Chlorotrimethylsilane supplier

Name
Chlorotrimethylsilane
EINECS 200-900-5
CAS No. 75-77-4
Article Data600
CAS DataBase
Density 0.868 g/cm³
Solubility reacts with water
Melting Point -40 °C(lit.)
Formula C₃H₉ClSi
Boiling Point 58.737 °C at 760 mmHg
Molecular Weight 108.643
Flash Point -18 °C
Transport Information UN 2924 3/PG 2
Appearance colourless liquid
Safety 26-36/37/39-45-16-36/37
Risk Codes 20/21-36/38-34-21-14-11-37-35-19-40-10
Molecular Structure
Hazard Symbols F,C
Synonyms KA 31;KA 31 (silane);Monochlorotrimethylsilane;Monochlorotrimethylsilicon;NSC 15750;TMCS;TSL 8031;Trimethylchlorosilane;Trimethylsilicon chloride;Trimethylsilyl chloride;Trimethyl Chlorosilane;Trimethylchlorosilane(TMCS);Chlorotrimethylsilane;
PSA 0.00000
LogP 2.06010

Synthetic route

: 75-76-3
tetramethylsilane

: 75-77-4
chloro-trimethyl-silane

Conditions

Conditions	Yield
With 1,2-dichloro-ethane; aluminium trichloride at 130℃; for 17h;	100%
With hydrogenchloride; aluminium trichloride
With chlorine; iodine In tetrachloromethane at 30℃;
With hydrogenchloride

: 686-69-1
diethylchlorophosphine

: 60820-27-1, 63853-18-9
C12H27OPSi

A: 75-77-4
chloro-trimethyl-silane

B: 131551-67-2
1-(1-tert-Butyl-2,2-diethyl-diphosphanyl)-2,2-dimethyl-propan-1-one

Conditions

Conditions	Yield
at 100℃; for 1h;	A n/a B 100%

...Expand

: 1719-57-9
Chloro(chloromethyl)dimethylsilane

: 1118-02-1
trimethylsilyl isocyanate

A: 75-77-4
chloro-trimethyl-silane

B: 86845-05-8
(chloromethyl)isocyanatodimethylsilane

Conditions

Conditions	Yield
for 9h; Heating;	A 100% B 95%

...Expand

: 7677-24-9
trimethylsilyl cyanide

: 63877-23-6
(trimethylsilyl)acetyl chloride

A: 75-77-4
chloro-trimethyl-silane

B: 54276-53-8
2-<(trimethylsilyl)oxy>propenenitrile

Conditions

Conditions	Yield
	A 100% B 76%

...Expand

: 814-49-3
diethyl chlorophosphate

: 18156-74-6
1-(Trimethylsilyl)imidazole

A: 75-77-4
chloro-trimethyl-silane

B: 16913-98-7
1-(Diethoxyphosphinyl)imidazole

Conditions

Conditions	Yield
In dichloromethane for 1h; Ambient temperature;	A n/a B 100%

...Expand

: 2524-04-1
diethyl phosphorochloridothioate

: 18156-74-6
1-(Trimethylsilyl)imidazole

A: 75-77-4
chloro-trimethyl-silane

B: 107313-21-3
Imidazol-1-yl-phosphonothioic acid O,O-diethyl ester

Conditions

Conditions	Yield
In dichloromethane for 1h; Ambient temperature;	A n/a B 100%

...Expand

: 2524-04-1
diethyl phosphorochloridothioate

: 18293-54-4
1-trimethylsilyl-1,2,4-triazole

A: 75-77-4
chloro-trimethyl-silane

B: [1,2,4]Triazol-1-yl-phosphonothioic acid O,O-diethyl ester

Conditions

Conditions	Yield
In dichloromethane for 1h; Ambient temperature;	A n/a B 100%

...Expand

: 7677-24-9
trimethylsilyl cyanide

: 18162-48-6
tert-butyldimethylsilyl chloride

A: 75-77-4
chloro-trimethyl-silane

B: 56522-24-8
tert-butyldimethylsilyl cyanide

Conditions

Conditions	Yield
With tetra-(n-butyl)ammonium iodide at 100 - 180℃; for 4h;	A n/a B 100%
	A n/a B 77%

...Expand

: 124-63-0
methanesulfonyl chloride

: 18293-54-4
1-trimethylsilyl-1,2,4-triazole

A: 75-77-4
chloro-trimethyl-silane

B: 75668-13-2
1-Methanesulfonyl-1H-[1,2,4]triazole

Conditions

Conditions	Yield
In dichloromethane for 1h; Ambient temperature;	A n/a B 100%

...Expand

: 112-13-0
n-decanoyl chloride

: 17154-34-6
(trimethylsilyl)diphenylphosphine

A: 75-77-4
chloro-trimethyl-silane

B: 87361-17-9
(n-Decanoyl)diphenylphosphan

Conditions

Conditions	Yield
In Petroleum ether for 0.5h;	A n/a B 100%

...Expand

: 1079-66-9
chloro-diphenylphosphine

: 18156-74-6
1-(Trimethylsilyl)imidazole

A: 75-77-4
chloro-trimethyl-silane

B: 54877-59-7
1-(di-phenylphosphino)imidazole

Conditions

Conditions	Yield
In dichloromethane for 1h; Ambient temperature;	A n/a B 100%

...Expand

: 589-57-1
diethyl phosphorylchloridite

: 18156-74-6
1-(Trimethylsilyl)imidazole

A: 75-77-4
chloro-trimethyl-silane

B: 76089-86-6
C7H13N2O2P

Conditions

Conditions	Yield
In dichloromethane for 1h; Ambient temperature;	A n/a B 100%

...Expand

: 18156-74-6
1-(Trimethylsilyl)imidazole

: 98-59-9
p-toluenesulfonyl chloride

A: 75-77-4
chloro-trimethyl-silane

B: 2232-08-8
N-tosylimidazole

Conditions

Conditions	Yield
In dichloromethane for 1h; Ambient temperature;	A n/a B 100%

...Expand

: 18156-74-6
1-(Trimethylsilyl)imidazole

: 1499-21-4
Diphenylphosphinic chloride

A: 75-77-4
chloro-trimethyl-silane

B: 71638-08-9
1-(diphenylphosphinoyl)imidazole

Conditions

Conditions	Yield
In dichloromethane for 1h; Ambient temperature;	A n/a B 100%

...Expand

: 18293-54-4
1-trimethylsilyl-1,2,4-triazole

: 98-59-9
p-toluenesulfonyl chloride

A: 75-77-4
chloro-trimethyl-silane

B: 13578-51-3
1-(4-toluenesulfonyl)-1H-1,2,4-triazole

Conditions

Conditions	Yield
In dichloromethane for 1h; Ambient temperature;	A n/a B 100%

...Expand

: 112-16-3
n-dodecanoyl chloride

: 17154-34-6
(trimethylsilyl)diphenylphosphine

A: 75-77-4
chloro-trimethyl-silane

B: 87361-18-0
(n-Dodecanoyl)diphenylphosphan

Conditions

Conditions	Yield
In Petroleum ether for 0.5h;	A n/a B 100%

...Expand

: 38460-95-6
undec-10-enoyl chloride

: 17154-34-6
(trimethylsilyl)diphenylphosphine

A: 75-77-4
chloro-trimethyl-silane

B: 87361-19-1
Diphenyl(n-undec-10-enoyl)phosphan

Conditions

Conditions	Yield
In Petroleum ether for 0.5h;	A n/a B 100%

...Expand

: 7677-24-9
trimethylsilyl cyanide

A: 75-77-4
chloro-trimethyl-silane

B: 506-77-4
cyanogen chloride

C S, SO2: S, SO2

Conditions

Conditions	Yield
With thionyl chloride at 30 - 40℃; Product distribution; oth. reagent (SO2Cl2);	A 100% B 45% C n/a

...Expand

: 75-76-3
tetramethylsilane

: 10038-98-9
germaniumtetrachloride

A: 75-77-4
chloro-trimethyl-silane

B: 1529-47-1
chlorotrimethylgermane

C: 865-52-1
tetramethylgermane

Conditions

Conditions	Yield
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 2/1, at 180°C for 2.75 h, cooled; NMR, mass spectra, chromy.;	A 100% B 18% C 82%
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 2/1, at 180°C for 4.5 h, cooled; NMR, mass spectra, chromy.;	A 100% B 23% C 77%
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 2/1, at 200°C for 3.5 h, cooled; NMR, mass spectra, chromy.;	A 100% B 13% C 87%

...Expand

: 75-76-3
tetramethylsilane

: 10038-98-9
germaniumtetrachloride

A: 75-77-4
chloro-trimethyl-silane

B: 1529-47-1
chlorotrimethylgermane

C: 75-78-5
dimethylsilicon dichloride

Conditions

Conditions	Yield
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 2/1, at 200°C for 15 h, cooled; NMR, mass spectra, chromy.;	A 50% B 100% C 50%

...Expand

: 90669-97-9
bis(bis(trimethylsilyl)amino)ytterbium * 1,2-dimethoxyethane

A: 75-77-4
chloro-trimethyl-silane

B: 110-71-4
1,2-dimethoxyethane

C: 10361-91-8
ytterbium(III) chloride

D: ammonium chloride

Conditions

Conditions	Yield
With hydrogenchloride In toluene condensing gaseous HCl with liquid nitrogen in an ampul containing toluene solution of (((CH3)3Si)2N)2Yb*CH3O(CH2)2OCH3; warming to room temperature; removing volatile compounds ((CH3)3SiCl, DME) by vac. condensation; vac. sublimation at 100°C (1E-2 mm): NH4Cl;;	A 100% B 90% C 100% D 92%

...Expand

: bis[bis(trimethylsilyl)amido][[(trimethylsilyl)methyl]stannyl]praseodymium*0.5(dimethoxyethane)

A: 75-77-4
chloro-trimethyl-silane

B: 1333-74-0
hydrogen

C: 10361-79-2
praseodymium(III) chloride

D: 34570-67-7
Chlor-tris<(trimethylsilyl)methyl>zinn

E: 999-97-3
1,1,1,3,3,3-hexamethyl-disilazane

Conditions

Conditions	Yield
With hydrogenchloride In tetrahydrofuran mixt. od dry HCl (excess), Pr/Sn-complex and THF keeping dor 1 d at room temp., THF replacing by hexane in usual way; ppt. filtration of, hexane-soln. evapn. (vac.), residue crystn. twice (hexane, -70°C), GLC of volatiles;	A 50% B 87% C 100% D 76.2% E 33.3%

...Expand

: 368-44-5
dichloro(fluoro)(phenyl)silane

: 999-97-3
1,1,1,3,3,3-hexamethyl-disilazane

A: 75-77-4
chloro-trimethyl-silane

B: 1321987-17-0
1,1,1-trimethyl-3-phenyl-3-chloro-3-fluorodisilazane

Conditions

Conditions	Yield
at 20℃;	A n/a B 100%

...Expand

: 75-79-6
Methyltrichlorosilane

: 3789-85-3
2-[(trimethylsilyl)oxy]benzoic acid trimethylsilyl ester

A: 75-77-4
chloro-trimethyl-silane

B: 2-chloro-2-methyl-4H-benzo[d][1,3,2]dioxasilin-4-one

Conditions

Conditions	Yield
at 20℃; for 24h;	A 100% B 95%

...Expand

: 683-18-1
dibutyltin chloride

: 63226-47-1
1,3-diallyl-4-(trimethylsilyloxy)-2,6-dioxo-1,3,5-triazine

A: 75-77-4
chloro-trimethyl-silane

B: 80671-62-1
Bis(diallylisocyanurato)dibutyltin

Conditions

Conditions	Yield
In neat (no solvent) mixt. heating (30-40 min, 120-160°C, distilling flask); exposition to vac. 1.33 hPa; elem. anal.;	A >99 B 99.5%

...Expand

: 4071-88-9
trimethylsilanyl-acetic acid ethyl ester

A: 75-77-4
chloro-trimethyl-silane

B: 623-48-3
ethyl iodoacetae

Conditions

Conditions	Yield
With Iodine monochloride In tetrachloromethane for 0.5h; Ambient temperature;	A n/a B 99%

: 1118-02-1
trimethylsilyl isocyanate

: 88-10-8
N,N-diethylcarbamyl chloride

A: 75-77-4
chloro-trimethyl-silane

B: 40797-42-0
diethylcarbamoyl isocyanate

Conditions

Conditions	Yield
With tin(IV) chloride at 100 - 120℃; for 5h;	A 99% B 90%

...Expand

: 1118-02-1
trimethylsilyl isocyanate

: 79-44-7
N,N-Dimethylcarbamoyl chloride

A: 75-77-4
chloro-trimethyl-silane

B: 40797-41-9
dimethylcarbamoyl isocyanate

Conditions

Conditions	Yield
With tin(IV) chloride at 100 - 120℃; for 5h;	A 99% B 90%

...Expand

: 98-13-5
Phenyltrichlorosilane

: N-allyl-N'-trimethylsilylurea

A: 75-77-4
chloro-trimethyl-silane

B: C7H5Cl2NOSi

Conditions

Conditions	Yield
Heating;	A 99% B n/a

...Expand

: 7525-23-7
4,4'-dimethoxydiphenylmethyl chloride

: (R)-5-Oxo-1-trimethylsilanyl-pyrrolidine-2-carboxylic acid methyl ester

A: 75-77-4
chloro-trimethyl-silane

B: (R)-1-[Bis-(4-methoxy-phenyl)-methyl]-5-oxo-pyrrolidine-2-carboxylic acid methyl ester

Conditions

Conditions	Yield
With trifluorormethanesulfonic acid at 130℃; for 0.25h;	A n/a B 99%

...Expand

: 75-77-4
chloro-trimethyl-silane

: 1450-14-2
1,1,1,2,2,2-hexamethyldisilane

Conditions

Conditions	Yield
With sodium; lithium In tetrahydrofuran at 25 - 28℃; for 4h; Heating; Irradiation; ultrasound irrad. var. time, var. temperatures, var. metal purity;	100%
With sodium; lithium In tetrahydrofuran at 25 - 28℃; for 4h; Irradiation;	100%
With potassium fluoride; phosphorus; potassium In 5,5-dimethyl-1,3-cyclohexadiene at 90℃; for 12h; Reagent/catalyst; Temperature;	97.3%

: 75-77-4
chloro-trimethyl-silane

: 420-56-4
trimethylsilyl fluoride

Conditions

Conditions	Yield
With pyridine hydrogenfluoride In 1,4-dioxane at 20℃; for 0.0833333h; Schlenk technique; Inert atmosphere;	100%
With [((2-tBuNO)C6H4CH2)3N]TiF In tetrahydrofuran at 23℃; for 0.0833333h; Inert atmosphere;	98%
With lithium fluoride In acetonitrile under 600 Torr; for 2h; Heating;	80%

: 75-77-4
chloro-trimethyl-silane

: 107-46-0
Hexamethyldisiloxane

Conditions

Conditions	Yield
With hydrogenchloride at 20℃;	100%
With sodium hydroxide In water at 30℃; for 0.416667h; Concentration; Temperature;	99.97%
With styrene type I anion exchange resin In water at 45 - 75℃; for 2.5h; Concentration; Temperature; Inert atmosphere;	93.8%

: 75-77-4
chloro-trimethyl-silane

: 18204-79-0
trimethylsilyl perchlorate

Conditions

Conditions	Yield
With silver perchlorate In diethyl ether; dichloromethane-d2 Ambient temperature;	100%
With silver perchlorate
With silver perchlorate In dichloromethane-d2 for 19h;

: 75-77-4
chloro-trimethyl-silane

: 141-97-9
ethyl acetoacetate

: 13257-83-5
ethyl 3-trimethylsiloxy-2-butenoate

Conditions

Conditions	Yield
With triethylamine In tetrahydrofuran; hexane at 21 - 45℃; for 3h;	100%
With triethylamine In tetrahydrofuran Ambient temperature;	89%
Stage #1: chloro-trimethyl-silane; ethyl acetoacetate In tetrahydrofuran; hexane at 0 - 5℃; for 0.5h; Inert atmosphere; Stage #2: With triethylamine In tetrahydrofuran; hexane at 0 - 20℃; Inert atmosphere;	87%

: 75-77-4
chloro-trimethyl-silane

: 104-92-7
1-bromo-4-methoxy-benzene

: 877-68-9
4-trimethylsilylanisole

Conditions

Conditions	Yield
With n-butyllithium In tetrahydrofuran; hexane at 0 - 20℃; for 1h; Inert atmosphere;	100%
Stage #1: 1-bromo-4-methoxy-benzene With n-butyllithium In tetrahydrofuran; hexane at -78℃; for 1h; Stage #2: chloro-trimethyl-silane In tetrahydrofuran; hexane at -78 - 20℃;	99%
Stage #1: 1-bromo-4-methoxy-benzene With n-butyllithium In tetrahydrofuran; hexane at -78℃; Inert atmosphere; Schlenk technique; Stage #2: chloro-trimethyl-silane In tetrahydrofuran; hexane at -78 - 20℃; for 18h; Inert atmosphere; Schlenk technique;	96%

: 75-77-4
chloro-trimethyl-silane

: 56974-15-3
S-phenyl hexanethioate

: 68117-64-6
1-trimethylsiloxy-1-phenylthio-1-hexene

Conditions

Conditions	Yield
With lithium diisopropyl amide at -78℃;	100%
Stage #1: S-phenyl hexanethioate With lithium diisopropyl amide In tetrahydrofuran; hexane at -78℃; for 0.5h; Stage #2: chloro-trimethyl-silane In tetrahydrofuran; hexane at -78 - 60℃; for 1.5h;	76%
With lithium diisopropyl amide
With lithium diisopropyl amide 1.) THF, -78 deg C, 2.) THF, RT, 2h; Yield given. Multistep reaction;

: 75-77-4
chloro-trimethyl-silane

: 536-74-3
phenylacetylene

: 2170-06-1
1-Phenyl-2-(trimethylsilyl)acetylene

Conditions

Conditions	Yield
With lithium iodide at 80℃; for 24h; Reagent/catalyst; Solvent;	100%
Stage #1: phenylacetylene With ethylmagnesium bromide In tetrahydrofuran at -78 - 0℃; Inert atmosphere; Stage #2: chloro-trimethyl-silane In tetrahydrofuran at 0 - 20℃; Inert atmosphere;	99%
With diethylzinc In hexane; acetonitrile at 80℃; for 20h; Solvent; Temperature; Time; Schlenk technique; Inert atmosphere;	99%

: 75-77-4
chloro-trimethyl-silane

: 120-92-3
cyclopentanone

: 19980-43-9
1-(trimethylsilyloxy)cyclopentene

Conditions

Conditions	Yield
With triethylamine; sodium iodide In acetonitrile at 23℃; for 1.5h; Inert atmosphere;	100%
With 1,8-diazabicyclo[5.4.0]undec-7-ene In dichloromethane at 40℃; for 0.5h;	98%
With magnesium In N,N-dimethyl-formamide at 15 - 25℃;	94%

: 75-77-4
chloro-trimethyl-silane

: 57-11-4
stearic acid

: 18748-91-9
octadecanoic acid, trimethylsilyl ester

Conditions

Conditions	Yield
With triethylamine In tetrahydrofuran at 20℃; Inert atmosphere;	100%
In benzene
In hexane for 5h; Reflux; Inert atmosphere;

: 75-77-4
chloro-trimethyl-silane

: 927-74-2
1-butyn-4-ol

: 2117-12-6
4-(trimethylsilyl)but-3-yn-1-ol

Conditions

Conditions	Yield
Stage #1: 3-Butyn-1-ol With n-butyllithium In tetrahydrofuran; hexane at -78 - 20℃; for 1h; Stage #2: chloro-trimethyl-silane In tetrahydrofuran; hexane at -78 - 20℃; for 2h;	100%
Stage #1: 3-Butyn-1-ol With n-butyllithium In tetrahydrofuran; hexane at -78℃; for 1h; Schlenk technique; Inert atmosphere; Stage #2: chloro-trimethyl-silane In tetrahydrofuran; hexane at -78 - 20℃; for 2h; Schlenk technique; Inert atmosphere;	100%
Stage #1: 3-Butyn-1-ol With n-butyllithium In tetrahydrofuran; hexane at -78℃; for 1h; Stage #2: chloro-trimethyl-silane In tetrahydrofuran; hexane at -78 - 20℃; for 2h;	98%

: 75-77-4
chloro-trimethyl-silane

: 101-41-7
benzeneacetic acid methyl ester

: 40195-27-5
(1-methoxy-2-phenylvinyloxy)trimethylsilane

Conditions

Conditions	Yield
With n-butyllithium; N-ethyl-N,N-diisopropylamine In tetrahydrofuran at -78 - 20℃; Inert atmosphere;	100%
Stage #1: benzeneacetic acid methyl ester With lithium diisopropyl amide In tetrahydrofuran at -78℃; for 2.1h; Inert atmosphere; Stage #2: chloro-trimethyl-silane In tetrahydrofuran at 20℃; Inert atmosphere;	100%
Stage #1: benzeneacetic acid methyl ester With lithium diisopropyl amide In tetrahydrofuran; hexane at -78℃; for 2h; Stage #2: chloro-trimethyl-silane In tetrahydrofuran; hexane at 20℃;	91%

: 1003-09-4
2-bromothiophene

: 75-77-4
chloro-trimethyl-silane

: 18246-28-1
2-bromo-5-trimethylsilylthiophene

Conditions

Conditions	Yield
Stage #1: 2-bromothiophene With lithium diisopropyl amide In tetrahydrofuran Stage #2: chloro-trimethyl-silane In tetrahydrofuran	100%
Stage #1: 2-bromothiophene With n-butyllithium; diisopropylamine In tetrahydrofuran at -78 - 0℃; for 0.0833333h; Stage #2: chloro-trimethyl-silane In tetrahydrofuran at -78 - 20℃; for 0.5h;	91%
With lithium diisopropyl amide Yield given. Multistep reaction;

: 75-77-4
chloro-trimethyl-silane

: 90-63-1
(RS)-1-hydroxy-1-phenylpropan-2-one

: 26205-40-3
methyl(α-trimethylsiloxybenzyl) ketone

Conditions

Conditions	Yield
With 1H-imidazole; dmap In diethyl ether	100%

: 75-77-4
chloro-trimethyl-silane

: 866-23-9
diethyl (trichloromethyl)phosphonate

: 176100-94-0
O,O-diethyltrimethylsilylchloromethylphosphonate α-lithie

Conditions

Conditions	Yield
With n-butyllithium In tetrahydrofuran; hexane at -90 - -85℃; for 0.25h;	100%
With n-butyllithium In tetrahydrofuran; hexane at -80℃; for 0.25h;

: 75-77-4
chloro-trimethyl-silane

: 6309-18-8
2-(3,4-dimethoxyphenyl)-2-hydroxyacetonitrile

: 95392-01-1
2-(3,4-dimethoxyphenyl)-2-((trimethylsilyl)oxy)acetonitrile

Conditions

Conditions	Yield
With 1H-imidazole; dmap In diethyl ether	100%

: 75-77-4
chloro-trimethyl-silane

: 867-13-0
diethoxyphosphoryl-acetic acid ethyl ester

: 65868-40-8
ethyl P,P-bis(trimethylsilyl) phosphonoacetate

Conditions

Conditions	Yield
at 100℃; for 168h; Inert atmosphere;	100%
With potassium iodide In acetonitrile at 25 - 35℃; for 0.5h;
In chlorobenzene at 140℃; for 18h;

: 75-77-4
chloro-trimethyl-silane

: 3167-63-3
diethyl chloromethylphosphonate

: 176100-94-0
O,O-diethyltrimethylsilylchloromethylphosphonate α-lithie

Conditions

Conditions	Yield
With n-butyllithium In tetrahydrofuran; hexane at -90 - -85℃; for 0.25h;	100%
With n-butyllithium In tetrahydrofuran; hexane at -80℃; for 0.833333h;

: 75-77-4
chloro-trimethyl-silane

: 33646-40-1
4-methoxymandelonitrile

: 66985-48-6
2-(4-methoxyphenyl)-2-(trimethylsilyloxy)acetonitrile

Conditions

Conditions	Yield
With 1H-imidazole; dmap In diethyl ether	100%

: 75-77-4
chloro-trimethyl-silane

: 18881-17-9, 62855-02-1, 62928-94-3, 63006-93-9
(S)-3-hydroxymethyl-1,2,3,4-tetrahydroisoquinoline

: 1025931-48-9
(S)-3-Trimethylsilanyloxymethyl-1,2,3,4-tetrahydro-isoquinoline

Conditions

Conditions	Yield
With triethylamine In tetrahydrofuran	100%

: 75-77-4
chloro-trimethyl-silane

: 34339-62-3
methyl 2,3-dideoxy-6-O-toluene-p-sulphonyl-α-D-erythro-hexopyranoside

: 92413-84-8
Toluene-4-sulfonic acid (2R,3S,6S)-6-methoxy-3-trimethylsilanyloxy-tetrahydro-pyran-2-ylmethyl ester

Conditions

Conditions	Yield
With 1,1,1,3,3,3-hexamethyl-disilazane In pyridine Ambient temperature;	100%

: 75-77-4
chloro-trimethyl-silane

: 24347-58-8
(R,R)-2,3-butandiol

: 125473-19-0
(R,R)-butanediol bis(trimethylsilyl) ether

Conditions

Conditions	Yield
With 1H-imidazole In diethyl ether at 0 - 20℃;	100%
With triethylamine In dichloromethane 5 deg C to room temperature;	96%
With triethylamine In tetrahydrofuran at 20℃; for 20h;	92%

: 75-77-4
chloro-trimethyl-silane

: 1117-86-8
1,2-octandiol

: 33968-37-5
1,2-bis(trimethylsilyloxy)octane

Conditions

Conditions	Yield
With triethylamine In dichloromethane for 1h; Ambient temperature;	100%

: 75-77-4
chloro-trimethyl-silane

: 5390-04-5
pent-1-yn-5-ol

: 13224-84-5
5-trimethylsilanyl-pent-4-yn-1-ol

Conditions

Conditions	Yield
With n-butyllithium Inert atmosphere;	100%
Stage #1: chloro-trimethyl-silane; pent-1-yn-5-ol With n-butyllithium In tetrahydrofuran; hexane at -78 - 20℃; for 2h; Inert atmosphere; Stage #2: With hydrogenchloride In water for 3h; Inert atmosphere;	100%
Stage #1: pent-1-yn-5-ol With n-butyllithium In tetrahydrofuran; hexane at -78℃; for 1.08333h; Inert atmosphere; Stage #2: chloro-trimethyl-silane In tetrahydrofuran; hexane at 20℃;	100%

: 75-77-4
chloro-trimethyl-silane

: 928-90-5
5-hexyl-1-ol

: 103437-52-1
6-trimethylsilanyl-hex-5-yn-1-ol

Conditions

Conditions	Yield
Stage #1: 5-hexyl-1-ol With ethylmagnesium bromide Stage #2: chloro-trimethyl-silane Stage #3: With sulfuric acid In tetrahydrofuran	100%
Stage #1: 5-hexyl-1-ol With n-butyllithium In tetrahydrofuran at -78℃; Inert atmosphere; Stage #2: chloro-trimethyl-silane In tetrahydrofuran at -78 - 0℃; Inert atmosphere; Stage #3: With hydrogenchloride In tetrahydrofuran; water at 0 - 20℃; Inert atmosphere;	100%
Stage #1: 5-hexyl-1-ol With dmap; n-butyllithium In tetrahydrofuran; diethyl ether; hexane at -78℃; for 1h; Inert atmosphere; Stage #2: chloro-trimethyl-silane at -78 - 20℃; for 2h; Inert atmosphere;	99%

: 75-77-4
chloro-trimethyl-silane

: 5296-64-0
allyl phenyl thioether

: 78905-13-2
phenyl 1-(trimethylsilyl)prop-2-en-1-yl sulfide

Conditions

Conditions	Yield
Stage #1: allyl phenyl thioether With n-butyllithium In tetrahydrofuran at -78℃; Stage #2: chloro-trimethyl-silane In tetrahydrofuran at -78 - 20℃;	100%
With n-butyllithium In tetrahydrofuran; hexane at -78℃; for 0.333333h;	93%
With lithium diisopropyl amide In tetrahydrofuran at -78℃; for 3.5h;	92%
With lithium diisopropyl amide In tetrahydrofuran at -78℃; Yield given;
Yield given. Multistep reaction;

: 75-77-4
chloro-trimethyl-silane

: 58556-75-5
2,7-dibromonaphthalene

: 40490-26-4
2,7-naphthalenediylbis(trimethylsilane)

Conditions

Conditions	Yield
With n-butyllithium In tetrahydrofuran -78 deg C to -20 deg C;	100%
With n-butyllithium In tetrahydrofuran; hexane at -78℃; for 1.08333h; Substitution;	100%
With n-butyllithium

: 75-77-4
chloro-trimethyl-silane

: 58556-75-5
2,7-dibromonaphthalene

: 99642-47-4
(7-bromonaphthalen-2-yl)trimethylsilane

Conditions

Conditions	Yield
Stage #1: 2,7-dibromonaphthalene With n-butyllithium In tetrahydrofuran; hexane at -78℃; for 0.333333h; Stage #2: chloro-trimethyl-silane In tetrahydrofuran; hexane at -78 - 20℃; for 2.25h;	100%
Stage #1: 2,7-dibromonaphthalene With n-butyllithium; N,N,N,N,-tetramethylethylenediamine In diethyl ether; hexane at -78℃; for 1.83333h; Inert atmosphere; Stage #2: chloro-trimethyl-silane In diethyl ether; hexane at -78℃; for 3h; Inert atmosphere;	81%
With n-butyllithium 1.) THF, hexane, -78 deg C, 20 min, 2.) THF, hexane, RT, 2 h; Yield given. Multistep reaction;

: 75-77-4
chloro-trimethyl-silane

: 103-28-6
benzyl 2-methylpropanoate

: 480453-25-6
((1-(benzyloxy)-2-methylprop-1-en-1-yl)oxy)trimethylsilane

Conditions

Conditions	Yield
With lithium hexamethyldisilazane at -78 - 20℃;	100%
1.) THF, -78 deg C, 2.) HMPA, -78 deg C; Multistep reaction;
Stage #1: benzyl 2-methylpropanoate With n-butyllithium; diisopropylamine In tetrahydrofuran; hexane at -78℃; for 1h; Inert atmosphere; Stage #2: chloro-trimethyl-silane In tetrahydrofuran; hexane at -78 - 20℃; for 20h; Inert atmosphere;

Chlorotrimethylsilane Chemical Properties

Molecular formula:C₃H₉SiCl
Molar mass:108.64 g/mol
Density:0.856 g/cm³, liquid
Melting point:-40 °C (233.2 K)
Boiling point:57 °C (330.2 K)
Solubility:in WATER reacts
Appearance:Colorless liquid, fumes in moist air
Chlorotrimethylsilane's Storage:Store in a cool, dry well-ventilated location, away from any area where the fire hazard may be acute. Outside or detached storage is preferred.
Stability: Reacts violently with WATER. Do not get WATER inside of container. Hydrochloric Acid is liberated on contact with moisture or heat.

Chlorotrimethylsilane Toxicity Data With Reference

Chlorotrimethylsilane's toxicity information:
Skin Contact:
Severe burns may occur from even a short time of contact. May be absorbed through the skin.
Eye Contact:
Eye contact produces severe burns, pain, swelling, corneal erosions and possibly blindness.
Inhalation:
Corrosive. Extremely destructive to tissues of the mucous membranes and upper respiratory tract. Symptoms may include burning sensation, coughing, wheezing, laryngitis, shortness of breath, headache, nausea and vomiting. Inhalation may be fatal as a result of spasm inflammation and edema of the larynx and bronchi, chemical pneumonitis and pulmonary edema.
Ingestion:
Corrosive. Swallowing can cause severe burns of the mouth, throat, and stomach, leading to death. Can cause sore throat, vomiting, diarrhea.

Chlorotrimethylsilane Safety Profile

Skin Contact:
In case of contact, immediately flush skin with plenty of WATER for at least 15 minutes while removing contaminated clothing and shoes. Wash clothing before reuse. Thoroughly clean shoes before reuse. Get medical attention immediately.
Eye Contact:
Immediately flush eyes with plenty of WATER for at least 15 minutes, lifting lower and upper eyelids occasionally. Get medical attention immediately.

Product Name

Chlorotrimethylsilane

Synthetic route

Chlorotrimethylsilane Chemical Properties

Chlorotrimethylsilane Toxicity Data With Reference

Chlorotrimethylsilane Safety Profile

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