Triethoxysilane supplier | CasNO.998-30-1

Name
Triethoxysilane
EINECS 213-650-7
CAS No. 998-30-1
Article Data61
CAS DataBase
Density 0.89 g/cm³
Solubility Insoluble in water. Soluble in organic solvents.
Melting Point -170 °C
Formula C₆H₁₆O₃Si
Boiling Point 133.5 °C at 760 mmHg
Molecular Weight 164.277
Flash Point 29.2 °C
Transport Information UN 3384 6.1/PG 1
Appearance colourless liquid
Safety 26-28-36/37/39-45
Risk Codes 10-26-34-23/24/25
Molecular Structure
Hazard Symbols T+,C,T
Synonyms 4-01-00-01359 (Beilstein Handbook Reference);Triethoxysilicon;
PSA 27.69000
LogP 0.81310

Synthetic route

: 64-17-5
ethanol

: 7440-21-3
silicon

A: 78-10-4
tetraethoxy orthosilicate

B: 998-30-1
Triethoxysilane

Conditions

Conditions	Yield
With sebaconitrile; copper(I) oxide In NALKYLENE 500 at 200℃; for 14h; Product distribution / selectivity;	A 3.32% B 95.7%
With octanedinitrile; copper(I) oxide In NALKYLENE 500 at 200℃; for 14 - 21h; Product distribution / selectivity;	A 3.45% B 94.18%
With hexanedinitrile; copper(I) oxide In NALKYLENE 500 at 200℃; for 14h; Product distribution / selectivity;	A 5.26% B 93.38%

...Expand

: 64-17-5
ethanol

: 998-30-1
Triethoxysilane

Conditions

Conditions	Yield
With trichlorosilane at 80℃; for 6h; Temperature;	86%
With trichlorosilane; N,N-dimethyl-aniline; benzene
With trichlorosilane
With trichlorosilane; N,N-diethylaniline

: 1825-62-3
ethyl trimethylsilyl ether

: 10025-78-2
trichlorosilane

: 998-30-1
Triethoxysilane

Conditions

Conditions	Yield
	84%
	84%

: 67-56-1
methanol

: C21H29NO3S

: 513-31-5
2-bromoallyl bromide

A: 998-30-1
Triethoxysilane

B: C20H24BrNO2

Conditions

Conditions	Yield
Stage #1: methanol; C21H29NO3S With hydrogenchloride In 1,4-dioxane at 0 - 23℃; for 1h; Inert atmosphere; Schlenk technique; Stage #2: 2-bromoallyl bromide With N-ethyl-N,N-diisopropylamine In acetonitrile at 23 - 80℃; for 12h; Inert atmosphere; Schlenk technique;	A 26% B 54%

...Expand

: 10025-78-2
trichlorosilane

: 998-30-1
Triethoxysilane

Conditions

Conditions	Yield
With C2H5OH In benzene byproducts: HCl;	45%
With ethanol byproducts: HCl;
With C2H5OH byproducts: HCl;

: 64-17-5
ethanol

: 74-85-1
ethene

A: 78-07-9
ethyltriethoxy silane

B: 13175-88-7
ethyldiethoxysilane

C: 998-30-1
Triethoxysilane

Conditions

Conditions	Yield
With silicon at 240℃;	A n/a B 13% C n/a

...Expand

: 78-10-4
tetraethoxy orthosilicate

: 998-30-1
Triethoxysilane

Conditions

Conditions	Yield
With Y(3+)2C12H21Si(1-)H(1-)*C4H8O; 4,4,5,5-tetramethyl-[1,3,2]-dioxaboralane In benzene-d6 at 80℃; for 20h;	12%
With hydrogen under 110 Torr; for 5h;

: 64-17-5
ethanol

A: 78-10-4
tetraethoxy orthosilicate

B: 998-30-1
Triethoxysilane

Conditions

Conditions	Yield
With trichlorosilane; benzene at 0℃;
With copper(l) chloride; silicon at 242℃;	A 105 g B 1635 g
With copper(l) chloride; silicon at 242℃; Concentration; Time; Large scale;	A 141 g B 3380 g

: 1825-62-3
ethyl trimethylsilyl ether

: 998-30-1
Triethoxysilane

Conditions

Conditions	Yield
With trichlorosilane

: 122-51-0
orthoformic acid triethyl ester

: 998-30-1
Triethoxysilane

Conditions

Conditions	Yield
With trichlorosilane

: 64-17-5
ethanol

: 18169-90-9
butoxy-dichloro-silane

: 71-43-2
benzene

A: 998-30-1
Triethoxysilane

B: 18236-16-3
di(ethoxy)(butoxy)silane

C: 17980-44-8
(ethoxy)di(butoxy)silane

Conditions

Conditions	Yield
at 0℃; dann bei Siedetemperatur;

...Expand

: 78-10-4
tetraethoxy orthosilicate

: 100-99-2
triisobutylaluminum

A: 998-30-1
Triethoxysilane

B: triethoxyisobutoxysilane

C diisobutylaluminumethoxide: diisobutylaluminumethoxide

Conditions

Conditions	Yield
In toluene at 110 - 114℃; for 2h; Product distribution; other temperature (25-30 and 50-75 deg C), or without solvent;

...Expand

: 64-17-5
ethanol

: 10025-78-2
trichlorosilane

: 71-43-2
benzene

A: 78-10-4
tetraethoxy orthosilicate

B: 998-30-1
Triethoxysilane

Conditions

Conditions	Yield
at 20℃;

...Expand

: 64-17-5
ethanol

A: 78-10-4
tetraethoxy orthosilicate

B: 18165-68-9
diethoxysilane

C: 13175-88-7
ethyldiethoxysilane

D: 998-30-1
Triethoxysilane

Conditions

Conditions	Yield
With thiophene; copper(l) chloride; silicon at 339.85℃; under 607.549 Torr; Further byproducts given;	A 3 % Chromat. B 4 % Chromat. C 14 % Chromat. D 75 % Chromat.

...Expand

: 64-17-5
ethanol

: 7440-21-3
silicon

A: 105-57-7
diethyl acetal

B: 78-10-4
tetraethoxy orthosilicate

C: 998-30-1
Triethoxysilane

D: 75-07-0
acetaldehyde

Conditions

Conditions	Yield
With FS1265; SAG 47; copper(II) hydroxide In THERMINOL 59 at 220℃; Product distribution / selectivity;

...Expand

: 64-17-5
ethanol

: 7440-21-3
silicon

A: 78-07-9
ethyltriethoxy silane

B: 78-10-4
tetraethoxy orthosilicate

C: 18165-68-9
diethoxysilane

D: 13175-88-7
ethyldiethoxysilane

E: 998-30-1
Triethoxysilane

Conditions

Conditions	Yield
With copper(I) cyanide; copper(I) oxide In THERMINOL 59 at 200℃; for 16 - 18h; Product distribution / selectivity;
With copper(I) cyanide; undecyl cyanide; copper(I) oxide In THERMINOL 59 at 200℃; for 15h; Product distribution / selectivity;
With copper(I) cyanide; copper(I) oxide In THERMINOL 59 at 200℃; for 20h; Product distribution / selectivity;
With octanedinitrile; copper(I) oxide In NALKYLENE 500 at 200℃; for 15h; Product distribution / selectivity; hydrogen atmosphere;

...Expand

: 64-17-5
ethanol

: 7440-21-3
silicon

A: 78-10-4
tetraethoxy orthosilicate

B: 18165-68-9
diethoxysilane

C: 13175-88-7
ethyldiethoxysilane

D: 998-30-1
Triethoxysilane

Conditions

Conditions	Yield
With octanedinitrile; copper(I) oxide In NALKYLENE 500 at 200℃; for 16h; Product distribution / selectivity; Nitrogen atmosphere;
With octanedinitrile; copper(I) oxide In NALKYLENE 500 at 200℃; for 19h; Product distribution / selectivity; hydrogen atmosphere;

...Expand

: 78-10-4
tetraethoxy orthosilicate

: argon

: 998-30-1
Triethoxysilane

: 64-17-5
ethanol

: 10025-78-2
trichlorosilane

: 998-30-1
Triethoxysilane

Conditions

Conditions	Yield
In neat (no solvent) dropwise addition of ethanol to SiHCl3; heating;; distillation;;

: 18236-12-9
trimethyl-silanyl-ammonium; chloride

A: 18165-31-6
methylmethoxy silane

B: 18165-68-9
diethoxysilane

C: 998-30-1
Triethoxysilane

Conditions

Conditions	Yield
With ethanol
With C2H5OH

...Expand

: 64-17-5
ethanol

: 7440-21-3
silicon

: 998-30-1
Triethoxysilane

Conditions

Conditions	Yield
copper(I) oxide; copper; copper(l) chloride In Marlotherm SH at 190℃; for 3.41667 - 3.45h; Product distribution / selectivity; Microwave irradiation;
copper(l) chloride In Marlotherm SH at 190℃; for 3.43333 - 3.51667h; Product distribution / selectivity; Microwave irradiation;

: 64-17-5
ethanol

A: 6485-91-2
chlorodiethoxysilane

B: 998-30-1
Triethoxysilane

Conditions

Conditions	Yield
With trichlorosilane In hexane at 0℃; Inert atmosphere;

: 116-15-4
perfluoropropylene

: 998-30-1
Triethoxysilane

Conditions

Conditions	Yield
In diethylene glycol dimethyl ether at -70℃; for 1h; Catalytic behavior; Solvent; Inert atmosphere; Schlenk technique;

: 771-56-2
2,3,4,5,6-pentafluorotoluene

: 998-30-1
Triethoxysilane

Conditions

Conditions	Yield
In diethylene glycol dimethyl ether at 110℃; for 72h; Catalytic behavior; Solvent; Inert atmosphere; Schlenk technique;

: 64-17-5
ethanol

: 15417-65-9
1,1,3,3-tetraethoxy-disiloxane

: 998-30-1
Triethoxysilane

Conditions

Conditions	Yield
With potassium hydroxide at 240℃; for 3h; Autoclave; Molecular sieve;

: 592-41-6
1-hexene

: 998-30-1
Triethoxysilane

: 18166-37-5
hexyltriethoxysilane

Conditions

Conditions	Yield
at 90℃; for 5h; Inert atmosphere;	100%
at 90℃; for 5h; Inert atmosphere;	100%
With platinum on carbon nanotubes In neat (no solvent) at 20℃; for 24h;	98%

: 111-66-0
oct-1-ene

: 998-30-1
Triethoxysilane

: 2943-75-1
triethoxy(octyl)silane

Conditions

Conditions	Yield
at 90℃; for 5h; Inert atmosphere;	100%
at 90℃; for 5h; Inert atmosphere;	100%
With graphene nanoplates-supported platinum nanoparticles In neat (no solvent) at 80℃; for 2h; Catalytic behavior;	99%

: 998-30-1
Triethoxysilane

: 536-74-3
phenylacetylene

: 65119-09-7
(E)-styryl(triethoxy)silane

Conditions

Conditions	Yield
With C34H39N3O2Rh(1+)*BF4(1-) In dichloromethane-d2 at 60℃; for 4h; Inert atmosphere; Glovebox; stereoselective reaction;	100%
With 2-dicyclohexyl-phosphino-2',4',6'-triisopropylbiphenyl; platinum(IV) oxide In tetrahydrofuran at 60℃; for 1h;	72%
With C24H23ClCrIrNO3 In 1,1,2,2-tetrachloroethane at 100℃; for 24h; Catalytic behavior; Inert atmosphere; Schlenk technique; regioselective reaction;	63%

: 592-76-7
1-Heptene

: 998-30-1
Triethoxysilane

: 41966-95-4
1-triethoxysilylheptane

Conditions

Conditions	Yield
at 90℃; for 5h; Inert atmosphere;	100%
at 90℃; for 5h; Inert atmosphere;	100%
With dihydrogen hexachloroplatinate; 7,8-dicarba-nido-undecaborate(1-) at 20℃; for 24h; Product distribution; other reaction time, various catalyst composition;	78%

: 1-(2-bromo-2-methyl)propionyloxy-5-hexene

: 998-30-1
Triethoxysilane

: (2-bromo-2-methyl)propionyloxyhexyltriethoxysilane

Conditions

Conditions	Yield
chloroplatinic acid 1,1,3,3-tetramethyl-1,3-divinyldisiloxane complex In toluene for 12h;	100%
chloroplatinic acid 1,1,3,3-tetramethyl-1,3-divinyldisiloxane complex at 20℃; for 4h;	38%

poly[2-methoxy-5-(2-ethylhexyloxy)-1,4-phenylenevinylene-co-2,5-bis(5-hexenyloxy)-1,4-phenylenevinylene], Mn = 17000 Da: poly[2-methoxy-5-(2-ethylhexyloxy)-1,4-phenylenevinylene-co-2,5-bis(5-hexenyloxy)-1,4-phenylenevinylene], Mn = 17000 Da

: 998-30-1
Triethoxysilane

poly[2-methoxy-5-(2-ethylhexyloxy)-1,4-phenylenevinylene-co-2,5-bis(6-triethoxysilylhexyloxy)-1,4-phenylenevinylene], Mn = 17000 Da: poly[2-methoxy-5-(2-ethylhexyloxy)-1,4-phenylenevinylene-co-2,5-bis(6-triethoxysilylhexyloxy)-1,4-phenylenevinylene], Mn = 17000 Da

Conditions

Conditions	Yield
dihydrogen hexachloroplatinate In dichloromethane for 60h; Heating;	100%

: 998-30-1
Triethoxysilane

: 4181-20-8
tris(4-iodophenyl)amine

: 930798-86-0
tris(4-triethoxysilylphenyl)amine

Conditions

Conditions	Yield
With tetra-(n-butyl)ammonium iodide; triethylamine; bis(acetonitrile)(1,5-cyclooctadiene)rhodium(I) tetrafluoroborate In N,N-dimethyl-formamide at 80℃; for 1h;	100%
With methyl-triphenylphosphonium iodide; triethylamine; bis(acetonitrile)(1,5-cyclooctadiene)rhodium(I) tetrafluoroborate In N,N-dimethyl-formamide at 80℃; for 1h;	100%

: 998-30-1
Triethoxysilane

: 1105562-02-4
C102H146OSi

: 1105561-86-1
C108H162O4Si2

Conditions

Conditions	Yield
Stage #1: C102H146OSi With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex In 2,2-Dimethyl-1-oxa-2-silacyclohexan; toluene at 20℃; for 0.166667h; Inert atmosphere; Stage #2: Triethoxysilane In 2,2-Dimethyl-1-oxa-2-silacyclohexan; toluene at 20℃; for 1h; Inert atmosphere;	100%

: 998-30-1
Triethoxysilane

: 1105561-84-9
C122H150O2

: 1105561-82-7
C128H166O5Si

Conditions

Conditions	Yield
Stage #1: C122H150O2 With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex In 2,2-Dimethyl-1-oxa-2-silacyclohexan; toluene at 20℃; for 0.166667h; Inert atmosphere; Stage #2: Triethoxysilane In 2,2-Dimethyl-1-oxa-2-silacyclohexan; toluene at 20℃; for 1h; Inert atmosphere;	100%

: 998-30-1
Triethoxysilane

: 1105561-90-7
10-(4-(10-undecenyloxy)phenyl)ethynyl-9-anthraldehyde

: 1105561-88-3
10-(4-(11-(triethoxysilyl)undecyloxy)phenyl)ethynyl-9-anthraldehyde

Conditions

Conditions	Yield
Stage #1: 10-(4-(10-undecenyloxy)phenyl)ethynyl-9-anthraldehyde With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex In 2,2-Dimethyl-1-oxa-2-silacyclohexan; toluene at 20℃; for 0.166667h; Inert atmosphere; Stage #2: Triethoxysilane In 2,2-Dimethyl-1-oxa-2-silacyclohexan; toluene at 20℃; for 1h; Inert atmosphere;	100%

: 998-30-1
Triethoxysilane

: 101028-73-3
tris(trimethylsilyl)(vinyldimethylsilyl)methane

: 1158184-68-9
(Me3Si)3CSiMe2CH2CH2Si(OEt)3

Conditions

Conditions	Yield
With platinum In toluene at 20℃; for 48h;	100%

: 998-30-1
Triethoxysilane

: 821-95-4
1-undecene

: 951128-81-7
1-triethoxysilylundecane

Conditions

Conditions	Yield
at 90℃; for 5h; Inert atmosphere;	100%
at 90℃; for 5h; Inert atmosphere;	100%
With tri[1-methyl-2-diphenylposphino-3-ethylimidazolium hexafluorophosphate] rhodium chloride at 70℃; for 5h; Ionic liquid; regioselective reaction;
With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex at 80℃; for 20h; Schlenk technique; Inert atmosphere; regioselective reaction;	94.7 %Spectr.

: 998-30-1
Triethoxysilane

: 1344059-11-5
5-hexen-1-yl α-bromophenylacetate

: 1344059-13-7
6-(triethoxysilyl)hexyl α-bromophenylacetate

Conditions

Conditions	Yield
With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex In toluene for 24h; Inert atmosphere;	100%

: 998-30-1
Triethoxysilane

: 124-38-9
carbon dioxide

: triethoxysilyl formate

Conditions

Conditions	Yield
With C56H75N4O2Zn(1+)*C24BF20(1-) at 90℃; under 1140.08 Torr; for 48h;	100%
With [(1,3-bis(2,6-diisopropylphenyl)imidazol-2-ylidene)CuO2CH] In benzene-d6 at 100℃; under 760.051 Torr; for 1h; Inert atmosphere; Schlenk technique; Glovebox;	82%
With C39H49N3OSiZn In neat (no solvent) at 70℃; under 7240.26 Torr; for 40h; Catalytic behavior; Temperature; Reagent/catalyst;	60%

: 75070-85-8
rhodium hydrido (PEt3)3 complex

: 998-30-1
Triethoxysilane

: [Rh{Si(OEt)3}(PEt3)3]

Conditions

Conditions	Yield
In benzene-d6 Schlenk technique; Inert atmosphere;	100%

: 998-30-1
Triethoxysilane

: 1055315-90-6
[Rh(CH3)(triethylphosphine)3]

: 1446417-30-6
[Rh{Si(OEt)3}(PEt3)3]

Conditions

Conditions	Yield
In pentane at -90.16℃; Schlenk technique; Inert atmosphere;	100%

: 998-30-1
Triethoxysilane

: 95124-07-5
dimethyl (prop-2-yn-1-yl)malonate

: dimethyl 2-(2-(triethoxysilyl)allyl)malonate

Conditions

Conditions	Yield
With Ru(Cp*)(MeCN)3PF6 In dichloromethane at 0 - 20℃; for 1h; Inert atmosphere;	100%

: 998-30-1
Triethoxysilane

: 4667-99-6
chlorotriethoxysilane

Conditions

Conditions	Yield
With trichloroisocyanuric acid In dichloromethane Heating;	99.7%
With trichloroisocyanuric acid; copper(l) chloride In dichloromethane at 25℃; for 4h; Temperature; Reagent/catalyst; Reflux; Inert atmosphere;

: 558-37-2
tert-butylethylene

: 998-30-1
Triethoxysilane

: 41966-94-3
(3,3-dimethylbutyl)triethoxysilane

Conditions

Conditions	Yield
With N-heterocyclic carbene fuctionalized with methyl(trimethylsilane) and methoxypolyethylene glycol Pt(II) complex at 90℃; for 10h;	99.7%
With (TFAPDI)Co(2-ethylhexanoate)2 In neat (no solvent) at 23℃; for 24h;	87%
With (TFAPDI)Co(2-ethylhexanoate)2 at 20℃; for 24h;	87%

: 592-76-7
1-Heptene

: 998-30-1
Triethoxysilane

: β-heptyltriethoxysilane

Conditions

Conditions	Yield
With rhodium(III) chloride trihydrate at 80℃; for 8h;	99.6%

: 592-41-6
1-hexene

: 998-30-1
Triethoxysilane

: 18166-36-4
β-hexyltriethoxysilane

Conditions

Conditions	Yield
With rhodium(III) chloride trihydrate at 60℃; for 6h; Reagent/catalyst; Temperature;	99.5%
With graphite oxide-supported Karstedt catalyst at 60℃; for 1.5h;
With rhodium(III) chloride trihydrate; diphenyl(3-triethylsilylphenyl)phosphine at 90℃; for 5h; Inert atmosphere; Schlenk technique;
With C19H40N2OPtSi3 at 60℃; for 5h; Reagent/catalyst; Sealed tube;
With 2C14H25N2O3PtSi2(1-)*Fe(2+) at 80℃; for 4h; Reagent/catalyst;

: 998-30-1
Triethoxysilane

: 107-05-1
3-chloroprop-1-ene

: 5089-70-3
(3-chloropropyl)triethoxysilane

Conditions

Conditions	Yield
With Ru-B/γ-Al2O3 at 115℃; for 1h; Temperature; Inert atmosphere;	99.44%
With dihydrogen hexachloroplatinate; Triethoxyvinylsilane; isopropyl alcohol at 50 - 80℃; for 4h; Product distribution; Mechanism; influence unsaturated Si-comp. on rate of hydrosilylation; effect of other additives;	22.7 % Chromat.
bis(1,5-cyclooctadiene)diiridium(I) dichloride at -78 - 40℃; for 2h; Product distribution / selectivity; Inert atmosphere; pressure tight tube;	21.8 %Chromat.
With di-tert-butyl peroxide In methanol at 80 - 91℃; for 4h;	65 %Chromat.

: 109-67-1
1-penten

: 998-30-1
Triethoxysilane

: pentyltriethoxysilane

Conditions

Conditions	Yield
With Wilkinson's catalyst at 60℃; for 6h;	99.4%

: 111-66-0
oct-1-ene

: 998-30-1
Triethoxysilane

: 1233710-95-6
β-octylltriethoxysilane

Conditions

Conditions	Yield
With Wilkinson's catalyst at 80℃; for 6h; Reagent/catalyst;	99.3%
With graphite oxide-supported Karstedt catalyst at 60℃; for 1h;
With rhodium(III) chloride trihydrate; diphenyl(3-triethylsilylphenyl)phosphine at 90℃; for 5h; Inert atmosphere; Schlenk technique;

: 74-85-1
ethene

: 998-30-1
Triethoxysilane

: 78-07-9
ethyltriethoxy silane

Conditions

Conditions	Yield
With C22H34FeO2Si4 In toluene at 20℃; for 16h; Inert atmosphere; Schlenk technique;	99%
With C21H34FeO2Si4 In toluene at 20℃; under 760.051 Torr; for 5h; Schlenk technique;	96%
With pentacarbonyl iron at 130℃;

: 998-30-1
Triethoxysilane

: 108-94-1
cyclohexanone

: 18027-46-8
cyclohexyloxy(triethoxy)silane

Conditions

Conditions	Yield
hydroxyapatite In n-heptane at 90℃; for 1h;	99%
With hydroxyapatite In n-heptane at 90℃; for 1h;	99%
Rh catalyst

: 998-30-1
Triethoxysilane

: 501-65-5
diphenyl acetylene

: 65119-10-0
triethoxy-[(E)-(1,2-diphenylvinyl)]silane

Conditions

Conditions	Yield
chloro(1,5-cyclooctadiene)rhodium(I) dimer at 20℃; for 3h;	99%
With Palladium nanoparticles stabilized withtris-imidazolium tetrafluoroborates (1b-Pd) at 90℃; for 17h; Inert atmosphere; Sealed tube;	99%
With rhodium nanaoparticle stablized by polyethylene glycol at 60℃; for 36h; Sealed tube; stereoselective reaction;	99%

: 1942-45-6
4-Octyne

: 998-30-1
Triethoxysilane

: (Z)-triethoxy(oct-4-en-4-yl)silane

Conditions

Conditions	Yield
Cp*Ru(MeCN)3+PF6- In dichloromethane for 1h;	99%

: 998-30-1
Triethoxysilane

: 2170-06-1
1-Phenyl-2-(trimethylsilyl)acetylene

: triethoxy-[(E)-(1-phenyl-2-(trimethylsilyl)vinyl)]silane

Conditions

Conditions	Yield
chloro(1,5-cyclooctadiene)rhodium(I) dimer at 20℃;	99%

: 998-30-1
Triethoxysilane

: 594838-61-6
2,6-diyl bis(trifluoromethanesulfonate)anthracene

: 867144-07-8
2,6-bis(triethoxysilyl)anthracene

Conditions

Conditions	Yield
With triethanolamine; tetra-(n-butyl)ammonium iodide; bis(acetonitrile)(1,5-cyclooctadiene)rhodium(I) tetrafluoroborate In N,N-dimethyl-formamide at 80℃; for 2h;	99%

Triethoxysilane Consensus Reports

EPA Extremely Hazardous Substances List. Reported in EPA TSCA Inventory.

Triethoxysilane Specification

The Triethoxysilane, with the CAS registry number 998-30-1, is also known as Silane, triethoxy-. It belongs to the product categories of Si (Classes of Silicon Compounds); Si-H Compounds; Si-O Compounds; Trialkoxysilanes; Alkoxy Silanes; Hydrogensilanes Hydrogensiloxanes; Reducing Agents; Organometallic Reagents; Organosilicon; Poss Precursors and Intermediates. Its EINECS number is 213-650-7. This chemical's molecular formula is C₆H₁₆O₃Si and molecular weight is 164.28. What's more, its systematic name is Triethoxysilane. Its Superlist Classification Code is Threshold Planning Quantity (TPQ) = 500 lb. The product is stable at room temperature and pressure, and it should be sealed and stored in containers with dry inert gas which are placed in cool and dry places. Moreover, it should be protected from water and strong oxidizers. This chemical is a toxic chemical compound. It is an important raw material for producing silane coupling agent.

Physical properties of Triethoxysilane: (1)ACD/LogP: 4.222; (2)# of Rule of 5 Violations: 0; (3)ACD/LogD (pH 5.5): 4.22; (4)ACD/LogD (pH 7.4): 4.22; (5)ACD/BCF (pH 5.5): 952.00; (6)ACD/BCF (pH 7.4): 952.00; (7)ACD/KOC (pH 5.5): 4717.46; (8)ACD/KOC (pH 7.4): 4717.46; (9)#H bond acceptors: 3; (10)#H bond donors: 0; (11)#Freely Rotating Bonds: 6; (12)Polar Surface Area: 27.69 Å²; (13)Flash Point: 29.233 °C; (14)Enthalpy of Vaporization: 35.568 kJ/mol; (15)Boiling Point: 133.499 °C at 760 mmHg; (16)Vapour Pressure: 10.4 mmHg at 25°C.

Preparation: this chemical can be produced by trichlorosilane and anhydrous ethanol. Besides, it also can be produced by silica fume and ethanol which need the catalyst copper.

Uses of Triethoxysilane: it can be used to produce triethoxy-hexyl-silane at ambient temperature. This reaction will need catalyst Rh(I)-catalyst and solvent tetrahydrofuran with reaction time of 1 hours. The yield is about 97%.

Triethoxysilane can be used to produce triethoxy-hexyl-silane at ambient temperature

When you are using this chemical, please be cautious about it as the following:
This chemical is very toxic by inhalation, in contact with skin and if swallowed. It is flammable and can cause burns. In case of contact with eyes, you should rinse immediately with plenty of water and seek medical advice. When using it, you need wear suitable protective clothing, gloves and eye/face protection. After contact with skin, you should wash immediately with plenty of ... (to be specified by the manufacturer). In case of accident or if you feel unwell, you must seek medical advice immediately (show the label where possible).

You can still convert the following datas into molecular structure:
(1)SMILES: O(CC)[SiH](OCC)OCC
(2)Std. InChI: InChI=1S/C6H16O3Si/c1-4-7-10(8-5-2)9-6-3/h10H,4-6H2,1-3H3
(3)Std. InChIKey: QQQSFSZALRVCSZ-UHFFFAOYSA-N

The toxicity data is as follows:

Organism	Test Type	Route	Reported Dose (Normalized Dose)	Effect	Source
mouse	LC50	inhalation	500mg/m³/2H (500mg/m³)	BEHAVIORAL: ATAXIA LUNGS, THORAX, OR RESPIRATION: ACUTE PULMONARY EDEMA KIDNEY, URETER, AND BLADDER: "CHANGES IN TUBULES (INCLUDING ACUTE RENAL FAILURE, ACUTE TUBULAR NECROSIS)"	Toksikologiya Novykh Promyshlennykh Khimicheskikh Veshchestv. Toxicology of New Industrial Chemical Substances. For English translation, see TNICS*. Vol. 5, Pg. 192, 1963.
mouse	LD50	intravenous	180mg/kg (180mg/kg)		U.S. Army Armament Research & Development Command, Chemical Systems Laboratory, NIOSH Exchange Chemicals. Vol. NX#00018,
rat	LC50	inhalation	500mg/m³/2H (500mg/m³)	BEHAVIORAL: ATAXIA LUNGS, THORAX, OR RESPIRATION: ACUTE PULMONARY EDEMA KIDNEY, URETER, AND BLADDER: "CHANGES IN TUBULES (INCLUDING ACUTE RENAL FAILURE, ACUTE TUBULAR NECROSIS)"	Toksikologiya Novykh Promyshlennykh Khimicheskikh Veshchestv. Toxicology of New Industrial Chemical Substances. For English translation, see TNICS*. Vol. 5, Pg. 192, 1963.

Product Name

Triethoxysilane

Synthetic route

Triethoxysilane Consensus Reports

Triethoxysilane Specification

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