Product Name

  • Name

    BIS(TRICHLOROSILYL)METHANE

  • EINECS
  • CAS No. 4142-85-2
  • Article Data45
  • CAS DataBase
  • Density 1.53 g/cm3
  • Solubility
  • Melting Point
  • Formula CH2Cl6Si2
  • Boiling Point 145 °C at 760 mmHg
  • Molecular Weight 282.916
  • Flash Point 31.4 °C
  • Transport Information
  • Appearance
  • Safety 26-36/37/39-43-45-7/8
  • Risk Codes 14/15-34
  • Molecular Structure Molecular Structure of 4142-85-2 (BIS(TRICHLOROSILYL)METHANE)
  • Hazard Symbols CorrosiveC
  • Synonyms 1,3-Disilapropane,1,1,1,3,3,3-hexachloro- (7CI,8CI);2-Carbatrisilane, 1,1,1,3,3,3-hexachloro-(6CI);1,1,1,3,3,3-Hexachloro-1,3-disilapropane;Bis(trichlorosilyl)methane;Methylenebis(trichlorosilane);Silane, methylenebis[trichloro- (9CI);
  • PSA 0.00000
  • LogP 3.83620

Synthetic route

tris(trichlorosilyl)methane
4775-56-8

tris(trichlorosilyl)methane

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With hydrogenchloride; tetrabutyl phosphine chloride In dodecane at 20℃; for 1h;87%
1,2-Dichloroethylene
540-59-0

1,2-Dichloroethylene

A

dichloromethane
75-09-2

dichloromethane

B

1,2-bis(trichlorosilyl)ethane
2504-64-5

1,2-bis(trichlorosilyl)ethane

C

1,2-bis(trichlorosilyl)ethene
692-52-4

1,2-bis(trichlorosilyl)ethene

D

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With hexachlorodisilane at 550℃; for 0.00833333h;A n/a
B n/a
C 83%
D n/a
3-chloroprop-1-ene
107-05-1

3-chloroprop-1-ene

A

allyltrichlorosilane
107-37-9

allyltrichlorosilane

B

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

C

Phenyltrichlorosilane
98-13-5

Phenyltrichlorosilane

D

3-(Dichloro-trichlorosilanylmethyl-silanyl)-propene

3-(Dichloro-trichlorosilanylmethyl-silanyl)-propene

E

1,1,3,3-tetrachloro-1,3-disilacyclohex-4-ene
59361-35-2

1,1,3,3-tetrachloro-1,3-disilacyclohex-4-ene

Conditions
ConditionsYield
With hexachlorodisilane at 500℃; for 0.00833333h; Product distribution; Mechanism;A 81%
B 1.85%
C 1.77%
D 1.52%
E 4.63%
bis(dichlorosilyl)methane
18081-42-0

bis(dichlorosilyl)methane

dichloromethane
75-09-2

dichloromethane

A

1,1,3,3,5,5-hexachloro-1,3,5-trisilacyclohexane
16538-69-5

1,1,3,3,5,5-hexachloro-1,3,5-trisilacyclohexane

B

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

C

1,1,1,3,3,5,5,5-octachloro-1,3,5-trisilapentane
16538-67-3

1,1,1,3,3,5,5,5-octachloro-1,3,5-trisilapentane

Conditions
ConditionsYield
tetra-n-butylphosphonium chloride at 180℃; for 2h; Product distribution / selectivity; Inert atmosphere;A 70.1%
B 40.6%
C 13%
trichloro(dichloromethyl)silane
1558-24-3

trichloro(dichloromethyl)silane

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With tri-n-propylamine; trichlorosilane In acetonitrile for 21h; Ambient temperature;64%
(chloromethyl)trichlorosilane
1558-25-4

(chloromethyl)trichlorosilane

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With tri-n-propylamine; trichlorosilane 1.) r.t., 8 h, 2.) reflux, 10 h;63.6%
With trichlorosilane; triethylamine In acetonitrile at 65 - 70℃; 12-15 h;57%
With copper; silicon at 300 - 400℃;
With trichlorosilane; trihexyl(tetradecyl)phosphonium chloride at 50 - 240℃; under 12929 - 33615.5 Torr; for 3.25h;
With tri-n-propylamine; trichlorosilane
chloroform
67-66-3

chloroform

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With tributylphosphine; trichlorosilane at 150℃; for 2h; Reagent/catalyst; Autoclave;54.3%
With tributylphosphine; trichlorosilane at 150℃; for 2h; Reagent/catalyst; Autoclave; High pressure; Inert atmosphere;54.3%
With trichlorosilane at 150℃; for 2h; Reagent/catalyst; Inert atmosphere; Sealed tube;54.3%
dichloromethane
75-09-2

dichloromethane

(dichlorosilylmethyl)trichlorosilane
18171-02-3

(dichlorosilylmethyl)trichlorosilane

A

1,1,3,3,5,5-hexachloro-1,3,5-trisilacyclohexane
16538-69-5

1,1,3,3,5,5-hexachloro-1,3,5-trisilacyclohexane

B

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

C

1,1,1,3,3,5,5,5-octachloro-1,3,5-trisilapentane
16538-67-3

1,1,1,3,3,5,5,5-octachloro-1,3,5-trisilapentane

Conditions
ConditionsYield
With tetra-n-butylphosphonium chloride In toluene at 180℃; for 3h; Inert atmosphere; Autoclave;A 54%
B 23%
C 8%
3-Chloro-2-methylpropene
563-47-3

3-Chloro-2-methylpropene

A

trichloro(2-methyl-2-propenyl)silane
18147-56-3

trichloro(2-methyl-2-propenyl)silane

B

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

C

(Z)-crotyltrichlorosilane
18147-55-2, 52885-13-9, 49749-84-0

(Z)-crotyltrichlorosilane

D

Phenyltrichlorosilane
98-13-5

Phenyltrichlorosilane

E

1,1,1,5,5,5-hexachloro-3-methyl-1,5-disila-1-pentene

1,1,1,5,5,5-hexachloro-3-methyl-1,5-disila-1-pentene

Conditions
ConditionsYield
With hexachlorodisilane at 520℃; for 30h; Product distribution; Mechanism;A 53.4%
B 1.5%
C 8.6%
D 5.3%
E 10.2%
3-Chloro-2-methylpropene
563-47-3

3-Chloro-2-methylpropene

A

trichloro(2-methyl-2-propenyl)silane
18147-56-3

trichloro(2-methyl-2-propenyl)silane

B

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

C

Phenyltrichlorosilane
98-13-5

Phenyltrichlorosilane

D

1,1,1,5,5,5-hexachloro-3-methyl-1,5-disila-1-pentene

1,1,1,5,5,5-hexachloro-3-methyl-1,5-disila-1-pentene

Conditions
ConditionsYield
With hexachlorodisilane at 520℃; for 0.00833333h; Further byproducts given;A 53.4%
B 10.2%
C 8.6%
D 5.3%
With hexachlorodisilane at 520℃; for 0.00833333h; Further byproducts given;A 53.4%
B 8.6%
C 5.3%
D 10.2%
With hexachlorodisilane at 520℃; for 0.00833333h; Further byproducts given;A 53.4%
B 10.2%
C 5.3%
D 8.6%
silicon
7440-21-3

silicon

A

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

B

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With dichloromethane; copper In neat (no solvent) Si-Cu (4:1) and gaseous CH2Cl2 at 400°C;;A 53%
B n/a
With CH2Cl2; copper In neat (no solvent) Si-Cu (4:1) and gaseous CH2Cl2 at 400°C;;A 53%
B n/a
With dichloromethane; copper In neat (no solvent) Si-Cu (4:1) and gaseous CH2Cl2 at 300-350°C;;
With CH2Cl2; copper In neat (no solvent) Si-Cu (4:1) and gaseous CH2Cl2 at 300-350°C;;
2-propynyl chloride
624-65-7

2-propynyl chloride

A

allyltrichlorosilane
107-37-9

allyltrichlorosilane

B

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

C

trichloro(prop-2-ynyl)silane
33415-29-1

trichloro(prop-2-ynyl)silane

D

1,1,2,2-tetrachloro-1,2-disilacyclopent-4-ene

1,1,2,2-tetrachloro-1,2-disilacyclopent-4-ene

Conditions
ConditionsYield
With hexachlorodisilane at 520℃; for 0.00833333h; Further byproducts given;A 14.4%
B 42.7%
C 22.1%
D 11.8%
2-propynyl chloride
624-65-7

2-propynyl chloride

A

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

B

trichloro(prop-2-ynyl)silane
33415-29-1

trichloro(prop-2-ynyl)silane

C

Phenyltrichlorosilane
98-13-5

Phenyltrichlorosilane

D

1,1,2,2-tetrachloro-1,2-disilacyclopent-4-ene

1,1,2,2-tetrachloro-1,2-disilacyclopent-4-ene

Conditions
ConditionsYield
With hexachlorodisilane at 520℃; for 0.00833333h; Further byproducts given;A 42.7%
B 22.1%
C 3.8%
D 11.8%
With hexachlorodisilane at 450℃; for 0.00694444h; Further byproducts given;A 35.7%
B 17.2%
C 14.1%
D 21.1%
chloroform
67-66-3

chloroform

A

dichloromethane
75-09-2

dichloromethane

B

(dichlorosilylmethyl)trichlorosilane
18171-02-3

(dichlorosilylmethyl)trichlorosilane

C

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With trichlorosilane at 100℃; for 8h;A 42%
B 5%
C 42%
2-propynyl chloride
624-65-7

2-propynyl chloride

A

allyltrichlorosilane
107-37-9

allyltrichlorosilane

B

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

C

trichloro(prop-2-ynyl)silane
33415-29-1

trichloro(prop-2-ynyl)silane

D

Phenyltrichlorosilane
98-13-5

Phenyltrichlorosilane

E

1,1,2,2-tetrachloro-1,2-disilacyclopent-4-ene

1,1,2,2-tetrachloro-1,2-disilacyclopent-4-ene

Conditions
ConditionsYield
With hexachlorodisilane at 450℃; for 0.00694444h; Product distribution; Mechanism; influence of temperature, ratio of reagents;A 11.6%
B 35.7%
C 17.2%
D 14.1%
E 21.1%
chloroform
67-66-3

chloroform

A

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

B

tris(trichlorosilyl)methane
4775-56-8

tris(trichlorosilyl)methane

Conditions
ConditionsYield
With hexachlorodisilane at 550℃; for 0.00833333h;A 30%
B 34%
With hexachlorodisilane at 550℃; for 0.00833333h; Product distribution; gas-phase reactions of chloroalkanes and chloroalkenes with Si2Cl6; other temperature, molar concentration of Si2Cl6;
trichloromethyltrichlorosilane
17760-13-3

trichloromethyltrichlorosilane

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With tri-n-propylamine; trichlorosilane In acetonitrile 1.) r.t., 18 h, 2.) reflux, 16 h;22.7%
Methyltrichlorosilane
75-79-6

Methyltrichlorosilane

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With aluminium trichloride at 450℃; unter Druck;
at 710℃; unter vermindertem Druck;
dichloromethane
75-09-2

dichloromethane

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With copper; silicon at 300 - 400℃;
With hexachlorodisilane at 620℃;
With tetrachlorosilane; hydrogen at 300 - 750℃; Catalytic behavior; Flow reactor;
With copper; silicon at 300℃;
1,1,3,3-tetrachloro-2,4-bis-trichlorosilanyl-[1,3]disiletane
18038-59-0

1,1,3,3-tetrachloro-2,4-bis-trichlorosilanyl-[1,3]disiletane

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With hydrogenchloride; N,N-dimethyl-aniline at 150℃;
C19H17Cl3Si2

C19H17Cl3Si2

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With hydrogenchloride; aluminium trichloride In benzene at 5 - 15℃; Yield given;
dichloromethane
75-09-2

dichloromethane

A

chloroform
67-66-3

chloroform

B

(chloromethyl)trichlorosilane
1558-25-4

(chloromethyl)trichlorosilane

C

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With hexachlorodisilane at 399℃; Product distribution; var. temp. and molar ratio;
dichloromethane
75-09-2

dichloromethane

A

bis(dichlorosilyl)methane
18081-42-0

bis(dichlorosilyl)methane

B

(dichlorosilylmethyl)trichlorosilane
18171-02-3

(dichlorosilylmethyl)trichlorosilane

C

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With hydrogenchloride; silicon; Cu(10 percent)-Cd(0.5 percent) at 280℃; for 2h;A 10.1 g
B 8.7 g
C 2.0 g
With hydrogenchloride; silicon; Cu(10 percent)-Cd(0.5 percent) at 280℃; for 2h; Product distribution; effects of temperature, mixing ratio and further catalysts investigated;A 10.2 g
B 8.7 g
C 2.0 g
With hydrogenchloride; methylene chloride; copper; cadmium; silicon at 280℃; for 2h;A 10.1 g
B 8.7 g
C 2 g
dichloromethane
75-09-2

dichloromethane

silicon

silicon

copper

copper

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
at 300 - 400℃;
trichloro(dichloromethyl)silane
1558-24-3

trichloro(dichloromethyl)silane

copper silicon-alloy

copper silicon-alloy

A

Methyltrichlorosilane
75-79-6

Methyltrichlorosilane

B

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

C

(chloromethyl)trichlorosilane
1558-25-4

(chloromethyl)trichlorosilane

D

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
at 360℃;
(chloromethyl)trichlorosilane
1558-25-4

(chloromethyl)trichlorosilane

silicon-copper

silicon-copper

A

Methyltrichlorosilane
75-79-6

Methyltrichlorosilane

B

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

C

1,1,1,3,3,5,5,5-octachloro-1,3,5-trisilapentane
16538-67-3

1,1,1,3,3,5,5,5-octachloro-1,3,5-trisilapentane

Conditions
ConditionsYield
at 300 - 370℃;
hexa-Si-chloro-Si,Si'-chloromethanediyl-bis-silane
18157-13-6

hexa-Si-chloro-Si,Si'-chloromethanediyl-bis-silane

copper silicon-alloy

copper silicon-alloy

A

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

B

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

C

tris(trichlorosilyl)methane
4775-56-8

tris(trichlorosilyl)methane

D

1,1,2,2-tetrakis-trichlorosilanyl-ethane
18105-80-1

1,1,2,2-tetrakis-trichlorosilanyl-ethane

Conditions
ConditionsYield
at 360℃;
chloroform
67-66-3

chloroform

silicon-copper

silicon-copper

A

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

B

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

C

tris(trichlorosilyl)methane
4775-56-8

tris(trichlorosilyl)methane

D

trichlorosilane
10025-78-2

trichlorosilane

Conditions
ConditionsYield
at 300℃;
trichloromethyltrichlorosilane
17760-13-3

trichloromethyltrichlorosilane

A

CH2Cl4Si

CH2Cl4Si

B

chloroform
67-66-3

chloroform

C

trichloro(dichloromethyl)silane
1558-24-3

trichloro(dichloromethyl)silane

D

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With trichlorosilane; tetrabutyl phosphine chloride In dodecane at 60℃; for 8h; Product distribution; Further Variations:; Temperatures;
octadec-1-ene
112-88-9

octadec-1-ene

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

1,1,1,3,3-pentachloro-1,3-disilaheneicosane
1621184-16-4

1,1,1,3,3-pentachloro-1,3-disilaheneicosane

Conditions
ConditionsYield
Stage #1: 1,1,1,3,3,3-hexachloro-1,3-disilapropane With trihexyl(tetradecyl)phosphonium chloride; Dichloromethylsilane at 80 - 90℃; Inert atmosphere; Autoclave;
Stage #2: octadec-1-ene With dihydrogen hexachloroplatinate In tetrahydrofuran at 90 - 110℃; Inert atmosphere;
91%
1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

disilylmethane
1759-88-2

disilylmethane

Conditions
ConditionsYield
With lithium aluminium tetrahydride In diethylene glycol dimethyl ether at -78 - 25℃; for 2h; Inert atmosphere;82%
With dibutyl ether; lithium hydride
With lithium aluminium tetrahydride
With lithium aluminium tetrahydride In various solvent(s) Reduction;
1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Dichloro-bis(trichlorosilyl)methane
18157-09-0

Dichloro-bis(trichlorosilyl)methane

Conditions
ConditionsYield
With chlorine In tetrachloromethane for 64h; Heating; Irradiation;80.8%
With tetrachloromethane; chlorine Irradiation.UV-Licht;
With chlorine at 240℃; Irradiation.UV-licht;
With sulfuryl dichloride; dibenzoyl peroxide at 240℃; Irradiation.UV-licht;
With chlorine UV-irradiation;
1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

allyloxytri(ethylene glycol) monomethyl ether
19685-21-3

allyloxytri(ethylene glycol) monomethyl ether

[2-methoxy(triethyleneoxy)propyl]-1,1,1,3,3-pentachloro-1,3-disilapropane
431900-65-1

[2-methoxy(triethyleneoxy)propyl]-1,1,1,3,3-pentachloro-1,3-disilapropane

Conditions
ConditionsYield
Stage #1: 1,1,1,3,3,3-hexachloro-1,3-disilapropane With trihexyl(tetradecyl)phosphonium chloride; Dichloromethylsilane at 80 - 90℃; Inert atmosphere; Autoclave;
Stage #2: allyloxytri(ethylene glycol) monomethyl ether With dihydrogen hexachloroplatinate In tetrahydrofuran at 85 - 105℃; Inert atmosphere;
70%
1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

lithium hydride

lithium hydride

disilylmethane
1759-88-2

disilylmethane

Conditions
ConditionsYield
In dibutyl ether63%
1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

ethylamine
75-04-7

ethylamine

(NEtH)3Si-CH2-Si(NEtH)3

(NEtH)3Si-CH2-Si(NEtH)3

Conditions
ConditionsYield
In pentane at -78 - 20℃;62%
1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

3-Chloro-2-methylpropene
563-47-3

3-Chloro-2-methylpropene

1,1,1,3,3,6-hexachloro-5-methyl-1,3-disilahexane
1627573-20-9

1,1,1,3,3,6-hexachloro-5-methyl-1,3-disilahexane

Conditions
ConditionsYield
Stage #1: 1,1,1,3,3,3-hexachloro-1,3-disilapropane With trihexyl(tetradecyl)phosphonium chloride; Dichloromethylsilane at 80 - 90℃; for 10h; Inert atmosphere; Autoclave;
Stage #2: 3-Chloro-2-methylpropene With dihydrogen hexachloroplatinate In tetrahydrofuran at 110 - 120℃; Inert atmosphere;
60%
(dichlorosilylmethyl)trichlorosilane
18171-02-3

(dichlorosilylmethyl)trichlorosilane

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

3-Chloro-2-methylpropene
563-47-3

3-Chloro-2-methylpropene

1,1,1,3,3,6-hexachloro-5-methyl-1,3-disilahexane
1627573-20-9

1,1,1,3,3,6-hexachloro-5-methyl-1,3-disilahexane

Conditions
ConditionsYield
With hexachloroplatinic acid In tetrahydrofuran at 110 - 130℃; for 3h;60%
1-Decene
872-05-9

1-Decene

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

1,1,1,3,3-pentachloro-1,3-disilatridecane
1621184-14-2

1,1,1,3,3-pentachloro-1,3-disilatridecane

Conditions
ConditionsYield
Stage #1: 1,1,1,3,3,3-hexachloro-1,3-disilapropane With trihexyl(tetradecyl)phosphonium chloride; Dichloromethylsilane at 80 - 90℃; for 10h; Inert atmosphere; Autoclave; Large scale;
Stage #2: 1-Decene With dihydrogen hexachloroplatinate In tetrahydrofuran at 90 - 110℃; Inert atmosphere; Large scale;
59%
1-Decene
872-05-9

1-Decene

(dichlorosilylmethyl)trichlorosilane
18171-02-3

(dichlorosilylmethyl)trichlorosilane

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

1,1,1,3,3-pentachloro-1,3-disilatridecane
1621184-14-2

1,1,1,3,3-pentachloro-1,3-disilatridecane

Conditions
ConditionsYield
With hexachloroplatinic acid In tetrahydrofuran at 90 - 110℃; for 1.5h; Inert atmosphere;59%
sodium dicarbonyl(cyclopentadienyl)ferrate

sodium dicarbonyl(cyclopentadienyl)ferrate

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

[dicarbonyl(η5-cyclopentadienyl)ferrio]dichlorosilyl-(trichlorosilyl)methane
545443-52-5

[dicarbonyl(η5-cyclopentadienyl)ferrio]dichlorosilyl-(trichlorosilyl)methane

Conditions
ConditionsYield
In cyclohexane suspn. of Fe-complex in cyclohexane was combined with Si-compound, stirred for 14 h at ambient temp. under exclusion of light; filtered, solvent was removed in vac., washed with n-pentane at -78°C, dried in vac., crystd. from petroleum ether at -78°C; elem.anal.;46%
1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

methylamine
74-89-5

methylamine

{Bis-methylamino-[(tris-methylamino-silanyl)-methyl]-silanyl}-methyl-amine

{Bis-methylamino-[(tris-methylamino-silanyl)-methyl]-silanyl}-methyl-amine

Conditions
ConditionsYield
In pentane at -78 - 20℃;41%

Silane,1,1'-methylenebis[1,1,1-trichloro- Specification

The Silane,1,1'-methylenebis[1,1,1-trichloro- is an organic compound with the formula CH2Cl6Si2. The systematic name of this chemical is methanediylbis(trichlorosilane). With the CAS registry number 4142-85-2, it is also named as Bis(trichlorosilyl)methane. The product's categories are Self Assembly & Contact Printing; Self-Assembly Materials; Silane Coupling Agents/Adhesion Promoters; SilanesSelf Assembly & Contact Printing; Trichlorosilanes. Besides, it should be stored in a closed cool and dry place.

Physical properties about Silane,1,1'-methylenebis[1,1,1-trichloro- are: (1)ACD/LogP: 8.31; (2)# of Rule of 5 Violations: 1; (3)ACD/LogD (pH 5.5): 8.3; (4)ACD/LogD (pH 7.4): 8.3; (5)ACD/BCF (pH 5.5): 1000000; (6)ACD/BCF (pH 7.4): 1000000; (7)ACD/KOC (pH 5.5): 784734.88; (8)ACD/KOC (pH 7.4): 784734.88; (9)#Freely Rotating Bonds: 2; (10)Index of Refraction: 1.487; (11)Molar Refractivity: 53.21 cm3; (12)Molar Volume: 184.8 cm3; (13)Polarizability: 21.09×10-24cm3; (14)Surface Tension: 26.8 dyne/cm; (15)Density: 1.53 g/cm3; (16)Flash Point: 31.4 °C; (17)Enthalpy of Vaporization: 36.63 kJ/mol; (18)Boiling Point: 145 °C at 760 mmHg; (19)Vapour Pressure: 6.25 mmHg at 25°C.

Preparation: this chemical can be prepared by trichloro-chloromethyl-silane. This reaction will need reagent copper and silicon. The reaction reaction temperature is 300 - 400 °C.

Uses of Silane,1,1'-methylenebis[1,1,1-trichloro-: it can be used to produce dichloro-bis-trichlorosilanyl-methane. It will need reagent tetrachloromethane and chlorine.

When you are using this chemical, please be cautious about it as the following:
It reacts violently with water, liberating extremely flammable gases. In case of contact with eyes, rinse immediately with plenty of water and seek medical advice. Besides, this chemical can cause burns. When you are using it, wear suitable gloves and eye/face protection. In case of fire use ... (indicate in the space the precise type of fire-fighting equipment. If water increases the risk add - Never use water). In case of accident or if you feel unwell seek medical advice immediately (show the label where possible).

You can still convert the following datas into molecular structure:
(1)SMILES: Cl[Si](Cl)(Cl)C[Si](Cl)(Cl)Cl
(2)InChI: InChI=1/CH2Cl6Si2/c2-8(3,4)1-9(5,6)7/h1H2
(3)InChIKey: ABDDAHLAEXNYRC-UHFFFAOYAJ
(4)Std. InChI: InChI=1S/CH2Cl6Si2/c2-8(3,4)1-9(5,6)7/h1H2
(5)Std. InChIKey: ABDDAHLAEXNYRC-UHFFFAOYSA-N

Post buying leads

About|Contact|Cas|Product Name|Molecular|Country|Encyclopedia

Message|New Cas|MSDS|Service|Advertisement|CAS DataBase|Article Data|Manufacturers | Chemical Catalog

©2008 LookChem.com,License: ICP

NO.:Zhejiang16009103

complaints:service@lookchem.com Desktop View