tube; addn. of coarse-grain unactivated Ni, 60°C; stirring, 7d;; isolation by standard Schlenk technique; drying in vac.; elem. anal.; | 100% |
diiodo tri-n-butylphosphorane
nickel
{(C4H9)3PI}(1+)*{Ni(P(C4H9)3)I3}(1-)={(C4H9)3PI}{Ni(P(C4H9)3)I3}
Conditions | Yield |
---|---|
In diethyl ether under N2: dissoln. of (C4H9)3PI2 (2 equivalents) in dry diethyl ether in a rotoflow tube; addn. of coarse-grain unactivated Ni, 60°C; stirring, 7d;; isolation by standard Schlenk technique; drying in vac.; elem. anal.; | 100% |
diiodotriethylphosphorane
nickel
{(C2H5)3PI}(1+)*{Ni(P(C2H5)3)I3}(1-)={(C2H5)3PI}{Ni(P(C2H5)3)I3}
Conditions | Yield |
---|---|
In diethyl ether under N2: dissoln. of (C2H5)3PI2 (2 equivalents) in dry diethyl ether in a rotoflow tube; addn. of coarse-grain unactivated Ni, 60°C; stirring, 7d;; isolation by standard Schlenk technique; drying in vac.; elem. anal.; | 100% |
Conditions | Yield |
---|---|
In neat (no solvent) Electric Arc; heating (650°C, 4 d; dynamic Ar atm., arc melting), annealing (5 h, 1050-1200°C); | 100% |
In neat (no solvent) vac. (5E-3 mbar); stoichiometric ratio, heating (1 week, 1100°C); | |
In melt Electric Arc; arc melted under Ar gettered with Ti; 5 wt.-% of Sb required to compensate evaporative losses during arc-melting; ingots sealed in evacuated fused-silica tubes and annealed at 870 K for 720 h; quenched in cold water; XRD; EDX; |
Conditions | Yield |
---|---|
In further solvent(s) High Pressure; prepd. under solvothermal conditions; reactants weighted in ratio of 1 Ni:1 Sn:3 S, heated in sealed Teflon-lined steel autoclave in pure 1,2-diaminopropane for 7 d at 140°C; elem. anal.; | 100% |
P(CH2CH2C6H5)3I2
nickel
{(C6H5CH2CH2)3PI}(1+)*{Ni(P(C6H5CH2CH2)3)I3}(1-)={(C6H5CH2CH2)3PI}{Ni(P(C6H5CH2CH2)3)I3}
Conditions | Yield |
---|---|
In diethyl ether under N2: dissoln. of (C6H5CH2CH2)3PI2 (2 equivalents) in dry diethyl ether in a rotoflow tube; addn. of coarse-grain unactivated Ni, 60°C; stirring, 7d;; isolation by standard Schlenk technique; drying in vac.; elem. anal.; | 100% |
(C2H5)2(CH3)PI2
nickel
{(C2H5)2(CH3)PI}(1+)*{Ni(P(C2H5)2(CH3))I3}(1-)={(C2H5)2(CH3)PI}{Ni(P(C2H5)2(CH3))I3}
Conditions | Yield |
---|---|
In diethyl ether under N2: dissoln. of (C2H5)2(CH3)PI2 (2 equivalents) in dry diethyl ether in a rotoflow tube; addn. of coarse-grain unactivated Ni, 60°C; stirring, 7d;; isolation by standard Schlenk technique; drying in vac.; elem. anal.; | 100% |
nickel
tris(dimethylamino)diiodophosphorane
{((CH3)2N)3PI}(1+)*{Ni(P(N(CH3)2)3)I3}(1-)={((CH3)2N)3PI}{Ni(P(N(CH3)2)3)I3}
Conditions | Yield |
---|---|
In diethyl ether under N2: dissoln. of (N(CH3)2)3PI2 (2 equivalents) in dry diethyl ether in a rotoflow tube; addn. of coarse-grain unactivated Ni, 60°C; stirring, 7d;; isolation by standard Schlenk technique; drying in vac.; elem. anal.; | 100% |
Conditions | Yield |
---|---|
In neat (no solvent) Electric Arc; heating (650°C, 4 d; dynamic Ar atm., arc melting); | 100% |
In neat (no solvent) Electric Arc; repeated remelting, annealing in evac. quartz tube for 250 h at 800°C, quenching (cold water); |
Conditions | Yield |
---|---|
In neat (no solvent, solid phase) mixt. of Sm, Ni, Sn loaded into Ta tube, heated at 970°C for 36 h, quenched in water, annealed at 700°C for 15 d; | 99% |
In neat (no solvent, solid phase) mixt. of Sm, Ni, Sn loaded into Nb tube, heated under dynamic vac. at 300°C for 1 d, heated at 950°C for 5 d, cooled to room temp.at 15°C/h; |
Conditions | Yield |
---|---|
In acetonitrile byproducts: H2; Electrochem. Process; electrolyse of a soln. of the ligand in acetonitrile (NH4BF4) with a Nianode at room temp. under N2; filtered, washed with acetonitrile, dried in vac.; elem. anal.; | 99% |
sulfuryl dichloride
nickel
acetonitrile
[Ni(NCCH3)6](2+)*[Te2Cl10](2-) = [Ni(NCCH3)6][Te2Cl10]
Conditions | Yield |
---|---|
In acetonitrile under dry Ar; Ni and Te mixed in CH3CN; SO2Cl2 added; stirred (2 h); evapd. to dryness (vac.); recrystd. from CH3CN (room temp.); elem. anal.; | 99% |
Conditions | Yield |
---|---|
In diethyl ether byproducts: I2; (N2); 60°C, ca. 4 d; drying (vac.), recrystn. (Et2O); elem. anal.; | 99% |
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: AsF3; all manipulations under Ar atm.; SO2 and AsF5 condensed on Ni and Te (external cooling bath of liq. N2), stirred for 5 h; SO2 distd. slowly; | 99% |
(2S)-2-[1-(diethoxymethyl)cyclopropyl]-2-{[(1S)-1-phenylethyl]amino}acetonitrile
nickel
Conditions | Yield |
---|---|
With sodium hydroxide In ethanol; chloroform; water; hydrogen | 98.4% |
3,5-dimethyl-1-(carbethoxymethylene)cyclohexane
nickel
(3,5-dimethyl-cyclohexyl)-acetic acid ethyl ester
Conditions | Yield |
---|---|
In methanol | 98% |
Conditions | Yield |
---|---|
In acetonitrile Electrolysis; 4 h, initial voltage 30 V; washed with acetonitrile and dried in vacuo for 3-4 h at room temp.;elem.anal; | 98% |
With tetrabutyl-ammonium chloride In acetonitrile for 8h; Electrolysis; |
nickel
2-Mercaptobenzothiazole
bis-[2-mercaptobenzothiazolatonickel(II)]
Conditions | Yield |
---|---|
In acetonitrile byproducts: H2; Electrochem. Process; electrolyse of a soln. of the ligand in acetonitrile (NH4BF4) with a Nianode at room temp. under N2; filtered, washed with acetonitrile, dried in vac.; elem. anal.; | 98% |
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