2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane
A
octamethylcyclotetrasiloxane
B
decamethylcyclopentasiloxane
D
copoly(dimethylsiloxane/divinylsiloxane), prepared by anionic polymerization of 2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane; monomer(s): 2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxanecopoly(dimethylsiloxane/divinylsiloxane), prepared by anionic polymerization of 2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane; monomer(s): 2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane
Conditions | Yield |
---|---|
With P4-t-Bu at 80℃; for 0.333333h; Further byproducts given; | A n/a B n/a C n/a D 80% |
dimethyl sulfoxide
dimethylsilicon dichloride
A
chloro-methylsulfanyl-methane
B
Hexamethylcyclotrisiloxane
C
octamethylcyclotetrasiloxane
D
decamethylcyclopentasiloxane
E
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
at 0℃; Mechanism; other diorganyldichlorosilanes; reactions in the presence of hexamethyldisiloxane, trimethylchlorosilane, tetramethoxysilane, tetraethoxysilane; | A 79% B 48% C 35% D 12% E 5% |
dimethyl sulfoxide
A
chloro-methylsulfanyl-methane
B
Hexamethylcyclotrisiloxane
C
octamethylcyclotetrasiloxane
D
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
With dimethylsilicon dichloride at 0℃; Further byproducts given; | A 79% B 48% C 35% D 5% |
phenyltrimethylsilyl ether
A
octamethylcyclotetrasiloxane
B
dimethyl-diphenoxy-silane
C
C13H26O3Si3
Conditions | Yield |
---|---|
With gallium(III) iodide at 175 - 180℃; for 3h; Yield given; Further byproducts given. Title compound not separated from byproducts; | A n/a B 79% C n/a D n/a |
bis(trimethylsilyl)ketene
A
Hexamethylcyclotrisiloxane
B
octamethylcyclotetrasiloxane
C
trimethylsilylacetylene
Conditions | Yield |
---|---|
at 700℃; flash vacuum pyrolysis; | A 22% B 16% C 76% |
(trimethylsilyl)(dimethylsilyl)ketene
A
Hexamethylcyclotrisiloxane
B
octamethylcyclotetrasiloxane
C
trimethylsilylacetylene
Conditions | Yield |
---|---|
at 700℃; | A 22% B 16% C 76% |
1-(1-Adamantyl)-2-diazo-2-(pentamethyldisilanyl)ethanone
A
Hexamethylcyclotrisiloxane
B
octamethylcyclotetrasiloxane
C
1-(trimethylsilylethynyl)adamantane
Conditions | Yield |
---|---|
at 400℃; | A 21% B 20% C 73% |
(benzylimino)triphenylphosphorane
3,3-dimethyl-6-oxa-3-silabicyclo<3.1.0>hexane
A
Hexamethylcyclotrisiloxane
B
octamethylcyclotetrasiloxane
C
2,2,4,4-tetramethyl-6-vinyl-1,3-dioxa-2,4-disilacyclohexane
D
buta-1,3-diene
Conditions | Yield |
---|---|
at 130℃; for 1h; | A n/a B n/a C 70% D n/a |
at 130℃; for 1h; |
dimethylsilicon dichloride
A
Hexamethylcyclotrisiloxane
B
octamethylcyclotetrasiloxane
Conditions | Yield |
---|---|
With water Autoclave; | A 63.7% B 27.2% |
With water In toluene at 20℃; for 27h; | A 17 % Chromat. B 38% |
With water Autoclave; | A 15.9% B 17.4% |
With water In toluene at 20℃; for 27h; | A 4% B 44 % Chromat. |
With tetrabutylammonium tetrafluoroborate; oxygen In tetrahydrofuran Product distribution; Further Variations:; Reagents; amount of electricity; type of electrolysis cell; Electrochemical reaction; |
Hexamethylcyclotrisiloxane
1,2-silaoxetene 2,2-dimethyl-3-(trimethylsilyl)-4-adamantyl-1-oxa-2-silacyclobutene
A
octamethylcyclotetrasiloxane
B
1-(trimethylsilylethynyl)adamantane
Conditions | Yield |
---|---|
In benzene at 120℃; | A 48% B 62% |
diallyl(dimethyl)silane
Trifluoromethanesulfonamide
A
octamethylcyclotetrasiloxane
Conditions | Yield |
---|---|
With tert-butylhypochlorite; sodium iodide In acetonitrile at -30℃; for 24h; Inert atmosphere; Darkness; | A n/a B 28% C 61% |
diiododimethylsilane
A
octamethylcyclotetrasiloxane
B
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
With 3,3-dimethyl-butan-2-one; zinc In dichloromethane for 0.166667h; Ambient temperature; | A 60% B 18% |
dimethylsilicon dichloride
A
octamethylcyclotetrasiloxane
B
Tetradecamethylcycloheptasilan
C
decamethylcyclopentasilane
D
dodecamethylcyclohexasilane
Conditions | Yield |
---|---|
With tetrahydrofuran; lithium 0 deg C, 1 h, then 20-25 deg C, 2 h; Further byproducts given. Yields of byproduct given; | A n/a B n/a C 60% D n/a |
With tetrahydrofuran; lithium 0 deg C, 1 h, then 20-25 deg C, 2 h; Further byproducts given. Yields of byproduct given; | A n/a B n/a C n/a D 60% |
With tetrahydrofuran; lithium at -5 - 0℃; for 1h; Yield given. Further byproducts given. Yields of byproduct given; |
dimethylsilicon dichloride
A
Hexamethylcyclotrisiloxane
B
octamethylcyclotetrasiloxane
C
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
With pyridine; sodium hydrogencarbonate In ethyl acetate at 20℃; for 3h; | A 60% B 20% C 15% |
With water Autoclave; | A 51.3% B 29.2% C 8% |
With composite catalyst at 150℃; under 675.068 Torr; for 0.5h; Temperature; Pressure; Reagent/catalyst; Large scale; | A n/a B 43% C n/a |
dimethylsilicon dichloride
A
Hexamethylcyclotrisiloxane
B
octamethylcyclotetrasiloxane
C
decamethylcyclopentasiloxane
D
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With dimethyl sulfoxide at 0℃; Further byproducts given; | A 48% B 35% C 12% D 5% |
With tetrahydrofuran; lithium at 40 - 45℃; for 1h; Yield given. Further byproducts given. Yields of byproduct given; | |
With hydrogenchloride In toluene at 20℃; for 4h; Yield given. Further byproducts given. Yields of byproduct given; |
(allyl)(cyclopentadienyl)dimethylsilane
benzaldehyde
A
Hexamethylcyclotrisiloxane
B
octamethylcyclotetrasiloxane
C
6-phenylfulvene
Conditions | Yield |
---|---|
A n/a B n/a C 47% |
dimethylsilicon dichloride
A
tetradecamethylcycloheptasiloxane
B
Hexamethylcyclotrisiloxane
C
octamethylcyclotetrasiloxane
D
decamethylcyclopentasiloxane
E
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With H2O In water slow addn. of 4l (CH3)2SiCl2 to 12l H2O at 15-20°C withorous stirring; further products;; distn.;; | A n/a B 0.5% C 42% D 6.7% E 1.6% |
With hydrogenchloride In toluene at 20℃; for 4h; Product distribution; diff. concentration of aq. HCl; diff. reaction time; other difunctional organochlorosilanes; | |
With H2O In diethyl ether; water addn. of (CH3)2SiCl2 to ether-H2O; further products;; distn.;; |
dimethylsilicon dichloride
A
octamethylcyclotetrasiloxane
B
decamethylcyclopentasiloxane
Conditions | Yield |
---|---|
With water at 15 - 20℃; Autoclave; | A 42% B 6.7% |
2,3-dimethyl-3,4-epoxy-1-butene
dodecamethylcyclohexasilane
A
Hexamethylcyclotrisiloxane
B
octamethylcyclotetrasiloxane
D
2,3-dimethyl-buta-1,3-diene
Conditions | Yield |
---|---|
at 0℃; Irradiation; | A 3% B 4% C 38% D 25% |
tetramethylorthosilicate
dimethylsilicon dichloride
A
chloro-methylsulfanyl-methane
B
octamethylcyclotetrasiloxane
C
1,1-dimethyltetramethoxydisiloxane
Conditions | Yield |
---|---|
With dimethyl sulfoxide at 0℃; | A n/a B n/a C 37% |
epoxybutene
dodecamethylcyclohexasilane
A
Hexamethylcyclotrisiloxane
B
octamethylcyclotetrasiloxane
D
buta-1,3-diene
Conditions | Yield |
---|---|
at 0℃; Irradiation; | A 3% B 6% C 15% D 35% |
benzophenone
(allyl)(cyclopentadienyl)dimethylsilane
A
Hexamethylcyclotrisiloxane
B
octamethylcyclotetrasiloxane
C
6,6-Diphenylfulvene
Conditions | Yield |
---|---|
With quartz In benzene at 600℃; | A n/a B n/a C 28% |
tetraethoxy orthosilicate
dimethylsilicon dichloride
A
chloro-methylsulfanyl-methane
B
octamethylcyclotetrasiloxane
C
1,1-dimethyl-1,3,3,3-tetraethoxydisiloxane
Conditions | Yield |
---|---|
With dimethyl sulfoxide at 0℃; | A n/a B n/a C 28% |
1,1,3,3-Tetramethyldisiloxane
A
tetradecamethylcycloheptasiloxane
B
octamethylcyclotetrasiloxane
C
decamethylcyclopentasiloxane
D
dodecamethyl-cyclohexasiloxane
Conditions | Yield |
---|---|
With iodine In dichloromethane for 0.333333h; Heating; Further byproducts given; | A 14% B 26% C 21% D 15% |
chloro-trimethyl-silane
dimethylsilicon dichloride
A
Hexamethylcyclotrisiloxane
B
decamethyltetrasiloxane
C
octamethylcyclotetrasiloxane
D
dodecamethylpentasiloxane
Conditions | Yield |
---|---|
With water In toluene at 20℃; for 27h; Further byproducts given; | A n/a B 22% C n/a D 10 % Chromat. |
With water In toluene at 20℃; for 27h; Further byproducts given; | A n/a B 22 % Chromat. C n/a D 10% |
chloro-trimethyl-silane
dimethylsilicon dichloride
A
Hexamethylcyclotrisiloxane
B
decamethyltetrasiloxane
C
octamethylcyclotetrasiloxane
D
tetradecamethylhexasiloxane
Conditions | Yield |
---|---|
With water In toluene at 20℃; for 27h; Further byproducts given; | A n/a B 22% C n/a D 6 % Chromat. |
dodecamethylcyclohexasilane
A
Hexamethylcyclotrisiloxane
B
octamethylcyclotetrasiloxane
C
octamethylcyclotetrasilane
D
decamethylcyclopentasilane
Conditions | Yield |
---|---|
With sodium perchlorate In tetrahydrofuran Photolysis; | A 73 % Chromat. B 20% C n/a D n/a |
A
Hexamethyldisiloxane
B
Hexamethylcyclotrisiloxane
C
octamethylcyclotetrasiloxane
Conditions | Yield |
---|---|
In decane byproducts: H2S; Ar atmosphere; decompn. (165°C, 13 h); GLC, chromato-mass spectroscopy; | A 15% B 15% C 15% |
1-chloro-1,1,3,3,3-pentamethyldisiloxane
A
trimethylsilyl iodide
B
octamethylcyclotetrasiloxane
C
1-chloroheptamethyltrisiloxane
D
1-chloro-1,1,3,3,5,5,7,7,7-nonamethyltetrasiloxane
Conditions | Yield |
---|---|
With sodium iodide In acetonitrile for 18h; Mechanism; Ambient temperature; other siloxanes; other reagent, var. temp.; | A 14% B 10% C n/a D n/a |
Conditions | Yield |
---|---|
With aluminium(III) iodide at 140 - 170℃; for 5h; | 99% |
octamethylcyclotetrasiloxane
1,3-bis(3-azidopropyl)-1,1,3,3-tetramethyldisiloxane
Conditions | Yield |
---|---|
With trifluorormethanesulfonic acid at 60℃; for 13h; | 98% |
1,1,3,3-Tetramethyldisiloxane
octamethylcyclotetrasiloxane
(dimethoxy)methylsilane
Conditions | Yield |
---|---|
With trifluorormethanesulfonic acid at 20 - 60℃; for 15.25h; | 95% |
Conditions | Yield |
---|---|
With China clay; sulfuric acid at 100℃; for 120h; | 94.3% |
Conditions | Yield |
---|---|
With trifluorormethanesulfonic acid at 20 - 60℃; for 15.25h; | 94% |
1,1,3,3-Tetramethyldisiloxane
octamethylcyclotetrasiloxane
1,1,3,3,5,5,7,7,9,9,11,11-dodecamethylhexasiloxane
Conditions | Yield |
---|---|
With Kg-23 catalyst at 80℃; for 12h; Inert atmosphere; | 93% |
With potassium hydroxide In water; toluene at 50℃; for 2h; | 72.9% |
With sulfuric acid | |
With trimethylsilyl trifluoromethanesulfonate for 24h; |
Conditions | Yield |
---|---|
In methanol | 92% |
octamethylcyclotetrasiloxane
dimethylaluminum hydride
(CH3)2Si((OAl(CH3)2)2Si(CH3)2H)2
Conditions | Yield |
---|---|
In hexane stirring (4 d); distn. (vac.); | 90% |
Conditions | Yield |
---|---|
mixed in a quarts tube; heated to 180°C for 24 h; pressure (28 psig); purified by vac. distillation; recrystd. (cold pentane, or vac. sublimation); elem. anal.; | 90% |
octamethylcyclotetrasiloxane
Conditions | Yield |
---|---|
With sodium hydroxide In methanol for 4h; Time; Reflux; | 90% |
octamethylcyclotetrasiloxane
1,3-bis(3-azidopropyl)-1,1,3,3-tetramethyldisiloxane
Conditions | Yield |
---|---|
With trifluorormethanesulfonic acid at 60℃; for 13h; | 90% |
Conditions | Yield |
---|---|
With sulfuric acid at 20℃; for 4h; | 89% |
1,1,3,3-Tetramethyldisiloxane
octamethylcyclotetrasiloxane
C20H62O9Si10
Conditions | Yield |
---|---|
With Kg-23 catalyst In toluene at 80℃; for 12h; Inert atmosphere; | 86% |
With sulfuric acid | |
With trimethylsilyl trifluoromethanesulfonate for 24h; |
octamethylcyclotetrasiloxane
(E)-But-2-enedioic acid mono-(3-{3-[3-((E)-3-carboxy-acryloyloxy)-propyl]-1,1,3,3-tetramethyl-disiloxanyl}-propyl) ester
Conditions | Yield |
---|---|
With KU-23 ion-exchange resin at 90℃; for 7h; | 86% |
octamethylcyclotetrasiloxane
A
trimethylsilyl iodide
B
Hexamethyldisiloxane
C
methyl iodide
Conditions | Yield |
---|---|
With aluminium(III) iodide at 140 - 170℃; for 5h; | A n/a B 83.5% C n/a |
octamethylcyclotetrasiloxane
2,4,6,8-tetramethyl-2,4,6,8-tetravinyl-cyclotetrasiloxane
2-vinyl-2,4,4,6,6-pentamethylcyclotrisiloxane
Conditions | Yield |
---|---|
With triphenylphosphine; potassium hydroxide at 95 - 145℃; for 2h; Temperature; Concentration; Reagent/catalyst; Autoclave; | 83.4% |
octamethylcyclotetrasiloxane
1,3-bis<3-chloropropyl>-1,1,3,3-tetramethyldisiloxane
Conditions | Yield |
---|---|
Purolite CT-175 at 100℃; for 17h; | 83% |
octamethylcyclotetrasiloxane
(E)-But-2-enedioic acid mono-(3-{3-[3-((E)-3-carboxy-acryloyloxy)-propyl]-1,1,3,3-tetramethyl-disiloxanyl}-propyl) ester
Conditions | Yield |
---|---|
With KU-23 ion-exchange resin at 90℃; for 7h; | 82% |
octamethylcyclotetrasiloxane
bis<4-(methacryloyloxy)butyl>tetramethyldisiloxane
Conditions | Yield |
---|---|
With trifluorormethanesulfonic acid In chloroform at 25℃; for 24h; | 82% |
octamethylcyclotetrasiloxane
Conditions | Yield |
---|---|
With trifluorormethanesulfonic acid In chloroform at 25℃; for 24h; | 81.1% |
1,1,3,3-tetraethoxy-1,3-dimethyldisiloxane
octamethylcyclotetrasiloxane
Conditions | Yield |
---|---|
With potassium hydroxide at 145℃; | 81% |
dimethylmonochlorosilane
octamethylcyclotetrasiloxane
1,1,3,3,5,5,7,7,9,9,11,11-dodecamethylhexasiloxane
Conditions | Yield |
---|---|
With water; sulfur dioxide Ambient temperature; | 78% |
octamethylcyclotetrasiloxane
1,3-bis(3-azidopropyl)-1,1,3,3-tetramethyldisiloxane
Conditions | Yield |
---|---|
With trifluorormethanesulfonic acid at 20 - 80℃; for 20.25h; | 77% |
The Molecular Structure of Octamethylcyclotetrasiloxane (CAS NO.556-67-2):
Empirical Formula: C8H24O4Si4
Molecular Weight: 296.6158
Nominal Mass: 296 Da
Average Mass: 296.6158 Da
Monoisotopic Mass: 296.075163 Da
Index of Refraction: 1.423
Molar Refractivity: 79.02 cm3
Molar Volume: 310 cm3
Surface Tension: 18.4 dyne/cm
Density: 0.95 g/cm3
Flash Point: 63.2 °C
Enthalpy of Vaporization: 39.44 kJ/mol
Boiling Point: 175 °C at 760 mmHg
Vapour Pressure: 1.57 mmHg at 25°C
Appearance: Colorless to brown liquid
IUPAC Name: 2,2,4,4,6,6,8,8-octamethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane
Product Categories: Chloro;Silicon Compounds;Organics;Dichlorosilanes;Dichlorosilanes (for Polysilanes);Functional Materials;Reagent for High-Performance Polymer Research;Si (Classes of Silicon Compounds);Si-Cl Compounds;Silicon Compounds (for Synthesis);Synthetic Organic Chemistry;Chloro Silanes
Storage temp: Store at 0-5°C
Water Solubility: reacts
Sensitive: Moisture Sensitive
Stability: Stable. Reacts violently with water and alcohols. Highly flammable. Incompatible with strong oxidizing agents, water, alcohols, caustics, ammonia
Octamethylcyclotetrasiloxane (CAS NO.556-67-2) is commonly used as raw materials of organic silicon, also used in the electronics industry.
1. | skn-rbt 500 mg/24H MLD | 85JCAE Prehled Prumyslove Toxikologie; Organicke Latky Marhold, J.,Prague, Czechoslovakia.: Avicenum,1986,1230. | ||
2. | eye-rbt 500 mg/24H MLD | 85JCAE Prehled Prumyslove Toxikologie; Organicke Latky Marhold, J.,Prague, Czechoslovakia.: Avicenum,1986,1230. |
Reported in EPA TSCA Inventory.
A skin irritant. When heated to decomposition it emits acrid smoke and irritating vapors.
Hazard Codes: XiXnFN
Risk Statements: 20-59-36/37/38-11-67-65-63-48/20-38-20/21-50/53
R20: Harmful by inhalation
R59: Dangerous to the ozone layer
R36/37/38: Irritating to eyes, respiratory system and skin
R11: Highly flammable
R67: Vapours may cause drowsiness and dizziness
R65: Harmful: may cause lung damage if swallowed
R63: Possible risk of harm to the unborn child
R38: Irritating to skin
R20/21: Harmful by inhalation and in contact with skin
R50/53: Very toxic to aquatic organisms, may cause long-term adverse effects in the aquatic environment
Safety Statements: 60-61-62-36/37-59
S60: This material and its container must be disposed of as hazardous waste
S61: Avoid release to the environment. Refer to special instructions / safety data sheets
S62: If swallowed, do not induce vomitting; seek medical advice immediately and show this container or label
S36/37: Wear suitable protective clothing and gloves
S59: Refer to manufacturer / supplier for information on recovery / recycling
RIDADR: UN 2924 3/PG 2
WGK Germany: 3
F: 3-10-19-21
TSCA: Yes
HazardClass: 3
PackingGroup: II
HS Code: 29310095
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