Conditions | Yield |
---|---|
With hydrogenchloride; tetrabutyl phosphine chloride In dodecane at 20℃; for 1h; | 87% |
1,2-Dichloroethylene
A
dichloromethane
B
1,2-bis(trichlorosilyl)ethane
C
1,2-bis(trichlorosilyl)ethene
D
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Conditions | Yield |
---|---|
With hexachlorodisilane at 550℃; for 0.00833333h; | A n/a B n/a C 83% D n/a |
3-chloroprop-1-ene
A
allyltrichlorosilane
B
1,1,1,3,3,3-hexachloro-1,3-disilapropane
C
Phenyltrichlorosilane
E
1,1,3,3-tetrachloro-1,3-disilacyclohex-4-ene
Conditions | Yield |
---|---|
With hexachlorodisilane at 500℃; for 0.00833333h; Product distribution; Mechanism; | A 81% B 1.85% C 1.77% D 1.52% E 4.63% |
bis(dichlorosilyl)methane
dichloromethane
A
1,1,3,3,5,5-hexachloro-1,3,5-trisilacyclohexane
B
1,1,1,3,3,3-hexachloro-1,3-disilapropane
C
1,1,1,3,3,5,5,5-octachloro-1,3,5-trisilapentane
Conditions | Yield |
---|---|
tetra-n-butylphosphonium chloride at 180℃; for 2h; Product distribution / selectivity; Inert atmosphere; | A 70.1% B 40.6% C 13% |
Conditions | Yield |
---|---|
With tri-n-propylamine; trichlorosilane In acetonitrile for 21h; Ambient temperature; | 64% |
Conditions | Yield |
---|---|
With tri-n-propylamine; trichlorosilane 1.) r.t., 8 h, 2.) reflux, 10 h; | 63.6% |
With trichlorosilane; triethylamine In acetonitrile at 65 - 70℃; 12-15 h; | 57% |
With copper; silicon at 300 - 400℃; | |
With trichlorosilane; trihexyl(tetradecyl)phosphonium chloride at 50 - 240℃; under 12929 - 33615.5 Torr; for 3.25h; | |
With tri-n-propylamine; trichlorosilane |
Conditions | Yield |
---|---|
With tributylphosphine; trichlorosilane at 150℃; for 2h; Reagent/catalyst; Autoclave; | 54.3% |
With tributylphosphine; trichlorosilane at 150℃; for 2h; Reagent/catalyst; Autoclave; High pressure; Inert atmosphere; | 54.3% |
With trichlorosilane at 150℃; for 2h; Reagent/catalyst; Inert atmosphere; Sealed tube; | 54.3% |
dichloromethane
(dichlorosilylmethyl)trichlorosilane
A
1,1,3,3,5,5-hexachloro-1,3,5-trisilacyclohexane
B
1,1,1,3,3,3-hexachloro-1,3-disilapropane
C
1,1,1,3,3,5,5,5-octachloro-1,3,5-trisilapentane
Conditions | Yield |
---|---|
With tetra-n-butylphosphonium chloride In toluene at 180℃; for 3h; Inert atmosphere; Autoclave; | A 54% B 23% C 8% |
3-Chloro-2-methylpropene
A
trichloro(2-methyl-2-propenyl)silane
B
1,1,1,3,3,3-hexachloro-1,3-disilapropane
C
(Z)-crotyltrichlorosilane
D
Phenyltrichlorosilane
Conditions | Yield |
---|---|
With hexachlorodisilane at 520℃; for 30h; Product distribution; Mechanism; | A 53.4% B 1.5% C 8.6% D 5.3% E 10.2% |
3-Chloro-2-methylpropene
A
trichloro(2-methyl-2-propenyl)silane
B
1,1,1,3,3,3-hexachloro-1,3-disilapropane
C
Phenyltrichlorosilane
Conditions | Yield |
---|---|
With hexachlorodisilane at 520℃; for 0.00833333h; Further byproducts given; | A 53.4% B 10.2% C 8.6% D 5.3% |
With hexachlorodisilane at 520℃; for 0.00833333h; Further byproducts given; | A 53.4% B 8.6% C 5.3% D 10.2% |
With hexachlorodisilane at 520℃; for 0.00833333h; Further byproducts given; | A 53.4% B 10.2% C 5.3% D 8.6% |
silicon
A
tetrachlorosilane
B
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Conditions | Yield |
---|---|
With dichloromethane; copper In neat (no solvent) Si-Cu (4:1) and gaseous CH2Cl2 at 400°C;; | A 53% B n/a |
With CH2Cl2; copper In neat (no solvent) Si-Cu (4:1) and gaseous CH2Cl2 at 400°C;; | A 53% B n/a |
With dichloromethane; copper In neat (no solvent) Si-Cu (4:1) and gaseous CH2Cl2 at 300-350°C;; | |
With CH2Cl2; copper In neat (no solvent) Si-Cu (4:1) and gaseous CH2Cl2 at 300-350°C;; |
2-propynyl chloride
A
allyltrichlorosilane
B
1,1,1,3,3,3-hexachloro-1,3-disilapropane
C
trichloro(prop-2-ynyl)silane
Conditions | Yield |
---|---|
With hexachlorodisilane at 520℃; for 0.00833333h; Further byproducts given; | A 14.4% B 42.7% C 22.1% D 11.8% |
2-propynyl chloride
A
1,1,1,3,3,3-hexachloro-1,3-disilapropane
B
trichloro(prop-2-ynyl)silane
C
Phenyltrichlorosilane
Conditions | Yield |
---|---|
With hexachlorodisilane at 520℃; for 0.00833333h; Further byproducts given; | A 42.7% B 22.1% C 3.8% D 11.8% |
With hexachlorodisilane at 450℃; for 0.00694444h; Further byproducts given; | A 35.7% B 17.2% C 14.1% D 21.1% |
chloroform
A
dichloromethane
B
(dichlorosilylmethyl)trichlorosilane
C
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Conditions | Yield |
---|---|
With trichlorosilane at 100℃; for 8h; | A 42% B 5% C 42% |
2-propynyl chloride
A
allyltrichlorosilane
B
1,1,1,3,3,3-hexachloro-1,3-disilapropane
C
trichloro(prop-2-ynyl)silane
D
Phenyltrichlorosilane
Conditions | Yield |
---|---|
With hexachlorodisilane at 450℃; for 0.00694444h; Product distribution; Mechanism; influence of temperature, ratio of reagents; | A 11.6% B 35.7% C 17.2% D 14.1% E 21.1% |
chloroform
A
1,1,1,3,3,3-hexachloro-1,3-disilapropane
B
tris(trichlorosilyl)methane
Conditions | Yield |
---|---|
With hexachlorodisilane at 550℃; for 0.00833333h; | A 30% B 34% |
With hexachlorodisilane at 550℃; for 0.00833333h; Product distribution; gas-phase reactions of chloroalkanes and chloroalkenes with Si2Cl6; other temperature, molar concentration of Si2Cl6; |
trichloromethyltrichlorosilane
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Conditions | Yield |
---|---|
With tri-n-propylamine; trichlorosilane In acetonitrile 1.) r.t., 18 h, 2.) reflux, 16 h; | 22.7% |
Conditions | Yield |
---|---|
With aluminium trichloride at 450℃; unter Druck; | |
at 710℃; unter vermindertem Druck; |
Conditions | Yield |
---|---|
With copper; silicon at 300 - 400℃; | |
With hexachlorodisilane at 620℃; | |
With tetrachlorosilane; hydrogen at 300 - 750℃; Catalytic behavior; Flow reactor; | |
With copper; silicon at 300℃; |
1,1,3,3-tetrachloro-2,4-bis-trichlorosilanyl-[1,3]disiletane
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Conditions | Yield |
---|---|
With hydrogenchloride; N,N-dimethyl-aniline at 150℃; |
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Conditions | Yield |
---|---|
With hydrogenchloride; aluminium trichloride In benzene at 5 - 15℃; Yield given; |
dichloromethane
A
chloroform
B
(chloromethyl)trichlorosilane
C
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Conditions | Yield |
---|---|
With hexachlorodisilane at 399℃; Product distribution; var. temp. and molar ratio; |
dichloromethane
A
bis(dichlorosilyl)methane
B
(dichlorosilylmethyl)trichlorosilane
C
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Conditions | Yield |
---|---|
With hydrogenchloride; silicon; Cu(10 percent)-Cd(0.5 percent) at 280℃; for 2h; | A 10.1 g B 8.7 g C 2.0 g |
With hydrogenchloride; silicon; Cu(10 percent)-Cd(0.5 percent) at 280℃; for 2h; Product distribution; effects of temperature, mixing ratio and further catalysts investigated; | A 10.2 g B 8.7 g C 2.0 g |
With hydrogenchloride; methylene chloride; copper; cadmium; silicon at 280℃; for 2h; | A 10.1 g B 8.7 g C 2 g |
Conditions | Yield |
---|---|
at 300 - 400℃; |
trichloro(dichloromethyl)silane
A
Methyltrichlorosilane
B
tetrachlorosilane
C
(chloromethyl)trichlorosilane
D
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Conditions | Yield |
---|---|
at 360℃; |
(chloromethyl)trichlorosilane
A
Methyltrichlorosilane
B
1,1,1,3,3,3-hexachloro-1,3-disilapropane
C
1,1,1,3,3,5,5,5-octachloro-1,3,5-trisilapentane
Conditions | Yield |
---|---|
at 300 - 370℃; |
hexa-Si-chloro-Si,Si'-chloromethanediyl-bis-silane
A
tetrachlorosilane
B
1,1,1,3,3,3-hexachloro-1,3-disilapropane
C
tris(trichlorosilyl)methane
D
1,1,2,2-tetrakis-trichlorosilanyl-ethane
Conditions | Yield |
---|---|
at 360℃; |
chloroform
A
tetrachlorosilane
B
1,1,1,3,3,3-hexachloro-1,3-disilapropane
C
tris(trichlorosilyl)methane
D
trichlorosilane
Conditions | Yield |
---|---|
at 300℃; |
trichloromethyltrichlorosilane
B
chloroform
C
trichloro(dichloromethyl)silane
D
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Conditions | Yield |
---|---|
With trichlorosilane; tetrabutyl phosphine chloride In dodecane at 60℃; for 8h; Product distribution; Further Variations:; Temperatures; |
octadec-1-ene
1,1,1,3,3,3-hexachloro-1,3-disilapropane
1,1,1,3,3-pentachloro-1,3-disilaheneicosane
Conditions | Yield |
---|---|
Stage #1: 1,1,1,3,3,3-hexachloro-1,3-disilapropane With trihexyl(tetradecyl)phosphonium chloride; Dichloromethylsilane at 80 - 90℃; Inert atmosphere; Autoclave; Stage #2: octadec-1-ene With dihydrogen hexachloroplatinate In tetrahydrofuran at 90 - 110℃; Inert atmosphere; | 91% |
Conditions | Yield |
---|---|
With lithium aluminium tetrahydride In diethylene glycol dimethyl ether at -78 - 25℃; for 2h; Inert atmosphere; | 82% |
With dibutyl ether; lithium hydride | |
With lithium aluminium tetrahydride | |
With lithium aluminium tetrahydride In various solvent(s) Reduction; |
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Dichloro-bis(trichlorosilyl)methane
Conditions | Yield |
---|---|
With chlorine In tetrachloromethane for 64h; Heating; Irradiation; | 80.8% |
With tetrachloromethane; chlorine Irradiation.UV-Licht; | |
With chlorine at 240℃; Irradiation.UV-licht; | |
With sulfuryl dichloride; dibenzoyl peroxide at 240℃; Irradiation.UV-licht; | |
With chlorine UV-irradiation; |
1,1,1,3,3,3-hexachloro-1,3-disilapropane
allyloxytri(ethylene glycol) monomethyl ether
[2-methoxy(triethyleneoxy)propyl]-1,1,1,3,3-pentachloro-1,3-disilapropane
Conditions | Yield |
---|---|
Stage #1: 1,1,1,3,3,3-hexachloro-1,3-disilapropane With trihexyl(tetradecyl)phosphonium chloride; Dichloromethylsilane at 80 - 90℃; Inert atmosphere; Autoclave; Stage #2: allyloxytri(ethylene glycol) monomethyl ether With dihydrogen hexachloroplatinate In tetrahydrofuran at 85 - 105℃; Inert atmosphere; | 70% |
Conditions | Yield |
---|---|
In dibutyl ether | 63% |
Conditions | Yield |
---|---|
In pentane at -78 - 20℃; | 62% |
1,1,1,3,3,3-hexachloro-1,3-disilapropane
3-Chloro-2-methylpropene
1,1,1,3,3,6-hexachloro-5-methyl-1,3-disilahexane
Conditions | Yield |
---|---|
Stage #1: 1,1,1,3,3,3-hexachloro-1,3-disilapropane With trihexyl(tetradecyl)phosphonium chloride; Dichloromethylsilane at 80 - 90℃; for 10h; Inert atmosphere; Autoclave; Stage #2: 3-Chloro-2-methylpropene With dihydrogen hexachloroplatinate In tetrahydrofuran at 110 - 120℃; Inert atmosphere; | 60% |
(dichlorosilylmethyl)trichlorosilane
1,1,1,3,3,3-hexachloro-1,3-disilapropane
3-Chloro-2-methylpropene
1,1,1,3,3,6-hexachloro-5-methyl-1,3-disilahexane
Conditions | Yield |
---|---|
With hexachloroplatinic acid In tetrahydrofuran at 110 - 130℃; for 3h; | 60% |
1-Decene
1,1,1,3,3,3-hexachloro-1,3-disilapropane
1,1,1,3,3-pentachloro-1,3-disilatridecane
Conditions | Yield |
---|---|
Stage #1: 1,1,1,3,3,3-hexachloro-1,3-disilapropane With trihexyl(tetradecyl)phosphonium chloride; Dichloromethylsilane at 80 - 90℃; for 10h; Inert atmosphere; Autoclave; Large scale; Stage #2: 1-Decene With dihydrogen hexachloroplatinate In tetrahydrofuran at 90 - 110℃; Inert atmosphere; Large scale; | 59% |
1-Decene
(dichlorosilylmethyl)trichlorosilane
1,1,1,3,3,3-hexachloro-1,3-disilapropane
1,1,1,3,3-pentachloro-1,3-disilatridecane
Conditions | Yield |
---|---|
With hexachloroplatinic acid In tetrahydrofuran at 90 - 110℃; for 1.5h; Inert atmosphere; | 59% |
1,1,1,3,3,3-hexachloro-1,3-disilapropane
[dicarbonyl(η5-cyclopentadienyl)ferrio]dichlorosilyl-(trichlorosilyl)methane
Conditions | Yield |
---|---|
In cyclohexane suspn. of Fe-complex in cyclohexane was combined with Si-compound, stirred for 14 h at ambient temp. under exclusion of light; filtered, solvent was removed in vac., washed with n-pentane at -78°C, dried in vac., crystd. from petroleum ether at -78°C; elem.anal.; | 46% |
Conditions | Yield |
---|---|
In pentane at -78 - 20℃; | 41% |
The Silane,1,1'-methylenebis[1,1,1-trichloro- is an organic compound with the formula CH2Cl6Si2. The systematic name of this chemical is methanediylbis(trichlorosilane). With the CAS registry number 4142-85-2, it is also named as Bis(trichlorosilyl)methane. The product's categories are Self Assembly & Contact Printing; Self-Assembly Materials; Silane Coupling Agents/Adhesion Promoters; SilanesSelf Assembly & Contact Printing; Trichlorosilanes. Besides, it should be stored in a closed cool and dry place.
Physical properties about Silane,1,1'-methylenebis[1,1,1-trichloro- are: (1)ACD/LogP: 8.31; (2)# of Rule of 5 Violations: 1; (3)ACD/LogD (pH 5.5): 8.3; (4)ACD/LogD (pH 7.4): 8.3; (5)ACD/BCF (pH 5.5): 1000000; (6)ACD/BCF (pH 7.4): 1000000; (7)ACD/KOC (pH 5.5): 784734.88; (8)ACD/KOC (pH 7.4): 784734.88; (9)#Freely Rotating Bonds: 2; (10)Index of Refraction: 1.487; (11)Molar Refractivity: 53.21 cm3; (12)Molar Volume: 184.8 cm3; (13)Polarizability: 21.09×10-24cm3; (14)Surface Tension: 26.8 dyne/cm; (15)Density: 1.53 g/cm3; (16)Flash Point: 31.4 °C; (17)Enthalpy of Vaporization: 36.63 kJ/mol; (18)Boiling Point: 145 °C at 760 mmHg; (19)Vapour Pressure: 6.25 mmHg at 25°C.
Preparation: this chemical can be prepared by trichloro-chloromethyl-silane. This reaction will need reagent copper and silicon. The reaction reaction temperature is 300 - 400 °C.
Uses of Silane,1,1'-methylenebis[1,1,1-trichloro-: it can be used to produce dichloro-bis-trichlorosilanyl-methane. It will need reagent tetrachloromethane and chlorine.
When you are using this chemical, please be cautious about it as the following:
It reacts violently with water, liberating extremely flammable gases. In case of contact with eyes, rinse immediately with plenty of water and seek medical advice. Besides, this chemical can cause burns. When you are using it, wear suitable gloves and eye/face protection. In case of fire use ... (indicate in the space the precise type of fire-fighting equipment. If water increases the risk add - Never use water). In case of accident or if you feel unwell seek medical advice immediately (show the label where possible).
You can still convert the following datas into molecular structure:
(1)SMILES: Cl[Si](Cl)(Cl)C[Si](Cl)(Cl)Cl
(2)InChI: InChI=1/CH2Cl6Si2/c2-8(3,4)1-9(5,6)7/h1H2
(3)InChIKey: ABDDAHLAEXNYRC-UHFFFAOYAJ
(4)Std. InChI: InChI=1S/CH2Cl6Si2/c2-8(3,4)1-9(5,6)7/h1H2
(5)Std. InChIKey: ABDDAHLAEXNYRC-UHFFFAOYSA-N
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