Triethyllead chloride was added directly to male rat liver microsomes (0.0, 0.05, 0.25, 0.5, 1.0, and 3.0 mm), or the rats were pretreated with ip injections, once a day for 2 days (0.0, 1.5, and 3.0 mg triethyllead chloride/kg body wt), and microsomes prepared without any further treatment on D...
The interaction of triethyllead chloride with human and rat hemoglobin has been investigated using equilibrium dialysis. In addition the uptake of triethyllead by washed human and rat erythrocytes has been studied in vitro and the distribution of the organolead between blood cells and plamsa has...
The reactions of 1,1,1-tris(N-methylaminomethyl) ethane (Me3tame) with nickel(II), copper(II), zinc(II) and hydrogen ions have been studied at 298 K in aqueous solution (0.5 mol dm−3 KNO3) using potentiometric techniques. The equilibrium constants have been calculated using the computer program ...
Tris-1,1,1-(hydroxymethyl)ethane 1 was converted to a series of mono- and disubstituted derivatives. An indirect protocol for the differentiation of the alcohol groups was employed for the synthesis of partially and fully differentiated 1 containing a protected aldehyde unit. Complete differenti...
Paramagnetic, pentacoordinated 2,9-dimethyl- 1,10-phenanthroline adducts of bis(O, O-alkylene dithiophosphates) of nickel(II) with the general formula (where G(OH)2 = 2,3-dimethylbutane-2,3-diol, 2- methylpentane-2,4-diol and butane-2,3-diol) have been prepared by the reactions of O, O-alkylene...
Reactions of glutathione (GSH) with O,O-diorganyl dithiophosphoric acids (DTPA) were studied to develop bioactive derivatives of GSH. Effective coupling reaction of GSH with DTPA was proposed to produce the ammonium dithiophosphates (GSH–DTPA) between the NH2 group in γ-glutamyl residue of GSH...
Organogermanium derivatives of dithiophosphoric acid of general formula R4−nGe[SP(S)(OR′)2]n, where n = 1–3, R, = Me, Ph and R′ = Me, Et, have been prepared and characterized by means of 1H, 13C NMR and vibrational spectroscopy and mass spectrometry. The spectroscopic results indicate that th...
In this study, we performed a numerical simulation of the low-temperature thin-film growth of TiN layers in a plasma-assisted MOCVD reaction chamber for the purpose of eventual scale-up. Tetrakis(dimethylamino)titanium (TDMAT) or tetrakis(diethylamino)titanium (TDEAT) is commonly employed as a p...
The formation and structure of a thin film deposited using tetrakis-(dimethylamino)-titanium [Ti(N(CH3)2)4, TDMAT] as a precursor onto a Si(100)-2×1 substrate at ultrahigh vacuum (UHV) conditions was investigated by a combination of surface analytical techniques. The effects of surface temperat...
SummaryElectrochemical reduction of carbon dioxide (CO2RR) to formate provides an avenue to the synthesis of value-added carbon-based fuels and feedstocks powered using renewable electricity. Here, we hypothesized that the presence of sulfur atoms in the catalyst surface could promote undercoord...
In this work, we have studied the atomic layer deposition (ALD) of ZrO2 under various O3 dosing conditions and systematically investigated the interfacial properties of ZrO2/TiN during ALD fabrication using the CpZr(N(CH3)2)3 and O3 reactant combination. In a typical ZrO2 ALD process, the oxidat...
The attributes and limitations of chemically vapor-deposited titanium nitride films from the reaction of tetrakis-diethylamino-titanium with ammmonia and tetrakis-dimethylamino-titanium wiht ammonia are discussed. Deposited films were characterized by growth rate, resistivity, surface morphology...
The atomic layer deposition (ALD) of TiO2 from tetrakis(dimethylamino)titanium (TDMAT) and water was studied in the substrate temperature (TS) range of 120 °C to 330 °C.The effect of deposition temperatures on the resulting layer microstructure is investigated. Based on the experimental result...
Titanium nitride (TiN) can be deposited using the organometallic precursor tetrakis(dimethylamino)titanium (Ti[N(CH3)2]4) (TDMAT). Deviations from conformal TiN film growth have been observed in trench structures using TDMAT. This nonconformal deposition may be associated with readsorption and s...
The gas phase electronic structure of two transition metal alkylamino complexes, M(N(CH3)2)4, where M = Ti, Hf, was studied using photoelectron spectroscopy and density functional theory (DFT). These studies are a first step for predicting atomic layer and chemical vapor deposition reactions on ...
The ALD SnO2 thin films were investigated as a function of growth temperature to obtain optimized process and film properties using tetrakis(dimethylamino)tin as a Sn precursor, and hydrogen peroxide as reactant. The film growth shows 1.2 Å/cycle in the 100–200 °C temperature range and follows...
The toxicokinetics of glyphosate after single 100 mg kg−1 intravenous (i.v.) and 400 mg kg−1 oral doses were studied in rats. Serial blood samples were obtained after i.v. and oral administration. Plasma concentrations of glyphosate and its metabolite amiomethyl phosphonic acid (AMPA) were deter...
New methods were developed to determine glyphosate, N-(phosphonomethyl)glycine, and its major metabolite, (aminomethyl)phosphonic acid in groundwater and soil. The methods involve ligand-exchange, anion-exchange and derivatisation and final identification and quantification by GC–MS. The limits...
As a globally popular herbicide, glyphosate (GLY) and its metabolite aminomethylphosphonic acid (AMPA) pose potential hazards to the ecological environment. In this study, a sensitive and reliable method for detecting GLY and AMPA was utilized to facilitate exposure risk assessment of the analyt...
Glyphosate, AMPA, its main metabolite, and Glufosinate-ammonium were monitored in ambient air samples collected for two years (2015–2016), at four sampling sites in Provence-Alpes-Côte-d’Azur Region (PACA, France) in different areas typologies (non-agricultural areas: city center, ‘zero pesti...
About|Contact|Cas|Product Name|Molecular|Country|Encyclopedia
Message|New Cas|MSDS|Service|Advertisement|CAS DataBase|Article Data|Manufacturers | Chemical Catalog
©2008 LookChem.com,License: ICP
NO.:Zhejiang16009103
complaints:service@lookchem.com Desktop View