Product Name

  • Name

    Ethoxytrimethylsilane

  • EINECS 217-370-6
  • CAS No. 1825-62-3
  • Article Data146
  • CAS DataBase
  • Density 0.772 g/cm3
  • Solubility reacts with water
  • Melting Point -83 °C
  • Formula C5H14OSi
  • Boiling Point 75.5 °C at 760 mmHg
  • Molecular Weight 118.251
  • Flash Point -18 °C
  • Transport Information UN 1993 3/PG 2
  • Appearance clear colorless liquid
  • Safety 16-26-9-37/39-33
  • Risk Codes 11-22-36/37/38
  • Molecular Structure Molecular Structure of 1825-62-3 (Ethoxytrimethylsilane)
  • Hazard Symbols FlammableF, HarmfulXn, IrritantXi
  • Synonyms Ethyl trimethylsilyl ether;Trimethylsilicon ethoxide;Trimethylsilyl ethoxide;Trimethylsilyl ethyl ether;LS 875;NSC 43345;Silane M 3-ethoxy;Trimethylethoxysilane;
  • PSA 9.23000
  • LogP 1.85780

Synthetic route

ethanol
64-17-5

ethanol

Nafion-TMS

Nafion-TMS

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

Conditions
ConditionsYield
With triethylamine In dichloromethane at 27℃; for 3h;100%
ethanol
64-17-5

ethanol

N,N'-bis<(trimethylsiloxy)carbonyl>-N,N'-bis(trimethylsilyl)hydrazine
114518-51-3

N,N'-bis<(trimethylsiloxy)carbonyl>-N,N'-bis(trimethylsilyl)hydrazine

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

Conditions
ConditionsYield
97.5%
ethanol
64-17-5

ethanol

1,1,1,3,3,3-hexamethyl-disilazane
999-97-3

1,1,1,3,3,3-hexamethyl-disilazane

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

Conditions
ConditionsYield
With tetrabutylammonium phthalimide-N-oxyl In ethyl acetate for 1h; Reflux;96%
With [nano-MCM-41(at)(CH2)3-1-methylimidazole]Br3 In dichloromethane at 20℃; for 0.416667h;90%
orthoformic acid triethyl ester
122-51-0

orthoformic acid triethyl ester

A

ethyl bromide
74-96-4

ethyl bromide

B

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

C

formic acid ethyl ester
109-94-4

formic acid ethyl ester

Conditions
ConditionsYield
With chloro-trimethyl-silane; sodium bromide for 2h; Product distribution; Heating; Me3SiBr generated in situ;A n/a
B n/a
C 92%
ethanol
64-17-5

ethanol

N,N'-trimethylsilyl(phenyl)diazene
17881-28-6

N,N'-trimethylsilyl(phenyl)diazene

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

Azobenzene
1227476-15-4

Azobenzene

C

benzene
71-43-2

benzene

Conditions
ConditionsYield
for 0.5h; Ambient temperature;A 92%
B 0.01 mmol
C 66%
3-(trimethylsilyl)-2-oxazolidinone
43112-38-5

3-(trimethylsilyl)-2-oxazolidinone

ethanol
64-17-5

ethanol

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

Conditions
ConditionsYield
chloro-trimethyl-silane at 20℃; for 0.0166667h;90%
(ethylthio)trimethylsilane
5573-62-6

(ethylthio)trimethylsilane

orthoformic acid triethyl ester
122-51-0

orthoformic acid triethyl ester

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

tris(ethylsulfanyl)methane
6267-24-9

tris(ethylsulfanyl)methane

Conditions
ConditionsYield
With zinc(II) chloride In toluene at 0℃; for 5h;A 85%
B 90%
orthoformic acid triethyl ester
122-51-0

orthoformic acid triethyl ester

C7H19PS4Si
153080-50-3

C7H19PS4Si

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

S,S'-diethyl-S''-bis(1-ethoxy)methyl tetrathiophosphate

S,S'-diethyl-S''-bis(1-ethoxy)methyl tetrathiophosphate

Conditions
ConditionsYield
at 20℃; for 2h;A 90%
B 69%
ethanol
64-17-5

ethanol

trimethyl-(1H,1H,3H-tetrafluoropropoxy)silane
56002-69-8

trimethyl-(1H,1H,3H-tetrafluoropropoxy)silane

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

Conditions
ConditionsYield
at 20℃; for 1h;88.9%
Triethoxyvinylsilane
78-08-0

Triethoxyvinylsilane

N-<(β-trimethylsiloxy)ethyl>formamide
77214-46-1

N-<(β-trimethylsiloxy)ethyl>formamide

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

N-<2-(diethoxyvinylsiloxy)ethyl>formamide

N-<2-(diethoxyvinylsiloxy)ethyl>formamide

Conditions
ConditionsYield
With aluminum isopropoxide for 0.166667h; Yields of byproduct given;A n/a
B 86%
N-(ethoxymethyl)diethylamine
7352-03-6

N-(ethoxymethyl)diethylamine

2-<2-(trimethylsiloxy)ethoxy>-1,3,2-dioxaphospholane
145861-40-1

2-<2-(trimethylsiloxy)ethoxy>-1,3,2-dioxaphospholane

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

5-<(diethylamino)methyl>-1,4,6,9-tetraoxa-5λ5-phosphaspiro<4.4>nonane
128429-58-3

5-<(diethylamino)methyl>-1,4,6,9-tetraoxa-5λ5-phosphaspiro<4.4>nonane

Conditions
ConditionsYield
With zinc(II) chloride at 120℃;A 86%
B 58%
With zinc(II) chlorideA n/a
B 58%
With zinc(II) chloride at 130℃; Inert atmosphere;A n/a
B 58%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

Diethyl glutarate
818-38-2

Diethyl glutarate

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

1,2-bis((trimethylsilyl)oxy)cyclopent-1-ene
6838-66-0

1,2-bis((trimethylsilyl)oxy)cyclopent-1-ene

Conditions
ConditionsYield
With benzophenone; sodium In toluene at 50℃; Concentration; Inert atmosphere;A Ca. 70.9 g
B 83.5%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

ethanol
64-17-5

ethanol

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

Conditions
ConditionsYield
With urea at 20℃; for 4h;80.2%
With pyridine; xylene
With pyridine In diethyl ether for 3h; Heating;
ethanol
64-17-5

ethanol

N,N-Dimethylcarbamidsaeure-trimethylsilylester
32115-55-2

N,N-Dimethylcarbamidsaeure-trimethylsilylester

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

Conditions
ConditionsYield
for 0.0833333h; Ambient temperature;77%
ethyl Pentafluoropropionate
426-65-3

ethyl Pentafluoropropionate

potassium trimethylsilonate
10519-96-7

potassium trimethylsilonate

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

Potassium pentafluoropropionate
378-76-7

Potassium pentafluoropropionate

Conditions
ConditionsYield
In diethyl ether at 20℃; for 2h; Inert atmosphere;A n/a
B 77%
3-trimethylsilyl-4-trichloromethyl-2-oxetanone
344409-08-1

3-trimethylsilyl-4-trichloromethyl-2-oxetanone

ethanol
64-17-5

ethanol

A

ethyl 4,4,4-trichloro-3-hydroxybutyrate
19486-93-2

ethyl 4,4,4-trichloro-3-hydroxybutyrate

B

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

Conditions
ConditionsYield
at 130 - 150℃; for 100h;A 76%
B n/a
1-(Ethoxycarbonyl)-4-<4-(trimethylsilyloxy)phenyl>semicarbazid
106821-07-2

1-(Ethoxycarbonyl)-4-<4-(trimethylsilyloxy)phenyl>semicarbazid

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

4-(4-Hydroxyphenyl)-1,2,4-triazolidin-3,5-dion
106821-08-3

4-(4-Hydroxyphenyl)-1,2,4-triazolidin-3,5-dion

Conditions
ConditionsYield
at 215℃; Yields of byproduct given;A n/a
B 75%
diethoxy dimethylsilane
78-62-6

diethoxy dimethylsilane

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

Conditions
ConditionsYield
With CH3Cl; Mg In diethyl ether73%
With methylene chloride; magnesium In diethyl ether73%
With methylene chloride; magnesium In diethyl ether introduction of CH3Cl in a suspension of Mg in a mixt. of (CH3)2Si(OC2H5)2 and ether;;70%
With methylene chloride; magnesium In diethyl ether introduction of CH3Cl in a suspension of Mg in a mixt. of (CH3)2Si(OC2H5)2 and ether;;70%
ethanol
64-17-5

ethanol

pentachloro-2-(trimethylsiloxy)propene
87651-34-1

pentachloro-2-(trimethylsiloxy)propene

A

chloroform
67-66-3

chloroform

B

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

C

ethyl 1,1-dichloroacetate
535-15-9

ethyl 1,1-dichloroacetate

Conditions
ConditionsYield
With triethylamine for 8h; Heating; Yields of byproduct given;A n/a
B n/a
C 71%
With triethylamine for 8h; Heating; Yield given;A n/a
B n/a
C 71%
1-trimethylsiloxy-5-dimethylethoxysilylpentane
86517-51-3

1-trimethylsiloxy-5-dimethylethoxysilylpentane

A

1-oxa-2-sila-2,2-dimethylcycloheptane
18269-45-9

1-oxa-2-sila-2,2-dimethylcycloheptane

B

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

Conditions
ConditionsYield
With sodium ethanolate 1) heating (byproduct removal), 2) heating (to distill); further catalysts; method for preparation of 1-oxo-2-sila-2,2-disubstituted cycloheptanes and cyclooctanes;A 70%
B n/a
With sodium ethanolate 1) heating (byproduct removal), 2) heating (to distill); Yield given. Multistep reaction;
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

orthoformic acid triethyl ester
122-51-0

orthoformic acid triethyl ester

triethyl phosphite
122-52-1

triethyl phosphite

A

chloroethane
75-00-3

chloroethane

B

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

C

diethyl(diethoxymethyl)phosphonate
17997-33-0

diethyl(diethoxymethyl)phosphonate

Conditions
ConditionsYield
With also with acetic anhydride instead Me3SiCl (90 -100 deg C, 5 h) Product distribution;A n/a
B n/a
C 60%
trimethylsilyl iodide
16029-98-4

trimethylsilyl iodide

ethoxytriphenylsilane
1516-80-9

ethoxytriphenylsilane

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

triphenylsilyl iodide
18602-95-4

triphenylsilyl iodide

Conditions
ConditionsYield
In toluene at 110℃; for 4h; regioselective reaction;A n/a
B 60%
N-(ethoxymethyl)morpholine
18811-63-7

N-(ethoxymethyl)morpholine

2-<2-(trimethylsiloxy)ethoxy>-1,3,2-dioxaphospholane
145861-40-1

2-<2-(trimethylsiloxy)ethoxy>-1,3,2-dioxaphospholane

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

5-(morpholinomethyl)-1,4,6,9-tetraoxa-5-phosphaspiro<4,4>nonane

5-(morpholinomethyl)-1,4,6,9-tetraoxa-5-phosphaspiro<4,4>nonane

Conditions
ConditionsYield
With zinc(II) chlorideA n/a
B 57%
With zinc(II) chloride at 120℃;A n/a
B 52%
With zinc(II) chloride at 130℃; Inert atmosphere;A n/a
B 52%
trimethylsilyl cyanide
7677-24-9

trimethylsilyl cyanide

Na-tetrakis(ethoxy)borate

Na-tetrakis(ethoxy)borate

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

C5H5BN3O(1-)*Na(1+)

C5H5BN3O(1-)*Na(1+)

Conditions
ConditionsYield
at 60℃; for 48h;A n/a
B 55%
1-(ethoxymethyl)piperidine
3275-13-6

1-(ethoxymethyl)piperidine

2-<2-(trimethylsiloxy)ethoxy>-1,3,2-dioxaphospholane
145861-40-1

2-<2-(trimethylsiloxy)ethoxy>-1,3,2-dioxaphospholane

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

5-(piperidinomethyl)-1,4,6,9-tetraoxa-5-phosphaspiro<4,4>nonane

5-(piperidinomethyl)-1,4,6,9-tetraoxa-5-phosphaspiro<4,4>nonane

Conditions
ConditionsYield
With zinc(II) chloride at 120℃;A n/a
B 54%
With zinc(II) chloride at 130℃; Inert atmosphere;A n/a
B 54%
With zinc(II) chlorideA n/a
B 52%
diethylamine
109-89-7

diethylamine

diethyl trimethylsilyl phosphite
13716-45-5

diethyl trimethylsilyl phosphite

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

diethyl diethylphosphoramidite
20262-87-7

diethyl diethylphosphoramidite

C

diethyl-phosphonamidic acid ethyl ester
16141-72-3

diethyl-phosphonamidic acid ethyl ester

Conditions
ConditionsYield
at 100℃; for 1h;A n/a
B n/a
C 52%
diethylamine
109-89-7

diethylamine

diethyl trimethylsilyl phosphite
13716-45-5

diethyl trimethylsilyl phosphite

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

diethyl-phosphonamidic acid ethyl ester
16141-72-3

diethyl-phosphonamidic acid ethyl ester

Conditions
ConditionsYield
at 100℃; for 1h; Product distribution; Mechanism; with dibutylamine and with morpholine;A n/a
B 52%
at 100℃; for 1h;A n/a
B 52%
ethanol
64-17-5

ethanol

acetamide O-(trimethylsilyl)oxime
53127-77-8

acetamide O-(trimethylsilyl)oxime

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

Conditions
ConditionsYield
at 25℃;A 47%
B 50%
phosphonic acid diethyl ester
762-04-9

phosphonic acid diethyl ester

N,N-diethyl-1,1,1-trimethylsilanamine
996-50-9

N,N-diethyl-1,1,1-trimethylsilanamine

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

diethyl-phosphonamidic acid ethyl ester
16141-72-3

diethyl-phosphonamidic acid ethyl ester

Conditions
ConditionsYield
at 100℃; for 1h; Product distribution; Mechanism;A n/a
B 50%
at 100℃; for 1h;A n/a
B 50%
ethanol
64-17-5

ethanol

benzyltrimethylsilane
770-09-2

benzyltrimethylsilane

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

1-(ethoxymethyl)benzene
539-30-0

1-(ethoxymethyl)benzene

Conditions
ConditionsYield
With copper(II) bis(tetrafluoroborate) In acetonitrile for 10h; Irradiation;A n/a
B 48%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

4-chloro-1-(2,3,5,6-tetramethyl-cyclohexa-1,3-dienyl)-2-(2,3,5,6-tetramethyl-phenyl)-3,5-bis-trimethylsilanyl-[1,2,4]triborolane

4-chloro-1-(2,3,5,6-tetramethyl-cyclohexa-1,3-dienyl)-2-(2,3,5,6-tetramethyl-phenyl)-3,5-bis-trimethylsilanyl-[1,2,4]triborolane

4-ethoxy-1-(2,3,5,6-tetramethyl-cyclohexa-1,3-dienyl)-2-(2,3,5,6-tetramethyl-phenyl)-3,5-bis-trimethylsilanyl-[1,2,4]triborolane

4-ethoxy-1-(2,3,5,6-tetramethyl-cyclohexa-1,3-dienyl)-2-(2,3,5,6-tetramethyl-phenyl)-3,5-bis-trimethylsilanyl-[1,2,4]triborolane

Conditions
ConditionsYield
Substitution;99%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

(Cl)B(Si(CH3)3)CH((CH3)4C6H)B((CH3)4C6H)B(Si(CH3)3)CH
195319-42-7

(Cl)B(Si(CH3)3)CH((CH3)4C6H)B((CH3)4C6H)B(Si(CH3)3)CH

(C2H5O)B(Si(CH3)3)CH((CH3)4C6H)B((CH3)4C6H)B(Si(CH3)3)CH
277742-11-7

(C2H5O)B(Si(CH3)3)CH((CH3)4C6H)B((CH3)4C6H)B(Si(CH3)3)CH

Conditions
ConditionsYield
99%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

vanadium(V) oxychloride
7727-18-6

vanadium(V) oxychloride

chloroorthovanadic acid diethyl ester
1635-99-0

chloroorthovanadic acid diethyl ester

Conditions
ConditionsYield
In dichloromethane byproducts: (CH3)3SiCl; (N2); addn. of 3 equiv. of silane deriv. to CH2Cl2 soln. of vanadium compd. at room temp., stirring for 2 h at room temp.; evapn., elem. anal.;99%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

bis(1,2,4-tri-tert-butylcyclopentadienyl)cerium hydride
832076-19-4

bis(1,2,4-tri-tert-butylcyclopentadienyl)cerium hydride

[1,2,4-tri-tert-butylcyclopentadienyl]2CeOEt
1256136-75-0

[1,2,4-tri-tert-butylcyclopentadienyl]2CeOEt

Conditions
ConditionsYield
In benzene-d6 (under inert atm., Schlenk); Ce-complex dissolved in C6D6 in NMR tube, ligand added, 2 min; monitored by NMR;99%
In pentane (under inert atm., Schlenk); Ce-complex dissolved in pentane, ligand added, 10 min, after 30 min taken to dryness, sealed under vac. in ampoule,sublimed at 185°C; elem. anal.;25%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

acetic anhydride
108-24-7

acetic anhydride

trimethylsilyl acetate
2754-27-0

trimethylsilyl acetate

Conditions
ConditionsYield
With iron(II) bromide at 25℃; for 0.0833333h; Reagent/catalyst; Temperature;99%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

propionic acid anhydride
123-62-6

propionic acid anhydride

trimethylsilyl propionate
16844-98-7

trimethylsilyl propionate

Conditions
ConditionsYield
With CBV780 at 60℃; for 0.0833333h; Microwave irradiation;99%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

benzoic acid anhydride
93-97-0

benzoic acid anhydride

trimethylsilyl benzoate
2078-12-8

trimethylsilyl benzoate

Conditions
ConditionsYield
With CBV780 at 120℃; for 0.0833333h; Temperature; Microwave irradiation;99%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

(4-isopropylphenyl)dibromoborane
76782-91-7

(4-isopropylphenyl)dibromoborane

A

4-(diethoxyboryl)cumene
476156-89-5

4-(diethoxyboryl)cumene

B

2,4,6-tris-(4-isopropyl-phenyl)-cyclotriboroxane

2,4,6-tris-(4-isopropyl-phenyl)-cyclotriboroxane

Conditions
ConditionsYield
In dichloromethane at 20℃; for 24h;A 98%
B n/a
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

(4-isopropylphenyl)dibromoborane
76782-91-7

(4-isopropylphenyl)dibromoborane

4-(diethoxyboryl)cumene
476156-89-5

4-(diethoxyboryl)cumene

Conditions
ConditionsYield
In dichloromethane at 20℃; for 24h;98%
dimethyl 5-fluoroadamantane-1,3-dicarboxylate
1029505-73-4

dimethyl 5-fluoroadamantane-1,3-dicarboxylate

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

dimethyl 5-ethoxyadamantane-1,3-dicarboxylate
1158076-77-7

dimethyl 5-ethoxyadamantane-1,3-dicarboxylate

Conditions
ConditionsYield
With aluminium(III) triflate In dichloromethane at 84℃; for 8h;98%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

4-methyl-benzaldehyde
104-87-0

4-methyl-benzaldehyde

allyl-trimethyl-silane
762-72-1

allyl-trimethyl-silane

(CH3)C6H4CH(OC2H5)CH2CHCH2

(CH3)C6H4CH(OC2H5)CH2CHCH2

Conditions
ConditionsYield
With cesium salt nanocrystal of tungstosilicic acid In acetonitrile at 20℃; for 2.5h; Sakurai reaction;98%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

benzaldehyde
100-52-7

benzaldehyde

allyl-trimethyl-silane
762-72-1

allyl-trimethyl-silane

(1-ethoxy-but-3-enyl)benzene
54703-48-9

(1-ethoxy-but-3-enyl)benzene

Conditions
ConditionsYield
With 35 percent H3PW12O40 modified aluminium-incorporated mesoporous KIT-6 In acetonitrile at 20℃; for 2h; Reagent/catalyst; Solvent; Temperature; Hosomi-Sakurai Reaction; Green chemistry;98%
With cesium salt nanocrystal of tungstosilicic acid In acetonitrile at 20℃; for 2h; Sakurai reaction;95%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

4-methoxy-benzaldehyde
123-11-5

4-methoxy-benzaldehyde

allyl-trimethyl-silane
762-72-1

allyl-trimethyl-silane

(CH3O)C6H4CH(OC2H5)CH2CHCH2

(CH3O)C6H4CH(OC2H5)CH2CHCH2

Conditions
ConditionsYield
With cesium salt nanocrystal of tungstosilicic acid In acetonitrile at 20℃; for 3h; Sakurai reaction;98%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

1-(4-methoxyphenyl)ethanone
100-06-1

1-(4-methoxyphenyl)ethanone

allyl-trimethyl-silane
762-72-1

allyl-trimethyl-silane

(CH3O)C6H4CH(OC2H5)CH2CHCH2

(CH3O)C6H4CH(OC2H5)CH2CHCH2

Conditions
ConditionsYield
With 35 percent H3PW12O40 modified aluminium-incorporated mesoporous KIT-6 In acetonitrile at 20℃; for 3h; Reagent/catalyst; Hosomi-Sakurai Reaction; Green chemistry;98%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

triethylamine
121-44-8

triethylamine

tetraethylammonium fluorosulfonate
86759-27-5

tetraethylammonium fluorosulfonate

Conditions
ConditionsYield
With fluorosulfonyl fluoride In acetonitrile at -20 - -14℃; under 13 - 500 Torr; Autoclave;97.5%
With fluorosulfonyl fluoride In chlorobenzene at 20℃; for 12h; Sealed tube;16%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

trimethylsilyl triphenyl methyl ether
50653-07-1

trimethylsilyl triphenyl methyl ether

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

Triphenylmethylethylether
968-39-8

Triphenylmethylethylether

Conditions
ConditionsYield
With trimethylsilyl trifluoromethanesulfonate In dichloromethane at 0℃; for 0.5h;A n/a
B 97%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

trimethylsilyl triphenyl methyl ether
50653-07-1

trimethylsilyl triphenyl methyl ether

Triphenylmethylethylether
968-39-8

Triphenylmethylethylether

Conditions
ConditionsYield
trimethylsilyl trifluoromethanesulfonate In dichloromethane at 0℃; for 0.5h;97%
trimethylsilyl trifluoromethanesulfonate In dichloromethane at 0℃; for 0.5h; Product distribution;97%
m-bromobenzoic aldehyde
3132-99-8

m-bromobenzoic aldehyde

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

allyl-trimethyl-silane
762-72-1

allyl-trimethyl-silane

1-bromo-3-(1-ethoxy-but-3-enyl)-benzene

1-bromo-3-(1-ethoxy-but-3-enyl)-benzene

Conditions
ConditionsYield
With trimethylsilyl trifluoromethanesulfonate; 1-(n-butyl)-3-methylimidazolium triflate at 20℃; for 0.166667h;97%
Fe(OTs)3*6H2O In acetonitrile at 20℃; for 19h;84%
With bismuth(lll) trifluoromethanesulfonate In dichloromethane at 0℃; for 3h;82%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

1-adamantyl fluoride
768-92-3

1-adamantyl fluoride

1-Adamantyl ethyl ether
6221-75-6

1-Adamantyl ethyl ether

Conditions
ConditionsYield
With boron trifluoride diethyl etherate In dichloromethane at 20℃; for 24h;97%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

vanadium(V) oxychloride
7727-18-6

vanadium(V) oxychloride

oxovanadium(V) ethoxydichloride
1801-77-0

oxovanadium(V) ethoxydichloride

Conditions
ConditionsYield
In dichloromethane byproducts: (CH3)3SiCl; (N2); addn. of 2 equiv. of silane deriv. to CH2Cl2 soln. of vanadium compd. at room temp., stirring for 2 h at room temp.; evapn., elem. anal.;97%
1-Methylpyrrolidine
120-94-5

1-Methylpyrrolidine

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

N-ethyl-N-methylpyrrolidinium fluorosulfonate

N-ethyl-N-methylpyrrolidinium fluorosulfonate

Conditions
ConditionsYield
With fluorosulfonyl fluoride In acetonitrile at -19℃; under 14 - 400 Torr; Autoclave;97%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

triphenylhydroxysilane
791-31-1

triphenylhydroxysilane

1,1,1-trimethyl-3,3,3-triphenyl-disiloxane
799-53-1

1,1,1-trimethyl-3,3,3-triphenyl-disiloxane

Conditions
ConditionsYield
96.5%
96.5%
96.5%
With hydrogenchloride
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

trimethylamine
75-50-3

trimethylamine

ethyltrimethylammonium fluorosulfonate

ethyltrimethylammonium fluorosulfonate

Conditions
ConditionsYield
With fluorosulfonyl fluoride In acetonitrile at -20 - -10℃; under 64 - 300 Torr; for 13.22h; Autoclave;96%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

trichloroacetic acid anhydride
4124-31-6

trichloroacetic acid anhydride

trimethylsilyl trichloroacetate
25436-07-1

trimethylsilyl trichloroacetate

Conditions
ConditionsYield
With iron perchlorate hexahydrate at 25℃; for 0.5h;96%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

n-hexanoic anhydride
2051-49-2

n-hexanoic anhydride

trimethylsilyl hexanoate
14246-15-2

trimethylsilyl hexanoate

Conditions
ConditionsYield
With CBV780 at 100℃; for 0.0833333h; Temperature; Microwave irradiation;96%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

4-chlorobenzaldehyde
104-88-1

4-chlorobenzaldehyde

allyl-trimethyl-silane
762-72-1

allyl-trimethyl-silane

4-ethoxy-4-(4-chlorophenyl)-1-butene
1056626-90-4

4-ethoxy-4-(4-chlorophenyl)-1-butene

Conditions
ConditionsYield
With cesium salt nanocrystal of tungstosilicic acid In acetonitrile at 20℃; for 3h; Sakurai reaction;95%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

para-methylacetophenone
122-00-9

para-methylacetophenone

allyl-trimethyl-silane
762-72-1

allyl-trimethyl-silane

(CH3)C6H4CH(OC2H5)CH2CHCH2

(CH3)C6H4CH(OC2H5)CH2CHCH2

Conditions
ConditionsYield
With 35 percent H3PW12O40 modified aluminium-incorporated mesoporous KIT-6 In acetonitrile at 20℃; for 2h; Reagent/catalyst; Hosomi-Sakurai Reaction; Green chemistry;95%

Ethoxytrimethylsilane Consensus Reports

Reported in EPA TSCA Inventory.

Ethoxytrimethylsilane Specification

The IUPAC name of this chemical is ethoxy(trimethyl)silane. With the CAS registry number 1825-62-3 and EINECS 217-370-6, it is also named as Silane, ethoxytrimethyl-. The product's categories are Monoalkoxysilanes; Si (Classes of Silicon Compounds); Si-O Compounds. It is clear colorless liquid which reacts with water. When heated to decomposition it emits acrid smoke and irritating fumes. Additioanlly, this chemical should be sealed in the container and stored in the cool, well-ventilated and dry place. People should ensure that the workplace has well-ventilated equipment.

The other characteristics of this product can be summarized as: (1)ACD/LogP: 2.15; (2)# of Rule of 5 Violations: 0; (3)ACD/LogD (pH 5.5): 2.15; (4)ACD/LogD (pH 7.4): 2.15; (5)ACD/BCF (pH 5.5): 25.37; (6)ACD/BCF (pH 7.4): 25.37; (7)ACD/KOC (pH 5.5): 352.2; (8)ACD/KOC (pH 7.4): 352.2; (9)#H bond acceptors: 1; (10)#H bond donors: 0; (11)#Freely Rotating Bonds: 2; (12)Polar Surface Area: 9.23 Å2; (13)Index of Refraction: 1.382; (14)Molar Refractivity: 35.67 cm3; (15)Molar Volume: 153.1 cm3; (16)Polarizability: 14.14×10-24 cm3; (17)Surface Tension: 16.7 dyne/cm; (18)Enthalpy of Vaporization: 30.35 kJ/mol; (19)Vapour Pressure: 115 mmHg at 25°C; (20)Rotatable Bond Count: 2; (21)Exact Mass: 118.081392; (22)MonoIsotopic Mass: 118.081392; (23)Topological Polar Surface Area: 9.2; (24)Heavy Atom Count: 7; (25)Complexity: 46.5.

Preparation of Ethoxytrimethylsilane: It can be obtained by chloro-trimethyl-silane and ethanol. This reaction needs reagent urea at temperature of 20 °C. The reaction time is 4 hours. The yield is 80.2%.

Ethoxytrimethylsilane can be obtained by chloro-trimethyl-silane and ethanol

Uses of Ethoxytrimethylsilane: It is used in the synthesis of organic silicon compounds. And it is also used as water repellent. Besides, it can react with benzene-1,2,4,5-tetracarbonitrile to get 5-Methyl-1,2,4-benzenetricarbonitrile. This reaction needs solvent acetonitrile by irradiation. The reaction time is 2 hours. The yield is 85%.

Ethoxytrimethylsilane can react with benzene-1,2,4,5-tetracarbonitrile to get 5-Methyl-1,2,4-benzenetricarbonitrile

When you are using this chemical, please be cautious about it as the following:
It is not only harmful if swallowed, but also irritating to eyes, respiratory system and skin. And it is highly flammable, so people should keep away from sources of ignition. In case of contacting with eyes, rinse immediately with plenty of water and seek medical advice. After using it, take precautionary measures against static discharges. If you want to contact this product, you must wear suitable gloves and eye/face protection. 

People can use the following data to convert to the molecule structure. 
1. SMILES:O(CC)[Si](C)(C)C
2. InChI:InChI=1/C5H14OSi/c1-5-6-7(2,3)4/h5H2,1-4H3 
3. InChIKey:RSIHJDGMBDPTIM-UHFFFAOYAV

The following are the toxicity data which has been tested.

Organism Test Type Route Reported Dose (Normalized Dose) Effect Source
rat LCLo inhalation 4000ppm/8H (4000ppm) BEHAVIORAL: TREMOR

LUNGS, THORAX, OR RESPIRATION: DYSPNEA

GASTROINTESTINAL: CHANGES IN STRUCTURE OR FUNCTION OF SALIVARY GLANDS
Journal of Industrial Hygiene and Toxicology. Vol. 30, Pg. 332, 1948.
rat LDLo oral 1400mg/kg (1400mg/kg)   Journal of Industrial Hygiene and Toxicology. Vol. 30, Pg. 332, 1948.

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