Conditions | Yield |
---|---|
With hydrogenchloride In diethyl ether at 60℃; for 0.5h; Temperature; Solvent; | 100% |
With hydrogenchloride In diethylene glycol dimethyl ether at -45 - 15℃; for 12h; | 99% |
Conditions | Yield |
---|---|
97% |
Conditions | Yield |
---|---|
With N,N-diethylaminodimethylsilane Heating; | 87% |
With sodium tetrahydroborate; tetra-n-butylphosphonium chloride In diethylene glycol dimethyl ether at 80 - 140℃; for 26h; | 11% |
With Dichloromethylsilane; homogeneous catalyst, preferably pyridinium, phosphonium or imidazolium salt Industry scale; |
1,1,2,2-tetramethyldisilane
A
chloro-trimethyl-silane
B
dimethylmonochlorosilane
C
dimethylsilane
D
trimethylsilan
Conditions | Yield |
---|---|
With tetra-n-butylphosphonium chloride at 180℃; for 17h; Sealed tube; | A 2% B 4% C 87% D 7% |
1,1,3,3-tetramethyldisilazane
A
dimethylmonochlorosilane
B
1,1-dimethyl-3,3,3-trichlorosilazane
C
1,1,3,3-tetramethyl-(2-trichlorosilyl)disilazane
Conditions | Yield |
---|---|
With tetrachlorosilane at 20℃; for 24h; | A n/a B n/a C 78% |
With tetrachlorosilane at 20℃; for 24h; | A n/a B 54% C n/a |
1,1,3,3-Tetramethyldisiloxane
dimethylsilicon dichloride
dimethylmonochlorosilane
Conditions | Yield |
---|---|
With tetrabutylammomium bromide In water | 74.9% |
Conditions | Yield |
---|---|
With sodium tetrahydroborate; N,N,N,N,N,N-hexamethylphosphoric triamide in a glass ampoule under hermetic conditions; | A 62% B 6.1 % Chromat. |
With Tetraethylene glycol dimethyl ether; tetra-n-butylphosphonium chloride; lithium hydride In 1,4-dioxane at -196 - 120℃; for 115.5h; Time; Temperature; Reagent/catalyst; Sealed tube; | A 57% B 35% |
With lithium hydride; triphenylphosphine In diethylene glycol dimethyl ether at -196 - 160℃; for 62h; Time; Reagent/catalyst; Sealed tube; | A 56% B 11% |
1,1,3,3-tetramethyldisilazane
chloromethylmethyldichlorosilane
A
dimethylmonochlorosilane
B
1-Chloro-1-chloromethyl-1,3,3-trimethyl-disilazane
Conditions | Yield |
---|---|
at 20℃; for 24h; | A n/a B 61% |
N,N,N,N,N,N-hexamethylphosphoric triamide
1,1,3,3-Tetramethyldisiloxane
dimethylsilicon dichloride
dimethylmonochlorosilane
Conditions | Yield |
---|---|
In water | 60% |
diethyl ether
dimethylsilane
A
dimethylmonochlorosilane
B
dimethyl chloro ethoxy silane
Conditions | Yield |
---|---|
With hydrogenchloride at 100℃; for 158h; | A 60% B 26% |
1,2-dichlorotetramethylsilane
A
chloro-trimethyl-silane
B
dimethylmonochlorosilane
C
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With 2-methylimidazole; tetra-n-butylphosphonium chloride at 175℃; for 89h; Temperature; Reagent/catalyst; Time; Sealed tube; | A 7% B 34% C 57% |
With tetra-n-butylphosphonium chloride at 140℃; for 64h; Temperature; Schlenk technique; Inert atmosphere; Sealed tube; |
1,2-dichlorotetramethylsilane
A
1,3-dichloro-1,1,2,2,3,3-hexamethyltrisilane
B
chloro-trimethyl-silane
C
dimethylmonochlorosilane
D
1,4-dichloropermethyltetrasilane
E
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With 2-methylimidazole; tetra-n-butylphosphonium chloride at 175℃; for 2.5h; Temperature; Time; Sealed tube; | A 14% B 7% C 34% D 8% E 57% |
1,2-dichlorotetramethylsilane
A
1,3-dichloro-1,1,2,2,3,3-hexamethyltrisilane
B
chloro-trimethyl-silane
C
dimethylmonochlorosilane
D
dimethylsilane
E
1,4-dichloropermethyltetrasilane
F
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With tetra-n-butylphosphonium chloride at 220℃; for 21h; Reagent/catalyst; Time; Sealed tube; | A 6% B 15% C 21% D 1% E 1% F 49% |
1,2-dichlorotetramethylsilane
A
chloro-trimethyl-silane
B
dimethylmonochlorosilane
C
trimethylsilan
D
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With tetra-n-butylphosphonium chloride at 220℃; for 24h; Sealed tube; | A 16% B 30% C 5% D 44% |
1,2-dichlorotetramethylsilane
dimethylsilicon dichloride
A
dimethylmonochlorosilane
B
dimethylsilane
C
1,1,2,2-tetramethyldisilane
D
1-chloro-2-hydro-1,1,2,2-tetramethyldisilane
Conditions | Yield |
---|---|
With tetra-n-butylphosphonium chloride; lithium hydride In diethylene glycol dimethyl ether at -196 - 160℃; for 35h; Sealed tube; | A 42% B 35% C 6% D 5% |
1,2-dichlorotetramethylsilane
A
chloro-trimethyl-silane
B
dimethylmonochlorosilane
C
dimethylsilane
D
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With 2-methylimidazole at 220℃; for 64h; Time; | A 13% B 37% C 10% D 40% |
Conditions | Yield |
---|---|
With Si-Cu; HCl In neat (no solvent) Si-Cu (10:2) and a mixt. of CH4 and HCl at 350°C;; | A 38.8% B 9.4% |
With hydrogenchloride; copper; silicon In neat (no solvent) Si-Cu (10:2) and a mixt. of CH4 and HCl at 350°C;; | A 38.8% B 9.4% |
1,2-dichlorotetramethylsilane
A
chloro-trimethyl-silane
B
dimethylmonochlorosilane
C
dimethylsilane
D
trimethylsilan
E
dichloro[(chlorodimethylsilyl)methyl]methylsilane
F
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With n-Butyl chloride; tributylphosphine at 220℃; for 70h; Sealed tube; | A 13% B 30% C 2% D 2% E 18% F 35% |
trimethylsilyl(dimethylchlorosilyl)methane
bis(chlorodimethylsilyl)methane
dichloro[(chlorodimethylsilyl)methyl]methylsilane
bis(methyldichlorosilyl)methane
dimethylsilicon dichloride
A
Dichloromethylsilane
B
dimethylmonochlorosilane
C
methylsilane
D
dimethylsilane
E
chloro-methyl-silane
Conditions | Yield |
---|---|
With tetra-n-butylphosphonium chloride; lithium hydride In diethylene glycol dimethyl ether at -196 - 220℃; for 31h; Sealed tube; | A 7% B 34% C 9% D 5% E 7% |
1,1,3,3-Tetramethyldisiloxane
dichloro(fluoro)(phenyl)silane
A
dimethylmonochlorosilane
B
phenyl(dimethylsiloxy)fluorochlorosilane
Conditions | Yield |
---|---|
at 20℃; for 14h; | A n/a B 30% |
Dichloromethylsilane
A
Methyltrichlorosilane
B
dimethylmonochlorosilane
C
chloro-methyl-silane
Conditions | Yield |
---|---|
dihydrogen hexachloroplatinate at 150℃; for 4h; | A 25.1% B 3.5% C 2.9% |
dihydrogen hexachloroplatinate at 150℃; for 4h; | A 25.1% B 3.5% C 2.9% |
Methyltrichlorosilane
dimethylsilicon dichloride
A
Dichloromethylsilane
B
dimethylmonochlorosilane
C
methylsilane
D
chloro-methyl-silane
Conditions | Yield |
---|---|
With Tetraethylene glycol dimethyl ether; tetra-n-butylphosphonium chloride; lithium hydride at 80 - 120℃; for 86.25h; | A 17% B 19% C 11% D 23% |
1,1,1,2,2,2-hexamethyldisilane
pentamethylchlorodisilane
1,2-dichlorotetramethylsilane
1,1,2-trichloro-1,2,2-trimethyldisilane
1,1,2,2-tetrachloro-1,2-dimethyldisilane
1,1-dichlorotetramethyldisilane
A
Dichloromethylsilane
B
chloro-trimethyl-silane
C
Methyltrichlorosilane
D
dimethylmonochlorosilane
E
dimethylsilicon dichloride
Conditions | Yield |
---|---|
With hydrogenchloride at 430 - 750℃; for 72h; Conversion of starting material; | A 4 %Chromat. B 12 %Chromat. C 7 %Chromat. D 6 %Chromat. E 21% |
1,1,1,2,2-pentamethyldisilane
A
chloro-trimethyl-silane
B
dimethylmonochlorosilane
C
trimethylsilan
D
pentamethylchlorodisilane
Conditions | Yield |
---|---|
With hydrogenchloride In dibutyl ether; water at 70℃; for 24h; | A 5% B 22.8 %Spectr. C 26 %Spectr. D 6.3 %Spectr. |
With hydrogenchloride In dibutyl ether; benzene-d6 at 70℃; for 24h; Sealed tube; |
hexachlorodisilane
tetra-n-butylphosphonium chloride
dimethylmonochlorosilane
Conditions | Yield |
---|---|
With 2-methylimidazole at 175℃; for 2.5h; Sealed tube; | 5% |
methane
dimethylmonochlorosilane
Conditions | Yield |
---|---|
With hydrogenchloride; copper(II) hydroxide; silicon at 350℃; |
Conditions | Yield |
---|---|
at 200℃; |
dimethyl(ethoxy)silane
Chlorodimethylvinylsilane
A
dimethylmonochlorosilane
B
ethoxydimethylvinylsilane
Conditions | Yield |
---|---|
at 28.5℃; Equilibrium constant; |
Conditions | Yield |
---|---|
at 90℃; for 5h; Inert atmosphere; | 100% |
With platinum on carbon nanotubes In neat (no solvent) at 20℃; for 24h; | 97% |
dihydrogen hexachloroplatinate In diethyl ether for 15h; Heating; | 80% |
dimethylmonochlorosilane
diallyl(dimethyl)silane
1-(Chloro-dimethyl-silanyl)-3-{[3-(chloro-dimethyl-silanyl)-propyl]-dimethyl-silanyl}-propane
Conditions | Yield |
---|---|
With platinum 1,3-divinyl-1,1,3,3-tetramethyldisiloxane In 5,5-dimethyl-1,3-cyclohexadiene; hexane at 20℃; Inert atmosphere; Reflux; | 100% |
platinum on activated charcoal In diethyl ether Heating; |
dimethylmonochlorosilane
1-iodo-10-undecene
11-(dimethylchlorosilyl)-1-iodoundecane
Conditions | Yield |
---|---|
With dihydrogen hexachloroplatinate In dichloromethane for 12h; | 100% |
dimethylmonochlorosilane
10-undecylenic acid N-hydroxysuccinimide ester
N-succinimidyl 11-(dimethylchlorosilyl)undecanoate
Conditions | Yield |
---|---|
With dihydrogen hexachloroplatinate In dichloromethane for 12h; | 100% |
dimethylmonochlorosilane
2-Methylene-succinic acid 4-(11-bromo-undecyl) ester 1-[11-((S)-2-dimethylamino-3-phenyl-propoxycarbonyl)-undecyl] ester
2-(Chloro-dimethyl-silanylmethyl)-succinic acid 4-(11-bromo-undecyl) ester 1-[11-((S)-2-dimethylamino-3-phenyl-propoxycarbonyl)-undecyl] ester
Conditions | Yield |
---|---|
With dihydrogen hexachloroplatinate In dichloromethane for 12h; | 100% |
dimethylmonochlorosilane
2-amino-phenol
2,2-dimethyl-2,3-dihydro-benzo[1,3,2]oxazasilole
Conditions | Yield |
---|---|
With triethylamine In tetrahydrofuran for 6h; Heating; | 100% |
dimethylmonochlorosilane
[Methyl-(2-{tris-[2-(methyl-divinyl-silanyl)-ethyl]-silanyl}-ethyl)-vinyl-silanyl]-ethene
Conditions | Yield |
---|---|
With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane (Karstedt's catalyst) In diethyl ether at 50℃; for 20h; | 100% |
dimethylmonochlorosilane
tetrakis[2-(trivinylsilyl)ethyl]silane
Conditions | Yield |
---|---|
bis(tetrabutylammonium) hexachloroplatinate(IV) In ethanol | 100% |
chloroplatinic acid 1,1,3,3-tetramethyl-1,3-divinyldisiloxane complex Hydrosilation; | |
platinum Addition; |
dimethylmonochlorosilane
(4-(allyloxy)phenyl)(phenyl)methanone
Conditions | Yield |
---|---|
platinum on activated charcoal for 5h; Addition; hydrosilation; Heating; | 100% |
dimethylmonochlorosilane
bis-allyloxy-dimethyl-silane
Conditions | Yield |
---|---|
dihydrogen hexachloroplatinate at 25℃; for 3.25h; | 100% |
Conditions | Yield |
---|---|
dihydrogen hexachloroplatinate at 25℃; for 3.25h; | 100% |
dimethylmonochlorosilane
3-[allyloxy-(3-{[3-(bis-allyloxy-methyl-silanyl)-propoxy]-dimethyl-silanyloxy}-propyl)-methyl-silanyloxy]-propene
Conditions | Yield |
---|---|
dihydrogen hexachloroplatinate In diethyl ether at 25℃; for 1.25h; | 100% |
Conditions | Yield |
---|---|
dihydrogen hexachloroplatinate at 25℃; for 3.25h; | 100% |
dimethylmonochlorosilane
Conditions | Yield |
---|---|
dihydrogen hexachloroplatinate at 25℃; for 3.25h; | 100% |
Conditions | Yield |
---|---|
dihydrogen hexachloroplatinate at 25℃; for 3.25h; | 100% |
Conditions | Yield |
---|---|
dihydrogen hexachloroplatinate at 25℃; for 3.25h; | 100% |
Conditions | Yield |
---|---|
With bis(tetrabutylammonium) hexachloroplatinate(IV) at 20℃; | 100% |
Conditions | Yield |
---|---|
With n-butyllithium In tetrahydrofuran; pentane at -78 - 20℃; | 100% |
Stage #1: hex-1-yne With ethylmagnesium bromide In tetrahydrofuran; diethyl ether at 0 - 20℃; for 0.0833333h; Inert atmosphere; Stage #2: dimethylmonochlorosilane In tetrahydrofuran; diethyl ether at 0 - 20℃; for 4h; Inert atmosphere; | 98% |
Stage #1: hex-1-yne With n-butyllithium In diethyl ether; hexane at -78℃; for 0.5h; Stage #2: dimethylmonochlorosilane In diethyl ether; hexane at -78 - 20℃; Further stages.; | 85% |
dimethylmonochlorosilane
4-(pent-4-en-1-yloxy)-1,1'-biphenyl
4-biphenyloxypentyldimethylchlorosilane
Conditions | Yield |
---|---|
chloroplatinic acid 1,1,3,3-tetramethyl-1,3-divinyldisiloxane complex In xylene at 60℃; for 24h; | 100% |
dimethylmonochlorosilane
acetic acid 2-allyloxyethyl ester
Conditions | Yield |
---|---|
divinyltetramethylsiloxaneplatinum(O) In xylene at 30 - 36℃; for 120h; | 100% |
N-(10'-undecenyl)-12,14-dinitrodehydroabietamide
dimethylmonochlorosilane
Conditions | Yield |
---|---|
With dihydrogen hexachloroplatinate In dichloromethane; isopropyl alcohol Heating; | 100% |
4-(10'-undecenylaminocarbonyl)-1-(friedelan-3α-yl)-benzoate
dimethylmonochlorosilane
Conditions | Yield |
---|---|
With dihydrogen hexachloroplatinate In dichloromethane; isopropyl alcohol Heating; | 100% |
dimethylmonochlorosilane
Zr[Me2Si(η5-C5Me4)(η5-C5H3CMe2CH2CH2CHCH2)]Cl2
Zr[Me2Si(η5-C5Me4)(η5-C5H3CMe2(CH2)4SiMe2Cl)]Cl2
Conditions | Yield |
---|---|
divinyltetramethylsiloxaneplatinum(O) In toluene (N2), 2 drops of catalyst were added to soln. of Zr complex in toluene, stirred at room temp. for 10 min, treated with excess SiHMe2Cl dropwise,stirred for 6 h; filtered, evapd.(vac.), elem. anal.; | 100% |
Conditions | Yield |
---|---|
With pyridine In toluene at 90℃; for 18h; | 100% |
dimethylmonochlorosilane
Ethyl 3,4,6-tri-O-benzyl-1-thio-α-D-mannopyranoside
ethyl 2-O-dimethylsilane-3,4,6-tri-O-benzyl-1-thio-α-D-mannopyranoside
Conditions | Yield |
---|---|
With triethylamine In dichloromethane at 0℃; Inert atmosphere; | 100% |
With triethylamine |
dimethylmonochlorosilane
ethyl 3,4,6-tri-O-benzyl-1-thio-β-D-glucopyranoside
ethyl 2-O-dimethylsilane-3,4,6-tri-O-benzyl-1-thio-β-D-glucopyranoside
Conditions | Yield |
---|---|
With triethylamine In dichloromethane at 0℃; Inert atmosphere; | 100% |
With triethylamine |
dimethylmonochlorosilane
1-Bromonaphthalene
dimethyl(naphthalen-1-yl)silane
Conditions | Yield |
---|---|
Stage #1: 1-Bromonaphthalene With diisobutylaluminium hydride; magnesium; lithium chloride In tetrahydrofuran; hexane at 20℃; for 3h; Schlenk technique; Inert atmosphere; Stage #2: dimethylmonochlorosilane In tetrahydrofuran; hexane at 20℃; Schlenk technique; Inert atmosphere; | 100% |
With n-butyllithium In tetrahydrofuran; hexane at -78 - 20℃; for 1h; Inert atmosphere; | 96.7% |
Stage #1: 1-Bromonaphthalene With n-butyllithium In tetrahydrofuran; hexane at -78℃; for 0.333333h; Inert atmosphere; Stage #2: dimethylmonochlorosilane In tetrahydrofuran; hexane at -78 - 20℃; for 0.5h; Inert atmosphere; | 91% |
Conditions | Yield |
---|---|
With dihydrogen hexachloroplatinate In dichloromethane for 18h; Reflux; | 100% |
dimethylmonochlorosilane
C79H132O6
2-(ω-(chlorodimethylsilyl)-undecyl)-3,6,7,10,11-penta-decyloxytriphenylene
Conditions | Yield |
---|---|
With dihydrogen hexachloroplatinate In dichloromethane for 18h; Reflux; | 100% |
Conditions | Yield |
---|---|
With dihydrogen hexachloroplatinate In dichloromethane for 18h; Reflux; | 100% |
The Chlorodimethylsilane with the CAS registry number 1066-35-9, is also known as Dimethylchlorohydrosilane. It belongs to the product categories of Dimethylsilylation (GC Derivatizing Reagents); Analytical Chemistry; GC Derivatizing Reagents; Monochlorosilanes; Reduction; Si (Classes of Silicon Compounds); Si-Cl Compounds; Si-H Compounds;Silylation (GC Derivatizing Reagents); Synthetic Organic Chemistry; Chloro Silanes; Hydrogensilanes Hydrogensiloxanes; Reducing Agents. Its EINECS number is 213-912-0. This chemical's molecular formula is C2H7ClSi and molecular weight is 94.62. What's more, its systematic name is chloro(dimethyl)silane. It is a silane, with a silicon atom bonded to two methyl groups, a chlorine atom, and a hydrogen atom. It is stable at common pressure and temperature, and it should be sealed and stored in containers with dry inert gas. Moreover, it should be protected from oxides, alcohol and water.
Physical properties of Chlorodimethylsilane: (1)ACD/LogP: 2.76; (2)# of Rule of 5 Violations: 0; (3)ACD/LogD (pH 5.5): 2.76; (4)ACD/LogD (pH 7.4): 2.76; (5)ACD/BCF (pH 5.5): 73.5; (6)ACD/BCF (pH 7.4): 73.5; (7)ACD/KOC (pH 5.5): 754.23; (8)ACD/KOC (pH 7.4): 754.23; (9)#H bond acceptors: 0; (10)#H bond donors: 0; (11)#Freely Rotating Bonds: 0; (12)Enthalpy of Vaporization: 26.68 kJ/mol; (13)Boiling Point: 33.1 °C at 760 mmHg; (14)Vapour Pressure: 569 mmHg at 25°C.
Preparation of Chlorodimethylsilane: This chemical can be prepared by silica powder and chloromethane at the temperature of 300 °C. This reaction will also need catalyst copper.
Uses of Chlorodimethylsilane: It can be used to produce 2,6-bis-dimethylsilanyl-pyridine by heating. It will need reagent Mg and solvent tetrahydrofuran with the reaction time of 3 hours. The yield is about 61%.
When you are using this chemical, please be cautious about it as the following:
Chlorodimethylsilane is highly flammable, so you should keep it away from sources of ignition - No smoking. It can cause burn. It is irritating to eyes, respiratory system and skin. You should keep the container in a well-ventilated place. In case of contact with eyes, you should rinse immediately with plenty of water and seek medical advice. When using it, you need wear suitable protective clothing, gloves and eye/face protection. In case of accident or if you feel unwell, you must seek medical advice immediately (show the label where possible).
You can still convert the following datas into molecular structure:
(1)InChI: InChI=1S/C2H6ClSi/c1-4(2)3/h1-2H3
(2)InChIKey: QABCGOSYZHCPGN-UHFFFAOYSA-N
(3)Canonical SMILES: C[Si](C)Cl
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