Conditions | Yield |
---|---|
With chlorine Irradiation; | 98% |
With chlorine at 65℃; for 6.5h; Irradiation; visible light; | 68% |
With chlorine im UV-Licht; |
trichloromethyltrichlorosilane
methyldiphenylsilane
A
(chloromethyl)trichlorosilane
B
trichloro(dichloromethyl)silane
C
chloromethyldiphenylsilane
Conditions | Yield |
---|---|
at 160 - 240℃; for 6h; | A 12.3% B 85.3% C 97.5% |
trichloro(dichloromethyl)silane
methyldiphenylsilane
A
Methyltrichlorosilane
B
(chloromethyl)trichlorosilane
C
chloromethyldiphenylsilane
Conditions | Yield |
---|---|
at 160 - 240℃; for 6h; | A 15.6% B 81.2% C 93.1% |
Methyltrichlorosilane
A
(chloromethyl)trichlorosilane
B
trichloro(dichloromethyl)silane
Conditions | Yield |
---|---|
With chlorine for 60h; Heating; Irradiation; | A 87% B 9% |
With chlorine at 70 - 80℃; Photolysis; |
Methyltrichlorosilane
A
(chloromethyl)trichlorosilane
B
trichloro(dichloromethyl)silane
C
trichloromethyltrichlorosilane
Conditions | Yield |
---|---|
With chlorine at 250℃; for 20h; Product distribution; Further Variations:; Temperatures; time; | A 85.9% B n/a C n/a |
With chlorine Irradiation; | A 70% B 5% C 1% |
Methyltrichlorosilane
A
(chloromethyl)trichlorosilane
B
trichloro(dichloromethyl)silane
C
Trichlorosilanyl-methanesulfonyl chloride
D
Chloro-trichlorosilanyl-methanesulfonyl chloride
Conditions | Yield |
---|---|
With yttrium(III) chloride; sulfuryl dichloride at 70℃; for 10h; Product distribution; Irradiation; other catalysts (HoCl3,TmCl3); | A 20% B 31% C 1.5% D 6.5% |
With yttrium(III) chloride; sulfuryl dichloride at 50 - 70℃; Product distribution; Irradiation; various inorganic additives (chlorides and oxychlorides of 32 elements); effect of inorganic chlorides and oxychlorides on the photochemical reaction of methylchlorosilanes with SO2Cl2; | A 22 % Spectr. B 31 % Spectr. C 1.5 % Spectr. D 6.5 % Spectr. |
diazomethane
(chloromethyl)trichlorosilane
Conditions | Yield |
---|---|
With tetrachlorosilane; diethyl ether; copper at -60℃; | |
With tetrachlorosilane; diethyl ether; copper at -78℃; | |
With tetrachlorosilane; diethyl ether at -50℃; |
Methyltrichlorosilane
A
methylene chloride
B
(chloromethyl)trichlorosilane
C
trichloro(dichloromethyl)silane
D
trichloromethyltrichlorosilane
Conditions | Yield |
---|---|
With chlorine at 80℃; for 17h; Further byproducts given; | A 0.7 g B 35.4 g C 5 g D 3.9 g |
dichloromethane
A
chloroform
B
(chloromethyl)trichlorosilane
C
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Conditions | Yield |
---|---|
With hexachlorodisilane at 399℃; Product distribution; var. temp. and molar ratio; |
trichloro(dichloromethyl)silane
A
Methyltrichlorosilane
B
tetrachlorosilane
C
(chloromethyl)trichlorosilane
D
1,1,1,3,3,3-hexachloro-1,3-disilapropane
Conditions | Yield |
---|---|
at 360℃; |
diazomethane
tetrachlorosilane
(chloromethyl)trichlorosilane
Conditions | Yield |
---|---|
In not given at low temp.;; | |
In diethyl ether byproducts: N2; SiCl4 and diazomethane in ether at about -50°C; vigorous react. under formation of N2;; | 45-47 |
(chloromethyl)trichlorosilane
ethylmagnesium chloride
triethylchloromethylsilane
Conditions | Yield |
---|---|
In tetrahydrofuran at 20℃; Inert atmosphere; Schlenk technique; | 98% |
In tetrahydrofuran at 0 - 20℃; |
(chloromethyl)trichlorosilane
isopropyl alcohol
(chloromethyl)triisopropoxysilane
Conditions | Yield |
---|---|
With 1H-imidazole; dmap In dichloromethane at 0 - 20℃; for 12h; Inert atmosphere; Schlenk technique; | 97% |
With triethylamine In hexane at 25 - 65℃; for 6h; Large scale; | 78% |
at 120℃; |
triisopropanolamine
(chloromethyl)trichlorosilane
1-chloromethyl-3,7,10-trimethyl-2,8,9-trioxa-5-aza-1-sila-bicyclo[3.3.3]undecane
Conditions | Yield |
---|---|
In chloroform | 97% |
(chloromethyl)trichlorosilane
1,3-bis(trimethylsilyl)tetrahydropyrimidin-2-one
1,3-bis[(trichlorosilyl)methyl]tetrahydropyrimidin-2-one
Conditions | Yield |
---|---|
In hexane for 27h; Inert atmosphere; Schlenk technique; | 96% |
(chloromethyl)trichlorosilane
HSiPh3
A
Methyltrichlorosilane
B
Triphenylsilyl chloride
Conditions | Yield |
---|---|
at 165 - 250℃; for 12h; | A 87.3% B 95.8% |
at 165 - 210℃; for 12h; | A 95.8% B 87.3% |
(chloromethyl)trichlorosilane
methyldiphenylsilane
A
Methyltrichlorosilane
B
chloromethyldiphenylsilane
Conditions | Yield |
---|---|
at 125 - 210℃; for 12h; | A 90.2% B 95.6% |
at 125 - 210℃; for 12h; | A 95.6% B 90.2% |
Conditions | Yield |
---|---|
In hexane at 20℃; for 3h; Inert atmosphere; | 95% |
In Petroleum ether at 25℃; for 4h; Solvent; Temperature; |
(chloromethyl)trichlorosilane
1,3,4,6,7,8-hexahydro-1-trimethylsilyl-2H-pyrimido<1,2-a>pyrimidin
Conditions | Yield |
---|---|
at 25℃; | 93.5% |
(chloromethyl)trichlorosilane
Conditions | Yield |
---|---|
In benzene at 25℃; | 92% |
2-(trimethylsilyloxy)pyridine
(chloromethyl)trichlorosilane
1-trichlorosilylmethylpyrid-2-one
Conditions | Yield |
---|---|
In hexane Alkylation; desilylation, rearrangement; | 92% |
(chloromethyl)trichlorosilane
Dimethylphenylsilane
A
Methyltrichlorosilane
B
phenyldimethylsilyl chloride
Conditions | Yield |
---|---|
at 125 - 210℃; for 2h; | A 91.4% B 88.6% |
trimethylsilan
(chloromethyl)trichlorosilane
A
chloro-trimethyl-silane
B
Methyltrichlorosilane
Conditions | Yield |
---|---|
at 500℃; for 0.00833333h; | A 86.8% B 91.2% |
at 500℃; for 0.00833333h; | A 91.2% B 86.8% |
Conditions | Yield |
---|---|
In hexane at -20℃; Inert atmosphere; Schlenk technique; | 91% |
With tin(IV) chloride; cyclohexene for 1h; Ambient temperature; | 75.1% |
With urea In Petroleum ether at 65℃; for 5h; Inert atmosphere; | 60% |
(chloromethyl)trichlorosilane
N,N-bis(2-hydroxypropyl)-N-(hydroxyethyl)amine
1-chloromethyl-3,7-dimethyl-2,8,9-trioxa-5-aza-1-sila-bicyclo[3.3.3]undecane
Conditions | Yield |
---|---|
In chloroform | 91% |
6-methyl-2-trimethylsiloxypyridine
(chloromethyl)trichlorosilane
Conditions | Yield |
---|---|
In hexane Alkylation; desilylation, rearrangement; | 91% |
(chloromethyl)trichlorosilane
2,2',2''-tris(trimethylsiloxy)triethylamine
A
1-(chloromethyl)silatrane
B
chloro-trimethyl-silane
Conditions | Yield |
---|---|
at 140 - 150℃; Yields of byproduct given; | A 90% B n/a |
(chloromethyl)trichlorosilane
6-chloro-2-trimethylsiloxypyridine
Conditions | Yield |
---|---|
In hexane Alkylation; desilylation, rearrangement; | 90% |
Conditions | Yield |
---|---|
In diethyl ether at 25℃; | 89% |
1-[N,N-bis(2-hydroxyethyl)amino]-2-propanol
(chloromethyl)trichlorosilane
1-(chloromethyl)-3-methylsilatrane
Conditions | Yield |
---|---|
In chloroform | 88% |
(chloromethyl)trichlorosilane
Conditions | Yield |
---|---|
In chloroform at 20℃; for 0.5h; Inert atmosphere; Schlenk technique; | 88% |
(chloromethyl)trichlorosilane
1,1,3,3-tetraphenyldisiloxane-1,3-diol
A
2-Chloro-2-chloromethyl-4,4,6,6-tetraphenyl-[1,3,5,2,4,6]trioxatrisilinane
Conditions | Yield |
---|---|
With pyridine In toluene for 3h; Heating; | A n/a B 87.6% |
bis(triethylgermyl)mercury
(chloromethyl)trichlorosilane
(Cl3SiCH2)2Hg
Conditions | Yield |
---|---|
In benzene byproducts: Et3GeCl; Irradiation (UV/VIS); in sealed ampul; irradiated for 15 min (distance of 10 cm); distild. (vac.); elem.anal.; | 87.1% |
In benzene byproducts: Et3GeCl; Irradiation (UV/VIS); Ge-compd. addn. to Si-compd. soln., sealing in evac. ampul, irradiation (DRT-375 quartz mercury lamp) until orange color of Ge-compd. disappeared (3 min); fractionation; elem. anal.; | 87.1% |
Conditions | Yield |
---|---|
With urea In diethyl ether for 4h; Reflux; Inert atmosphere; | 87% |
In Petroleum ether for 2h; Ambient temperature; | 83% |
In hexane at -20℃; Inert atmosphere; Schlenk technique; | 81% |
Conditions | Yield |
---|---|
for 8h; Heating; | 86% |
(chloromethyl)trichlorosilane
<(trimethylsilyl)thio>pyridine
Conditions | Yield |
---|---|
In benzene for 0.333333h; Alkylation; desilylation; | 86% |
EPA Extremely Hazardous Substances List.
The (Chloromethyl)trichlorosilane, with the CAS registry number 1558-25-4, is also known as Silane, trichloro(chloromethyl)-. It belongs to the product categories of Industrial/Fine Chemicals; Alpha Silanes; Chloro Silanes. Its EINECS registry number is 216-316-9. Its IUPAC name is called trichloro(chloromethyl)silane. This chemical is colorless clear liquid. You should keep its container tightly sealed which should be stored in a cool, dry place and ensure that workplaces have good ventilation or exhaust.
Physical properties of (Chloromethyl)trichlorosilane: (1)ACD/LogP: 4.42; (2)# of Rule of 5 Violations: 0; (3)ACD/LogD (pH 5.5): 4.42; (4)ACD/LogD (pH 7.4): 4.42; (5)ACD/BCF (pH 5.5): 1353.77; (6)ACD/BCF (pH 7.4): 1353.77; (7)ACD/KOC (pH 5.5): 6069.57; (8)ACD/KOC (pH 7.4): 6069.57; (9)#H bond acceptors: 0; (10)#H bond donors: 0; (11)#Freely Rotating Bonds: 1; (12)Index of Refraction: 1.463; (13)Molar Refractivity: 34.79 cm3; (14)Molar Volume: 126.3 cm3; (15)Surface Tension: 25.8 dyne/cm; (16)Density: 1.456 g/cm3; (17)Flash Point: 69.4 °C; (18)Enthalpy of Vaporization: 34.11 kJ/mol; (19)Boiling Point: 117.5 °C at 760 mmHg; (20)Vapour Pressure: 20.7 mmHg at 25°C.
Preparation: this chemical can be prepared by trichloro-methyl-silane. This reaction will need reagent chlorine.
Uses of (Chloromethyl)trichlorosilane: it can be used to produce chloromethyl-triethoxy-silane at temperature of 100 °C.
When you are using this chemical, please be cautious about it as the following:
Chemicals that at very low levels cause damage to health. Reacts violently with water. Very toxic by inhalation. Causes burns. In case of contact with eyes, rinse immediately with plenty of water and seek medical advice. Wear suitable protective clothing, gloves and eye/face protection.
You can still convert the following datas into molecular structure:
(1)Canonical SMILES: C([Si](Cl)(Cl)Cl)Cl
(2)InChI: InChI=1S/CH2Cl4Si/c2-1-6(3,4)5/h1H2
(3)InChIKey: FYTPGBJPTDQJCG-UHFFFAOYSA-N
The toxicity data is as follows:
Organism | Test Type | Route | Reported Dose (Normalized Dose) | Effect | Source |
---|---|---|---|---|---|
mouse | LC50 | inhalation | 60mg/m3/2H (60mg/m3) | BRAIN AND COVERINGS: OTHER DEGENERATIVE CHANGES LUNGS, THORAX, OR RESPIRATION: DYSPNEA BLOOD: HEMORRHAGE | Toksikologiya Novykh Promyshlennykh Khimicheskikh Veshchestv. Toxicology of New Industrial Chemical Substances. For English translation, see TNICS*. Vol. 3, Pg. 33, 1961. |
mouse | LDLo | intraperitoneal | 100mg/kg (100mg/kg) | Toksikologiya Novykh Promyshlennykh Khimicheskikh Veshchestv. Toxicology of New Industrial Chemical Substances. For English translation, see TNICS*. Vol. 3, Pg. 81, 1961. | |
mouse | LDLo | oral | 100mg/kg (100mg/kg) | Toksikologiya Novykh Promyshlennykh Khimicheskikh Veshchestv. Toxicology of New Industrial Chemical Substances. For English translation, see TNICS*. Vol. 3, Pg. 81, 1961. | |
mouse | LDLo | skin | 100mg/kg (100mg/kg) | "Toxicometric Parameters of Industrial Toxic Chemicals Under Single Exposure," Izmerov, N.F., et al., Moscow, Centre of International Projects, GKNT, 1982Vol. -, Pg. 37, 1982. | |
rat | LC | inhalation | > 5mg/m3/2H (5mg/m3) | BRAIN AND COVERINGS: OTHER DEGENERATIVE CHANGES LUNGS, THORAX, OR RESPIRATION: DYSPNEA BLOOD: HEMORRHAGE | Toksikologiya Novykh Promyshlennykh Khimicheskikh Veshchestv. Toxicology of New Industrial Chemical Substances. For English translation, see TNICS*. Vol. 3, Pg. 33, 1961. |
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